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    • 11. 发明专利
    • Semiconductor light-emitting element
    • JP5337862B2
    • 2013-11-06
    • JP2011276729
    • 2011-12-19
    • 株式会社東芝
    • 浩一 橘肇 名古年輝 彦坂重哉 木村真也 布上
    • H01L33/32H01S5/343
    • PROBLEM TO BE SOLVED: To provide a semiconductor light-emitting element having high luminous efficiency. SOLUTION: A semiconductor light-emitting element comprises: an n-type semiconductor layer including an n-type GaN layer; an n-side electrode connected to the n-type semiconductor layer; a p-type semiconductor layer including a p-type GaN layer and a p-type GaN contact layer stacked on the p-type GaN layer; a p-side electrode connected to the p-type semiconductor layer; a light-emitting portion that is provided between the n-type semiconductor layer and the p-type semiconductor layer and includes a plurality of well layers; a first layer having a thickness of 0.5 to 5 nm that is provided between the light-emitting portion and the p-type semiconductor layer and includes AlGaN having a first Al composition ratio of 0.001 to 0.05; a second layer that is provided between the first layer and the p-type semiconductor layer and includes AlGaN having a second Al composition ration of 0.1 to 0.2; and an intermediate layer having a thickness of 3 to 8 nm that contacts a p-type well layer nearest the p-type semiconductor layer in between the first layer and the light-emitting portion, includes In z1 Ga 1-z1 N (0≤z1 COPYRIGHT: (C)2012,JPO&INPIT
    • 20. 发明专利
    • Semiconductor light-emitting element
    • JP5379843B2
    • 2013-12-25
    • JP2011281325
    • 2011-12-22
    • 株式会社東芝
    • 年輝 彦坂肇 名古浩一 橘俊秀 伊藤真也 布上
    • H01L33/32H01L21/205H01L33/22H01S5/343
    • PROBLEM TO BE SOLVED: To provide a semiconductor light-emitting element with a low driving voltage. SOLUTION: A semiconductor light-emitting element comprises an n-type semiconductor layer, an electrode, a p-type semiconductor layer, and a light-emitting layer. The p-type semiconductor layer is provided between the n-type semiconductor layer and the electrode. The p-type semiconductor layer includes a p-side contact layer contacting the electrode. The light-emitting layer is provided between the n-type semiconductor layer and the p-type semiconductor layer. The p-type semiconductor layer is provided between the p-side contact layer and the light-emitting layer and includes a p-type layer with a p-type impurity concentration lower than that of the p-type contact layer. The p-side contact layer includes a plurality of protrusions protruding in a first direction toward the p-type semiconductor layer from the n-type semiconductor layer. The density of the plurality of protrusions in the plane perpendicular to the first direction ranges from 5×10 7 pieces/cm 2 or more to 2×10 8 pieces/cm 2 or less. The Mg concentration contained in the plurality of protrusions is higher than that contained in the portions other than the protrusions. COPYRIGHT: (C)2012,JPO&INPIT