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11. 发明申请

US20070125967A1 System and method pf electron beam writing 有权
标题翻译：系统和方法pf电子束写入
公开(公告)号：US20070125967A1
公开(公告)日：2007-06-07
申请号：US11607753
申请日：2006-11-30
申请人： Dmitri Lapanik , Shohei Matsushita , Takashi Mitsuhashi , Zhigang Wu
发明人： Dmitri Lapanik , Shohei Matsushita , Takashi Mitsuhashi , Zhigang Wu
IPC分类号： G21K5/10
CPC分类号： G03F1/16 , B82Y10/00 , B82Y40/00 , G03F1/78 , G06F17/50 , H01J37/3026 , H01J37/3174 , H01J2237/31762 , H01J2237/31788
摘要： A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an optimal writing pattern based, at least in part, on the received information.
摘要翻译：一种能够考虑设计意图，设备能力和设计要求的改进电子束写入的系统和方法。该系统和方法至少部分地基于所接收的信息来确定最佳写入模式。

12. 发明申请

US20110265049A1 METHOD AND SYSTEM FOR STENCIL DESIGN FOR PARTICLE BEAM WRITING 审中-公开
标题翻译：用于粒子束写入的方法和系统
公开(公告)号：US20110265049A1
公开(公告)日：2011-10-27
申请号：US13174830
申请日：2011-07-01
申请人： Dmitri Lapanik , Shohei Matsushita , Takashi Mitsuhashi , Zhigang Wu
发明人： Dmitri Lapanik , Shohei Matsushita , Takashi Mitsuhashi , Zhigang Wu
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , B82Y10/00 , B82Y40/00 , G03F1/20 , G03F1/36 , G03F1/78 , H01J37/3174
摘要： Various embodiments of the present invention relate to particle beam writing to fabricate an integrated circuit on a wafer. In various embodiments, cell projection (CP) cell library information is stored in the form of a data structure. Subsequently, the CP cell library information is referenced by a writing system. The patterns are written on the wafer depending on the referenced CP cell library.
摘要翻译：本发明的各种实施例涉及粒子束写入以在晶片上制造集成电路。在各种实施例中，以数据结构的形式存储单元投影（CP）单元库信息。随后，CP单元库信息由书写系统引用。根据参考的CP单元库，将图案写在晶片上。

13. 发明授权

US07953582B2 Method and system for lithography simulation and measurement of critical dimensions 有权
标题翻译：用于光刻模拟和关键尺寸测量的方法和系统
公开(公告)号：US07953582B2
公开(公告)日：2011-05-31
申请号：US11603526
申请日：2006-11-21
申请人： Daisuke Hara , Takashi Mitsuhashi , Zhigang Wu
发明人： Daisuke Hara , Takashi Mitsuhashi , Zhigang Wu
IPC分类号： G06G7/48
CPC分类号： G03F7/2061 , G03F1/36 , G03F1/68
摘要： A method and system for lithography simulation is disclosed. The method and system specify a subject region of a lithography image with a CD marker, specify a threshold intensity over the lithography image, specify a gradient to a threshold value of the threshold intensity, and calculate a sensitivity or ratio of change of an image boundary of the lithography image to lithography process variation.
摘要翻译：公开了一种用于光刻仿真的方法和系统。该方法和系统使用CD标记指定光刻图像的主题区域，在光刻图像上指定阈值强度，指定到阈值强度的阈值的梯度，并计算图像边界的灵敏度或变化率的光刻图像到光刻工艺的变化。

14. 发明授权

US07897522B2 Method and system for improving particle beam lithography 有权
标题翻译：改进粒子束光刻的方法和系统
公开(公告)号：US07897522B2
公开(公告)日：2011-03-01
申请号：US11603603
申请日：2006-11-21
申请人： Akira Fujimura , James Fong , Takashi Mitsuhashi , Shohei Matsushita
发明人： Akira Fujimura , James Fong , Takashi Mitsuhashi , Shohei Matsushita
IPC分类号： H01L21/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： A method for particle beam lithography, such as electron beam (EB) lithography, includes forming a plurality of cell patterns on a stencil mask and shaping one or more of the cell patterns with a polygonal-shaped contour. A first polygonal-shaped cell pattern is exposed to a particle beam so as to project the first polygonal-shaped cell pattern on a substrate. A second polygonal-shaped cell pattern, having a contour that mates with the contour of the first polygonal-shaped cell pattern, is exposed to the particle beam, such as an electron beam, so as to project the second polygonal-shaped cell pattern adjacent to the first polygonal-shaped cell pattern to thereby form a combined cell with the contour of the first polygonal-shaped cell pattern mated to the contour of the second polygonal-shaped cell pattern. The polygonal-shaped contour of the first and second cell patterns may comprise a rectilinear-shaped contour.
摘要翻译：用于粒子束光刻的方法，例如电子束（EB）光刻，包括在模板掩模上形成多个单元图案并且以多边形轮廓对一个或多个单元图案进行成型。将第一多边形形状的单元图案暴露于粒子束，以将第一多边形单元图案投影到基板上。具有与第一多边形形状的单元图案的轮廓相匹配的轮廓的第二多边形形状的单元图案被暴露于诸如电子束的粒子束，以便将第二多边形单元图案相邻地突出到第一多边形形状的单元图案，从而形成与第二多边形形状的单元图案的轮廓相配合的第一多边形单元图案的轮廓的组合单元。第一和第二单元图案的多边形轮廓可以包括直线形轮廓。

