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    • 12. 发明授权
    • Method and apparatus for scatterfield microscopical measurement
    • 散射场微观测量的方法和装置
    • US07872741B2
    • 2011-01-18
    • US12071362
    • 2008-02-20
    • Sen-Yih ChouShu-Ping DongWei-Te HsuDeh-Ming ShyuChia-Lin WuYi-Sha KuChang-Hai Sung
    • Sen-Yih ChouShu-Ping DongWei-Te HsuDeh-Ming ShyuChia-Lin WuYi-Sha KuChang-Hai Sung
    • G01N21/00
    • G01N21/47G01N2021/4709G02B21/02G02B21/06
    • A method and an apparatus are disclosed for scatterfield microscopical measurement. The method integrates a scatterometer and a bright-field microscope for enabling the measurement precision to be better than the optical diffraction limit. With the aforesaid method and apparatus, a detection beam is generated by performing a process on a uniform light using an LCoS (liquid crystal on silicon) or a DMD (digital micro-mirror device) which is to directed to image on the back focal plane of an object to be measured, and then scattered beams resulting from the detection beam on the object's surface are focused on a plane to form an optical signal which is to be detected by an array-type detection device. The detection beam can be oriented by the modulation device to illuminate on the object at a number of different angles, by which zero order or higher order diffraction intensities at different positions of the plane at different incident angles can be collected.
    • 公开了用于散射场微观测量的方法和装置。 该方法集成了散射仪和明视野显微镜,使测量精度优于光学衍射极限。 利用上述方法和装置,通过使用LCoS(硅上液晶)或DMD(数字微镜装置)进行均匀光的处理来生成检测光束,DMD(数字微镜装置)是指向后焦平面上的图像 测量对象物体上的检测光束产生的散射光束聚焦在平面上,形成由阵列型检测装置检测出的光信号。 检测光束可以通过调制装置定向,以多个不同的角度对物体进行照射,从而可以收集在不同入射角处的平面不同位置的零级或更高阶衍射强度。
    • 14. 发明申请
    • Method and apparatus for scatterfield microscopical measurement
    • 散射场微观测量的方法和装置
    • US20090079969A1
    • 2009-03-26
    • US12071362
    • 2008-02-20
    • Sen-Yih ChouShu-Ping DongWei-Te HsuDeh-Ming ShyuChia-Lin WuYi-Sha KuChang-Hai Sung
    • Sen-Yih ChouShu-Ping DongWei-Te HsuDeh-Ming ShyuChia-Lin WuYi-Sha KuChang-Hai Sung
    • G01N21/00
    • G01N21/47G01N2021/4709G02B21/02G02B21/06
    • A method and an apparatus are disclosed for scatterfield microscopical measurement. The method integrates a scatterometer and a bright-field microscope for enabling the measurement precision to be better than the optical diffraction limit. With the aforesaid method and apparatus, a detection beam is generated by performing a process on a uniform light using an LCoS (liquid crystal on silicon) or a DMD (digital micro-mirror device) which is to directed to image on the back focal plane of an object to be measured, and then scattered beams resulting from the detection beam on the object's surface are focused on a plane to form an optical signal which is to be detected by an array-type detection device. The detection beam can be oriented by the modulation device to illuminate on the object at a number of different angles, by which zero order or higher order diffraction intensities at different positions of the plane at different incident angles can be collected.
    • 公开了用于散射场微观测量的方法和装置。 该方法集成了散射仪和明视野显微镜,使测量精度优于光学衍射极限。 利用上述方法和装置,通过使用LCoS(硅上液晶)或DMD(数字微镜装置)进行均匀光的处理来生成检测光束,DMD(数字微镜装置)是指向后焦平面上的图像 测量对象物体上的检测光束产生的散射光束聚焦在平面上,形成由阵列型检测装置检测出的光信号。 检测光束可以通过调制装置定向,以多个不同的角度对物体进行照射,从而可以收集在不同入射角处的平面不同位置的零级或更高阶衍射强度。