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11. 发明申请

US20040119021A1 Electron optics for multi-beam electron beam lithography tool 审中-公开
标题翻译：多光束电子束光刻工具的电子光学
公开(公告)号：US20040119021A1
公开(公告)日：2004-06-24
申请号：US10630349
申请日：2003-07-29
申请人： Ion Diagnostics , Multibeam Systems, Inc. , Motorola, Inc.
发明人： N. William Parker , Alan D. Brodie , George Xinsheng Guo , Edward M. Yin , Michael C. Matter
IPC分类号： H01J003/14
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177
摘要： A charge particle optical column capable of being used in a high throughput, mutli-column, multi-beam electron beam lithography system is disclosed herein. The column has the following properties: purely electrostatic components; small column footprint (20 mm square); multiple, individually focused charge particle beams; telecentric scanning of all beams simultaneously on a wafer for increased depth of field; and conjugate blanking of the charged particle beams for reduced beam blur. An electron gun is disclosed that uses microfabricated, field emission sources and a microfabricated aperture-deflector assembly. The aperture-deflector assembly acts as a perfect lens in focusing, steering and blanking a multipicity of electron beams through the back focal plane of an immersion lens located at the bottom of the column. Beam blanking can be performed using a gating signal to decrease beam blur during writing on the wafer.
摘要翻译：本文公开了一种能够在高通量，多列，多光束电子束光刻系统中使用的电荷粒子光学列。该柱具有以下特性：纯静电成分; 小柱占地面积（20平方米）; 多个单独聚焦的电荷粒子束; 同时在晶圆上同时扫描所有光束以增加景深; 并且用于减少光束模糊的带电粒子束的共轭消隐。公开了一种电子枪，其使用微制造的场致发射源和微加工的孔径 - 偏转器组件。孔径偏转器组件用作聚焦，转向和消隐通过位于塔底部的浸没透镜的后焦平面的多个电子束的完美透镜。可以使用门控信号进行光束消隐，以减少在晶片上写入期间的光束模糊。

12. 发明申请

WO2007133176A2 FLAT PANEL DISPLAY SUBSTRATE TESTING SYSTEM 审中-公开
标题翻译：平板显示基板测试系统
公开(公告)号：WO2007133176A2
公开(公告)日：2007-11-22
申请号：PCT/US2006/014794
申请日：2006-04-19
申请人： MULTIBEAM SYSTEMS, INC.
发明人： PARKER, N., William , MILLER, s., Daniel , RAVI, Tirunelveli, S.
IPC分类号： H04L9/28
CPC分类号： G09G3/006 , G01R31/2893 , G01R31/305
摘要： A flat panel display substrate (FPDS) testing system configured such that prior to testing, the FPDS is loaded into a pallet to prevent breakage, and to provide electrical connections to test pads on the FPDS. The system achieves high throughput by testing FPDSs using one or more charged particle beams simultaneously with the following operations: unloading of already-tested substrates, loading of substrates ready for testing, assembly of pallets, and alignment of electrical contactors to a large number of FPDS test pads. The system design eliminates a prior art X-Y stage, and all moving electrical connections to the FPDS during testing, reducing costs and improving reliability. In one embodiment, the FPDS testing system has three subsystems: a process chamber, loadlock assembly, and pallet elevator; in another embodiment, the functions of loadlock and pallet elevator are combined to reduce system footprint.
摘要翻译：平板显示器基板（FPDS）测试系统被配置为使得在测试之前，将FPDS加载到托盘中以防止断裂，并提供与FPDS上的测试焊盘的电连接。该系统通过以下操作同时测试使用一个或多个带电粒子束的FPDS来实现高吞吐量：已经测试的基板的卸载，准备进行测试的基板的装载，托盘的组装以及电接触器对大量FPDS的对准测试垫。该系统设计消除了现有技术的X-Y平台，以及在测试过程中与FPDS的所有移动电气连接，降低了成本并提高了可靠性。在一个实施例中，FPDS测试系统具有三个子系统：处理室，负载锁组件和托盘电梯; 在另一个实施例中，组合负载锁和托盘升降机的功能以减少系统占用空间。