15. 发明授权

US07777204B2 System and method of electron beam writing 有权
标题翻译：电子束写入系统和方法
公开(公告)号：US07777204B2
公开(公告)日：2010-08-17
申请号：US11607753
申请日：2006-11-30
申请人： Dmitri Lapanik , Shohei Matsushita , Takashi Mitsuhashi , Zhigang Wu
发明人： Dmitri Lapanik , Shohei Matsushita , Takashi Mitsuhashi , Zhigang Wu
IPC分类号： G06F17/50 , G03F1/16
CPC分类号： G03F1/16 , B82Y10/00 , B82Y40/00 , G03F1/78 , G06F17/50 , H01J37/3026 , H01J37/3174 , H01J2237/31762 , H01J2237/31788
摘要： A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an optimal writing pattern based, at least in part, on the received information.
摘要翻译：一种能够考虑设计意图，设备能力和设计要求的改进电子束写入的系统和方法。该系统和方法至少部分地基于所接收的信息来确定最佳写入模式。

16. 发明申请

US20100058282A1 METHOD AND SYSTEM FOR DESIGN OF A RETICLE TO BE MANUFACTURED USING CHARACTER PROJECTION LITHOGRAPHY 有权
标题翻译：使用字符投影算术设计制作的方法和系统
公开(公告)号：US20100058282A1
公开(公告)日：2010-03-04
申请号：US12202366
申请日：2008-09-01
申请人： Akira Fujimura , Lance Glasser , Takashi Mitsuhashi , Kazuyuki Hagiwara
发明人： Akira Fujimura , Lance Glasser , Takashi Mitsuhashi , Kazuyuki Hagiwara
IPC分类号： G06F17/50 , G03F1/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/20 , G03F1/36 , G03F1/68 , G03F1/78 , G06F2217/12 , Y02P90/265 , Y10S430/143
摘要： A method for fracturing or mask data preparation or proximity effect correction is disclosed which comprises the steps of inputting patterns to be formed on a surface, a subset of the patterns being slightly different variations of each other and selecting a set of characters some of which are complex characters to be used to form the number of patterns, and reducing shot count or total write time by use of a character varying technique. A system for fracturing or mask data preparation or proximity effect correction is also disclosed.
摘要翻译：公开了一种用于压裂或掩模数据准备或接近效应校正的方法，其包括以下步骤：输入要在表面上形成的图案，所述图案的子集彼此稍微不同的变化，并且选择一组字符，其中一些是用于形成图案数量的复杂字符，并且通过使用字符变化技术减少镜头计数或总写入时间。还公开了用于压裂或掩模数据准备或邻近效应校正的系统。

17. 发明申请

US20100055619A1 METHOD AND SYSTEM FOR MANUFACTURING A RETICLE USING CHARACTER PROJECTION LITHOGRAPHY 有权
标题翻译：使用特征投影算法制造一个实例的方法和系统
公开(公告)号：US20100055619A1
公开(公告)日：2010-03-04
申请号：US12269777
申请日：2008-11-12
申请人： Akira Fujimura , Lance Glasser , Takashi Mitsuhashi , Kazuyuki Hagiwara
发明人： Akira Fujimura , Lance Glasser , Takashi Mitsuhashi , Kazuyuki Hagiwara
IPC分类号： H01L21/027
CPC分类号： G03B27/42 , B82Y10/00 , B82Y40/00 , G03F1/78 , H01J37/3174 , Y10S430/143
摘要： A method for manufacturing a surface, the surface having a multiplicity of slightly different patterns, is disclosed with the method comprising the steps of designing a stencil mask having a set of characters for forming the patterns on the surface and reducing shot count or total write time by use of a character varying technique. A system for manufacturing a surface is also disclosed.
摘要翻译：公开了一种用于制造表面的方法，该表面具有多个稍微不同的图案，该方法包括以下步骤：设计具有用于在表面上形成图案的一组字符的模版掩模，并减少镜头数量或总写入时间通过使用字符变化技术。还公开了一种用于制造表面的系统。

