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    • 15. 发明授权
    • Method for optimizing the configuration of a scatterometry measurement system
    • 优化散射测量系统配置的方法
    • US07826072B1
    • 2010-11-02
    • US11999814
    • 2007-12-06
    • Daniel C. WackAndrei VeldmanEdward R. RatnerJohn HenchNoah Bareket
    • Daniel C. WackAndrei VeldmanEdward R. RatnerJohn HenchNoah Bareket
    • G01B11/14G06F19/00
    • G01B11/0625G01B11/24G01B2210/56
    • The present application discloses a method of model-based measurement of semiconductor device features using a scatterometer system. The method includes at least the following steps. A cost function is defined depending upon a plurality of variable parameters of the scatterometer system and upon a plurality of variable parameters for computer-implemented modeling to determine measurement results. Constraints are established for the plurality of variable parameters of the scatterometer system and for the plurality of variable parameters for the computer-implemented modeling. A computer-implemented optimization procedure is performed to determine an optimized global set of parameters, including both the variable parameters of the scatterometer system and the variable parameters for the computer-implemented modeling, which result in a minimal value of the cost function. Finally, the optimized global set of parameters is applied to configure the scatterometer system and the computer-implemented modeling. Other embodiments, features and aspects are also disclosed herein.
    • 本申请公开了使用散射仪系统的基于模型的半导体器件特征的测量方法。 该方法至少包括以下步骤。 根据散射仪系统的多个可变参数以及多个用于计算机实现的建模的可变参数来确定测量结果来定义成本函数。 为散射仪系统的多个可变参数和计算机实现的建模的多个可变参数建立约束。 执行计算机实现的优化过程以确定优化的全局参数集合,包括散射仪系统的可变参数和用于计算机实现的建模的可变参数,其导致成本函数的最小值。 最后,应用优化的全局参数集来配置散射仪系统和计算机实现的建模。 本文还公开了其它实施例,特征和方面。