专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

141. 发明授权

US07956274B2 Performance apparatus and storage medium therefor 有权
标题翻译：性能仪器及其存储介质
公开(公告)号：US07956274B2
公开(公告)日：2011-06-07
申请号：US12057317
申请日：2008-03-27
申请人： Michihiko Sasaki , Gou Usui , Shinichi Ito
发明人： Michihiko Sasaki , Gou Usui , Shinichi Ito
IPC分类号： G10H1/00
CPC分类号： G10H1/40 , A63B71/0686 , A63B2071/0625 , A63B2220/803 , A63B2230/06 , G10H1/42 , G10H2210/391 , G10H2220/395 , G10H2240/056 , G10H2240/061
摘要： A performance apparatus capable of reproducing music pieces while making changeover between the music pieces without disturbing the rhythm of exercise, dance, or the like performed by a user to the rhythm of music. A beat position is acquired that will appear in a preceding performance data for the first time after a preparatory time required for changing the reproduction of the preceding music piece to the reproduction of a subsequent music piece elapses from when a music selection instruction is given. The reproduction of the subsequent music piece is started at the same time when the music is reproduced up to the acquired beat position.
摘要翻译：一种演奏装置，能够在不影响用户对音乐节奏的运动，跳舞等的节奏的同时，在音乐片段之间进行切换时再现音乐片段。在从给出音乐选择指令之后经过的前一乐段的再现所需的准备时间到随后的音乐片段的再现之后，获取将首先出现在前一演奏数据中的拍子位置。在音乐再现到获取的拍子位置的同时，开始随后的音乐片段的再现。

142. 发明授权

US07918753B2 Hydraulic control unit 有权
标题翻译：液压控制单元
公开(公告)号：US07918753B2
公开(公告)日：2011-04-05
申请号：US11570149
申请日：2005-06-09
申请人： Akira Murakami , Makoto Funahashi , Shinichi Ito , Toshihiro Aoyama , Michio Yoshida , Ryuji Ibaraki , Takashi Kuwabara , Toshiya Yamashita
发明人： Akira Murakami , Makoto Funahashi , Shinichi Ito , Toshihiro Aoyama , Michio Yoshida , Ryuji Ibaraki , Takashi Kuwabara , Toshiya Yamashita
IPC分类号： F16H61/00
CPC分类号： F16H61/66272 , F16H2312/14
摘要： A hydraulic control unit (18), for a power transmission system having an oil receiving device (26,37), which controls a power transmitting condition of the power transmission system, and an oil reserving device for feeding the oil to the oil receiving device, wherein the oil reserving device comprises a piston (59) in which a diametrically large portion and a diametrically small portion are arranged integrally and coaxially, a first hydraulic chamber (57) in which the diametrically large portion, and a second hydraulic chamber (58) in which the diametrically small portion are housed liquid-tightly and movably back and forth; and an oil feeding amount control device for feeding the oil of the first hydraulic chamber to the oil receiving device, by raising the oil pressure in the second hydraulic chamber (58) to operate the piston (59).
摘要翻译：一种液压控制单元（18），用于具有控制动力传动系统的动力传递状态的油接收装置（26,37）的动力传动系统和用于将油供给到油接收装置的储油装置其特征在于，所述储油装置具有一体地同轴配置有直径大的部分和径向小部分的活塞（59），具有径向大部分的第一液压室（57）和第二液压室（58）），其中直径较小的部分被液密地并且可移动地来回容纳; 以及供油量控制装置，用于通过提高第二液压室（58）中的油压来操作活塞（59），将第一液压室的油供给到油接收装置。

143. 发明申请

US20110059406A1 PATTERN FORMING METHOD 有权
标题翻译：图案形成方法
公开(公告)号：US20110059406A1
公开(公告)日：2011-03-10
申请号：US12878828
申请日：2010-09-09
申请人： Yoshihisa KAWAMURA , Eishi Shiobara , Shinichi Ito
发明人： Yoshihisa KAWAMURA , Eishi Shiobara , Shinichi Ito
IPC分类号： G03F7/20
CPC分类号： G03F7/0002
摘要： According to one embodiment, a pattern forming method is disclosed. The method can include selectively providing a curing agent to a pattern in a template, contacting the template provided the curing agent to a substrate, irradiating the curing agent with light where the template and the substrate are contacted each other to harden the curing agent, demolding the template from the substrate to form a curing agent pattern on the substrate, and etching the substrate on a basis of the curing agent pattern.
摘要翻译：根据一个实施例，公开了一种图案形成方法。该方法可以包括选择性地向模板中的图案提供固化剂，使提供固化剂的模板与基底接触，用光照射固化剂，其中模板和基底彼此接触以硬化固化剂，脱模所述模板从所述基板在所述基板上形成固化剂图案，并且基于所述固化剂图案来蚀刻所述基板。

144. 外观设计

USD633986S1 Pressure regulator 有权
公开(公告)号：USD633986S1
公开(公告)日：2011-03-08
申请号：US29365167
申请日：2010-07-04
申请人： Shinichi Ito , Michihiro Hanada
设计人： Shinichi Ito , Michihiro Hanada

