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11. 发明授权

US07009683B2 Exposure apparatus 失效
公开(公告)号：US07009683B2
公开(公告)日：2006-03-07
申请号：US10824513
申请日：2004-04-15
申请人： Mitsuya Sato
发明人： Mitsuya Sato
IPC分类号： G03B27/42
CPC分类号： G03F9/7003 , G03B27/42 , G03B27/58 , G03F7/70716 , G03F7/70733 , G03F9/7011 , G03F9/7088
摘要： Two independent fine adjustment stages are arranged on one coarse adjustment stage to simultaneously perform all of focus measurement and part of alignment measurement in parallel with an exposure operation. A method of transporting a wafer together with a chuck is adopted as a precondition. Alignment of a pattern on a wafer with a chuck is performed before the chuck is mounted on each fine adjustment stage.

12. 发明授权

US06862079B2 Light source, light source generation control method, exposure apparatus and maintenance method therefor, and semiconductor device manufacturing method and semiconductor production facility 失效
标题翻译：光源，光源发生控制方法，曝光装置及其维护方法以及半导体器件制造方法和半导体制造设备
公开(公告)号：US06862079B2
公开(公告)日：2005-03-01
申请号：US10286813
申请日：2002-11-04
申请人： Mitsuya Sato
发明人： Mitsuya Sato
IPC分类号： G03F7/20 , G03B27/72 , H01L21/027 , H01S3/136 , G03B27/42 , G03B27/54 , H01S3/00
CPC分类号： G03B27/72 , G03F7/70575
摘要： In a step S1, an excimer laser control unit sets a central wavelength command value, an integral spectrum distribution command value, and an exposure pulse number in a laser internal control unit. In a step S2, the laser internal control unit receives the central wavelength command value, the integral spectrum distribution command value, and the exposure pulse number from the excimer control unit, and executes an actual exposure when an exposure command is received. In a step S3, the laser internal control unit, after executing exposure, measures the central wavelength of the pulse and the spectral distribution, and corrects any discrepancy between the actually measured central wavelength and the central wavelength command value by outputting a drive command to the narrow-band module so that the central wavelength of the succeeding pulse substantially matches the central wavelength command value. In a step S4, spectral distribution data is integrated with each exposure.
摘要翻译：在步骤S1中，准分子激光控制单元在激光内部控制单元中设定中心波长指令值，积分光谱分布指令值和曝光脉冲数。在步骤S2中，激光内部控制单元从准分子控制单元接收中心波长指令值，积分光谱分布指令值和曝光脉冲数，并且在接收到曝光命令时执行实际曝光。在步骤S3中，激光内部控制单元在执行曝光之后测量脉冲的中心波长和光谱分布，并通过向第三步骤输出驱动命令来校正实际测量的中心波长与中心波长指令值之间的差异窄带模块，使得后续脉冲的中心波长基本上与中心波长指令值相匹配。在步骤S4中，将光谱分布数据与每次曝光相结合。

13. 发明授权

US4870288A Alignment method 失效
标题翻译：对齐方法
公开(公告)号：US4870288A
公开(公告)日：1989-09-26
申请号：US31134
申请日：1987-03-30
申请人： Yuji Abuku , Mitsuya Sato
发明人： Yuji Abuku , Mitsuya Sato
IPC分类号： G03F9/00
CPC分类号： G03F9/70
摘要： A method of detecting a position of a wafer, including memorizing a pattern of a part of the wafer, comparing a pattern of another part of the wafer at a position which is in a predetermined positional relationship with the first part, with the memorized pattern, and detecting a rotational position of the wafer on the basis of the comparison.
摘要翻译：一种检测晶片的位置的方法，包括存储晶片的一部分图案，将晶片的另一部分的图案与位于与第一部分预定位置关系的位置与存储图案进行比较，并且基于该比较来检测晶片的旋转位置。

