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11. 发明授权

US07105836B2 Method and apparatus for cooling a reticle during lithographic exposure 失效
标题翻译：在光刻曝光期间冷却掩模版的方法和装置
公开(公告)号：US07105836B2
公开(公告)日：2006-09-12
申请号：US10273405
申请日：2002-10-18
申请人： Santiago del Puerto , Daniel N. Galburt , Andrew W. McCullough , Stephen Roux , Joost Jeroen Ottens
发明人： Santiago del Puerto , Daniel N. Galburt , Andrew W. McCullough , Stephen Roux , Joost Jeroen Ottens
IPC分类号： G03F7/20 , F25B29/00 , H01J37/20
CPC分类号： G03F7/70716 , F28F3/048 , G03F7/70875
摘要： Systems and methods eliminate vibrations produced by coolant fluid flowing through a short stroke stage and prevent change in thermally-induced distortion of the short stroke stage by maintaining the temperature and temperature distribution within the short stroke stage constant regardless of actinic heat load incident on a reticle. This is done by: (1) conducting heat through the reticle and short stroke stage components, (2) radiatively transferring heat from the short stroke stage to a long stroke stage, and (3) using convection and a cooling system to dissipate heat from the long stroke stage. The short stroke stage can be magnetically levitated from the long stroke stage. This way there is no physical contact, but the long stroke stage's movements can still control the short stroke stage's movements. By not physically contacting the long stroke stage, the short stroke stage is not affected by vibrations in the long stroke stage caused by the flowing coolant.
摘要翻译：系统和方法消除了通过短行程级流动的冷却剂流体产生的振动，并且通过将短程序段内的温度和温度分布保持恒定，并且防止入射到光罩上的光化热负荷而保持短行程级的热诱导变形的变化。。这通过以下方式完成：（1）通过标线和短行程部件进行热量，（2）将热量从短行程级辐射传递到长行程级，以及（3）使用对流和冷却系统来散发热量长时间的阶段。短行程阶段可以从长行程阶段磁悬浮。这样就没有身体接触，但长时间运动的运动仍然可以控制短路阶段的动作。通过不与长行程阶段物理接触，短行程级不受流动的冷却剂引起的长行程阶段的振动的影响。

12. 发明授权

US07087911B2 Method for recycling gases used in a lithography tool 有权
标题翻译：在光刻工具中使用的再循环气体的方法
公开(公告)号：US07087911B2
公开(公告)日：2006-08-08
申请号：US11087639
申请日：2005-03-24
申请人： Stephen Roux
发明人： Stephen Roux
IPC分类号： H01J61/12
CPC分类号： G03F7/70908 , G03F7/70858 , G03F7/70916
摘要： A system and method are used to isolate a first gas from a second gas using a third gas. A first chamber includes an element that emits light based on a first gas. A second chamber uses the emitted light to perform a process and includes the second gas. A gaslock that couples the first chamber to the second chamber. A gas source supplies a third gas between the first and the second gas in the gaslock, such that the first gas is isolated from the second gas in the gaslock. The first and third gas can be pumped from the first chamber and separated from one another, such that the first gas can be recycled for reuse to form the emitting light.
摘要翻译：使用系统和方法使用第三气体将第一气体与第二气体隔离。第一室包括基于第一气体发光的元件。第二室使用发射的光进行处理并且包括第二气体。将第一室耦合到第二室的气闸。气体源在气闸中的第一和第二气体之间提供第三气体，使得第一气体与气闸中的第二气体隔离。第一和第三气体可以从第一室泵送并彼此分离，使得第一气体可以被再循环以重新使用以形成发射光。

13. 发明申请

US20050264791A1 Wafer handling method for use in lithography patterning 有权
公开(公告)号：US20050264791A1
公开(公告)日：2005-12-01
申请号：US11182192
申请日：2005-07-15
申请人： Santiago del Puerto , Stephen Roux , Justin Kreuzer
发明人： Santiago del Puerto , Stephen Roux , Justin Kreuzer
IPC分类号： G03B27/58 , G03F7/20 , G03F9/00 , H01L21/00 , H01L21/027 , H01L21/677 , H01L21/68
CPC分类号： H01L21/67225 , G03F7/707 , G03F7/7075 , G03F7/70808 , G03F9/7011 , G03F9/7096 , H01L21/67201 , H01L21/681
摘要： A method utilizing a lithography system comprises a lithography patterning chamber, a wafer exchange chamber separated from the lithography patterning chamber by a first gate valve, and at least one alignment load-lock separated from the wafer exchange chamber by a second gate valve. The alignment load-lock includes an alignment stage that aligns a wafer during pump-down. The alignment load-lock can be uni-directional or bi-directional. The lithography system can include one or multiple alignment load-locks.