18. 发明申请

US20080116399A1 Method and system for improving particle beam lithography 有权
标题翻译：改进粒子束光刻的方法和系统
公开(公告)号：US20080116399A1
公开(公告)日：2008-05-22
申请号：US11603603
申请日：2006-11-21
申请人： Akira Fujimura , James Fong , Takashi Mitsuhashi , Shohei Matsushita
发明人： Akira Fujimura , James Fong , Takashi Mitsuhashi , Shohei Matsushita
IPC分类号： G21K5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： A method for particle beam lithography, such as electron beam (EB) lithography, includes forming a plurality of cell patterns on a stencil mask and shaping one or more of the cell patterns with a polygonal-shaped contour. A first polygonal-shaped cell pattern is exposed to a particle beam so as to project the first polygonal-shaped cell pattern on a substrate. A second polygonal-shaped cell pattern, having a contour that mates with the contour of the first polygonal-shaped cell pattern, is exposed to the particle beam, such as an electron beam, so as to project the second polygonal-shaped cell pattern adjacent to the first polygonal-shaped cell pattern to thereby form a combined cell with the contour of the first polygonal-shaped cell pattern mated to the contour of the second polygonal-shaped cell pattern. The polygonal-shaped contour of the first and second cell patterns may comprise a rectilinear-shaped contour.
摘要翻译：用于粒子束光刻的方法，例如电子束（EB）光刻，包括在模板掩模上形成多个单元图案并且以多边形轮廓对一个或多个单元图案进行成型。将第一多边形形状的单元图案暴露于粒子束，以将第一多边形单元图案投影到基板上。具有与第一多边形形状的单元图案的轮廓相匹配的轮廓的第二多边形形状的单元图案被暴露于诸如电子束的粒子束，以便将第二多边形单元图案相邻地突出到第一多边形形状的单元图案，从而形成与第二多边形形状的单元图案的轮廓相配合的第一多边形单元图案的轮廓的组合单元。第一和第二单元图案的多边形轮廓可以包括直线形轮廓。

19. 发明授权

US06324292B1 Speaker apparatus 失效
标题翻译：扬声器装置
公开(公告)号：US06324292B1
公开(公告)日：2001-11-27
申请号：US09416048
申请日：1999-10-12
申请人： Takashi Mitsuhashi , Hiroyuki Hamada
发明人： Takashi Mitsuhashi , Hiroyuki Hamada
IPC分类号： H04R2500
CPC分类号： H04R1/2888 , H04R1/288
摘要： A speaker apparatus comprises a speaker unit, a cabinet for forming an internal space on the rear side of the speaker unit with a plurality of wall surfaces including a baffle plate for use in mounting the speaker unit, a acoustic tube which is formed along at least one wall surface out of the plurality of wall surfaces and has not only a substantially uniform hollow section but also an opening at one end, and an acoustical material for separating the internal space from the internal space of the acoustic tube by closing the opening of the acoustic tube. The speaker apparatus is characterized in that the acoustic tube has a tube length about 1/(2n) (n=positive integer) time as large as a wavelength corresponding to the lowest resonance mode of the standing wave produced along the one wall surface out of the standing waves produced in the internal space and that the opening is disposed close to the node of the standing wave.
摘要翻译：扬声器装置包括扬声器单元，用于在扬声器单元的后侧形成内部空间的机壳，其具有包括用于安装扬声器单元的挡板的多个壁面，至少形成有声管在多个壁表面中的一个壁表面，并且不仅具有基本上均匀的中空部分，而且在一端具有开口，以及声学材料，用于通过闭合所述声管的开口将内部空间与声管的内部空间分离声管。扬声器装置的特征在于，声管具有与沿着一个壁表面产生的驻波的最低共振模式相对应的波长的大约1 /（2n）（n =正整数）时间的管长度在内部空间中产生的驻波，并且开口布置成靠近驻波的节点。

20. 发明授权

US5994922A Output buffer, semiconductor integrated circuit having output buffer and driving ability adjusting method for output buffer 失效
标题翻译：输出缓冲器，具有输出缓冲器的半导体集成电路和输出缓冲器的驱动能力调整方法
公开(公告)号：US5994922A
公开(公告)日：1999-11-30
申请号：US797289
申请日：1997-02-07
申请人： Takahiro Aoki , Takashi Mitsuhashi
发明人： Takahiro Aoki , Takashi Mitsuhashi
IPC分类号： H03K17/12 , H03K17/687 , H03K19/0175 , H03K19/0185 , H03K19/0948
CPC分类号： H03K19/018585
摘要： A semiconductor integrated circuit has an internal circuit to execute a predetermined circuit operation, an input node to which output from the internal circuit is provided, and an output buffer capable of changing its driving ability placed between the input node and a signal outputs pad of the semiconductor integrated circuit. The outfit buffer has transistors connected in parallel for driving an external circuit connected to the signal output pad according to the output from the internal circuit and switching circuits. Each switching circuit switches a signal to be provided to each transistor. The switching state of each switching circuit is set according to the load capacity of the external circuit.
摘要翻译：半导体集成电路具有执行预定电路操作的内部电路，设置有内部电路的输出的输入节点和能够改变其输入节点与输入节点的信号输出板之间的驱动能力的输出缓冲器半导体集成电路。装配缓冲器具有并联连接的晶体管，用于根据内部电路和开关电路的输出驱动连接到信号输出焊盘的外部电路。每个开关电路切换要提供给每个晶体管的信号。各开关电路的开关状态根据外部电路的负载容量而设定。

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