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    • 11. 发明公开
    • 급속냉각장치를 가지는 탄소나노튜브 반응챔버
    • 碳纳米管与快速冷却单元的反应室
    • KR1020100054909A
    • 2010-05-26
    • KR1020080113731
    • 2008-11-16
    • 금호석유화학 주식회사
    • 김성수황호수
    • B82B3/00C01B31/02B82Y40/00
    • B82B3/0004B82B3/0009B82Y40/00C01B32/162
    • PURPOSE: A carbon nanotube reaction chamber is provided, which minimizes cooling period of a carbon nanotube synthetic substrate using the air of the room temperature. CONSTITUTION: A carbon nanotube reaction chamber comprises: a reactor(100) in which the production of the carbon nanotube is performed in a composition substrate by loading or unloading a composition substrate(10); a heater(140) which is arranged outside the reactor and heats the reactor; a controller controlling the heater; and a quick cooling device(170) cooling the reactor by injecting the air of the room temperature compulsively to the outside of the heated reactor. The quick cooling device includes a suction block(171), an exhaust block(172), an air pass(173), and an air blower(177).
    • 目的:提供一种使用室温空气使碳纳米管合成基板的冷却周期最小化的碳纳米管反应室。 构成:碳纳米管反应室包括:反应器(100),其中通过加载或卸载组合物基材(10)在组合物基材中进行碳纳米管的制备; 加热器(140),其布置在反应器外部并加热反应器; 控制加热器的控制器; 和快速冷却装置(170),通过强制地将室温空气注入加热的反应器的外部来冷却反应器。 快速冷却装置包括抽吸块(171),排气块(172),空气通道(173)和鼓风机(177)。
    • 12. 发明公开
    • 촉매 공급 장치
    • 提供催化剂颗粒的装置
    • KR1020090029391A
    • 2009-03-23
    • KR1020070094586
    • 2007-09-18
    • 금호석유화학 주식회사
    • 심재원김성수
    • B01J4/00B82B3/00
    • B01J4/004B82Y30/00B82Y40/00C01B32/162
    • Provided is a catalyst supplying apparatus for supplying a catalyst to a circular substrate in order to uniformly coat the whole circular substrate with the catalyst. A catalyst supplying apparatus(100) comprises a catalyst dropping unit(200), a dispersing plate(300), a vibration offering unit(400), and a transfer shield(500). The catalyst dropping unit drops the catalyst downward. The dispersing plate equipped with a plurality of dispersion holes(310) is installed in a lower part of the catalyst dropping unit to disperses the dropped catalyst through the dispersion holes. The vibration offering unit linked with the dispersing plate generates vibration for the dispersing plate.
    • 提供了一种催化剂供给装置,用于向圆形基板供应催化剂,以便用催化剂均匀地涂覆整个圆形基材。 催化剂供给装置(100)包括催化剂滴加单元(200),分散板(300),振动提供单元(400)和转移屏蔽(500)。 催化剂滴下装置向下滴下催化剂。 配备有多个分散孔(310)的分散板安装在催化剂滴加单元的下部,以将滴下的催化剂分散在分散孔中。 与分散板连接的振动提供单元产生分散板的振动。