14. 发明授权

US06934005B2 Reticle focus measurement method using multiple interferometric beams 失效
标题翻译：使用多个干涉光束的光栅聚焦测量方法
公开(公告)号：US06934005B2
公开(公告)日：2005-08-23
申请号：US10235499
申请日：2002-09-06
申请人： Stephen Roux , Todd J. Bednarek
发明人： Stephen Roux , Todd J. Bednarek
IPC分类号： G03F7/20 , G03F9/00 , G01B27/42
CPC分类号： G03F9/7026 , G03F7/70716 , G03F7/70725
摘要： A first set of interferometric measuring beams is used to determine a location of a patterned surface of a reticle and a reticle focus plane for a reticle that is back clamped to a reticle stage. A second set of interferometric measuring beams is used to determine a map of locations of the reticle stage during scanning in a Y direction. The two sets of interferometric measuring beams are correlated to relate the reticle focal plane to the map of the reticle stage. The information is used to control the reticle stage during exposure of a pattern on the patterned surface of the reticle onto a wafer.
摘要翻译：第一组干涉测量光束用于确定掩模版的图案化表面的位置和用于后夹紧到标线片台的掩模版的掩模版聚焦平面。第二组干涉测量光束用于确定在Y方向扫描期间光罩台的位置的图。两组干涉测量光束相关联，将标线片焦平面与标线片平台的图相关。该信息用于在将掩模版的图案化表面上的图案曝光到晶片上时控制掩模版阶段。

15. 发明授权

US06906789B2 Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees freedom of motion 有权
标题翻译：具有六度自由度的磁悬浮和驱动的掩模版掩模刀片机构
公开(公告)号：US06906789B2
公开(公告)日：2005-06-14
申请号：US10449663
申请日：2003-06-02
申请人： Frederick M. Carter , Daniel N. Galburt , Stephen Roux
发明人： Frederick M. Carter , Daniel N. Galburt , Stephen Roux
IPC分类号： G03F7/20 , H01L21/027 , G03B27/62 , G03B27/72
CPC分类号： G03F7/70066 , G03F7/70758 , G03F7/70816 , G03F7/70825 , H02K41/03 , H02K2201/18
摘要： A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.
摘要翻译：一种用于在光刻系统中控制掩模掩模刀片的方法，装置和系统。掩模版掩模刀片由掩模版掩模刀片托架组件支撑。掩模版掩模刀片托架组件相对于参考框架在相对于参考框架的取向处悬浮。优选地，掩模版掩模片滑架组件是电磁悬浮的。测量掩模版掩模片滑架组件的位置和取向中的至少一个。掩模版掩模刀片支架组件的位置和取向中的至少一个被控制。可选地，掩模版掩模刮板滑架组件在由参考框限定的范围内的尺寸内移动。尺寸可以是两个维度。可以控制掩模掩模刮板托架组件的运动。

16. 发明授权

US06770895B2 Method and apparatus for isolating light source gas from main chamber gas in a lithography tool 有权
标题翻译：用于在光刻工具中隔离主室气体的光源气体的方法和装置
公开(公告)号：US06770895B2
公开(公告)日：2004-08-03
申请号：US10300898
申请日：2002-11-21
申请人： Stephen Roux
发明人： Stephen Roux
IPC分类号： F01J6100
CPC分类号： G03F7/70908 , G03F7/70858 , G03F7/70916
摘要： A system and method are used to isolate a first gas from a second gas using a third gas. A first chamber includes an element that emits light based on a first gas. A second chamber uses the emitted light to perform a process and includes the second gas. A gaslock that couples the first chamber to the second chamber. A gas source supplies a third gas between the first and the second gas in the gaslock, such that the first gas is isolated from the second gas in the gaslock. The first and third gas can be pumped from the first chamber and separated from one another, such that the first gas can be recycled for reuse to form the emitting light.
摘要翻译：使用系统和方法使用第三气体将第一气体与第二气体隔离。第一室包括基于第一气体发光的元件。第二室使用发射的光进行处理并且包括第二气体。将第一室耦合到第二室的气闸。气体源在气闸中的第一和第二气体之间提供第三气体，使得第一气体与气闸中的第二气体隔离。第一和第三气体可以从第一室泵送并彼此分离，使得第一气体可以被再循环以重新使用以形成发射光。

