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    • 17. 发明授权
    • Methods of forming and operating field effect transistors having gate and sub-gate electrodes
    • 形成和操作具有栅极和子栅电极的场效应晶体管的方法
    • US06680224B2
    • 2004-01-20
    • US10389846
    • 2003-03-17
    • Hyung-cheol ShinJong-ho LeeSang-yeon Han
    • Hyung-cheol ShinJong-ho LeeSang-yeon Han
    • H01L218234
    • H01L29/66643H01L21/2807H01L21/28105H01L29/1083H01L29/4983H01L29/7831H01L29/7836
    • Field effect transistors include a semiconductor substrate having a channel region of first conductivity type therein extending adjacent a surface thereof. Source and drain regions of second conductivity type are also provided at opposite ends of the channel region. The source and drain regions extend in the semiconductor substrate and form P-N rectifying junctions with the channel region. A gate electrode extends on the channel region and comprises a first electrically conductive material having a first work function. A first sub-gate electrode extends on the channel region and comprises a second electrically conductive material having a second work function that is unequal to the first work function. The second electrically conductive material is preferably selected so that a difference between the second work function and a work function of the channel region is sufficient to form an inversion-layer in a portion of the channel region extending opposite the first sub-gate electrode when the first sub-gate electrode is at a zero potential bias relative to the channel region.
    • 场效应晶体管包括其中具有第一导电类型的沟道区的半导体衬底,其在其表面附近延伸。 第二导电类型的源极和漏极区域也设置在沟道区域的相对端。 源区和漏区在半导体衬底中延伸并与沟道区形成P-N整流结。 栅电极在沟道区域上延伸并且包括具有第一功函数的第一导电材料。 第一子栅极电极在沟道区域上延伸并且包括具有不等于第一功函数的第二功函数的第二导电材料。 优选选择第二导电材料,使得第二功函数和沟道区的功函数之间的差足以在沟道区域的与第一子栅电极相对延伸的部分中形成反转层,当第 第一子栅极电极相对于沟道区域处于零电位偏置。