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11. 发明授权

US07196390B1 Solid state image wavelength converter 有权
标题翻译：固态图像波长转换器
公开(公告)号：US07196390B1
公开(公告)日：2007-03-27
申请号：US10048962
申请日：1999-06-26
申请人： Amnon Manassen , Giora Yahav
发明人： Amnon Manassen , Giora Yahav
IPC分类号： H01L31/107
CPC分类号： B82Y20/00 , G02F1/017 , G02F1/01716 , G02F1/0338 , G02F2202/12 , G02F2203/12 , H04N5/2254 , H04N5/253
摘要： A method for encoding information that is encoded in spatial variations of the intensity of light (24) of a first wave-length into light of a second wavelength, the method comprising: generating a first density distribution of electrons homologous with the spatial variations in intensity of the first wavelength light; generating a second additional electron density homologous with the first electron density distribution; trapping electrons from the first and second electron density distributions in a trapping region (34) to generate an electric field homologous with the density distributions in a material (36) that modulates a characteristic of light (22) that passes therethrough responsive to an electric field (46) therein; and transmitting the second wavelength light (22) through the modulating material (36) thereby modulating the second wavelength light in response to the electric field and encoding it with the information.
摘要翻译：一种将第一波长的光的强度（24）编码为第二波长的光的信息的编码方法，所述方法包括：产生与强度的空间变化同源的电子的第一密度分布的第一波长光; 产生与第一电子密度分布同源的第二附加电子密度; 从捕获区域（34）中的第一和第二电子密度分布捕获电子以产生与调制通过其中的光（22）的特性的材料（36）中的密度分布同源的电场，其响应于电场（46）; 并且通过调制材料（36）传输第二波长光（22），从而响应于电场调制第二波长光并用信息进行编码。

12. 发明授权

US08214771B2 Scatterometry metrology target design optimization 有权
标题翻译：散射计量目标设计优化
公开(公告)号：US08214771B2
公开(公告)日：2012-07-03
申请号：US12350826
申请日：2009-01-08
申请人： Michael Adel , Amnon Manassen , Daniel Kandel
发明人： Michael Adel , Amnon Manassen , Daniel Kandel
IPC分类号： G06F17/50 , G06F17/10 , G01B11/14
CPC分类号： G03F7/70683 , G03F7/705 , G03F7/70633 , H01L22/12
摘要： A metrology target design may be optimized using inputs including metrology target design information, substrate information, process information, and metrology system information. Acquisition of a metrology signal with a metrology system may be modeled using the inputs to generate one or more optical characteristics of the metrology target. A metrology algorithm may be applied to the characteristics to determine a predicted accuracy and precision of measurements of the metrology target made by the metrology system. Part of the information relating to the metrology target design may be modified and the signal modeling and metrology algorithm may be repeated to optimize the accuracy and precision of the one or more measurements. The metrology target design may be displayed or stored after the accuracy and precision are optimized.
摘要翻译：可以使用包括计量目标设计信息，底物信息，过程信息和计量系统信息的输入来优化计量目标设计。采用计量系统获取计量信号可以使用输入来建模，以产生计量目标的一个或多个光学特性。可以将计量学算法应用于特征以确定由计量系统制定的度量目标的预测精度和测量精度。可以修改与度量目标设计有关的部分信息，并且可以重复信号建模和计量学算法以优化一个或多个测量的精度和精度。可以在精度和精度优化后显示或存储度量目标设计。