14. 发明授权

US4543499A I.sup.2 L circuitry having operating current supplied by higher-voltage circuitry fabricated on same chip 失效
标题翻译： I2L电路具有由在同一芯片上制造的较高电压电路提供的工作电流
公开(公告)号：US4543499A
公开(公告)日：1985-09-24
申请号：US366784
申请日：1982-04-08
申请人： Kenji Kaneko , Minoru Nagata , Makoto Furihata , Setsuo Ogura , Takahiro Okabe , Mitsuya Sato
发明人： Kenji Kaneko , Minoru Nagata , Makoto Furihata , Setsuo Ogura , Takahiro Okabe , Mitsuya Sato
IPC分类号： H01L21/8226 , H01L27/02 , H01L27/06 , H01L27/082 , H03K19/091 , H03K19/092
CPC分类号： H01L27/0244 , H01L27/06
摘要： A semiconductor integrated circuit includes low voltage operation circuitries such as I.sup.2 L and high voltage operation circuitries operating at a higher voltage than the low voltage operation circuitries. Both of the low and high voltage operation circuitries are implemented in a single semiconductor chip in coexistence with each other. The low voltage operation circuitries are disposed in constant current paths in the high voltage operation circuitries so that the currents once used by the high voltage operation circuits are utilized again by the low voltage operation circuitries. Power dissipation of the whole integrated circuit is thus reduced significantly.
摘要翻译：半导体集成电路包括低电压操作电路，例如I2L和高电压工作电路，工作电压高于低电压工作电路。低电压和高电压操作电路都可以在单个半导体芯片中实现，彼此共存。低电压工作电路在高电压工作电路中以恒定电流通路设置，使得高电压操作电路一度使用的电流被低压操作电路再利用。因此整个集成电路的功耗显着降低。

15. 发明申请

US20100227263A1 POSITION DETECTOR AND EXPOSURE APPARATUS 失效
标题翻译：位置检测器和曝光装置
公开(公告)号：US20100227263A1
公开(公告)日：2010-09-09
申请号：US12716368
申请日：2010-03-03
申请人： Mitsuya Sato
发明人： Mitsuya Sato
IPC分类号： G03F7/20 , G01B11/14 , G03B27/58
CPC分类号： G03F9/7049 , G03B27/58 , G03F9/7003 , G03F9/7011 , G03F9/7019 , G03F9/7026 , G03F9/7088
摘要： A position detector includes a first planar encoder including a first encoder head unit mounted on a test object that is a movable member, and a first grating unit mounted on a fixed member, the first planar encoder being configured to detect a position of the test object in two directions by measuring a position of the first grating unit using the first encoder head unit, and a second planar encoder including a second encoder head unit mounted on the fixed member, and a second grating unit mounted on the movable member, the second planar encoder being used to generate data for calibrating the position of the first grating unit measured by the first encoder head unit.
摘要翻译：位置检测器包括：第一平面编码器，包括安装在作为可动构件的被测物体上的第一编码器头单元和安装在固定构件上的第一光栅单元，所述第一平面编码器被配置为检测被测物体的位置通过使用第一编码器头单元测量第一光栅单元的位置，以及第二平面编码器，其包括安装在固定构件上的第二编码器头单元和安装在可动构件上的第二光栅单元，在两个方向上，编码器用于生成用于校准由第一编码器头单元测量的第一光栅单元的位置的数据。

16. 发明授权

US06369876B1 Exposure apparatus and method, device manufacturing method, and discharge lamp 有权
公开(公告)号：US06369876B1
公开(公告)日：2002-04-09
申请号：US09276834
申请日：1999-03-26
申请人： Mitsuya Sato
发明人： Mitsuya Sato
IPC分类号： G03B2772
CPC分类号： G03F7/70016 , G03F7/70058 , G03F7/70541
摘要： A sensor is provided for identifying the type of discharge lamp mounted as the light source of an exposure apparatus, and at least one of an optical condition, power-source condition and cooling condition is set based upon the identification made. For example, an optical condition is changed by adjusting the zoom lens of an illuminating optical unit in dependence upon the type of discharge lamp. Alternatively, a power-source condition or discharge-lamp cooling performance is changed by setting the range of allowable power applied to the discharge lamp.

17. 发明授权

US4789294A Wafer handling apparatus and method 失效
标题翻译：晶圆处理装置及方法
公开(公告)号：US4789294A
公开(公告)日：1988-12-06
申请号：US900711
申请日：1986-08-27
申请人： Mitsuya Sato , Shunzo Imai , Ryozo Hiraga
发明人： Mitsuya Sato , Shunzo Imai , Ryozo Hiraga
IPC分类号： H01L21/677 , B65H5/08
CPC分类号： H01L21/67778 , Y10S414/137 , Y10S414/138
摘要： A wafer processing apparatus, comprising a wafer processing station for processing a wafer, a key input portion for inputting wafer processing instructions into the wafer processing station, and wherein at least one of a portion for accommodating a wafer carrier for carrying the wafer, a mechanism for taking the wafer out of the wafer carrier and putting it back into the wafer carrier, wafer alignment station for aligning the wafer and a wafer observing station for allowing an operator to observe the wafer, is disposed at a front side of the apparatus to which the operator faces when actuating the key input portion.
摘要翻译：一种晶片处理装置，包括用于处理晶片的晶片处理站，用于将晶片处理指令输入晶片处理站的键输入部分，并且其中用于容纳用于承载晶片的晶片载体的部分中的至少一个，为了将晶片从晶片载体中取出并将其放回到晶片载体中，用于对准晶片的晶片对准站和用于允许操作者观察晶片的晶片观察站被布置在装置的前侧当操作键输入部分时，操作者面对。