17. 发明授权

US6105852A Etched glass solder bump transfer for flip chip integrated circuit devices 失效
标题翻译：蚀刻玻璃焊料凸块传输用于倒装芯片集成电路器件
公开(公告)号：US6105852A
公开(公告)日：2000-08-22
申请号：US19396
申请日：1998-02-05
申请人： Steven A. Cordes , Peter Alfred Gruber , Egon Max Kummer , Stephen Roux , Carlos Juan Sambucetti , James Louis Speidell
发明人： Steven A. Cordes , Peter Alfred Gruber , Egon Max Kummer , Stephen Roux , Carlos Juan Sambucetti , James Louis Speidell
IPC分类号： B23K35/12 , H01L21/60 , H05K3/00 , H05K3/34 , H01L29/40 , H01L2/44
CPC分类号： H01L24/11 , H05K3/3468 , H01L2224/05571 , H01L2224/05573 , H01L2224/13099 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/01072 , H01L2924/01079 , H01L2924/014 , H01L2924/14 , H05K2203/0113 , H05K2203/0338 , H05K2203/128 , H05K3/002
摘要： A precise volume, precisely registerable carrier is provided for use with injection molding for producing integrated circuit bump contacts in the "flip chip" technology. A hemispherical cavity is produced by etching through and undercutting a registered opening into a transparent carrier. The hemispherical cavity has related specific volume and visible peripheral shape that permits simple optical quality control when the injection molding operation has filled the cavity and simple optical registration for fusing to the pads on the integrated circuit.
摘要翻译：提供精确的体积，精确对准的载体，用于注射成型，用于在“倒装芯片”技术中制造集成电路凸块触点。通过将注册的开口蚀刻穿透并切割成透明载体来制造半球形腔。半球形腔体具有相关的体积和可见的周边形状，当注射成型操作已经填充空腔时，允许简单的光学质量控制，并且简单的光学配准用于熔合到集成电路上的焊盘。

18. 发明申请

US20210027320A1 METHOD AND SYSTEM FOR GENERATING RETURN FORECASTS AND PORTFOLIO CONSTRUCTION 有权
公开(公告)号：US20210027320A1
公开(公告)日：2021-01-28
申请号：US16939911
申请日：2020-07-27
申请人： Gustavo Schwenkler , Stephen Roux
发明人： Gustavo Schwenkler , Stephen Roux
IPC分类号： G06Q30/02 , G06Q50/00
摘要： A method for performance forecasting of an asset, the method comprising: collecting data associated with an asset; aggregating the data associated with the asset over a predetermined time; calculating a sentiment score of the asset; constructing a forecast of the sentiment score; constructing historical and forecasting data based on the sentiment score; calculating a predication of a daily return of the asset; calculating a historical fitted value of daily return of the asset; constructing a simulation forecast for a future time period, and estimating a return on the asset over the future time period; generating a signal of the asset; ranking the asset based on the signal; and generating a portfolio of at least one asset.

19. 发明授权

US08553205B2 Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus 有权
标题翻译：用于控制可移动物体的位置的方法，用于控制定位装置的控制系统和光刻设备
公开(公告)号：US08553205B2
公开(公告)日：2013-10-08
申请号：US12822370
申请日：2010-06-24
申请人： Stephen Roux , Frederick Michael Carter , Ross Ian Mackenzie
发明人： Stephen Roux , Frederick Michael Carter , Ross Ian Mackenzie
IPC分类号： G03B27/58
CPC分类号： G05B19/416 , G03F7/70725 , G03F7/70758 , G05B2219/42083
摘要： A control system controls a positioning device displaceable in at least one degree of freedom by a reluctance motor. A force sensing element and a controller adjust force applied by the motor responsive to a force sensing element configured to sense force applied by the motor. The controller receives a signal representing force applied by the motor from the force sensing element, obtain an acceleration trajectory plan associated with a velocity trajectory plan for the positioning device, obtain a force trajectory plan associated with the acceleration trajectory plan, compare the force applied with a required amount of force obtained from the force trajectory, and adjust the amount of force applied by the motor based on the comparison. Related methods are also presented.
摘要翻译：控制系统控制通过磁阻马达至少一个自由度位移的定位装置。力感测元件和控制器响应于被配置为感测由电动机施加的力的力感测元件来调节由电动机施加的力。控制器接收表示来自力传感元件的马达所施加的力的信号，获得与定位装置的速度轨迹计划相关联的加速度轨迹计划，获得与加速度轨迹计划相关联的力轨迹计划，从力轨迹获得的所需的力量，并且基于比较来调节由马达施加的力的量。还提出了相关方法。

20. 发明授权

US07692766B2 Lithographic apparatus 有权
标题翻译：平版印刷设备
公开(公告)号：US07692766B2
公开(公告)日：2010-04-06
申请号：US11797649
申请日：2007-05-04
申请人： Stephen Roux
发明人： Stephen Roux
IPC分类号： G03B27/42 , G02B7/02
CPC分类号： G03F7/70891 , G03F7/70308
摘要： A projection system suitable for use in a lithographic apparatus, the projection system including a transmissive optical element and a thermal profile corrector configured to change a thermal profile of the transmissive optical element, the thermal profile corrector including a transfer member and a thermal profile conditioner, the transfer member being moveable into and out of proximity with the transmissive optical element to transfer a desired thermal profile from the thermal profile conditioner into the transmissive optical element.
摘要翻译：一种适用于光刻设备的投影系统，所述投影系统包括透射光学元件和配置为改变所述透射光学元件的热分布的热分布校正器，所述热分布校正器包括转印部件和热分布调节器，所述传送构件可移动到与所述透射光学元件接近和离开的位置，以将期望的热剖面从所述热剖面调节器转移到所述透射光学元件中。

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