13. 发明申请

WO2007094811A3 DETECTOR OPTICS FOR MULTIPLE ELECTRON BEAM TEST SYSTEM 审中-公开
公开(公告)号：WO2007094811A3
公开(公告)日：2007-08-23
申请号：PCT/US2006/019113
申请日：2006-05-05
申请人： MULTIBEAM SYSTEMS, INC.
发明人： PARKER, N., William , MILLER, S., Daniel
IPC分类号： G21K7/00
摘要： A detector optics system for collecting secondary electrons (SEs) and/or backscattered electrons (BSEs) in a multiple charged particle beam test system is disclosed. One embodiment comprises a charged particle optical system comprising a charged particle optical assembly comprising a line of N charged particle optical columns, the line of columns being aligned along a main scan axis, the optical axes of the columns being equally spaced along the line. Each of the columns is configured to produce a charged particle beam, each beam being deflectable through a large angle along the main scan axis. A first linear array of at least 2N electron detectors is aligned parallel to and offset from the main scan axis.

14. 发明申请

WO2006086665A3 MULTIPLE LOADLOCKS AND PROCESSING CHAMBER 审中-公开
标题翻译：多个负载和加工室
公开(公告)号：WO2006086665A3
公开(公告)日：2007-06-14
申请号：PCT/US2006004795
申请日：2006-02-09
申请人： MULTIBEAM SYSTEMS INC
发明人： PARKER WILLIAM N , MILLER DANIEL S , RAVI TIRUNELVELI S
IPC分类号： B65G1/00
CPC分类号： H01L21/67201 , H01L21/67236
摘要： A system for the processing of large substrates such as those employed in the manufacture of flat panel displays is disclosed. In a first embodiment, a loadlock assembly, comprising two loadlock chambers configured to accommodate a multiplicity of large substrates, is coupled to a processing chamber with an input/output port. The processing chamber and the loadlock assembly are configured to move relative to each other to allow positioning of: either of the two loadlock chambers with said port; and any one of the multiplicity of large substrates for passage through the port. In a second embodiment, input and output loadlock assemblies, each comprising two loadlock chambers, are coupled to a dual-ported processing chamber in a pass-through configuration, wherein the input and output loadlock assemblies each move independently relative to the processing chamber.
摘要翻译：公开了一种用于处理大型基板的系统，例如用于制造平板显示器的那些基板。在第一实施例中，包括被配置为容纳多个大基板的两个负载锁定室的负载锁组件通过输入/输出端口耦合到处理室。所述处理室和所述负载锁组件构造成相对于彼此移动以允许所述两个负载锁定室中的任一个与所述端口定位; 以及用于通过港口的多个大基板中的任何一个。在第二实施例中，每个包括两个负载锁定室的输入和输出负载锁定组件以直通配置耦合到双端口处理室，其中输入和输出负载锁定组件相对于处理室独立地移动。

