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11. 发明授权

US09212350B2 Method of cloning stable stress tolerant superoxide dismutase using universal primers 有权
标题翻译：使用通用引物克隆稳定的胁迫耐受性超氧化物歧化酶的方法
公开(公告)号：US09212350B2
公开(公告)日：2015-12-15
申请号：US12935881
申请日：2009-03-31
申请人： Pardeep Kumar Bhardwaj , Arun Kumar , Amit Kishore , Sanjay Ghawana , Arti Rani , Kashmir Singh , Harsharan Singh , Ravi Shankar Singh , Hitesh Kumar , Payal Sood , Som Dutt , Sanjay Kumar , Paramvir Singh Ahuja
发明人： Pardeep Kumar Bhardwaj , Arun Kumar , Amit Kishore , Sanjay Ghawana , Arti Rani , Kashmir Singh , Harsharan Singh , Ravi Shankar Singh , Hitesh Kumar , Payal Sood , Som Dutt , Sanjay Kumar , Paramvir Singh Ahuja
IPC分类号： C12P19/34 , C07H21/04 , C12N9/02 , C12N15/82 , C12Q1/68
CPC分类号： C12N9/0089 , C12N15/8271 , C12Q1/6895
摘要： The present invention relates to a method of cloning stable stress tolerant superoxide dismutase from diverse plant species using universal primers.
摘要翻译：本发明涉及使用通用引物克隆来自不同植物物种的稳定胁迫耐受性超氧化物歧化酶的方法。

12. 发明授权

US07307002B2 Non-critical complementary masking method for poly-1 definition in flash memory device fabrication 有权
标题翻译：闪存器件制造中poly-1定义的非关键互补掩模方法
公开(公告)号：US07307002B2
公开(公告)日：2007-12-11
申请号：US11099339
申请日：2005-04-04
申请人： Unsoon Kim , Hiroyuki Kinoshita , Yu Sun , Krishnashree Achuthan , Christopher H. Raeder , Christopher M. Foster , Harpreet Kaur Sachar , Kashmir Singh Sahota
发明人： Unsoon Kim , Hiroyuki Kinoshita , Yu Sun , Krishnashree Achuthan , Christopher H. Raeder , Christopher M. Foster , Harpreet Kaur Sachar , Kashmir Singh Sahota
IPC分类号： H01L21/76
CPC分类号： H01L27/105 , H01L21/3212 , H01L21/32139 , H01L21/76229 , H01L27/1052 , H01L27/11526 , H01L27/11543 , H01L27/11568
摘要： A method is disclosed for the definition of the poly-1 layer in a semiconductor wafer. A non-critical mask is used to recess field oxides in the periphery prior to poly-1 deposition by an amount equal to the final poly-1 thickness. A complimentary non-critical mask is used to permit CMP of the core to expose the tops of core oxide mesas from the shallow isolation trenches.
摘要翻译：公开了一种用于在半导体晶片中定义多晶硅层的方法。使用非临界掩模在聚-1沉积之前将外围的场氧化物凹入等于最终聚-1厚度的量。使用互补的非关键掩模来允许芯的CMP将浅层隔离沟的核心氧化物台面的顶部暴露出来。