18. 发明授权

US07898119B2 Planar motor and stage using the same 失效
标题翻译：平面电机和舞台使用相同
公开(公告)号：US07898119B2
公开(公告)日：2011-03-01
申请号：US12324476
申请日：2008-11-26
申请人： Mitsuya Sato
发明人： Mitsuya Sato
IPC分类号： H02K41/02
CPC分类号： H02K41/03 , G03F7/70758 , H02K2201/18
摘要： A planar motor includes a movable body and a stator configured to drive the movable body in a plane. The stator includes a first stator unit and a second stator unit. The movable body is moved in a first direction by a force acting between the movable body and the first stator unit, and is moved in a second direction by a force acting between the movable body and the second stator unit. The first stator unit and the second stator unit are arranged to face each other in such a manner that the movable body is provided therebetween.
摘要翻译：平面电动机包括可移动体和构造成在平面中驱动可移动体的定子。定子包括第一定子单元和第二定子单元。可移动体通过作用在可动体和第一定子单元之间的力沿第一方向移动，并且通过作用在可移动体和第二定子单元之间的力沿第二方向移动。第一定子单元和第二定子单元被布置为以可移动体设置在它们之间的方式彼此面对。

19. 发明申请

US20090310108A1 EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE 审中-公开
标题翻译：曝光装置及其制造方法
公开(公告)号：US20090310108A1
公开(公告)日：2009-12-17
申请号：US12481125
申请日：2009-06-09
申请人： Mitsuya Sato
发明人： Mitsuya Sato
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F9/7026
摘要： A reticle stage, a substrate stage and a measurement device are controlled such that first measurement of the position of a surface of a substrate, positioning of the surface at an image plane of the projection optical system based on the first measurement, and an exposure are performed during a constant-speed scanning with respect to each shot area of a first group including a row of shot areas, second measurement of the position of the surface is performed during a constant-speed scanning with respect to a shot area belonging to a second group which is adjacent to the first group and includes a row of shot areas, and the constant-speed scanning and the exposure are started with respect to a shot area subjected to the second measurement, after positioning of the surface at the image plane is performed during acceleration of the substrate stage based on the second measurement.
摘要翻译：控制刻线台，基板台和测量装置，使得基板的表面的位置的第一次测量，基于第一测量的投影光学系统的像面处的表面的定位和曝光是在相对于包括拍摄区域的第一组的每个拍摄区域的恒定速度扫描期间进行的表面的位置的第二测量在相对于属于第二个的拍摄区域的恒定速度扫描期间执行与第一组相邻并且包括一排拍摄区域，并且在进行了第二测量的拍摄区域之后，在进行了在平面上的表面定位之后开始定速扫描和曝光在基于第二测量的基板载台的加速期间。

20. 发明申请

US20090033158A1 PLANAR PULSE MOTOR, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 失效
标题翻译：平面脉冲电机，曝光装置和装置制造方法
公开(公告)号：US20090033158A1
公开(公告)日：2009-02-05
申请号：US12182973
申请日：2008-07-30
申请人： Mitsuya Sato
发明人： Mitsuya Sato
IPC分类号： H02K33/16
CPC分类号： H02K41/02 , H02K2201/18
摘要： A planar pulse motor includes a stator and a mover which is arranged opposite to the stator and which has a plurality of coils. The planar pulse motor can drive the mover in a first direction on a horizontal plane and in a second direction orthogonal to the first direction by controlling current flowing in the plurality of coils. The stator has a plurality of raised portions, including a plurality of first raised portions composed by laminating a plurality of layers of members including magnetic materials through which magnetic flux can pass only in the first direction and a plurality of second raised portions composed by laminating a plurality of layers of members including magnetic materials through which magnetic flux can pass only in the second direction, and a plurality of recessed portions through which magnetic flux does not pass in either the first or the second direction. The plurality of raised portions are regularly arranged in a vicinity of each of recessed portions in the first and second directions.
摘要翻译：平面脉冲电动机包括定子和与定子相对布置并具有多个线圈的动子。平面脉冲电动机可以通过控制在多个线圈中流动的电流，在水平面上的第一方向和与第一方向正交的第二方向上驱动动子。定子具有多个凸起部分，其包括多个第一凸起部分，该多个第一凸起部分通过层叠多个包括磁性材料在第一方向上可以通过的磁性材料的构件，以及多个第二凸部，包括磁通量只能在第二方向通过的磁性材料的多层构件，以及磁通不通过第一方向或第二方向的多个凹部。多个凸部在第一方向和第二方向上规则地配置在各凹部附近。

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