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11. 发明申请

US20110320025A1 METHOD OF MEASURING AN OVERLAY OF AN OBJECT 有权
标题翻译：测量对象覆盖的方法
公开(公告)号：US20110320025A1
公开(公告)日：2011-12-29
申请号：US13107166
申请日：2011-05-13
申请人： Jin-Seok Heo , Seok-Hwan Oh , Jeong-Ho Yeo
发明人： Jin-Seok Heo , Seok-Hwan Oh , Jeong-Ho Yeo
IPC分类号： G06F17/50
CPC分类号： G03F7/70633
摘要： A method of measuring an overlay of an object is provided. In the method, first information of a first structure may be obtained. A preliminary structure may be formed on the first structure. Second information of the preliminary structure may be obtained. The first information and the second information may be processed to obtain virtual information of a second structure that would be formed on the first structure if a process is performed on the preliminary structure. A virtual overlay between the first structure and the second structure may be measured using the virtual information.
摘要翻译：提供了一种测量物体的重叠的方法。在该方法中，可以获得第一结构的第一信息。可以在第一结构上形成初步结构。可以获得初步结构的第二信息。如果对初步结构执行处理，则可以处理第一信息和第二信息以获得将在第一结构上形成的第二结构的虚拟信息。可以使用虚拟信息来测量第一结构和第二结构之间的虚拟覆盖。

12. 发明申请

US20110210747A1 CELL VOLTAGE MEASURING APPARATUS AND METHOD OF BATTERY PACK 有权
标题翻译：电池电压测量装置和电池组的方法
公开(公告)号：US20110210747A1
公开(公告)日：2011-09-01
申请号：US13050493
申请日：2011-03-17
申请人： Jin-Seok HEO , Jee-Ho KIM , Dal-Hoon LEE , Sang-Hoon LEE
发明人： Jin-Seok HEO , Jee-Ho KIM , Dal-Hoon LEE , Sang-Hoon LEE
IPC分类号： G01N27/416
CPC分类号： G01R31/3658 , B60L11/1855 , B60L11/1859 , B60L11/1866 , G01R19/16542 , G01R31/362 , H01M10/48 , H02J7/0021 , Y02T10/7005 , Y02T10/7061
摘要： A cell voltage measuring apparatus of a battery pack comprises a plurality of multiplexers connected corresponding to each cell group of the battery pack and operated to output a voltage signal of each cell in each cell group based on a reference potential applied from a corresponding cell group; a plurality of floating capacitors connected corresponding to each cell in each cell group and on which the voltage of each cell is charged and held; a switching means for enabling the voltage of each cell to be charged and held on each corresponding floating capacitor; and a controller for controlling the switching means per each cell group to enable the voltage of each cell to be charged and held on each corresponding floating capacitor and controlling each multiplexer to measure the cell voltage held on each floating capacitor of each cell group connected to each corresponding multiplexer.
摘要翻译：电池组的电池电压测量装置包括对应于电池组的每个电池组连接的多个多路复用器，并且被操作以基于从相应的电池组施加的参考电位输出每个电池组中的每个电池单元的电压信号; 与每个单元组中的每个单元对应地连接的多个浮置电容器，并且在每个单元组中对每个单元的电压进行充电和保持; 开关装置，用于使每个电池的电压被充电并保持在每个对应的浮动电容器上; 以及控制器，用于控制每个单元组的开关装置，以使每个单元的电压被充电并保持在每个相应的浮动电容器上，并且控制每个多路复用器以测量保持在每个单元组连接的每个单元组的每个浮置电容器上的单元电压相应的多路复用器。