13. 发明授权

US5837275A Anti-microbial materials 失效
标题翻译：抗菌材料
公开(公告)号：US5837275A
公开(公告)日：1998-11-17
申请号：US459470
申请日：1995-06-02
申请人： Robert Edward Burrell , Larry Roy Morris , Prasad Shrikrishna Apte , Sudhindra Bharat Sant , Kashmir Singh Gill
发明人： Robert Edward Burrell , Larry Roy Morris , Prasad Shrikrishna Apte , Sudhindra Bharat Sant , Kashmir Singh Gill
IPC分类号： A61L31/00 , A01N59/16 , A61L17/14 , A61L27/30 , A61L27/54 , A61L29/10 , A61L29/16 , A61L31/02 , A61L31/16 , B22F1/02 , B22F9/04 , C04B37/00 , C22C5/06 , C22C45/00 , C23C14/00 , C23C14/02 , C23C14/06 , C23C14/08 , C23C14/14 , C23C14/16 , C23C14/20 , C23C14/22 , C23C14/35 , C23C14/58 , A01N25/12
CPC分类号： A01N59/16 , A61L17/145 , A61L27/306 , A61L27/54 , A61L29/106 , A61L29/16 , A61L31/16 , C23C14/0036 , C23C14/025 , C23C14/06 , C23C14/0688 , C23C14/086 , C23C14/14 , C23C14/16 , C23C14/205 , C23C14/225 , C23C14/35 , C23C14/588 , A61B2018/00119 , A61L2300/102 , A61L2300/104 , A61L2300/404 , A61L2300/602 , A61L2300/606 , A61L2300/63 , H01H2300/014 , Y10S977/899 , Y10S977/915
摘要： Anti-microbial coatings and method of forming same on medical devices are provided. The coatings are preferably formed by depositing an anti-microbial, biocompatible metal by vapor deposition techniques to produce atomic disorder in the coating such that a sustained release of metal ions sufficient to produce an anti-microbial effect is achieved. Preferred deposition conditions to achieve atomic disorder include a lower than normal substrate temperature, and one or more of a higher than normal working gas pressure and a lower than normal angle of incidence of coating flux. Anti-microbial powders formed by vapor deposition or altered by mechanical working to produce atomic disorder are also provided. Novel anti-microbial silver materials are defined, characterized by having a positive rest potential, a T.sub.rec /T.sub.m less than 0.33, and a grain size less than 200 nm. Anti-microbial fine grain or nanocrystalline materials are provided, together with methods of preparation, wherein the anti-microbial metal if deposited in a matrix with atoms or molecules of a different material such as other biocompatible metals (ex. Ta), trapped or absorbed oxygen, or compounds of anti-microbial metals or biocompatible metals (ex. AgO or TaO).
摘要翻译：提供了抗微生物涂层及其在医疗装置上的形成方法。优选通过气相沉积技术沉积抗微生物相容性金属来形成涂层，以在涂层中产生原子紊乱，从而实现足以产生抗微生物作用的金属离子的持续释放。实现原子紊乱的优选沉积条件包括低于正常的衬底温度，以及高于正常工作气体压力和低于正常入射角的涂层焊剂的一种或多种。还提供了通过气相沉积或通过机械加工改变以产生原子紊乱形成的抗微生物粉末。定义了新的抗微生物银材料，其特征在于具有阳性静电位，Trec / Tm小于0.33，粒度小于200nm。提供抗微生物细晶粒或纳米晶体材料以及制备方法，其中如果将抗微生物金属沉积在具有不同材料的原子或分子的基质中，例如其它生物相容性金属（例如Ta），被捕获或吸收氧气或抗微生物金属或生物相容性金属化合物（例如AgO或TaO）。

14. 发明申请

US20120070835A1 Method of Cloning Stable Stress Tolerant Superoxide Dismutase Using Universal Primers 有权
标题翻译：使用通用引物克隆稳定胁迫耐受性超氧化物歧化酶的方法
公开(公告)号：US20120070835A1
公开(公告)日：2012-03-22
申请号：US12935881
申请日：2009-03-31
申请人： Pardeep Kumar Bhardwaj , Arun Kumar , Amit Kishore , Sanjay Ghawana , Arti Rani , Kashmir Singh , Harsharan Singh , Ravi Shankar Singh , Hitesh Kumar , Payal Sood , Som Dutt , Sanjay Kumar , Paramvir Singh Ahuja
发明人： Pardeep Kumar Bhardwaj , Arun Kumar , Amit Kishore , Sanjay Ghawana , Arti Rani , Kashmir Singh , Harsharan Singh , Ravi Shankar Singh , Hitesh Kumar , Payal Sood , Som Dutt , Sanjay Kumar , Paramvir Singh Ahuja
IPC分类号： C12Q1/68 , C09K3/00 , C12N9/02
CPC分类号： C12N9/0089 , C12N15/8271 , C12Q1/6895
摘要： The present invention relates to a method of cloning stable stress tolerant superoxide dismutase from diverse plant species using universal primers.
摘要翻译：本发明涉及使用通用引物克隆来自不同植物物种的稳定胁迫耐受性超氧化物歧化酶的方法。

