专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明申请

US20120034559A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH 有权
标题翻译：抗紫外线或辐射敏感性树脂组合物，其抗蚀剂及其形成图案的方法
公开(公告)号：US20120034559A1
公开(公告)日：2012-02-09
申请号：US13193235
申请日：2011-07-28
申请人： Toshiya TAKAHASHI , Hideaki TSUBAKI , Hiroshi TAMAOKI , Hidenori TAKAHASHI
发明人： Toshiya TAKAHASHI , Hideaki TSUBAKI , Hiroshi TAMAOKI , Hidenori TAKAHASHI
IPC分类号： G03F7/039 , G03F7/075 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0758 , G03F7/20 , G03F7/2037 , G03F7/2039 , G03F7/30 , G03F7/322
摘要： Provided is an actinic-ray- or radiation-sensitive resin composition, includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a repeating unit (B) with a structure that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and a compound (U) structured so that when the composition is formed into a film, the compound is unevenly distributed in a surface of the film.
摘要翻译：本发明提供一种光化学射线或辐射敏感性树脂组合物，其包含含有重复单元（A）的树脂（P），当将其暴露于光化射线或辐射时，分解出酸和重复单元（B）具有当被酸作用时的结构被分解，从而增加其在碱性显影剂中的溶解度，以及组合物（U），使得当组合物形成膜时，化合物不均匀地分布在这个电影。

12. 发明申请

US20130078434A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, RESIST FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE SAME 有权
标题翻译：丙烯酸类敏感性或辐射敏感性树脂组合物，耐蚀膜，图案形成方法，电子设备制造方法和电子设备，每个使用它们
公开(公告)号：US20130078434A1
公开(公告)日：2013-03-28
申请号：US13614872
申请日：2012-09-13
申请人： Kosuke KOSHIJIMA , Hidenori TAKAHASHI , Shuhei YAMAGUCHI , Kei YAMAMOTO
发明人： Kosuke KOSHIJIMA , Hidenori TAKAHASHI , Shuhei YAMAGUCHI , Kei YAMAMOTO
IPC分类号： G03F7/038 , B32B3/10 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/325 , Y10T428/24802
摘要： An actinic ray-sensitive or radiation-sensitive resin composition of the present invention includes a resin (P) having a repeating unit (a) represented by following General Formula (I), a compound (B) generating organic acid by irradiation of actinic ray or radiation, and 1% by mass or more of a resin (C) which has at least one of a fluorine atom and a silicon atom and is different from the resin (P) with regard to total solids of the actinic ray-sensitive or radiation-sensitive resin composition, wherein, in General Formula (I), R0 represents a hydrogen atom or a methyl group, and each of R1, R2, and R3 independently represents a straight chain or branched alkyl group.
摘要翻译：本发明的光化射线敏感性或辐射敏感性树脂组合物包括具有由通式（I）表示的重复单元（a）的树脂（P），通过光化射线照射产生有机酸的化合物（B）或辐射，和1质量％以上的具有氟原子和硅原子中的至少一个并且与树脂（P）不同的树脂（C）相对于光化射线敏感的总固体或辐射敏感性树脂组合物，其中，在通式（I）中，R 0表示氢原子或甲基，R 1，R 2和R 3各自独立地表示直链或支链烷基。

13. 发明申请

US20120076997A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN 有权
标题翻译：抗紫外线或辐射敏感性树脂组合物，其抗紫外线或辐射敏感性膜及其形成图案的方法
公开(公告)号：US20120076997A1
公开(公告)日：2012-03-29
申请号：US13246618
申请日：2011-09-27
申请人： Shuji HIRANO , Hidenori TAKAHASHI , Hideaki TSUBAKI
发明人： Shuji HIRANO , Hidenori TAKAHASHI , Hideaki TSUBAKI
IPC分类号： G03F7/20 , B32B3/00
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397
摘要： Provided is an actinic-ray- or radiation-sensitive resin composition, including a resin comprising a repeating unit (A), the a repeating unit (A) containing a structural moiety (S1) that when acted on by an acid, is decomposed to thereby generate an alkali-soluble group and a structural moiety (S2) that when acted on by an alkali developer, is decomposed to thereby increase its rate of dissolution in the alkali developer, and a repeating unit (B) that when exposed to actinic rays or radiation, generates an acid.
摘要翻译：本发明提供一种光化学射线或辐射敏感性树脂组合物，其包含含有重复单元（A）的树脂，含有结构部分（S1）的重复单元（A），其被酸分解时分解成从而产生碱溶性基团和结构部分（S2），当被碱显影剂作用时，其分解，从而增加其在碱性显影剂中的溶解速率，以及当暴露于光化射线时的重复单元（B）或辐射，产生酸。

