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    • 14. 发明申请
    • METHOD OF FABRICATION AND RESULTANT ENCAPSULATED ELECTROMECHANICAL DEVICE
    • 制造和结果封装机电装置的方法
    • WO2012087942A3
    • 2012-10-26
    • PCT/US2011065864
    • 2011-12-19
    • QUALCOMM MEMS TECHNOLOGIES INCHE RIHUIYAN XIAOMINGLAN JE-HSIUNG
    • HE RIHUIYAN XIAOMINGLAN JE-HSIUNG
    • B81C1/00
    • B81C1/00333B81C2203/0136B81C2203/0145
    • This disclosure provides systems, methods, and apparatus for encapsulated electromechanical systems. In one aspect, a release path includes a release hole through an encapsulation layer. The release path exposes a portion of a first sacrificial layer that extends beyond a second sacrificial layer in a horizontal direction. This allows the first sacrificial layer and the second sacrificial layer to later be etched through the release path. The corresponding electromechanical system device includes a shell layer encapsulating a mechanical layer. A conformal layer seals a release hole that extends through a shell layer. A portion of the conformal layer blocks the opening of the release passage within the release hole. The release passage has substantially the same vertical height as a gap that defines the spacing between the mechanical layer and a substrate.
    • 本公开提供了用于封装机电系统的系统,方法和设备。 在一个方面,释放路径包括穿过封装层的释放孔。 释放路径暴露沿水平方向延伸超出第二牺牲层的第一牺牲层的一部分。 这允许第一牺牲层和第二牺牲层稍后通过释放路径被蚀刻。 相应的机电系统装置包括封装机械层的壳层。 保形层密封延伸穿过壳层的释放孔。 共形层的一部分阻塞释放孔内释放通道的打开。 释放通道具有与限定机械层和衬底之间的间隔的间隙基本相同的垂直高度。