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    • 13. 发明公开
    • IMAGE DEINTERLACING SYSTEM FOR REMOVING MOTION ARTIFACTS AND ASSOCIATED METHODS
    • BILDESCHUTTELUNGSSYSTEM ZUM ENTFERNEN VON BEWEGUNGSARTEFAKTEN UND ZUGEORDNETE VERFAHREN
    • EP1520411A4
    • 2005-08-03
    • EP03728497
    • 2003-04-22
    • ALCON REFRACTIVE HORIZONS INC
    • GRAY GARY PAUL
    • H04N7/01H04N5/44H04N7/12H04N11/00H04N11/20
    • H04N7/012
    • Deinterlacing is applied to a composite video image that includes alternating even and odd rows of pixels. The even rows form a first image; the odd rows, a second image; these are recorded at different times, introducing a possibility of motion artifact. A first average horizontal intensity difference is computed (105) between the first image and the second image. The first image is offset (106) by one pixel in each horizontal direction to form a horizontally offset image, and another average horizontal intensity difference is computed (107). A minimum average intensity difference is determined (110) from a comparison of the average horizontal intensity differences. The first image is shifted (113) in a horizontal direction determined to achieve the minimum average horizontal intensity difference, and the horizontally shifted first image is combined (114) with the second image to form an imiproved composite image. An analogous series of steps is carried out in a vertical direction.
    • 将隔行扫描应用于包含偶数行和奇数行像素的复合视频图像。 偶数行形成第一个图像; 奇数行,第二个图像; 这些记录在不同的时间,引入运动伪影的可能性。 在第一图像和第二图像之间计算(105)第一平均水平强度差。 第一图像在每个水平方向上偏移(106)一个像素以形成水平偏移图像,并计算另一平均水平亮度差(107)。 根据平均水平强度差的比较确定(110)最小平均强度差。 第一图像在确定为实现最小平均水平强度差的水平方向上被移位(113),并且水平移动的第一图像与第二图像组合(114)以形成非模型化合成图像。 在垂直方向上执行类似的一系列步骤。
    • 15. 发明授权
    • Photoresist for holography and laser recording with bleachout dyes
    • 用于全息摄影和激光记录的漂白剂
    • US3925077A
    • 1975-12-09
    • US44726774
    • 1974-03-01
    • HORIZONS INC
    • LEWIS JAMES MNEWYEAR RAYMOND W
    • G03F7/26G03C1/73G03F7/00G03F7/004G03F7/029G03F7/09G03F7/20G03F7/36G03F7/40G03C5/00G03C1/68G03C5/04G03C5/24
    • G03F7/40G03F7/0005G03F7/0295G03F7/091Y10S430/146
    • High photographic speed photoresists based on N-vinyl monomers are made capable of exhibiting broad spectral response between at least 3200 A and up to 11,000 A without loss of speed by incorporating therein one or more specific bleachout dyes. Any color produced as a consequence of exposure and development may be eliminated by blanket exposure after fixing to light or to a combination of light and heat. While these photoresist compositions are particularly suitable for the formation of relief phase holograms, generally called thin film surface reflection type holograms, thick phase holograms, optical components such as diffraction gratings, holographic tape for video cassette recording, microfiche type holograms and similar devices where the absence of color in the developed and fixed resist is important, these compositions are also suitable for the preparation of patterns whereby after suitable development, photomechanical milling may be accomplished for printing plates, printed circuits, microelectronic circuits and general chemical milling of metals, plastics and glass where the original pattern is formed in the photoresist placed on a suitable surface by the medium of scanning with a modulated or unmodulated laser beam of chosen wavelength and of relatively low power. The majority of applications, particularly photomechanical milling, require wet development. A significant property of these broad spectrum response photoresists is that they may be processed completely dry without the need for wet development and still yield high quality relief phase holograms both for holographic purposes and for formation of optical components and still retain the potential for complete bleaching of the sensitizing agents by treatment with ultraviolet light with or without the presence of heat or visible or other type of light representing the peak response of the bleachout dye at which wavelength the bleachout dye bleaches most rapidly.