14. 发明申请

US20100033831A1 LIQUID CRYSTAL SEALING APPARATUS 审中-公开
标题翻译：液晶密封装置
公开(公告)号：US20100033831A1
公开(公告)日：2010-02-11
申请号：US12493533
申请日：2009-06-29
申请人： Hidenori TAKAHASHI , Hideo KANDA
发明人： Hidenori TAKAHASHI , Hideo KANDA
IPC分类号： G02B27/30 , G02F1/1339
CPC分类号： G02F1/1339
摘要： A liquid crystal sealing apparatus that radiates light to a sealing layer for sealing liquid crystal between a pair of substrates to cure the sealing layer includes: a laser beam source that emits laser beams as the light; and an optical system V that shapes the laser beams such that regions irradiated with the laser beams emitted from the laser beam source are substantially identical to the shape of the sealing layer. According to the liquid crystal sealing apparatus, since laser beams are used as light, it is possible to substantially restrict the irradiation regions to the sealing layer. Therefore, a mask for covering a liquid crystal region is not needed, and it is possible to radiate light with sufficiently high intensity to the sealing layer. As a result, it is possible to reliably seal the liquid crystal.
摘要翻译：一种液晶密封装置，其将光照射到用于将液晶密封在一对基板之间以固化密封层的密封层包括：激光束源，其发射作为光的激光束; 以及光学系统V，其使激光束成形，使得从激光束源发射的激光束照射的区域与密封层的形状基本相同。根据液晶密封装置，由于使用激光作为光，因此可以将照射区域基本上限制在密封层上。因此，不需要用于覆盖液晶区域的掩模，并且可以向密封层辐射具有足够高强度的光。结果，可以可靠地密封液晶。

15. 发明申请

US20120219913A1 PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM 有权
标题翻译：图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物和耐腐蚀膜
公开(公告)号：US20120219913A1
公开(公告)日：2012-08-30
申请号：US13406306
申请日：2012-02-27
申请人： Shohei KATAOKA , Hidenori TAKAHASHI , Shuhei YAMAGUCHI , Shoichi SAITOH , Michihiro SHIRAKAWA , Fumihiro YOSHINO
发明人： Shohei KATAOKA , Hidenori TAKAHASHI , Shuhei YAMAGUCHI , Shoichi SAITOH , Michihiro SHIRAKAWA , Fumihiro YOSHINO
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0397
摘要： Provided is a pattern forming method that is excellent in roughness performance such as line width roughness and exposure latitude, and an actinic-ray-sensitive or radiation-sensitive resin composition and a resist film used for the pattern forming method.The pattern forming method includes (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition containing a resin that includes 65 mol % or more of a repeating unit having a group which generates a polar group by being degraded by the action of an acid based on all repeating units in the resin and at least one kind of repeating unit represented by the following General Formula (I) or (II), (2) exposing the film, and (3) developing the exposed film using a developer that contains an organic solvent.
摘要翻译：提供了一种图案形成方法，其具有优异的粗糙度性能，例如线宽粗糙度和曝光宽容度，以及用于图案形成方法的光化学敏感或辐射敏感性树脂组合物和抗蚀剂膜。图案形成方法包括：（1）使用含有树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜，所述树脂组合物包含65摩尔％以上的具有通过降解产生极性基团的基团的重复单元基于树脂中所有重复单元的酸的作用和由以下通式（I）或（II）表示的至少一种重复单元，（2）使膜曝光，和（3）显影曝光膜使用含有机溶剂的显影剂。

16. 发明申请

US20100248143A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME 有权
标题翻译：化学敏感性或辐射敏感性树脂组合物，耐腐蚀膜和使用其的图案形成方法
公开(公告)号：US20100248143A1
公开(公告)日：2010-09-30
申请号：US12748728
申请日：2010-03-29
申请人： Takayuki ITO , Hidenori TAKAHASHI , Tomotaka TSUCHIMURA , Shohei KATAOKA , Takeshi INASAKI
发明人： Takayuki ITO , Hidenori TAKAHASHI , Tomotaka TSUCHIMURA , Shohei KATAOKA , Takeshi INASAKI
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0045 , G03F7/0048 , G03F7/0392 , G03F7/0397
摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition, a resist film formed with the composition, and a pattern-forming method using the same. The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin that contains the following repeating units (A), (B) and (C); and a solvent having a boiling temperature of 150° C. or less, (A) a repeating unit containing a group capable of decomposing and forming an acid upon irradiation with an actinic ray or radiation, (B) a repeating unit containing a group capable of decomposing and forming a carboxylic acid by the action of an acid, and (C) a repeating unit containing a carbon-carbon unsaturated bond.
摘要翻译：提供了一种光化射线敏感或辐射敏感性树脂组合物，由该组合物形成的抗蚀剂膜和使用其的图案形成方法。光化射线敏感性或辐射敏感性树脂组合物包含（P）含有以下重复单元（A），（B）和（C）的树脂; 和沸点为150℃以下的溶剂，（A）含有能够在光化射线或辐射照射时能够分解形成酸的基团的重复单元，（B）含有能够具有基团的重复单元通过酸的作用分解和形成羧酸，和（C）含有碳 - 碳不饱和键的重复单元。