13. 发明申请

US20100149502A1 Method of detecting reticle errors 有权
标题翻译：检测掩模误差的方法
公开(公告)号：US20100149502A1
公开(公告)日：2010-06-17
申请号：US12458503
申请日：2009-07-14
申请人： Jin-seok Heo , Jin-hong Park , Dae-youp Lee , Jeong-ho Yeo
发明人： Jin-seok Heo , Jin-hong Park , Dae-youp Lee , Jeong-ho Yeo
IPC分类号： G03B27/42
CPC分类号： G03B27/42
摘要： A method of detecting reticle error may include using an optical source of an exposure unit to cause light to be incident on a reticle installed in the exposure unit, and detecting the reticle error using only 0th diffraction light from among diffraction lights transmitted through the reticle. A method of detecting reticle error may include: installing a reticle, including a mask substrate and mask patterns having a critical dimension formed on the mask substrate, in an exposure unit to cause light to be incident on the reticle; exposing a photoresist film disposed on a wafer in the exposure unit using only 0th diffraction light from among diffraction lights transmitted through the reticle; developing the exposed photoresist film; and analyzing a thickness change, an image, or the thickness change and image of the developed photoresist film, in order to detect the reticle error at a wafer level.
摘要翻译：检测标线错误的方法可以包括使用曝光单元的光源使光入射到安装在曝光单元中的掩模版上，并且仅使用通过掩模版传播的衍射光中的第0衍射光来检测标线误差。检测标线错误的方法可以包括：在曝光单元中安装包括掩模基板的掩模版和具有形成在掩模基板上的临界尺寸的掩模图案，以使光入射到掩模版上; 使用透射通过掩模版的衍射光中的第0衍射光曝光设置在曝光单元中的晶片上的光致抗蚀剂膜; 显影曝光的光致抗蚀剂膜; 并分析显影的光刻胶膜的厚度变化，图像或厚度变化和图像，以便检测晶片级的标线误差。

14. 发明授权

US09544985B2 Apparatus and system for generating extreme ultraviolet light and method of using the same 有权
标题翻译：用于产生极紫外光的装置和系统及其使用方法
公开(公告)号：US09544985B2
公开(公告)日：2017-01-10
申请号：US14803920
申请日：2015-07-20
申请人： Jin-Seok Heo , Jin-Hong Park
发明人： Jin-Seok Heo , Jin-Hong Park
IPC分类号： A61N5/06 , H05G2/00 , G21K1/06 , G03F7/20 , B05B12/12
CPC分类号： H05G2/008 , B05B12/12 , G03F7/70033 , G21K1/067 , G21K2201/064 , G21K2201/065 , H05G2/005
摘要： Provided is an apparatus for generating extreme ultraviolet light. The apparatus includes a collector mirror unit, a gas supply unit configured to supply a processing gas to the collector mirror unit, a gas supply nozzle arranged in at least one area of the collector mirror unit and configured to supply the processing gas to a surface of the collector mirror unit, and a controller configured to adjust a shape of a spray hole of the gas supply nozzle. The shape of the spray hole may be changed according to a control operation of the controller.
摘要翻译：提供一种用于产生极紫外光的装置。该装置包括收集反射镜单元，被配置为向收集反射镜单元供应处理气体的气体供给单元，设置在收集反射镜单元的至少一个区域中并被配置为将处理气体供应到收集器反射镜单元和被配置为调节气体供应喷嘴的喷射孔的形状的控制器。可以根据控制器的控制操作来改变喷孔的形状。

15. 发明授权

US09256124B2 Apparatus for manufacturing a mask 有权
标题翻译：用于制造面罩的装置
公开(公告)号：US09256124B2
公开(公告)日：2016-02-09
申请号：US13440112
申请日：2012-04-05
申请人： Jin-Seok Heo , Chang-Min Park , Seok-Hwan Oh , Jeong-Ho Yeo
发明人： Jin-Seok Heo , Chang-Min Park , Seok-Hwan Oh , Jeong-Ho Yeo
IPC分类号： B29C43/02 , G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B29C35/0805 , B29C2035/0827 , B29L2031/737 , B82Y10/00 , B82Y40/00
摘要： A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern.
摘要翻译：制造掩模的方法包括将具有设计图案的模板的上表面划分为多个区域，模板布置在掩模基板上的聚合物层上，校正区域之间的变形区域，将聚合物层与该模板形成对应于聚合物层上的设计图案的掩模图案; 并固化掩模图案。

