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11. 发明申请

US20120052599A1 Wafer Chucking System for Advanced Plasma Ion Energy Processing Systems 有权
标题翻译：用于先进等离子体离子能量处理系统的晶圆卡盘系统
公开(公告)号：US20120052599A1
公开(公告)日：2012-03-01
申请号：US13193299
申请日：2011-07-28
申请人： Victor Brouk , Daniel J. Hoffman
发明人： Victor Brouk , Daniel J. Hoffman
IPC分类号： H01L21/66 , B05C11/00 , H01L21/3065
CPC分类号： C23C16/50 , C23C14/345 , H01J37/32009 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis.
摘要翻译：公开了用于调节等离子体室中的离子能并将衬底夹持到衬底支撑件的系统，方法和装置。一种示例性方法包括将衬底放置在等离子体室中，在等离子体室中形成等离子体，可控制地将功率切换到衬底，以便向衬底施加周期性电压功能，并且在周期性电压函数的多个周期内调制，所述周期性电压功能响应于所述衬底表面处的离子能量的期望分布，以便以时间平均的方式实现所需的离子能量分布。

12. 发明申请

US20110259851A1 SYSTEM, METHOD AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION 有权
标题翻译：用于控制离子能量分布的系统，方法和装置
公开(公告)号：US20110259851A1
公开(公告)日：2011-10-27
申请号：US12870837
申请日：2010-08-29
申请人： Victor Brouk , Randy Heckman , Daniel J. Hoffman
发明人： Victor Brouk , Randy Heckman , Daniel J. Hoffman
IPC分类号： C23F1/00 , C23C16/52 , C23C16/458 , C23F1/08 , C23C16/50
CPC分类号： H01J37/24 , C23C14/345 , C23C16/50 , H01J37/32009 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis.
摘要翻译：公开了用于调节等离子体室中的离子能量的系统，方法和装置。一种示例性方法包括将衬底放置在等离子体室中，在等离子体室中形成等离子体，可控制地将功率切换到衬底，以便向衬底施加周期性电压功能，并且在周期性电压函数的多个周期内调制，所述周期性电压功能响应于所述衬底表面处的离子能量的期望分布，以便以时间平均的方式实现所需的离子能量分布。

13. 发明申请

US20100270141A1 Detecting and Preventing Instabilities in Plasma Processes 有权
标题翻译：检测和防止等离子体过程中的不稳定性
公开(公告)号：US20100270141A1
公开(公告)日：2010-10-28
申请号：US12766913
申请日：2010-04-25
申请人： Daniel Carter , Victor Brouk , Jeff Roberg
发明人： Daniel Carter , Victor Brouk , Jeff Roberg
IPC分类号： H05H1/24
CPC分类号： H05H1/46 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for reducing instabilities in a plasma-based processing system are disclosed. An exemplary method includes applying power to a plasma with a power amplifier; determining whether low frequency instability oscillations are present or high frequency instability oscillations are present in the plasma; and altering, based upon whether high or low frequency instability oscillations are present, an impedance of a load that is experienced by the power amplifier, the load experienced by the power amplifier including at least an impedance of the plasma.
摘要翻译：公开了用于减少基于等离子体的处理系统中的不稳定性的系统，方法和装置。一种示例性方法包括用功率放大器对等离子体施加功率; 确定是否存在低频不稳定振荡，或者等离子体中存在高频不稳定振荡; 以及基于是否存在高频或低频不稳定振荡来改变由功率放大器经历的负载的阻抗，所述功率放大器经历的负载至少包括等离子体的阻抗。

14. 发明授权

US07822565B2 System, method, and apparatus for monitoring characteristics of RF power 有权
标题翻译：用于监测射频功率特性的系统，方法和装置
公开(公告)号：US07822565B2
公开(公告)日：2010-10-26
申请号：US11968081
申请日：2007-12-31
申请人： Victor Brouk , Jeff Roberg
发明人： Victor Brouk , Jeff Roberg
IPC分类号： G01R11/00
CPC分类号： H05H1/46 , G01R21/01 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： A system and method for monitoring RF power is described. In one embodiment the system samples RF power that is generated by an RF generator to obtain RF signals that include information indicative of electrical characteristics at a plurality of particular frequencies that fall within a frequency range. The RF signals are digitized to obtain a stream of digital RF signals that include information indicative of electrical characteristics at the plurality of particular frequencies, and the information indicative of electrical characteristics is successively transformed, for each of the plurality of particular frequencies, from a time domain into a frequency domain.
摘要翻译：描述了用于监视RF功率的系统和方法。在一个实施例中，系统对由RF发生器产生的RF功率进行采样，以获得RF信号，该RF信号包括表示在频率范围内的多个特定频率处的电特性的信息。 RF信号被数字化以获得数字RF信号流，其包括指示多个特定频率处的电特性的信息，并且针对多个特定频率中的每一个从一个时间顺序地变换表示电特性的信息域变成频域。

