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11. 发明申请

US20060077374A1 Step and repeat imprint lithography systems 审中-公开
标题翻译：步骤和重复刻印光刻系统
公开(公告)号：US20060077374A1
公开(公告)日：2006-04-13
申请号：US11127060
申请日：2005-05-11
申请人： Sidlgata Sreenivasan , Michael Watts , Byung Choi , Mario Meissl , Norman Schumaker , Ronald Voisin
发明人： Sidlgata Sreenivasan , Michael Watts , Byung Choi , Mario Meissl , Norman Schumaker , Ronald Voisin
IPC分类号： G03B27/58
CPC分类号： B82Y10/00 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B81C1/0046 , B82Y40/00 , G03F7/0002 , H01L21/0271
摘要： Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.
摘要翻译：描述的是通过压印光刻来图案化衬底的系统。压印光刻系统包括压印头，其被配置为将模板保持为与衬底间隔开的关系。压印光刻系统被配置为将激活光可固化液体分配到基底或模板上。该系统包括施加激活光以固化活化光可固化液体的光源。

12. 发明申请

US20050270312A1 Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing 审中-公开
标题翻译：流体分配和点滴式点胶纳米级制造
公开(公告)号：US20050270312A1
公开(公告)日：2005-12-08
申请号：US11143092
申请日：2005-06-02
申请人： Pankaj Lad , Ian McMackin , Van Truskett , Norman Schumaker , Sidlgata Sreenivasan , Duane Voth , Philip Schumaker , Edward Fletcher
发明人： Pankaj Lad , Ian McMackin , Van Truskett , Norman Schumaker , Sidlgata Sreenivasan , Duane Voth , Philip Schumaker , Edward Fletcher
IPC分类号： B41J2/01 , B41J3/28 , B41J3/407 , G03F7/00 , H01L51/40
CPC分类号： B82Y10/00 , B41J3/28 , B82Y40/00 , G03F7/0002 , H01L51/0004
摘要： The present invention is directed to a method for dispensing a total volume of liquid on a substrate, the method including, inter alia, disposing a plurality of spaced-apart droplets on a region of the substrate, each having an unit volume associated therewith, with an aggregate volume of the droplets in the region being a function of a volume of a pattern to be formed thereat.
摘要翻译：本发明涉及一种用于在基底上分配总体积的液体的方法，该方法尤其包括在衬底区域上设置多个间隔开的液滴，每个液滴具有与之相关联的单位体积，与该区域中的液滴的总体积是要在其上形成的图案的体积的函数。

13. 发明申请

US20070099337A1 Positive Tone Bi-Layer Imprint Lithography Method 有权
标题翻译：正音双层印记平版印刷方法
公开(公告)号：US20070099337A1
公开(公告)日：2007-05-03
申请号：US11560928
申请日：2006-11-17
申请人： Sidlgata Sreenivasan
发明人： Sidlgata Sreenivasan
IPC分类号： H01L51/40 , H01L21/00
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/76802
摘要： The present invention provides a method to pattern a substrate which features creating a multi-layered structure by forming, on the substrate, a patterned layer having protrusions and recessions. Formed upon the patterned layer is a conformal layer, with the multi-layered structure having a crown surface facing away from the substrate. Portions of the multi-layered structure are removed to expose regions of the substrate in superimposition with the protrusions, while forming a hard mask in areas of the crown surface in superimposition with the recessions.
摘要翻译：本发明提供一种通过在衬底上形成具有突起和凹陷的图案化层来形成特征为产生多层结构的衬底的方法。形成在图案层上的是保形层，多层结构具有背离衬底的表冠表面。去除多层结构的部分以暴露与突起叠加的衬底的区域，同时在与凹部重叠的冠表面的区域中形成硬掩模。

14. 发明申请

US20070082461A1 Method of Forming a Recessed Structure Employing a Reverse Tone Process 有权
标题翻译：形成采用反向色调工艺的嵌入式结构的方法
公开(公告)号：US20070082461A1
公开(公告)日：2007-04-12
申请号：US11611287
申请日：2006-12-15
申请人： Sidlgata Sreenivasan
发明人： Sidlgata Sreenivasan
IPC分类号： H01L21/30 , H01L21/46
CPC分类号： H01L21/0276 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/3081 , H01L21/3086 , H01L21/3088
摘要： The present invention provides a method of forming recesses on a substrate, the method including forming on the substrate a patterning layer having first features; trim etching the first features to define trimmed features having a shape; and transferring an inverse of the shape into the substrate.
摘要翻译：本发明提供了在基板上形成凹部的方法，该方法包括在基板上形成具有第一特征的图案化层; 修剪蚀刻第一特征以限定具有形状的修剪特征; 并将形状的倒数转移到衬底中。

