会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 13. 发明授权
    • Method of producing a thin film magnetic head
    • 薄膜磁头的制造方法
    • US5289628A
    • 1994-03-01
    • US865583
    • 1992-04-09
    • Yuuji OmataTatsuo Mifune
    • Yuuji OmataTatsuo Mifune
    • G11B5/31G11B5/42
    • G11B5/3163Y10T29/49034
    • A method of producing a thin film magnetic head in which at least one of two, lower and upper, magnetic layers is formed of a soft magnetic amorphous alloy thin film of a given pattern shape, includes the steps of preparing a soft magnetic thin film to communicate directly or magnetically with the soft magnetic amorphous alloy thin film so that an external magnetic field can effectively be applied, during in-field heat treatment, to the soft magnetic amorphous alloy thin film of the head core assembly from a direction at a right angle to the direction of a head core magnetic path, inducing uniaxial magnetic anisotropy in the soft magnetic amorphous alloy thin film through heat treatment in the external magnetic field, and removing the soft magnetic thin film for application of the external magnetic field during the in-field heat treatment. Also, another form of the method in which at least one of two, lower and upper, magnetic layers is formed by electroplating of a soft magnetic alloy thin film of a given pattern shape, includes the steps of preparing a soft magnetic thin film to communicate directly or magnetically with the soft magnetic electroplated alloy thin film so that an external magnetic field can effectively be applied, during in-field electroplating action, to the soft magnetic electroplated alloy thin film of the head core assembly from a direction at a right angle to the direction of a head core magnetic path.
    • 一种制造薄膜磁头的方法,其中由具有给定图案形状的软磁性非晶态合金薄膜形成两个,下部和上部磁性层中的至少一个,包括以下步骤:制备软磁性薄膜至 与软磁性非晶合金薄膜直接或磁性地通信,使得在现场热处理期间,能够从头芯组件的软磁性非晶合金薄膜从直角方向有效地施加外部磁场 在磁芯磁芯的方向上,通过在外部磁场中的热处理在软磁性非晶态合金薄膜中引起单轴磁各向异性,并且在场内去除用于施加外部磁场的软磁性薄膜 热处理。 此外,通过电镀具有给定图案形状的软磁性合金薄膜来形成两个,下部和上部磁性层中的至少一个的方法的另一种形式包括以下步骤:制备软磁性薄膜以进行通信 与软磁性电镀合金薄膜直接或磁耦合,使得在现场电镀动作期间可以将外磁场从头芯组件的软磁电镀合金薄膜从直角向 磁头磁芯磁路的方向。
    • 15. 发明授权
    • Electrodeless low-pressure discharge lamp operating device and self-ballasted electrodeless fluorescent lamp
    • 无极低压放电灯操作装置和自镇流无极荧光灯
    • US07049763B2
    • 2006-05-23
    • US10516221
    • 2003-05-30
    • Akira HochiTakeshi ArakawaKiyoshi HashimotodaniKatsushi SekiYuuji OmataYoshihisa Hagiwara
    • Akira HochiTakeshi ArakawaKiyoshi HashimotodaniKatsushi SekiYuuji OmataYoshihisa Hagiwara
    • H05B41/16H05B41/24
    • H01J65/048
    • An electrodeless discharge lamp operating device including a light-transmitting discharge bulb 120, an induction coil including a core 103 and a coil 104, and a ballast circuit 140 for supplying a high-frequency power to the induction coil. The operating frequency of the ballast circuit 140 is in the range of 80 kHz to 500 kHz, and where the operating frequency of the ballast circuit 140 is f (kHz) and the power input to the discharge bulb 120 is P (W), the rare gas pressure p (Pa) in the discharge bulb 120 satisfies the relationship of the following expression: p ≥ A P - B f 2 - C [ Expression ⁢ ⁢ 1 ] (where A, B and C are constants having the following values: A=4.0×104, B=3.5×104 and C=6.2), and the power input P to the discharge bulb 120 is 7 W at minimum and 22 W at maximum.