15. 发明授权

US06253855B1 Intelligent production riser 有权
标题翻译：智能生产立管
公开(公告)号：US06253855B1
公开(公告)日：2001-07-03
申请号：US09467438
申请日：1999-12-20
申请人： Kashmir Singh Johal , Anthony Robert Cousins
发明人： Kashmir Singh Johal , Anthony Robert Cousins
IPC分类号： E21B1701
CPC分类号： E21B17/01 , E21B17/015 , E21B43/122 , E21B43/36
摘要： A production riser that provides the benefits of a slug catcher, riser based gas lift, and multiphase meter in a single device and is suited to both shallow and deep-water oil/gas field developments. The riser is formed from a pipe within a pipe. The inner pipe provides the path for the production fluids. Perforations are provided near the base and top of the inner pipe. The top of the annulus between the pipes is closed and is in fluid communication with a gas supply/compression system via an isolation control valve/choke. The bottom of the annulus is closed. Three sets of pressure and temperature transducer transmitters are installed at the top, center, and base of the riser through the outer pipe wall.
摘要翻译：一个生产立管，在单个设备中提供了一个集渣捕获器，立管式气举和多相流量计的优点，适用于浅层和深水油气田开发。提升管由管道内的管道形成。内管提供生产流体的路径。在内管的基部和顶部附近提供穿孔。管道之间的环形顶部封闭，并通过隔离控制阀/扼流圈与气体供应/压缩系统流体连通。环的底部是封闭的。三套压力和温度传感器变送器通过外管壁安装在提升管的顶部，中心和底部。

16. 发明授权

US6017553A Anti-microbial materials 失效
标题翻译：抗菌材料
公开(公告)号：US6017553A
公开(公告)日：2000-01-25
申请号：US459469
申请日：1995-06-02
申请人： Robert Edward Burrell , Larry Roy Morris , Prasad Shrikrishna Apte , Sudhindra Bharat Sant , Kashmir Singh Gill
发明人： Robert Edward Burrell , Larry Roy Morris , Prasad Shrikrishna Apte , Sudhindra Bharat Sant , Kashmir Singh Gill
IPC分类号： A61L31/00 , A01N59/16 , A61L17/14 , A61L27/30 , A61L27/54 , A61L29/10 , A61L29/16 , A61L31/02 , A61L31/16 , B22F1/02 , B22F9/04 , C04B37/00 , C22C5/06 , C22C45/00 , C23C14/00 , C23C14/02 , C23C14/06 , C23C14/08 , C23C14/14 , C23C14/16 , C23C14/20 , C23C14/22 , C23C14/35 , C23C14/58 , A01N25/12
CPC分类号： A01N59/16 , A61L17/145 , A61L27/306 , A61L27/54 , A61L29/106 , A61L29/16 , A61L31/16 , C23C14/0036 , C23C14/025 , C23C14/06 , C23C14/0688 , C23C14/086 , C23C14/14 , C23C14/16 , C23C14/205 , C23C14/225 , C23C14/35 , C23C14/588 , A61B2018/00119 , A61L2300/102 , A61L2300/104 , A61L2300/404 , A61L2300/602 , A61L2300/606 , A61L2300/63 , H01H2300/014 , Y10S977/899 , Y10S977/915
摘要： Anti-microbial coatings and method of forming same on medical devices are provided. The coatings are preferably formed by depositing an anti-microbial, biocompatible metal by vapor deposition techniques to produce atomic disorder in the coating such that a sustained release of metal ions sufficient to produce an anti-microbial effect is achieved. Preferred deposition conditions to achieve atomic disorder include a lower than normal substrate temperature, and one or more of a higher than normal working gas pressure and a lower than normal angle of incidence of coating flux. Anti-microbial powders formed by vapor deposition or altered by mechanical working to produce atomic disorder are also provided. Novel anti-microbial silver materials are defined, characterized by having a positive rest potential, a T.sub.rec /T.sub.m less than 0.33, and a grain size less than 200 nm. Anti-microbial fine grain or nanocrystalline materials are provided, together with methods of preparation, wherein the anti-microbial metal if deposited in a matrix with atoms or molecules of a different material such as other biocompatible metals (ex. Ta), trapped or absorbed oxygen, or compounds of anti-microbial metals or biocompatible metals (ex. Ag0 or TaO).
摘要翻译：提供了抗微生物涂层及其在医疗装置上的形成方法。优选通过气相沉积技术沉积抗微生物相容性金属来形成涂层，以在涂层中产生原子紊乱，从而实现足以产生抗微生物作用的金属离子的持续释放。实现原子紊乱的优选沉积条件包括低于正常的衬底温度，以及高于正常工作气体压力和低于正常入射角的涂层焊剂的一种或多种。还提供了通过气相沉积或通过机械加工改变以产生原子紊乱形成的抗微生物粉末。定义了新的抗微生物银材料，其特征在于具有阳性静电位，Trec / Tm小于0.33，粒度小于200nm。提供抗微生物细晶粒或纳米晶体材料以及制备方法，其中如果将抗微生物金属沉积在具有不同材料的原子或分子的基质中，例如其它生物相容性金属（例如Ta），被捕获或吸收氧气或抗微生物金属或生物相容性金属化合物（例如AgO或TaO）。

