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    • 17. 发明申请
    • Apparatus and method for optimizing scalar code executed on a SIMD engine by alignment of SIMD slots
    • 用于通过SIMD槽的对准来优化在SIMD引擎上执行的标量的装置和方法
    • US20070174825A1
    • 2007-07-26
    • US11339591
    • 2006-01-25
    • Alexandre EichenbergerJohn Kevin O'Brien
    • Alexandre EichenbergerJohn Kevin O'Brien
    • G06F9/45
    • G06F9/3885G06F9/30032G06F9/30036G06F9/30109G06F9/3824
    • An apparatus and method for optimizing scalar code executed on a single instruction multiple data (SIMD) engine is provided that aligns the slots of SIMD registers. With the apparatus and method, a compiler is provided that parses source code and, for each statement in the program, generates an expression tree. The compiler inspects all storage inputs to scalar operations in the expression tree to determine their alignment in the SIMD registers. This alignment is propagated up the expression tree from the leaves. When the alignments of two operands in the expression tree are the same, the resulting alignment is the shared value. When the alignments of two operands in the expression tree are different, one operand is shifted. For shifted operands, a shift operation is inserted in the expression tree. The executable code is then generated for the expression tree and shifts are inserted where indicated.
    • 提供了一种用于优化在单指令多数据(SIMD)引擎上执行的标量码的装置和方法,其对准SIMD寄存器的时隙。 使用设备和方法,提供了一个解析源代码的编译器,对于程序中的每个语句,都会生成一个表达式树。 编译器检查表达式树中的所有存储输入到标量运算,以确定它们在SIMD寄存器中的对齐。 该对齐方式从树叶中向上传播。 当表达式树中的两个操作数的对齐方式相同时,生成的对齐方式是共享值。 当表达式树中的两个操作数的对齐不同时,一个操作数被移位。 对于移位的操作数,在表达式树中插入shift操作。 然后为表达式树生成可执行代码,并在指定的位置插入移位。
    • 18. 发明申请
    • PHOTOACTIVE ADHESION PROMOTER IN A SLAM
    • 光滑粘合促进剂在SLAM
    • US20070105383A1
    • 2007-05-10
    • US11620516
    • 2007-01-05
    • Robert MeagleyHeidi CaoKevin O'Brien
    • Robert MeagleyHeidi CaoKevin O'Brien
    • H01L21/302
    • G03F7/091G03F7/0045
    • A semiconductor process technique to help reduce semiconductor process effects, such as undesired line edge roughness, insufficient lithographical resolution, and limited depth of focus problems associated with the removal of a photoresist layer. More particularly, embodiments of the invention use a photoacid generator (PAG) material in conjunction with a sacrificial light absorbing material (SLAM) to help reduce these and other undesired effects associated with the removal of photoresist in a semiconductor manufacturing process. Furthermore, embodiments of the invention allow a PAG to be applied in a semiconductor manufacturing process in an efficient manner, requiring fewer processing operations than typical prior art techniques.
    • 有助于减少半导体工艺效应的半导体工艺技术,例如不期望的线边缘粗糙度,光刻分辨率不足以及与去除光致抗蚀剂层相关的有限的焦深问题。 更具体地,本发明的实施例使用光致酸产生剂(PAG)材料结合牺牲光吸收材料(SLAM)来帮助减少在半导体制造过程中与去除光致抗蚀剂有关的这些和其它不期望的影响。 此外,本发明的实施例允许PAG以有效的方式应用于半导体制造过程中,与典型的现有技术相比需要较少的处理操作。