    • 一种无电极放电灯操作装置,包括透光放电灯泡120,包括芯103和线圈104的感应线圈,以及用于向感应线圈提供高频电力的镇流器电路140。 镇流器电路140的工作频率在80kHz至500kHz的范围内,并且镇流电路140的工作频率为f(kHz)且输入到放电灯泡120的功率为P(W)时, 放电灯泡120中的稀有气体压力p(Pa)满足以下表达式的关系: p = A MO> - B C [ 表达 / MN> ] (其中A,B和C是 以下值:A = 4.0×10 4,B = 3.5×10 4和C = 6.2),并且放电灯泡的功率输入P 120最小7W,最大22W。
        • 16. 发明授权
        • Method for forming thin film, spheroid coated with thin film, light bulb using the spheroid and equipment for film formation
        • 薄膜形成方法,涂有薄膜的球体,使用球体的灯泡和用于成膜的设备
        • US06472022B1
        • 2002-10-29
        • US09537622
        • 2000-03-29
        • Yuuji OmataNaotaka HashimotoMasahide YokoyamaToshiyuki SuemitsuTakahiro Kitai
        • Yuuji OmataNaotaka HashimotoMasahide YokoyamaToshiyuki SuemitsuTakahiro Kitai
        • B05B100
        • C23C14/505H01J9/20H01K3/005Y10T428/131Y10T428/2991Y10T428/8305
        • The present invention provides a method for forming thin films, wherein thin films with a uniform thickness can be formed on substrates as objects such as spheroids, even when the films are formed by conventional film-formation methods using an incident particle beam coming from a specific direction (e.g., evaporation and sputtering). In the method, thin films are formed on substrates such as spheroids with an incident particle beam coming from a particle source located in a specific direction by performing a spin motion together with a swing motion. The spin motion is a rotation of the substrate at a constant angular velocity about the spheroidal axis. The swing motion is a rotational oscillation of the same substrate for rotationally oscillating the axis at a constant cycle in one surface, where the center of the rotational oscillation is in the vicinity of the midpoint between two focal points on the axis of the spheroid. As a result, thin films with a uniform thickness in both the peripheral direction of the substrate and in the rotational axis direction of the spin motion can be formed even on substrates including spheroids.
        • 本发明提供了一种形成薄膜的方法,其中,即使当使用来自特定的粒子束的入射粒子束的常规成膜方法形成膜时,也可以在诸如球体的物体的基板上形成具有均匀厚度的薄膜 方向(如蒸发和溅射)。 在该方法中,通过与摆动运动一起执行旋转运动,在具有来自位于特定方向的粒子源的入射粒子束的基底上形成薄膜,例如球体。 旋转运动是围绕球球轴以恒定角速度旋转基底。 摆动是同一基板的旋转振动,用于在一个表面中以恒定周期旋转轴的旋转振动,其中旋转振荡的中心在球体的轴线上的两个焦点之间的中点附近。 结果,即使在包括球体的基板上也可以形成在基板的圆周方向上和旋转轴的旋转轴方向上具有均匀厚度的薄膜。
        • 18. 发明授权
        • Method for forming thin film, spheroid coated with thin film, light bulb using the spheroid and equipment for film formation
        • 薄膜形成方法,涂有薄膜的球体,使用球体的灯泡和用于成膜的设备
        • US06726816B2
        • 2004-04-27
        • US10238092
        • 2002-09-09
        • Yuuji OmataNaotaka HashimotoMasahide YokoyamaToshiyuki SuemitsuTakahiro Kitai
        • Yuuji OmataNaotaka HashimotoMasahide YokoyamaToshiyuki SuemitsuTakahiro Kitai
        • C25D1728
        • C23C14/505H01J9/20H01K3/005Y10T428/131Y10T428/2991Y10T428/8305
        • The present invention provides a method for forming thin films, wherein thin films with a uniform thickness can be formed on substrates as objects such as spheroids, even when the films are formed by conventional film-formation methods using an incident particle beam coming from a specific direction (e.g., evaporation and sputtering). In the method, thin films are formed on substrates such as spheroids with an incident particle beam coming from a particle source located in a specific direction by performing a spin motion together with a swing motion. The spin motion is a rotation of the substrate at a constant angular velocity about the spheroidal axis. The swing motion is a rotational oscillation of the same substrate for rotationally oscillating the axis at a constant cycle in one surface, where the center of the rotational oscillation is in the vicinity of the midpoint between two focal points on the axis of the spheroid. As a result, thin films with a uniform thickness in both the peripheral direction of the substrate and in the rotational axis direction of the spin motion can be formed even on substrates including spheroids.
        • 本发明提供了一种形成薄膜的方法,其中,即使当使用来自特定的粒子束的入射粒子束的常规成膜方法形成膜时,也可以在诸如球体的物体的基板上形成具有均匀厚度的薄膜 方向(如蒸发和溅射)。 在该方法中,通过与摆动运动一起执行旋转运动,在具有来自位于特定方向的粒子源的入射粒子束的基底上形成薄膜,例如球体。 旋转运动是围绕球球轴以恒定角速度旋转基底。 摆动是同一基板的旋转振动,用于在一个表面中以恒定周期旋转轴的旋转振动,其中旋转振荡的中心在球体的轴线上的两个焦点之间的中点附近。 结果,即使在包括球体的基板上也可以形成在基板的圆周方向上和旋转轴的旋转轴方向上具有均匀厚度的薄膜。