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    • 13. 发明申请
    • AUTO-EXTENSIBLE DEVICE
    • 自动伸缩装置
    • WO2006010933A1
    • 2006-02-02
    • PCT/GB2005/002959
    • 2005-07-28
    • FINSBURY (DEVELOPMENT) LIMITEDTAYLOR, Andrew, Clive
    • TAYLOR, Andrew, Clive
    • A61B17/66
    • A61B17/66
    • An auto-extensible device, which can be incorporated in a tissue distractor (1), has an electrorestrictive device (50) which has a proximal end (51) mounted in a first body member (2) and which is located within an elongate tubular member (4) that is externally screw threaded and carries a first gear ring (40) and a second gear ring (41) threaded thereon. Upon applying a voltage to the electrorestrictive device (50) a linear bearing guide (21) together with a second body member (3) is caused to move distally with respect to the first body member (2) and hence, by interference with the second gear ring (41), to carry with it the elongate tubular member (4). This movement produces a first gap (A) between the second body member (3) and the first body member (2) as well as a second gap (B) between a distal end surface of the first body member (2) and the first gear ring (41). A first motor (42) then drives a first spur gear (45) engaged with the first gear ring (40) so as to cause it to move proximally along the elongate tubular member (4) until it abuts the first body member (2) and thereby closes the second gap (B). Next the voltage is allowed to drop to zero causing the electrorestrictive device (50) to contract again, thereby causing the first gap (A) to close and a third gap (C) to open up between a second gear ring (41) screw threadedly engaged with the external screw thread (ET) on the tubular member (4) and a distal surface of the second body member (3). A second motor (46) then drives a second spur gear (49) engaged with the second gear ring (41) so as to move the second gear ring (41) proximally of the elongate tubular member (4) and to cause it to close the third gap (C).
    • 可以包括在组织牵引器(1)中的自动延伸装置具有电绝缘装置(50),其具有安装在第一本体构件(2)中的近端(51),并且位于细长管状 构件(4),其外螺纹并带有螺纹连接在其上的第一齿圈(40)和第二齿圈(41)。 当向电气限制装置(50)施加电压时,使线性轴承导向件(21)与第二主体构件(3)一起相对于第一主体构件(2)向远侧运动,因此通过与第二主体构件 齿圈(41),以便承载细长管状构件(4)。 该移动在第二主体构件(3)与第一主体构件(2)之间产生第一间隙(A)以及在第一主体构件(2)的远端表面与第一主体构件 齿圈(41)。 然后,第一马达(42)驱动与第一齿圈(40)接合的第一正齿轮(45),以使其沿着细长管状构件(4)向近侧移动,直到其抵靠第一主体构件(2) 从而封闭第二间隙(B)。 接下来,允许电压下降至零,使得电气限制装置(50)再次收缩,从而导致第一间隙(A)闭合,并且第三间隙(C)在螺纹的第二齿圈(41)螺钉 与管状构件(4)上的外螺纹(ET)和第二主体构件(3)的远侧表面接合。 然后,第二马达(46)驱动与第二齿圈(41)接合的第二正齿轮(49),以使第二齿圈(41)在细长管状部件(4)的近侧移动并使其闭合 第三个差距(C)。
    • 16. 发明申请
    • APPARATUS
    • 仪器
    • WO2003042423A1
    • 2003-05-22
    • PCT/GB2002/005139
    • 2002-11-13
    • NORDIKO LIMITEDDAVIS, Mervyn, Howard
    • DAVIS, Mervyn, Howard
    • C23C14/34
    • H01J37/3473C23C14/3464C23C14/352C23C14/568
    • A vacuum sputterring apparatus capable of depositing a plurality of thin film layers on a substrate, the apparatus comprising: a vacuum chamber (1) having gas inlet means and gas evacuation means; a substrate support table (2) arranged to be rotatable about at least one axis perpendicular to the plane of the table; means for rotating the substrate support table about said at least one axis; a plurality of sputtering targets (5) spaced around the walls of the chamber, each sputtering target having electrode means associated therewith; and means for altering the position of the substrate support table relative to each one of the plurality of sputtering targets (4) such that in use a substrate placed on the substrate support table may have a film deposited thereon of atoms sputtered from at least one of the said plurality of targets and subsequently, following alteration of the position of the substrate support table, have at least one further film deposited thereon by exposure to atoms form at least one other of said plurality of targets. A method of depositing multi-layer materials on a substrate and a method of controlling stoichiometry of deposited alloys are also provided.
    • 一种能够在基板上沉积多个薄膜层的真空溅射装置,该装置包括:具有气体入口装置和排气装置的真空室; 基板支撑台(2),布置成可绕垂直于工作台平面的至少一个轴线旋转; 用于使所述基板支撑台围绕所述至少一个轴线旋转的装置; 多个溅射靶(5)围绕室的壁间隔开,每个溅射靶具有与其相关联的电极装置; 以及用于相对于所述多个溅射靶(4)中的每一个改变所述衬底支撑台的位置的装置,使得在使用中,放置在所述衬底支撑台上的衬底可以具有沉积在其上的至少一个溅射靶 所述多个靶并且随后在衬底支撑台的位置改变之后,通过暴露于原子形成至少一个另外的膜,所述至少一个另外的膜形成所述多个靶中的至少另一个靶。 还提供了在衬底上沉积多层材料的方法和控制沉积合金的化学计量的方法。