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11. 发明专利

JP2013055303A Raw material vaporization supply device with raw material concentration detection mechanism 有权
标题翻译：原材料浓缩装置原料浓度检测机理
公开(公告)号：JP2013055303A
公开(公告)日：2013-03-21
申请号：JP2011194285
申请日：2011-09-06
申请人： Fujikin Inc , 株式会社フジキン
发明人： NAGASE MASAAKI , HIRATA KAORU , HIDAKA ATSUSHI , NISHINO KOJI , IKEDA SHINICHI , NAKAMURA TAKESHI
IPC分类号： H01L21/205 , C23C16/455
CPC分类号： F17D3/00 , C23C16/4482 , C23C16/45561 , G05D11/135 , Y10T137/8158
摘要： PROBLEM TO BE SOLVED: To provide a raw material vaporization supply device including a raw material concentration detection mechanism which allows for stable supply to a process chamber under high accuracy flow control, while adjusting the raw material concentration in a mixed gas accurately.SOLUTION: In the raw material vaporization supply device which supplies a carrier gas Gthrough a master flow controller 3 into a source tank 5, and supplies the saturation steam G of a raw material 4, generated while holding at a constant temperature in a thermostatic section, to a process chamber, an automatic pressure regulating device 8 is provided in the outflow path of a mixed gas Gfrom the source tank, and a mass flow meter 9 is provided on te downstream side thereof. Internal pressure Po of the source tank 5 is controlled to a predetermined value by performing open/close control of the control valve 8a of the automatic pressure regulating device 8. The detection values of flow rate Qof carrier gas G, and the source tank inner pressure Po by the master flow controller 3, and the flow rate Qof a mixed gas Gs of the mass flow meter 9 are input to a raw material concentration operation unit where the flow rate Qof the raw material 4 and the raw material concentration K are operated and displayed.
摘要翻译：解决的问题：提供一种原料蒸发供给装置，其包括原料浓度检测机构，其能够在精确地调整混合气体中的原料浓度的同时，在高精度流量控制下稳定地供给处理室。解决方案：在通过主流量控制器3将载气G K 供给源罐5的原料蒸发供给装置中，在恒温区域保持恒定温度下产生的原料4到处理室，在混合气体G S“的流出路径中设置有自动调压装置8， SB>，并且在其下游侧设置质量流量计9。通过执行自动压力调节装置8的控制阀8a的打开/关闭控制，将源箱5的内部压力Po控制到预定值。流量Q 1的检测值 / SB>载气G K ，由主流量控制器3输出源罐内压Po，流量Q S < 质量流量计9的混合气体Gs / SB>输入原料浓度运转单元，原料浓度运转单元中原料4的流量Q 2 浓度K被操作和显示。版权所有（C）2013，JPO＆INPIT

12. 发明专利

JP2011117499A Piezoelectrically driven valve and piezoelectrically driven flow volume control apparatus 有权
标题翻译：压电驱动阀和压电驱动流量控制装置
公开(公告)号：JP2011117499A
公开(公告)日：2011-06-16
申请号：JP2009274005
申请日：2009-12-01
申请人： Fujikin Inc , 株式会社フジキン
发明人： HIDAKA ATSUSHI , HIRATA KAORU , NAGASE MASAAKI , IKEDA SHINICHI , DOI RYOSUKE , NISHINO KOJI
IPC分类号： F16K49/00 , F16K7/14 , F16K31/02 , F16K37/00 , G05D7/06
CPC分类号： F16K31/007 , F16K7/14 , F16K25/005 , G05D7/0629 , Y10T137/6416 , Y10T137/7759 , Y10T137/776 , Y10T137/7761
摘要： PROBLEM TO BE SOLVED: To provide a piezoelectrically driving valve and a piezoelectrically driven flow volume control apparatus capable of controlling even a fluid with a temperature exceeding a use range temperature of a piezoelectric actuator. SOLUTION: The piezoelectrically driven valve includes a valve element 2 for opening/closing a fluid flow passage 1b, the piezoelectric actuator 10 for driving opening/closing of the valve element 2 by using extension of a piezoelectric element, and a heat radiation spacer 40 for holding up and supporting the piezoelectric actuator 10 so as to locate it away from the fluid flow passage 1b and radiating heat transmitted to the piezoelectric actuator 10 from a fluid flowing in the fluid flow passage 1b. More favorably, the piezoelectric driving type valve includes a supporting cylinder 23A housing and supporting both of the piezoelectric actuator 10 and the heat radiation spacer 40. In the supporting cylinder 23A, at least a part for housing the heat radiation spacer 40 is formed of a material with the same thermal expansion coefficient as that of the heat radiation spacer 40. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种压电驱动阀和压电驱动流量控制装置，其能够即使在超过压电致动器的使用范围温度的温度下控制流体。解决方案：压电驱动阀包括用于打开/关闭流体流动通道1b的阀元件2，用于通过使用压电元件的延伸来驱动阀元件2的打开/关闭的压电致动器10和热辐射用于保持和支撑压电致动器10的间隔件40，以使其远离流体流动通道1b并且从流体流动通道1b中流动的流体辐射传递到压电致动器10的热量。更优选地，压电驱动型阀包括容纳并支撑压电致动器10和散热隔离件40的支撑筒23A。在支撑筒23A中，用于容纳散热隔离物40的至少一部分由材料具有与散热垫片40相同的热膨胀系数。版权所有（C）2011，JPO＆INPIT

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