    • 17. 发明授权
    • Recovery of clean polyester materials from photographic film
    • 从摄影胶片中回收清洁的聚酯材料
    • US3873314A
    • 1975-03-25
    • US30453772
    • 1972-11-07
    • HORIZONS INC
    • WOO JAMES T KGLOWE DONALD ETHORNTON J SCOTT
    • C08J11/08G03C11/24G03C5/26C08G53/22
    • G03C11/24C08J11/08Y02P20/582Y02W30/701
    • Polymers containing polyvinylidene halides are generally used as a subbing or anchoring layer between a polyester film base and a gelatin layer containing halides or other silver compounds. It has been found that the silver and silver compound containing gelatin layer can be separated cleanly from the polyester base with attendant removal of the polyvinylidene halide containing polymer from both the gelatin fractions and the polyester fraction by suitable treatment of the photographic film (whether exposed or unexposed) in polar aprotic solvents; somewhat less polar solvents comprising cyclic compounds taken from the class of aliphatic and aromatic hydrocarbons, ethers, sulfides, and ketones; and mixtures of polar aprotic solvents such as sulfoxides or amides in combination with the cyclic solvents as cosolvents. These solvents dissolve the polyvinylidene containing polymer while not affecting materially either the polyester base or the silver compound or silver metal containing gelatin layer. Of this group of solvents the polar aprotic solvents are the preferred species; mixtures of polar aprotic solvents and polar cyclic compounds being preferred next; and cyclic organic compounds which are less polar being the least preferred in view of the relatively high temperature required for suitable action. The preferred solvents are effective at room temperature, at elevated temperature below the boiling point of the solvent and in the vapor phase above the boiling point of the solvent.
    • 含有聚偏二氯乙烯的聚合物通常用作聚酯膜基材和含有卤化物或其它银化合物的明胶层之间的底层或锚定层。 已经发现,含银明胶层的银和银化合物可以从聚酯基材干净地分离出来,通过适当地处理照相胶片(无论是曝光的还是暴露的或不可见的),从明胶部分和聚酯部分中随着去除含聚偏二卤乙烯的聚合物 未曝光)在极性非质子溶剂中; 包含从脂族和芳族烃类,醚类,硫化物和酮类中获得的环状化合物的极少量极性溶剂; 以及极性非质子溶剂如亚砜或酰胺与环状溶剂的组合作为助溶剂的混合物。 这些溶剂溶解含聚偏二烯聚合物,同时不影响聚酯基或银化合物或含银金属明胶层的物质。 在这组溶剂中,极性非质子溶剂是优选的物质; 接下来优选极性非质子溶剂和极性环状化合物的混合物; 考虑到合适的作用所需的相对较高的温度,极性较小的环状有机化合物是最不优选的。 优选的溶剂在室温下,在低于溶剂沸点的高温下和高于溶剂沸点的气相中有效。
    • 19. 发明授权
    • Light sensitive reproduction and electron beam sensitive material
    • US3769023A
    • 1973-10-30
    • US3769023D
    • 1971-05-07
    • HORIZONS INCHORIZONS RESEARCH INC
    • LEWIS JWAINER E
    • G03F7/027G03F7/032G03C1/68
    • G03F7/0325G03F7/027Y10S430/107Y10S430/114Y10S430/143
    • Light sensitive reproduction and electron beam sensitive material useful in preparing positive and/or negative copies, planographic and deep etched lithographic plates, deep etched printing plates, thin and thick film printed circuits, circuits for microelectronics, and chemical milling of metals, plastics and glass, is formed by coating a suitable support with a composition which includes (1) a hydroxy alkyl cellulose; (2) an ethenically unsaturated vinyl monomer including N-vinyl monomers; (3) at least one compound which produces free-radicals on exposure to light; (4) color formers taken from the general class of intermediates which produce color on exposure to condensation agents, oxidizing agents, and/or acids; (5) organic sulphur compounds for the promotion of adhesion; and (6) agents for improving the shelf stability of the product either in dissolved form or in the form of a solvent-free layer on a suitable surface taken from the class of cresols, phenols and triaryl compounds of the A sub group of metals taken from the 5th column of the Periodic Table. The composition may or may not contain other compounds which promote polymerization and/or crosslinking on exposure to light. The composition is dry working and is placed into solution for coating purposes only in organic solvents. After exposure and suitable development, the non-image areas may be removed by washing in water which has no effect on the areas which are exposed to light or electron beams. The exposed areas are colored and are hydrophobic in nature, readily accepting ink so as to make the end result suitable for lithographic and printing purposes. The composition has the further feature that while the non-image areas are soluble in cold water the image areas after exposure, development and washing in cold water may be removed readily for circuit purposes by washing in hot deionized water or in certain cases by a mixture of water and acetone. The composition is characterized by exceptionally high resolution, and though originally sensitive primarily to the ultraviolet and to electron beams can be sensitized to the visible through the panchromatic range by the addition of suitable color sensitizers. Certain aspects of the composition may be operated positively or negatively. The composition is further characterized that under suitable conditions it will print-out in any one of a variety of prechosen colors, if desired. The composition may be utilized for imaging and/or resist purposes as desired.