13. 发明授权

US07884936B2 Apparatus and methods for scattering-based semiconductor inspection and metrology 有权
标题翻译：用于散射半导体检测和计量的装置和方法
公开(公告)号：US07884936B2
公开(公告)日：2011-02-08
申请号：US12182788
申请日：2008-07-30
申请人： Amnon Manassen
发明人： Amnon Manassen
IPC分类号： G01B11/00
CPC分类号： G01N21/8901 , G01N21/9501
摘要： Disclosed are apparatus and methods for inspecting or measuring one or more semiconductor targets. An incident beam is directed towards a first target as the first target substantially, continuously moves such that the incident beam remains directed at such first target during a first time period in which the first target substantially, continuously moves between a first position and a second position. An output beam scattered from the first target, in response to the incident beam being directed towards the first target during the first time period in which the first target substantially, continuously moves between the first and second positions, is detected such that information is obtained from the detected output beam during the first time period. The first time period is selected so that the information that is collected from the detected output beam during such first time period can be used to determine a characteristic of the first target.
摘要翻译：公开了用于检查或测量一个或多个半导体靶的装置和方法。入射光束作为第一目标基本上被引向第一目标，连续移动，使得入射光束在第一时间段期间保持指向第一目标，其中第一目标基本上在第一位置和第二位置之间连续移动。检测从第一目标散射的输出光束，其响应于入射光束在第一时间段期间被引导到第一目标，其中第一目标在第一和第二位置之间基本上连续移动，从而从在第一时间段期间检测到的输出光束。选择第一时间段，使得在这样的第一时间段期间从检测到的输出光束收集的信息可以用于确定第一目标的特性。

14. 发明申请

US20210072021A1 DARKFIELD IMAGING OF GRATING TARGET STRUCTURES FOR OVERLAY MEASUREMENT 有权
公开(公告)号：US20210072021A1
公开(公告)日：2021-03-11
申请号：US16996328
申请日：2020-08-18
申请人： Andrew V. Hill , Amnon Manassen
发明人： Andrew V. Hill , Amnon Manassen
IPC分类号： G01B11/27 , G06T7/00
摘要： A metrology system may include an illumination sub-system to illuminate a metrology target on a sample with illumination having a symmetric off-axis illumination profile, where the symmetric off-axis illumination profile is symmetric along one or more measurement directions, and where the illumination sub-system provides illumination from opposing angles in the symmetric off-axis illumination profile at least one of simultaneously or sequentially. The metrology target may include a first periodic structure on a first layer of the sample and a second periodic structure on a second layer of the sample. The metrology system may further include an imaging sub-system to generate images of the metrology target formed using two non-zero diffraction orders from each point of the symmetric off-axis illumination profile. The metrology subsystem may further determine an overlay error indicative of alignment between the first layer and the second layer based on the one or more images.

15. 发明授权

US08209767B1 Near field detection for optical metrology 有权
标题翻译：光学测量近场检测
公开(公告)号：US08209767B1
公开(公告)日：2012-06-26
申请号：US12828112
申请日：2010-06-30
申请人： Amnon Manassen
发明人： Amnon Manassen
IPC分类号： G02F1/01 , G01J4/00
CPC分类号： G01B11/026 , G01Q60/22
摘要： An optical metrology tool may include a source of electromagnetic radiation having a characteristic wavelength, an objective having a central obscuration, a near field element located within the central obscuration of the objective, and an electromagnetic radiation detector coupled to the near field element. A mechanism is configured to bring the near field element into proximity to the target. A characteristic dimension of the near field element is sufficient smaller than the wavelength of the electromagnetic radiation that when the electromagnetic radiation passes through the cavity and the cavity is in sufficient proximity to the target that evanescent waves can couple energy from propagating radiation in the near-field element to the target. The detector detects an optical signal due to the evanescent waves coupling to the target.
摘要翻译：光学测量工具可以包括具有特征波长的电磁辐射源，具有中心遮蔽的物镜，位于物镜的中心遮蔽范围内的近场元件以及耦合到近场元件的电磁辐射探测器。一种机构被配置为使近场元素接近目标。近场元件的特征尺寸足够小于当电磁辐射通过空腔并且空腔足够靠近靶的电磁辐射的波长时，ev逝波可以将能量从近场辐射中的传播辐射耦合，字段元素到目标。检测器由于与目标耦合的ev逝波而检测光信号。