16. 发明申请

US20100271035A1 BATTERY CELL VOLTAGE MEASURING APPARATUS AND METHOD 有权
标题翻译：电池电压测量装置及方法
公开(公告)号：US20100271035A1
公开(公告)日：2010-10-28
申请号：US12830737
申请日：2010-07-06
申请人： Jin-Seok HEO , Dal-Hoon Lee , Jee-Ho Kim , Sang-Hoon Lee , Chang-Eon Jin
发明人： Jin-Seok HEO , Dal-Hoon Lee , Jee-Ho Kim , Sang-Hoon Lee , Chang-Eon Jin
IPC分类号： G01N27/416
CPC分类号： G01R31/3658 , G01R19/0084 , G01R31/362
摘要： Disclosed is a battery cell voltage measuring apparatus and method. The battery cell voltage measuring apparatus comprises a plurality of floating capacitors provided corresponding to a plurality of cells contained in a battery pack; a plurality of switching units provided corresponding to each cell of the battery pack and switchable into a charge mode or a measurement mode; and a cell voltage detector for measuring the voltage of each cell by switching each switching unit into a charge mode to charge the voltage of each cell on each corresponding floating capacitor and time-differentially switching each switching unit into a measurement mode to apply the cell voltage charged on the floating capacitor between a reference potential and a common cell voltage measuring line.
摘要翻译：公开了一种电池单元电压测量装置和方法。电池单元电压测量装置包括与容纳在电池组中的多个电池对应地设置的多个浮动电容器; 多个开关单元，其对应于电池组的每个单元设置并可切换到充电模式或测量模式; 以及电池电压检测器，用于通过将每个开关单元切换到充电模式来测量每个电池的电压，以对每个相应的浮动电容器上的每个电池单元的电压进行充电，并将每个开关单元时差地切换成测量模式以施加电池电压在参考电位和公共电池电压测量线之间的浮动电容器上充电。

17. 发明申请

US20070090793A1 MULTI-BATTERY PACK SYSTEM, METHOD FOR CONTROLLING THE SAME, AND BATTERY PACK 有权
标题翻译：多电池包系统，其控制方法和电池组
公开(公告)号：US20070090793A1
公开(公告)日：2007-04-26
申请号：US11551478
申请日：2006-10-20
申请人： Yasuhito Eguchi , Shoji Tanina , Young Joon Shin , Chang Eon Jin , Jin Seok Heo
发明人： Yasuhito Eguchi , Shoji Tanina , Young Joon Shin , Chang Eon Jin , Jin Seok Heo
IPC分类号： H02J7/00
CPC分类号： H01M10/4207 , G06F1/263 , G06F1/3203 , H01M10/482 , H02J7/0013 , H02J7/0021 , H02J7/1423
摘要： Disclosed are a multi-battery pack system, a method for controlling battery packs, and a battery pack, in which plural battery packs provided in the multi-battery pack system can be set as a master battery pack and slave battery packs by themselves. The method for controlling the battery packs constructing the multi-battery pack system includes: a first step of checking if a communication line is maintained at a first level for a first desired amount of time when an activation signal or a message of setting a master battery pack is received; and a second step of outputting signals of a second level to the communication line for a second desired amount of time when the communication line is maintained at the first level for the first desired amount of time, and setting a battery pack as a master battery pack.
摘要翻译：公开了一种多电池组系统，控制电池组的方法和电池组，其中设置在多电池组系统中的多个电池组可以自己设置为主电池组和从属电池组。用于控制构成多电池组系统的电池组的方法包括：第一步骤，当激活信号或设置主电池的消息时，检查通信线路是否保持在第一电平第一期望的时间量收到包; 以及第二步骤，当所述通信线路保持在所述第一级别的所述第一期望时间量时，将第二级别的信号输出到所述通信线路用于第二期望量的时间，并且将所述电池组设置为主电池组。