15. 发明申请

US20060035464A1 Method of planarizing a semiconductor substrate 有权
标题翻译：平面化半导体衬底的方法
公开(公告)号：US20060035464A1
公开(公告)日：2006-02-16
申请号：US10917563
申请日：2004-08-13
申请人： Sidlgata Sreenivasan
发明人： Sidlgata Sreenivasan
IPC分类号： H01L21/302
CPC分类号： B29C43/003 , B29C2043/025 , H01L21/0334 , H01L21/30604 , H01L21/31051 , H01L21/32115
摘要： The present invention provides a method of planarizing a substrate, the method including, forming, on the substrate, a patterned layer having a first shape associated therewith; and processing the patterned layer, with the first shape compensating for variations in the processing such that upon processing the patterned layer, the patterned layer comprises a substantially planar shape.
摘要翻译：本发明提供一种平面化基板的方法，所述方法包括在基板上形成与其相关联的具有第一形状的图案化层; 并且处理图案化层，其中第一形状补偿了处理中的变化，使得在处理图案化层时，图案化层包括基本上平面的形状。

16. 发明申请

US20050275251A1 Compliant device for nano-scale manufacturing 有权
标题翻译：符合纳米级制造的器件
公开(公告)号：US20050275251A1
公开(公告)日：2005-12-15
申请号：US11142838
申请日：2005-06-01
申请人： Byung-Jin Choi , Sidlgata Sreenivasan
发明人： Byung-Jin Choi , Sidlgata Sreenivasan
IPC分类号： A47C1/024 , A47C1/0355 , A47C3/00 , A47D1/02 , B60N2/02 , G03F7/00 , A47C1/038
CPC分类号： G03F7/0002 , B29C43/021 , B29C2043/025 , B29C2043/5858 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： The present invention is directed to a compliant device comprising a support body, a floating body, and a plurality of flexure arms. Each of the plurality of flexure arms is connected between the support body and the floating body to transfer a load therebetween in parallel. To that end, the flexure arms have first and second sets of flexure joints. The first set of flexure joints facilitate rotational movement of said flexure arm about a first axis extending along a first direction. The second set of flexure joints are arranged to facilitate rotational movement of the flexure arm about a second axis, extending along a second direction that is transverse to the first direction. The flexure joints are revolute joints.
摘要翻译：本发明涉及一种包括支撑体，浮体和多个弯曲臂的柔性装置。多个挠曲臂中的每一个连接在支撑体和浮体之间，以在它们之间平行地传送负载。为此，弯曲臂具有第一组和第二组挠曲接头。第一组弯曲接头便于围绕围绕第一方向延伸的第一轴线的所述弯曲臂的旋转运动。第二组弯曲接头被布置成便于弯曲臂围绕第二轴线的旋转运动，第二轴线沿着横向于第一方向的第二方向延伸。挠性接头是旋转接头。

17. 发明申请

US20050263077A1 Adaptive shape substrate support method 失效
标题翻译：自适应形状衬底支持方法
公开(公告)号：US20050263077A1
公开(公告)日：2005-12-01
申请号：US11136892
申请日：2005-05-25
申请人： Mahadevan GanapathiSubramanian , Sidlgata Sreenivasan
发明人： Mahadevan GanapathiSubramanian , Sidlgata Sreenivasan
IPC分类号： G03F7/00 , G03F7/20 , H01L21/302 , H01L41/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/707
摘要： The present method features an active compliant pin chuck to hold a substrate, having opposed first and second surfaces, and compensates for non-planarity in one of the surfaces of the substrate. To that end, the method includes creating a point contact on the first surface to generate a change in shape of the second surface to obtain a desired shape of the second surface. The desired shape may be smooth, if not substantially planar or any other shape desired within the operational parameters of the chuck and the substrate. For example, the method may compensate for non-planarity due to particulate matter on the first surface and substrate topography. These and other embodiments are discussed more fully below.
摘要翻译：本发明的方法具有主动柔性销卡盘以保持具有相对的第一和第二表面的基板，并且补偿基板的一个表面中的非平面性。为此，该方法包括在第一表面上产生点接触以产生第二表面的形状变化以获得第二表面的期望形状。所需的形状可以是平滑的，如果不是基本平坦的或在卡盘和基底的操作参数内所需的任何其它形状。例如，该方法可以补偿由于第一表面上的颗粒物质和基底形貌引起的非平面性。以下将更全面地讨论这些和其它实施例。