16. 发明授权

US08063463B2 Solid state image wavelength converter 有权
标题翻译：固态图像波长转换器
公开(公告)号：US08063463B2
公开(公告)日：2011-11-22
申请号：US11716603
申请日：2007-03-12
申请人： Amnon Manassen , Giora Yahav
发明人： Amnon Manassen , Giora Yahav
IPC分类号： H01L31/107
CPC分类号： B82Y20/00 , G02F1/017 , G02F1/01716 , G02F1/0338 , G02F2202/12 , G02F2203/12 , H04N5/2254 , H04N5/253
摘要： A method for encoding information that is encoded in spatial variations of the intensity of light characterized by a first wavelength in light characterized by a second wavelength, the method comprising: transmitting the first wavelength light through a photo-conducting material in which electron-hole pairs are generated by absorbing photons from the first wavelength light to generate a first density distribution of electrons homologous with the spatial variations in intensity of the first wavelength light; trapping electrons from the first electron density distributions in a trapping region to generate an electric field homologous with the density distribution in a material that modulates a characteristic of light that passes therethrough responsive to an electric field therein; transmitting a pulse of light having sufficient energy to generate electron-hole pairs in the photo-conducting material through the modulating material and thereafter through the photo-conducting layer to generate a second additional electron density homologous with the first electron density distribution; trapping electrons from the second electron density distribution in the trapping region; and transmitting the second wavelength light through the modulating material thereby modulating the second wavelength light in response to the electric field and encoding it with the information.
摘要翻译：一种编码信息的方法，其特征在于以第二波长为特征的光的第一波长的光强度的空间变化，该方法包括：将第一波长的光透过其中电子 - 空穴对的光导材料通过从第一波长光吸收光子而产生与第一波长光的强度的空间变化同源的电子的第一密度分布; 从捕获区域中的第一电子密度分布捕获电子以产生与在其中响应于其中的电场调制通过其的光的特性的材料中的密度分布同源的电场; 传输具有足够能量的光脉冲，以在光导材料中通过调制材料产生电子 - 空穴对，之后通过光导层产生与第一电子密度分布同源的第二附加电子密度; 从捕获区域中的第二电子密度分布捕获电子; 并且通过调制材料透射第二波长光，从而响应于电场调制第二波长光并用信息进行编码。

17. 发明授权

US08508748B1 Inspection system with fiber coupled OCT focusing 有权
标题翻译：光纤耦合OCT聚焦检测系统
公开(公告)号：US08508748B1
公开(公告)日：2013-08-13
申请号：US12793527
申请日：2010-06-03
申请人： Amnon Manassen
发明人： Amnon Manassen
IPC分类号： G01B9/02 , G01B11/02
CPC分类号： G01N21/4795 , G01B9/02063 , G01B9/02068 , G01B9/02091 , G01N21/8422 , G01N21/9501 , G01N2021/1787
摘要： An optical inspection system can include an optical coherent tomography (OCT) tool having an optical column with a beam splitter optically coupled to an objective. Illumination optics are coupled to the beam splitter. An OCT focusing system is optically coupled to the objective via the beam splitter. The OCT focusing system includes a broadband light source, a reflector, a photo-detector, all of which are connected by optical fiber to a fiber coupler in an interferometer configuration. The objective is optically coupled to the fiber coupler in the OCT focusing system by an optical fiber.
摘要翻译：光学检查系统可以包括具有光学柱的光学相干断层摄影（OCT）工具，所述光学柱具有光学耦合到物镜的分束器。照明光学器件耦合到分束器。 OCT聚焦系统通过分束器光学耦合到物镜。 OCT聚焦系统包括宽带光源，反射器，光电检测器，它们都通过光纤连接到干涉仪配置中的光纤耦合器。该目的通过光纤光耦合到OCT聚焦系统中的光纤耦合器。