15. 发明申请

US20050134186A1 Stabilizing plasma and generator interactions 有权
标题翻译：稳定等离子体和发生器相互作用
公开(公告)号：US20050134186A1
公开(公告)日：2005-06-23
申请号：US10741226
申请日：2003-12-19
申请人： Victor Brouk , Randy Heckman
发明人： Victor Brouk , Randy Heckman
IPC分类号： H01J7/24 , H01J37/32
CPC分类号： H01J37/32935 , H01J37/32183
摘要： An approach for stabilizing the interactions between a plasma and the generator powering the plasma is provided. Reactive elements disposed between the power generator and plasma operate to modify the apparent impedance characteristics of the plasma such that the trajectory of the plasma load impedance as a function of power is substantially aligned locally with the contours of constant power output in impedance space. In this way, instabilities in the generator and plasma system are avoided because reinforcement or amplification of fluctuations in plasma impedance due to interactions between the generator and the plasma are reduced or eliminated. The reactive elements may be variable in order to align plasma trajectories and generator power contours under a range of process conditions.
摘要翻译：提供了一种用于稳定等离子体和为等离子体供电的发电机之间的相互作用的方法。布置在功率发生器和等离子体之间的无功元件操作以改变等离子体的表观阻抗特性，使得作为功率的函数的等离子体负载阻抗的轨迹基本上与阻抗空间中恒定功率输出的轮廓对准。以这种方式，避免发电机和等离子体系统中的不稳定性，因为由于发电机和等离子体之间的相互作用引起的等离子体阻抗波动的增强或放大被减少或消除。反应元件可以是可变的，以便在一定范围的工艺条件下对准等离子体轨迹和发电机功率轮廓。

16. 发明授权

US09767988B2 Method of controlling the switched mode ion energy distribution system 有权
公开(公告)号：US09767988B2
公开(公告)日：2017-09-19
申请号：US13596976
申请日：2012-08-28
申请人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
发明人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
IPC分类号： C23C14/00 , H01J37/32
CPC分类号： H01J37/32009 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.

17. 发明授权

US09685297B2 Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system 有权
公开(公告)号：US09685297B2
公开(公告)日：2017-06-20
申请号：US13597093
申请日：2012-08-28
申请人： Daniel Carter , Victor Brouk , Daniel J. Hoffman
发明人： Daniel Carter , Victor Brouk , Daniel J. Hoffman
IPC分类号： C23C14/34 , H01J37/08 , G01N27/06 , H01J37/32
CPC分类号： H01J37/08 , G01N27/06 , H01J37/32944 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.

18. 发明授权

US09362089B2 Method of controlling the switched mode ion energy distribution system 有权
标题翻译：控制开关式离子能量分配系统的方法
公开(公告)号：US09362089B2
公开(公告)日：2016-06-07
申请号：US13597050
申请日：2012-08-28
申请人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
发明人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
IPC分类号： C23C14/34 , H01J37/32
CPC分类号： H01J37/32009 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.
摘要翻译：公开了用于调节等离子体室中的离子能并将衬底夹持到衬底支撑件的系统，方法和装置。一种示例性方法包括将衬底放置在等离子体室中，在等离子体室中形成等离子体，可控制地将功率切换到衬底，以便向衬底施加周期性电压函数（或修改的周期性电压函数），并且对衬底进行调制周期性电压功能的多个周期，周期性电压函数响应于衬底表面处的离子能量的限定分布，以便以时间平均的方式实现定义的离子能量分布。

19. 发明授权

US09309594B2 System, method and apparatus for controlling ion energy distribution of a projected plasma 有权
标题翻译：用于控制投影等离子体的离子能量分布的系统，方法和装置
公开(公告)号：US09309594B2
公开(公告)日：2016-04-12
申请号：US13193345
申请日：2011-07-28
申请人： Daniel J. Hoffman , Victor Brouk , Daniel Carter
发明人： Daniel J. Hoffman , Victor Brouk , Daniel Carter
IPC分类号： C23C16/50 , C23C14/34 , H01J37/32
CPC分类号： C23C16/50 , C23C14/345 , H01J37/32009 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber via a remotely generated ionizing electromagnetic field that extends into the plasma chamber from a remote projected source, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis.
摘要翻译：公开了用于调节等离子体室中的离子能量的系统，方法和装置。一种示例性方法包括将基板放置在等离子体室中，通过远程产生的电离电磁场在等离子体室中形成等离子体，该离子化电磁场从远程投影源延伸到等离子体室中，可控制地将功率切换到基板，以便施加周期性电压功能到基板，并且在周期性电压函数的多个周期中调制周期性电压函数，其响应于衬底表面处的离子能量的期望分布，以便在一段时间内实现所需的离子能量分布依据。

20. 发明申请

US20120319584A1 METHOD OF CONTROLLING THE SWITCHED MODE ION ENERGY DISTRIBUTION SYSTEM 有权
公开(公告)号：US20120319584A1
公开(公告)日：2012-12-20
申请号：US13597050
申请日：2012-08-28
申请人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
发明人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
IPC分类号： H05H1/24
CPC分类号： H01J37/32009 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.

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