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    • 15. 发明授权
    • Semiconductor laser device and method of fabricating the same
    • 半导体激光器件及其制造方法
    • US07120181B1
    • 2006-10-10
    • US09532786
    • 2000-03-22
    • Nobuhiko HayashiTakenori Goto
    • Nobuhiko HayashiTakenori Goto
    • H01S5/00
    • B82Y20/00H01S5/065H01S5/0658H01S5/2219H01S5/223H01S5/34333
    • In a semiconductor laser device, an AlGaN buffer layer, a GaN layer, an n-GaN layer, an n-AlGaN cladding layer, an MQW light emitting layer, a p-AlGaN cladding layer, a p-first GaN cap layer, a current blocking layer composed of n-AlGaN, and a p-second GaN cap layer are stacked in this order on a sapphire substrate, and a ridge portion having an upper surface having a width W1 is formed by etching. The current blocking layer has an opening having a width W2 on the upper surface of the ridge portion. The width W2 of the opening is smaller than the width W1 of the upper surface of the ridge portion. Accordingly, in a light emitting region of the MQW light emitting layer, a saturable light absorbing region is formed on both sides of a current injection region.
    • 在半导体激光器件中,AlGaN缓冲层,GaN层,n-GaN层,n-AlGaN包覆层,MQW发光层,p-AlGaN包覆层,p第一GaN覆盖层, 由n-AlGaN构成的电流阻挡层和p-second GaN覆盖层依次层叠在蓝宝石基板上,具有宽度W 1 1的上表面的脊部由 蚀刻。 电流阻挡层在脊部的上表面上具有宽度W 2 2的开口。 开口的宽度W 2 2小于脊部的上表面的宽度W 1 1 <1>。 因此,在MQW发光层的发光区域中,在电流注入区域的两侧形成有可饱和的光吸收区域。