15. 发明申请

WO02086804A9 IMAGE PROCESSING SYSTEM FOR MULTI-BEAM INSPECTION 审中-公开
标题翻译：用于多光束检测的图像处理系统
公开(公告)号：WO02086804A9
公开(公告)日：2003-04-10
申请号：PCT/US0212265
申请日：2002-04-17
申请人： MULTIBEAM SYSTEMS INC
发明人： MILLER STEPHEN DANIEL , PARKER NORMAN WILLIAM , HOBMANN STEVEN B
IPC分类号： G06T7/00 , G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： An image processing system (fig. 1A 200) for use in semiconductor wafer inspection comprises a multiplicity of self-contained image processors for independently performing image cross-correlation and defect detection. The system may also comprise an image normalization engine for performing image brightness and contrast normalization. The self-contained image processors and image normalization engine (fig. 1A 400) access image data from a memory array (fig. 1A 300); the array is fed data from a multiplicity of imaging modules operating in parallel. The memory array is configured to allow simultaneous access for data input, normalization, and cross-correlation and defect detection. Multiple image processing systems can be configured in parallel as a single image processing computer, all sending defect data to a common display module.
摘要翻译：用于半导体晶片检查的图像处理系统（图1A 200）包括用于独立执行图像互相关和缺陷检测的多个自包含图像处理器。该系统还可以包括用于执行图像亮度和对比度归一化的图像归一化引擎。独立的图像处理器和图像归一化引擎（图1A400）从存储器阵列（图1A300）访问图像数据; 该阵列从并行操作的多个成像模块馈送数据。存储器阵列被配置为允许同时访问数据输入，归一化和互相关和缺陷检测。多个图像处理系统可以并行配置为单个图像处理计算机，全部将缺陷数据发送到公共显示模块。

16. 发明申请

WO2010027368A1 VARIABLE-RATIO DOUBLE-DEFLECTION BEAM BLANKER 审中-公开
标题翻译：可变比例双偏转光束保护膜
公开(公告)号：WO2010027368A1
公开(公告)日：2010-03-11
申请号：PCT/US2008/075637
申请日：2008-09-08
申请人： MULTIBEAM SYSTEMS, INC. , TOKYO ELECTRON LIMITED , PARKER, N., William
发明人： PARKER, N., William
IPC分类号： G21K5/10
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/1471 , H01J37/1472 , H01J37/3174 , H01J2237/043 , H01J2237/0451
摘要： The invention provides methods for conjugate blanking of a charged particle beam within a charged particle column using a beam blanker. The beam blanker comprises a first deflector, a second deflector and a blanking aperture, the first deflector being positioned between a gun lens and a main lens, the second deflector being positioned between the first deflector and the main lens, the blanking aperture being positioned between the second deflector and the main lens, and the first deflector, the second deflector and the blanking aperture being aligned on the optical axis of the column. A method according to the invention comprises the steps of: configuring electron optical elements of said charged particle column to form a beam in the column either with or without a crossover; configuring the main lens to focus the beam formed by the gun lens onto a substrate plane; deflecting the beam with a first deflector in a first direction; and deflecting the beam with a second deflector in a second direction onto the blanking aperture, wherein the first direction is parallel or anti-parallel to the second direction; and wherein the image at the substrate plane does not move during blanking.
摘要翻译：本发明提供了使用光束消除器对带电粒子束内的带电粒子束进行共轭消隐的方法。光束消除器包括第一偏转器，第二偏转器和消隐孔，第一偏转器位于枪式透镜和主透镜之间，第二偏转器位于第一偏转器和主透镜之间，消隐孔位于第二偏转器和主透镜，以及第一偏转器，第二偏转器和冲裁孔在柱的光轴上对准。根据本发明的方法包括以下步骤：配置所述带电粒子的电子光学元件以在所述色谱柱中形成具有或不具有交叉的光束; 配置主透镜以将由枪形透镜形成的光束聚焦到衬底平面上; 在第一方向上用第一偏转器偏转光束; 以及将具有第二导向器的所述梁在第二方向上偏转到所述消隐孔上，其中所述第一方向平行或反平行于所述第二方向; 并且其中衬底平面处的图像在消隐期间不移动。