17. 发明申请

US20100183975A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD USING THE SAME, AND RESIN 有权
标题翻译：丙烯酸敏感性或辐射敏感性树脂组合物，耐腐蚀膜，使用其的图案形成方法和树脂
公开(公告)号：US20100183975A1
公开(公告)日：2010-07-22
申请号：US12641877
申请日：2009-12-18
申请人： Hidenori TAKAHASHI , Tomotaka TSUCHIMURA , Toru TSUCHIHASHI , Katsuhiro YAMASHITA , Hideaki TSUBAKI
发明人： Hidenori TAKAHASHI , Tomotaka TSUCHIMURA , Toru TSUCHIHASHI , Katsuhiro YAMASHITA , Hideaki TSUBAKI
IPC分类号： G03F7/20 , C08F228/06 , G03F7/004
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0397 , Y10S430/122 , Y10S430/123
摘要： Provided is a actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin containing (A) a repeating unit having an ionic structure moiety that contains a cation represented by formula (Ia) and is capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation: wherein each of R1a to R13a independently represents a hydrogen atom or a monovalent substituent and may combine together to form a ring, and Z represents a single bond or a divalent linking group.
摘要翻译：本发明提供一种光化学射线敏感性或辐射敏感性树脂组合物，其包含（P）含有（A）具有离子性结构部分的重复单元的树脂，所述重复单元含有式（Ia）所示的阳离子，并且能够在侧光在照射光化学射线或辐射时：其中R 1a至R 13a各自独立地表示氢原子或一价取代基，并且可以结合在一起形成环，Z表示单键或二价连接基团。

18. 发明申请

US20130078433A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM USING THE SAME, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE SAME 有权
标题翻译：化学敏感性或辐射敏感性树脂组合物，使用它们的耐光膜，图案形成方法，电子设备制造方法和电子设备，每个使用它们
公开(公告)号：US20130078433A1
公开(公告)日：2013-03-28
申请号：US13614797
申请日：2012-09-13
申请人： Kaoru IWATO , Hidenori TAKAHASHI , Michihiro SHIRAKAWA
发明人： Kaoru IWATO , Hidenori TAKAHASHI , Michihiro SHIRAKAWA
IPC分类号： G03F7/038 , B32B3/10 , G03F7/20
CPC分类号： G03F7/0045 , B32B3/10 , C07C303/32 , C07C309/04 , C07C309/06 , C07C309/12 , C07C309/17 , C07C309/19 , C07C309/24 , C07D327/10 , G03F7/0046 , G03F7/038 , G03F7/0382 , G03F7/0397 , G03F7/11 , G03F7/20 , G03F7/2041 , G03F7/325 , G03F7/38 , Y10T428/24802
摘要： Provided are an actinic-ray-sensitive or a radiation-sensitive resin composition with greater residual film ratio and capable of suppressing pattern collapse and an occurrence of bridge defects after development, and a resist film, a pattern forming method, an electronic device manufacturing method, and an electronic device, each using the same. An actinic-ray-sensitive or radiation-sensitive resin composition includes a resin (P) having a repeating unit (a) represented by following General Formula (I), a compound (B) represented by any of following General Formulae (B-1) to (B-3), and a solvent, in General Formula (I), R0 represents a hydrogen atom or a methyl group, and R1, R2 and R3 each independently represent a straight chain or branched alkyl group.
摘要翻译：本发明提供了具有更大的残留膜比并且能够抑制图案塌陷和显影后的桥缺陷的发生的光化学敏感性或辐射敏感性树脂组合物，以及抗蚀剂膜，图案形成方法，电子器件制造方法，以及各自使用的电子设备。光化射线敏感性或辐射敏感性树脂组合物包含具有下述通式（I）表示的重复单元（a）的树脂（P），下述通式（B-1））至（B-3），和通式（I）中的R 0表示氢原子或甲基的溶剂，R 1，R 2和R 3各自独立地表示直链或支链烷基。