17. 发明授权

US5985308A Process for producing anti-microbial effect with complex silver ions 失效
标题翻译：用复合银离子生成抗菌效果的方法
公开(公告)号：US5985308A
公开(公告)日：1999-11-16
申请号：US190617
申请日：1994-02-02
申请人： Robert Edward Burrell , Prasad Shrikrishna Apte , Kashmir Singh Gill , Roderick John Precht , Larry Roy Morris
发明人： Robert Edward Burrell , Prasad Shrikrishna Apte , Kashmir Singh Gill , Roderick John Precht , Larry Roy Morris
IPC分类号： A61L31/00 , A01N59/16 , A61L17/14 , A61L27/30 , A61L27/54 , A61L29/10 , A61L29/16 , A61L31/02 , A61L31/16 , B22F1/02 , B22F9/04 , C04B37/00 , C22C5/06 , C22C45/00 , C23C14/00 , C23C14/02 , C23C14/06 , C23C14/08 , C23C14/14 , C23C14/16 , C23C14/20 , C23C14/22 , C23C14/35 , C23C14/58 , A61F2/02 , B05B3/10 , C23C16/06
CPC分类号： A01N59/16 , A61L17/145 , A61L27/306 , A61L27/54 , A61L29/106 , A61L29/16 , A61L31/16 , C23C14/0036 , C23C14/025 , C23C14/06 , C23C14/0688 , C23C14/086 , C23C14/14 , C23C14/16 , C23C14/205 , C23C14/225 , C23C14/35 , C23C14/588 , A61B2018/00119 , A61L2300/102 , A61L2300/104 , A61L2300/404 , A61L2300/602 , A61L2300/606 , A61L2300/63 , H01H2300/014 , Y10S977/899 , Y10S977/915
摘要： Production of an anti-microbial effect in an alcohol or water based electrolyte is achieved by preparing silver materials that form complex ions other than Ag.sup.+, Ag.sup.2+, or Ag.sup.3+, and which produce an anti-microbial effect that is greater than that produced by an equivalent amount of silver as Ag.sup.+. Exemplary complex silver ions produced include Ag(CN).sub.2.sup.-, AgCN(.sub.aq)(ion pair), Ag(NH.sub.3).sub.2.sup.+, AgCl.sub.2.sup.-, Ag(OH).sub.2.sup.-, Ag.sub.2 (OH).sub.3.sup.-, Ag.sub.3 (OH).sub.4.sup.-, and Ag(S.sub.2 O.sub.3).sub.2.sup.3-. The silver materials may be prepared as powders or as solutions or suspensions containing the complex silver ions. The silver materials might also be prepared as coatings, foils, powders, or fine grain or nanocrystalline powders, which are formed with atomic disorder to provide sustained release of the complex silver ions.
摘要翻译：通过制备形成Ag +，Ag2 +或Ag3 +以外的复合离子的银材料，可以制得醇或水基电解质中的抗微生物作用，并产生大于等同物产生的抗微生物作用银量为Ag +。生成的示例性复合银离子包括Ag（CN）2，AgCN（aq）（离子对），Ag（NH 3）2+，AgCl 2 - ，Ag（OH）2，Ag 2（OH）3，Ag 3（OH） 4-和Ag（S2O3）23-。银材料可以制备成粉末或作为含有复合银离子的溶液或悬浮液。银材料也可以制备成涂层，箔，粉末或细晶粒或纳米晶体粉末，其由原子紊乱形成以提供复合银离子的持续释放。