17. 发明申请

WO2008113079A1 CHARGED PARTICLE OPTICS WITH AZIMUTHALLY-VARYING THIRD-ORDER ABERRATIONS FOR GENERATION OF SHAPED BEAMS 审中-公开
标题翻译：带有三角形变化的三角形的带有粒子的光学器件用于形成形状的贝叶斯
公开(公告)号：WO2008113079A1
公开(公告)日：2008-09-18
申请号：PCT/US2008/057259
申请日：2008-03-17
申请人： MULTIBEAM SYSTEMS, INC. , PARKER, N., William
发明人： PARKER, N., William
IPC分类号： H01J3/14
CPC分类号： H01J37/153 , B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3023 , H01J37/3174 , H01J2237/1534 , H01J2237/303 , H01J2237/30494
摘要： A charged particle shaped beam column Includes a charged particle source, a gun lens configured to provide a charged particle beam approximately parallel to the optic axis of the column, an objective lens configured to form the charged particle shaped beam on the surface of a substrate, wherein the disk of least confusion of the objective lens does not coincide with the surface of the substrate an 8N-pole optical magnetic or electrostatic element disposed radially symmetrically about the optic axis of the column between the condenser lens and the objective lens, wherein N is an integer greater than or equal to 1, and a power supply configured to apply excitations to the 8N poles of the optical element to provide an octupole electromagnetic field configured to induce azimuthally-varying deflections to the beams passing through the 8N-pole optical element, and to form a shaped beam at the surface of the substrate.
摘要翻译：带电粒子束柱包括带电粒子源，配置成提供大致平行于柱的光轴的带电粒子束的枪形透镜，配置成在衬底的表面上形成带电粒子束的物镜，其中所述物镜的最小混淆的盘与所述基板的表面不一致，所述8N极光磁或静电元件围绕所述柱的所述光轴在所述聚光透镜和所述物镜之间径向对称设置，其中N为大于或等于1的整数;以及电源，被配置为对所述光学元件的8N极施加激励，以提供被配置为对通过所述8N极光学元件的光束引起方位角变化的偏转的八极电磁场，并在基板的表面形成成形梁。

18. 发明申请

WO2007094811A2 DETECTOR OPTICS FOR MULTIPLE ELECTRON BEAM TEST SYSTEM 审中-公开
标题翻译：多电子束测试系统的探测器光学
公开(公告)号：WO2007094811A2
公开(公告)日：2007-08-23
申请号：PCT/US2006019113
申请日：2006-05-05
申请人： MULTIBEAM SYSTEMS INC
发明人： PARKER N WILLIAM , MILLER S DANIEL
CPC分类号： H01J37/244 , H01J9/42 , H01J37/256 , H01J37/28 , H01J2237/24495 , H01J2237/24592 , H01J2237/2485 , H01J2237/2817
摘要： A detector optics system for collecting secondary electrons (SEs) and/or backscattered electrons (BSEs) in a multiple charged particle beam test system is disclosed. Aspects of the detector optics system include: the ability to image and/or electrically test a number of locations simultaneously across the full width of a large substrate with high throughput and uniform collection efficiency while avoiding crosstalk between signals generated by neighboring beams. In one embodiment, a linear array of N electron beams causes SEs to be emitted from the substrate, which are then collected by one or more linear arrays of >2N detectors. Each linear array is connected to a signal combiner circuit which dynamically determines which detectors are collecting SEs generated by each electron beam as it scans across the substrate surface and then combines the signals from these detectors to form N simultaneous output signals (one per charged particle beam) for each detector array.
摘要翻译：公开了一种用于在多重带电粒子束测试系统中收集二次电子（SE）和/或反向散射电子（BSE）的检测器光学系统。检测器光学系统的方面包括：在具有高吞吐量和均匀采集效率的同时在大型衬底的整个宽度上同时跨多个位置进行成像和/或电测试的能力，同时避免由相邻光束产生的信号之间的串扰。在一个实施例中，N个电子束的线性阵列导致从衬底发射SE，然后由> 2N个检测器的一个或多个线性阵列收集。每个线性阵列连接到信号组合器电路，其在动态地确定哪些检测器正在收集由每个电子束产生的SE，因为它扫描基板表面，然后组合来自这些检测器的信号以形成N个同时输出信号（每个带电粒子束一个）。