18. 发明申请

US20070247608A1 Tesselated Patterns in Imprint Lithography 有权
标题翻译：印记光刻中的镶嵌图案
公开(公告)号：US20070247608A1
公开(公告)日：2007-10-25
申请号：US11694612
申请日：2007-03-30
申请人： Sidlgata Sreenivasan , Philip Schumaker , Ian McMackin
发明人： Sidlgata Sreenivasan , Philip Schumaker , Ian McMackin
IPC分类号： G03B27/62
CPC分类号： G03B27/62 , B82Y10/00 , B82Y40/00 , G03B27/42 , G03F7/0002 , G03F9/00 , G03F9/7042 , G03F9/7076 , G03F9/7084
摘要： The present invention is directed towards a choice of the shape of the patterned fields for Level 0 (patterned by imprint or photolithography or e-beam, etc.) and Level 1 (patterned by imprint) such that these shapes when tessellated together eliminate the open areas causes by the moats.
摘要翻译：本发明涉及用于0级（通过压印或光刻或电子束等图案化）和1级（通过印记图案化）的图案化场的形状的选择，使得这些形状在细分时一起消除开路地区由护城河引起。

19. 发明申请

US20070122942A1 Conforming Template for Patterning Liquids Disposed on Substrates 有权
标题翻译：符合基板上图案化液体的模板
公开(公告)号：US20070122942A1
公开(公告)日：2007-05-31
申请号：US11669569
申请日：2007-01-31
申请人： Sidlgata Sreenivasan , Byung Choi , Ronald Voisin
发明人： Sidlgata Sreenivasan , Byung Choi , Ronald Voisin
IPC分类号： H01L21/00 , B28B11/08
CPC分类号： B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/887
摘要： The present invention includes a conforming template for patterning liquids disposed on substrates. The template includes a body having opposed first and second surfaces. The first surface includes a plurality of recessed regions with a patterning region being disposed between adjacent recessed regions. Specifically, the recessed regions define flexure regions about which each patterning region may move independent of the remaining patterning regions of the template. In one embodiment the template is mounted to a fluid chamber having an inlet and a throughway. The template is connected to the throughway and the inlet is connected to a fluid source to facilitate deformation of the template to conform to a profile of a surface adjacent thereto.
摘要翻译：本发明包括用于图案化液体配置在基板上的一致性模板。模板包括具有相对的第一和第二表面的主体。第一表面包括多个凹陷区域，其中图案化区域设置在相邻的凹陷区域之间。具体地，凹陷区域限定挠曲区域，每个图案化区域围绕该弯曲区域可独立于模板的剩余图案形成区域移动。在一个实施例中，模板安装到具有入口和通道的流体室。模板连接到通道，并且入口连接到流体源以便于模板的变形以符合与其相邻的表面的轮廓。

20. 发明申请

US20060063277A1 Method of forming an in-situ recessed structure 有权
标题翻译：形成原位凹陷结构的方法
公开(公告)号：US20060063277A1
公开(公告)日：2006-03-23
申请号：US10946565
申请日：2004-09-21
申请人： David Vidusek , Sidlgata Sreenivasan , David Wang
发明人： David Vidusek , Sidlgata Sreenivasan , David Wang
IPC分类号： B44C1/22 , H01L21/00
CPC分类号： B81C1/00626
摘要： The present invention features a method of patterning a substrate that includes forming from a first material, disposed on the substrate, a first film having an original pattern that includes a plurality of projections. The projections extend from a nadir surface terminating in an apex surface defining a height therebetween. A portion of the first film in superimposition with the nadir surface defines a nadir portion. The nadir portion is removed to expose a region of the substrate in superimposition therewith, defining a plurality of recessions. A second material is disposed upon the first film to form a second film having a surface spaced-apart from the apex surface of the plurality of projections and filling the plurality of recessions to form a multi-film stack. The first film and portions of the second film are removed to create a plurality of spaced-apart projections of the second material on the substrate.
摘要翻译：本发明的特征在于一种图案化衬底的方法，其包括由设置在衬底上的第一材料形成具有包括多个突起的原始图案的第一膜。突起从最终的表面延伸，终止于限定其间的高度的顶点表面。第一膜中与最低点表面重叠的部分限定最低点部分。去除最低点部分以暴露衬底的区域，从而限定多个凹陷。第二材料设置在第一膜上以形成具有与多个突起的顶点表面间隔开的表面并填充多个凹陷以形成多层叠层的第二膜。去除第一膜和第二膜的部分以在基板上产生多个间隔开的第二材料的突出部分。

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