18. 发明申请

US20180174636A1 DATA ALIGNMENT CIRCUIT OF A SEMICONDUCTOR MEMORY DEVICE, A SEMICONDUCTOR MEMORY DEVICE AND A METHOD OF ALIGNING DATA IN A SEMICONDUCTOR MEMORY DEVICE 审中-公开
公开(公告)号：US20180174636A1
公开(公告)日：2018-06-21
申请号：US15787101
申请日：2017-10-18
申请人： SEONG-HWAN JEON , KYUNG-SOO HA , JIN-SEOK HEO , IN-DAL SONG , JUNG-HWAN CHOI
发明人： SEONG-HWAN JEON , KYUNG-SOO HA , JIN-SEOK HEO , IN-DAL SONG , JUNG-HWAN CHOI
IPC分类号： G11C11/402 , G11C11/22 , G11C7/22
CPC分类号： G11C11/4023 , G11C7/1012 , G11C7/1087 , G11C7/1093 , G11C7/222 , G11C11/2293 , G11C11/4093
摘要： A data alignment circuit of a semiconductor memory device including: a data sampling circuit configured to receive a data sequence and an internal data strobe signal, wherein the data sampling circuit samples the data sequence based on the internal data strobe signal to generate first and second data sequences; a division circuit configured to receive a clock signal and the internal data strobe signal, divide the clock signal to produce a divided clock signal and output an alignment control signal by sampling the divided clock signal based on the internal data strobe signal; and a data alignment block configured to receive the first and second data sequences, and the alignment control signal, and align the first and second data sequences in parallel to output internal data.

19. 发明申请

US20160278195A1 APPARATUS FOR GENERATING EXTREME ULTRAVIOLET LIGHT 有权
标题翻译：用于产生极度超紫外线灯的装置
公开(公告)号：US20160278195A1
公开(公告)日：2016-09-22
申请号：US14995398
申请日：2016-01-14
申请人： Sung-Joo Kim , Jin-Seok Heo , Do-Hyun Seo , Da-Hae Lee , Jae-Pil Lee , Sung-Jo Hwang
发明人： Sung-Joo Kim , Jin-Seok Heo , Do-Hyun Seo , Da-Hae Lee , Jae-Pil Lee , Sung-Jo Hwang
IPC分类号： H05G2/00 , H01S3/223
CPC分类号： H05G2/006 , G21K2201/065 , H01S3/2232 , H05G2/005 , H05G2/008
摘要： An apparatus for generating extreme ultraviolet light includes a droplet generator which provides a droplet to react with light from a light source to generate extreme ultraviolet light, a droplet collector which collects the droplet, and a droplet detector which includes a plurality of pressure sensors, the pressure sensors detect a position of the droplet provided to the droplet collecting unit.
摘要翻译：用于产生极紫外光的装置包括：液滴发生器，其提供液滴以与来自光源的光反应以产生极紫外光;收集液滴的液滴收集器;以及包括多个压力传感器的液滴检测器，压力传感器检测提供给液滴收集单元的液滴的位置。

20. 发明授权

US08384876B2 Method of detecting reticle errors 有权
标题翻译：检测掩模误差的方法
公开(公告)号：US08384876B2
公开(公告)日：2013-02-26
申请号：US12458503
申请日：2009-07-14
申请人： Jin-seok Heo , Jin-hong Park , Dae-youp Lee , Jeong-ho Yeo
发明人： Jin-seok Heo , Jin-hong Park , Dae-youp Lee , Jeong-ho Yeo
IPC分类号： G03B27/68
CPC分类号： G03B27/42
摘要： A method of detecting reticle error may include using an optical source of an exposure unit to cause light to be incident on a reticle installed in the exposure unit, and detecting the reticle error using only 0th diffraction light from among diffraction lights transmitted through the reticle. A method of detecting reticle error may include: installing a reticle, including a mask substrate and mask patterns having a critical dimension formed on the mask substrate, in an exposure unit to cause light to be incident on the reticle; exposing a photoresist film disposed on a wafer in the exposure unit using only 0th diffraction light from among diffraction lights transmitted through the reticle; developing the exposed photoresist film; and analyzing a thickness change, an image, or the thickness change and image of the developed photoresist film, in order to detect the reticle error at a wafer level.
摘要翻译：检测标线错误的方法可以包括使用曝光单元的光源使光入射到安装在曝光单元中的掩模版上，并且仅使用通过掩模版传播的衍射光中的第0衍射光来检测标线误差。检测标线错误的方法可以包括：在曝光单元中安装包括掩模基板的掩模版和具有形成在掩模基板上的临界尺寸的掩模图案，以使光入射到掩模版上; 使用透射通过掩模版的衍射光中的第0衍射光曝光设置在曝光单元中的晶片上的光致抗蚀剂膜; 显影曝光的光致抗蚀剂膜; 并分析显影的光刻胶膜的厚度变化，图像或厚度变化和图像，以便检测晶片级的标线误差。

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