19. 发明申请

WO2007032779A2 APPARATUS AND METHOD FOR INSPECTION AND TESTING OF FLAT PANEL DISPLAY SUBSTRATES 审中-公开
标题翻译：用于检查和测试平板显示基板的装置和方法
公开(公告)号：WO2007032779A2
公开(公告)日：2007-03-22
申请号：PCT/US2006/011381
申请日：2006-03-28
申请人： MULTIBEAM SYSTEMS, INC.
发明人： PARKER, William, N.
IPC分类号： H01J3/14
CPC分类号： H01J37/256 , H01J9/42 , H01J37/09 , H01J37/147 , H01J37/244 , H01J2237/0492 , H01J2237/1501 , H01J2237/162 , H01J2237/188 , H01J2237/24475 , H01J2237/2448 , H01J2237/2594 , H01J2237/2817
摘要： A charged particle optical system for testing, imaging or inspecting substrates comprises: a charged particle optical assembly configured to produce a line of charged particle beams equally spaced along a main scan axis, each beam being deflectable through a large angle along the main scan axis; and linear detector optics aligned along the main scan axis. The detector optics includes a linear secondary electron detector, a field free tube, voltage contrast plates and a linear backscattered electron detector. The large beam deflection is achieved using an electrostatic deflector for which the exit aperture is larger than the entrance aperture. One embodiment of the deflector includes: two parallel plates with chamfered inner surfaces disposed perpendicularly to the main scan axis; and a multiplicity of electrodes positioned peripherally in the gap between the plates, the electrodes being configured to maintain a uniform electric field transverse to the main scan axis.
摘要翻译：用于测试，成像或检查基板的带电粒子光学系统包括：带电粒子光学组件，被配置为产生沿着主扫描轴等距间隔的带电粒子束线，每个束可沿主扫描轴线偏转大角度; 以及沿主扫描轴对准的线性检测器光学元件。检测器光学器件包括线性二次电子检测器，无磁场管，电压对比板和线性背散射电子检测器。使用静电偏转器实现大的光束偏转，出射孔大于入射孔。偏转器的一个实施例包括：具有与主扫描轴垂直设置的倒角内表面的两个平行板; 以及多个电极位于板之间的间隙周边，电极被配置为保持横向于主扫描轴的均匀电场。

20. 发明申请

WO2006086665A2 MULTIPLE LOADLOCKS AND PROCESSING CHAMBER 审中-公开
标题翻译：多个负载和加工室
公开(公告)号：WO2006086665A2
公开(公告)日：2006-08-17
申请号：PCT/US2006/004795
申请日：2006-02-09
申请人： MULTIBEAM SYSTEMS, INC.
发明人： PARKER, William, N. , MILLER, Daniel, S. , RAVI, Tirunelveli, S.
IPC分类号： B65G1/00
CPC分类号： H01L21/67201 , H01L21/67236
摘要： A system for the processing of large substrates such as those employed in the manufacture of flat panel displays is disclosed. In a first embodiment, a loadlock assembly, comprising two loadlock chambers configured to accommodate a multiplicity of large substrates, is coupled to a processing chamber with an input/output port. The processing chamber and the loadlock assembly are configured to move relative to each other to allow positioning of: either of the two loadlock chambers with said port; and any one of the multiplicity of large substrates for passage through the port. In a second embodiment, input and output loadlock assemblies, each comprising two loadlock chambers, are coupled to a dual-ported processing chamber in a pass-through configuration, wherein the input and output loadlock assemblies each move independently relative to the processing chamber.
摘要翻译：公开了一种用于处理大型基板的系统，例如用于制造平板显示器的那些基板。在第一实施例中，包括被配置为容纳多个大基板的两个负载锁定室的负载锁组件通过输入/输出端口耦合到处理室。所述处理室和所述负载锁组件构造成相对于彼此移动以允许所述两个负载锁定室中的任一个与所述端口定位; 以及用于通过港口的多个大基板中的任何一个。在第二实施例中，每个包括两个负载锁定室的输入和输出负载锁定组件以直通配置耦合到双端口处理室，其中输入和输出负载锁定组件相对于处理室独立地移动。

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