19. 发明申请

US20130078432A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 有权
标题翻译：图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，制备电子器件的方法和电子器件
公开(公告)号：US20130078432A1
公开(公告)日：2013-03-28
申请号：US13614672
申请日：2012-09-13
申请人： Hidenori TAKAHASHI , Shuhei YAMAGUCHI , Shohei KATAOKA , Michihiro SHIRAKAWA , Fumihiro YOSHINO , Shoichi SAITOH
发明人： Hidenori TAKAHASHI , Shuhei YAMAGUCHI , Shohei KATAOKA , Michihiro SHIRAKAWA , Fumihiro YOSHINO , Shoichi SAITOH
IPC分类号： G03F7/027 , B32B3/10 , G03F7/075 , G03F7/20 , G03F7/004
CPC分类号： B32B3/10 , G03F7/004 , G03F7/0045 , G03F7/0046 , G03F7/027 , G03F7/0382 , G03F7/039 , G03F7/0392 , G03F7/0397 , G03F7/075 , G03F7/0758 , G03F7/11 , G03F7/20 , G03F7/2041 , G03F7/325 , G03F7/40 , Y10T428/24802
摘要： The pattern forming method of the invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit (a) represented by the following general formula (I), a compound (B) capable of generating an organic acid upon irradiation with actinic rays or radiation, and a nitrogen-containing organic compound (NA) having a group capable of leaving by the action of an acid, (ii) exposing the film, and (iii) developing the film after the exposure using a developer including an organic solvent to form a negative type pattern, in the general formula (I), R0 represents a hydrogen atom or a methyl group, and each of R1, R2, and R3 independently represents a linear or branched alkyl group.
摘要翻译：本发明的图案形成方法包括：（i）使用含有具有由以下通式（I）表示的重复单元（a）的树脂（P）的光化射线敏感性或辐射敏感性树脂组合物形成膜，能够在用光化学射线或辐射照射时能够产生有机酸的化合物（B）和具有能够通过酸作用离去的基团的含氮有机化合物（NA），（ii）曝光该膜和（ iii）使用包含有机溶剂的显影剂在曝光后显影膜以形成负型图案，在通式（I）中，R 0表示氢原子或甲基，R 1，R 2和R 3各自独立地表示直链或支链烷基。

20. 发明申请

US20130078426A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH USING THE SAME 有权
标题翻译：化学敏感性或辐射敏感性树脂组合物，耐蚀膜，图案形成方法，制备电子器件的方法和使用其的电子器件
公开(公告)号：US20130078426A1
公开(公告)日：2013-03-28
申请号：US13610271
申请日：2012-09-11
申请人： Kosuke KOSHIJIMA , Hidenori TAKAHASHI , Shuhei YAMAGUCHI , Kei YAMAMOTO
发明人： Kosuke KOSHIJIMA , Hidenori TAKAHASHI , Shuhei YAMAGUCHI , Kei YAMAMOTO
IPC分类号： G03F7/075 , B32B3/30 , G03F7/20
CPC分类号： G03F7/325 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/0755 , G03F7/0758 , G03F7/11 , G03F7/2041 , G03F7/40 , Y10T428/24479
摘要： An actinic ray-sensitive or radiation-sensitive resin composition capable of forming a hole pattern which has an ultrafine pore diameter (for example, 60 nm or less) and has an excellent cross-sectional shape with excellent local pattern dimensional uniformity; and a resist film, a pattern forming method, a method for preparing an electronic device, and an electronic device, each using the same, are provided.The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin containing 30 mol % or more of a repeating unit (a) represented by the following general formula (I) based on all the repeating units; (B) a compound capable of generating an acid upon irradiation of actinic rays or radiation; and (G) a compound having at least one of a fluorine atom and a silicon atom, and further having basicity or being capable of increasing the basicity by an action of an acid:
摘要翻译：能够形成具有超细孔径（例如60nm以下）的孔图案并且具有优异的局部图案尺寸均匀性的截面形状优异的光化射线敏感或辐射敏感性树脂组合物; 并且提供了各自使用它们的抗蚀剂膜，图案形成方法，制备电子设备的方法和电子设备。光化射线敏感性或辐射敏感性树脂组合物包含（P）基于所有重复单元含有30mol％以上由以下通式（I）表示的重复单元（a）的树脂的树脂; （B）能够在光化射线或辐射照射时能产生酸的化合物; 和（G）具有氟原子和硅原子中的至少一个的化合物，并且还具有碱性或能够通过酸的作用增加碱度：

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式