18. 发明授权

US5958440A Anti-microbial materials 失效
标题翻译：抗菌材料
公开(公告)号：US5958440A
公开(公告)日：1999-09-28
申请号：US154694
申请日：1993-11-18
申请人： Robert Edward Burrell , Larry Roy Morris , Prasad Shrikrishna Apte , Sudhindra Bharat Sant , Kashmir Singh Gill
发明人： Robert Edward Burrell , Larry Roy Morris , Prasad Shrikrishna Apte , Sudhindra Bharat Sant , Kashmir Singh Gill
IPC分类号： A61L31/00 , A01N59/16 , A61L17/14 , A61L27/30 , A61L27/54 , A61L29/10 , A61L29/16 , A61L31/02 , A61L31/16 , B22F1/02 , B22F9/04 , C04B37/00 , C22C5/06 , C22C45/00 , C23C14/00 , C23C14/02 , C23C14/06 , C23C14/08 , C23C14/14 , C23C14/16 , C23C14/20 , C23C14/22 , C23C14/35 , C23C14/58 , A01N25/12
CPC分类号： A01N59/16 , A61L17/145 , A61L27/306 , A61L27/54 , A61L29/106 , A61L29/16 , A61L31/16 , C23C14/0036 , C23C14/025 , C23C14/06 , C23C14/0688 , C23C14/086 , C23C14/14 , C23C14/16 , C23C14/205 , C23C14/225 , C23C14/35 , C23C14/588 , A61B2018/00119 , A61L2300/102 , A61L2300/104 , A61L2300/404 , A61L2300/602 , A61L2300/606 , A61L2300/63 , H01H2300/014 , Y10S977/899 , Y10S977/915
摘要： Anti-microbial coatings and method of forming same on medical devices are provided. The coatings are preferably formed by depositing an anti-microbial, biocompatible metal by vapour deposition techniques to produce atomic disorder in the coating such that a sustained release of metal ions sufficient to produce an anti-microbial effect is achieved. Preferred deposition conditions to achieve atomic disorder include a lower than normal substrate temperature, and one or more of a higher than normal working gas pressure and a lower than normal angle of incidence of coating flux. Anti-microbial powders formed by vapour deposition or altered by mechanical working to produce atomic disorder are also provided. Novel anti-microbial silver materials are defined, characterized by having a positive rest potential, a T.sub.rec /T.sub.m less than 0.33, and a grain size less than 200 nm. Anti-microbial fine grain or nanocrystalline materials are provided, together with methods of preparation, wherein the anti-microbial metal if deposited in a matrix with atoms or molecules of a different material such as other biocompatible metals (ex. Ta), trapped or absorbed oxygen, or compounds of anti-microbial metals or biocompatible metals (ex. Ag0 or TaO).
摘要翻译：提供了抗微生物涂层及其在医疗装置上的形成方法。优选通过气相沉积技术沉积抗微生物相容性金属来形成涂层，以在涂层中产生原子紊乱，从而实现足以产生抗微生物作用的金属离子的持续释放。实现原子紊乱的优选沉积条件包括低于正常的衬底温度，以及高于正常工作气体压力和低于正常入射角的涂层焊剂的一种或多种。还提供了通过气相沉积或通过机械加工改变以产生原子紊乱形成的抗微生物粉末。定义了新的抗微生物银材料，其特征在于具有阳性静电位，Trec / Tm小于0.33，粒度小于200nm。提供抗微生物细晶粒或纳米晶体材料以及制备方法，其中如果将抗微生物金属沉积在具有不同材料的原子或分子的基质中，例如其它生物相容性金属（例如Ta），被捕获或吸收氧气或抗微生物金属或生物相容性金属化合物（例如AgO或TaO）。

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