18. 发明申请

US20100175033A1 SCATTEROMETRY METROLOGY TARGET DESIGN OPTIMIZATION 有权
标题翻译： SCATTERMETRY计量学目标设计优化
公开(公告)号：US20100175033A1
公开(公告)日：2010-07-08
申请号：US12350826
申请日：2009-01-08
申请人： Michael Adel , Amnon Manassen , Daniel Kandel
发明人： Michael Adel , Amnon Manassen , Daniel Kandel
IPC分类号： G06F17/50
CPC分类号： G03F7/70683 , G03F7/705 , G03F7/70633 , H01L22/12
摘要： A metrology target design may be optimized using inputs including metrology target design information, substrate information, process information, and metrology system information. Acquisition of a metrology signal with a metrology system may be modeled using the inputs to generate one or more optical characteristics of the metrology target. A metrology algorithm may be applied to the characteristics to determine a predicted accuracy and precision of measurements of the metrology target made by the metrology system. Part of the information relating to the metrology target design may be modified and the signal modeling and metrology algorithm may be repeated to optimize the accuracy and precision of the one or more measurements. The metrology target design may be displayed or stored after the accuracy and precision are optimized.
摘要翻译：可以使用包括计量目标设计信息，底物信息，过程信息和计量系统信息的输入来优化计量目标设计。采用计量系统获取计量信号可以使用输入来建模，以产生计量目标的一个或多个光学特性。可以将计量学算法应用于特征以确定由计量系统制定的度量目标的预测精度和测量精度。可以修改与度量目标设计有关的部分信息，并且可以重复信号建模和计量学算法以优化一个或多个测量的精度和精度。可以在精度和精度优化后显示或存储度量目标设计。

19. 发明申请

US20090050823A1 APPARATUS AND METHODS FOR SCATTERING-BASED SEMICONDUCTOR INSPECTION AND METROLOGY 有权
标题翻译：基于散射的半导体检测和方法的装置和方法
公开(公告)号：US20090050823A1
公开(公告)日：2009-02-26
申请号：US12182788
申请日：2008-07-30
申请人： Amnon Manassen
发明人： Amnon Manassen
IPC分类号： A61N5/00
CPC分类号： G01N21/8901 , G01N21/9501
摘要： Disclosed are apparatus and methods for inspecting or measuring one or more semiconductor targets. An incident beam is directed towards a first target as the first target substantially, continuously moves such that the incident beam remains directed at such first target during a first time period in which the first target substantially, continuously moves between a first position and a second position. An output beam scattered from the first target, in response to the incident beam being directed towards the first target during the first time period in which the first target substantially, continuously moves between the first and second positions, is detected such that information is obtained from the detected output beam during the first time period. The first time period is selected so that the information that is collected from the detected output beam during such first time period can be used to determine a characteristic of the first target.
摘要翻译：公开了用于检查或测量一个或多个半导体靶的装置和方法。入射光束作为第一目标基本上被引向第一目标，连续移动，使得入射光束在第一时间段期间保持指向第一目标，其中第一目标基本上在第一位置和第二位置之间连续移动。检测从第一目标散射的输出光束，其响应于入射光束在第一时间段期间被引导到第一目标，其中第一目标在第一和第二位置之间基本上连续移动，从而从在第一时间段期间检测到的输出光束。选择第一时间段，使得在这样的第一时间段期间从检测到的输出光束收集的信息可以用于确定第一目标的特性。

20. 发明授权

US06999219B2 Optical modulator 失效
标题翻译：光调制器
公开(公告)号：US06999219B2
公开(公告)日：2006-02-14
申请号：US10470826
申请日：2001-02-14
申请人： Amnon Manassen , Ori J. Braun , Giora Yahav
发明人： Amnon Manassen , Ori J. Braun , Giora Yahav
IPC分类号： G02F1/01
CPC分类号： B82Y20/00 , G02F1/017
摘要： Provided is an optical modulator for modulating light comprising: a superlattice structure having a plurality of interleaved narrow and wide bandgap semiconductor layers, wherein wave functions of energy states of electrons and holes in different narrow bandgap layers are coupled; and a power supply that applies voltage to the superlattice structure between a first non-zero voltage and a second non-zero voltage to modulate the light.
摘要翻译：提供了一种用于调制光的光调制器，包括：具有多个交错的窄带宽宽带隙半导体层的超晶格结构，其中耦合不同窄带隙层中的电子和空穴的能态的波函数; 以及在第一非零电压和第二非零电压之间向超晶格结构施加电压以调制光的电源。

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