145. 发明申请

US20100327206A1 REGULATOR VALVE 有权
标题翻译：调节阀
公开(公告)号：US20100327206A1
公开(公告)日：2010-12-30
申请号：US12597646
申请日：2008-04-25
申请人： Akiko Nishimine , Shinichi Ito , Kenichi Tsuchida
发明人： Akiko Nishimine , Shinichi Ito , Kenichi Tsuchida
IPC分类号： F16K1/00
CPC分类号： F16H61/0276 , F16H61/0021 , F16H2061/0253 , F16K11/07 , F16K31/122 , G05D16/14 , Y10T137/2564 , Y10T137/2652 , Y10T137/2665 , Y10T137/8663 , Y10T137/8671
摘要： A regulator valve is structured such that hydraulic pressure to be output from a regulated pressure output port is regulated according to urging forces, i.e., line pressure to be regulated, throttle pressure, spring force from a compression coil spring, and operating force from a plunger, which are applied to a valve spool. The plunger has a small diameter portion and a large diameter portion having a diameter larger than the diameter of the small diameter portion, both of which are axially displaceably retained in a spring receiving sleeve. The small diameter portion is urged in one axial direction at one end of the plunger that protrudes into a spring chamber and faces the valve spool, while the large diameter portion is urged in the other axial direction by range pressure at the other end of the plunger which is isolated from the small diameter portion located in the spring chamber.
摘要翻译：调节阀被构造成使得从调节压力输出端口输出的液压根据作用力调节，即被调节的管路压力，节流阀压力，来自压缩螺旋弹簧的弹簧力，以及来自柱塞的操作力，其被施加到阀芯。柱塞具有小直径部分和大直径部分，其直径大于小直径部分的直径，两者均轴向移位地保持在弹簧接收套筒中。小直径部分在柱塞的一端沿一个轴向方向被推压到弹簧室中并面向阀芯，而大直径部分在另一个轴向方向上被推压在柱塞另一端的范围压力其与位于弹簧室中的小直径部分隔离。

146. 发明授权

US07796237B2 Lithography apparatus, method of forming pattern and method of manufacturing semiconductor device 失效
标题翻译：平版印刷设备，形成图案的方法和制造半导体器件的方法
公开(公告)号：US07796237B2
公开(公告)日：2010-09-14
申请号：US12341179
申请日：2008-12-22
申请人： Shinichi Ito , Tsuyoshi Shibata
发明人： Shinichi Ito , Tsuyoshi Shibata
IPC分类号： G03B27/52 , G03B27/42 , G03B27/32 , G03D5/00
CPC分类号： G03F7/70991 , G03F7/70341 , G03F7/70858 , G03F7/70916 , G03F7/70925
摘要： A lithography apparatus includes a resist processing apparatus to perform a process of applying a resist on a substrate, a process of heating a resist film on the substrate, and a process of developing the resist film on the substrate, an immersion exposure apparatus including a projection optical system which projects an image of a pattern on a photomask onto the resist film and configured to perform exposure through liquid located on an optical path between the projection optical system and resist film, a transporting apparatus connected to the resist processing and immersion exposure apparatuses to perform transportation of the substrate between the resist processing and immersion exposure apparatuses, and a temperature/humidity control apparatus configured to control at least one of temperature and humidity in at least one of the resist processing and transporting apparatuses based on temperature and humidity or the in humidity the immersion exposure apparatus.
摘要翻译：光刻设备包括：抗蚀剂处理设备，用于执行在基板上施加抗蚀剂的工艺;加热基板上的抗蚀剂膜的工艺;以及在基板上显影抗蚀剂膜的工艺;浸渍曝光设备，包括：投影光学系统，其将光掩模上的图案的图像投影到抗蚀剂膜上，并且被配置为通过位于投影光学系统和抗蚀剂膜之间的光路上的液体进行曝光，连接到抗蚀剂处理和浸没曝光装置的传送装置在抗蚀剂处理和浸没曝光装置之间执行基板的传送，以及温度/湿度控制装置，其被配置为基于温度和湿度控制至少一个抗蚀剂处理和输送装置中的温度和湿度，湿度浸渍曝光设备。

147. 发明授权

US07741739B2 Automotive alternator 有权
标题翻译：汽车交流发电机
公开(公告)号：US07741739B2
公开(公告)日：2010-06-22
申请号：US11604687
申请日：2006-11-28
申请人： Shinichi Ito
发明人： Shinichi Ito
IPC分类号： H02K9/00
CPC分类号： H02K5/225 , H02K5/141 , H02K9/06 , H02K9/28
摘要： A cooling airflow introducing guide portion is disposed on a portion of a connector that faces fins of a voltage regulator heatsink so as to extend in a direction of array of the fins so as to ensure a predetermined clearance relative to the fins. An air intake aperture is disposed through a portion of the rear bracket that faces the voltage regulator heatsink.
摘要翻译：冷却风导入引导部设置在连接器的面对电压调节器散热片的翅片的部分上，以便沿散热片排列方向延伸，以确保相对于翅片的预定间隙。进气口通过后支架的面向调压器散热器的部分设置。

148. 发明授权

US07527918B2 Pattern forming method and method for manufacturing a semiconductor device 失效
标题翻译：图案形成方法和制造半导体器件的方法
公开(公告)号：US07527918B2
公开(公告)日：2009-05-05
申请号：US10992349
申请日：2004-11-19
申请人： Takehiro Kondoh , Eishi Shiobara , Tomoyuki Takeishi , Kenji Chiba , Shinichi Ito
发明人： Takehiro Kondoh , Eishi Shiobara , Tomoyuki Takeishi , Kenji Chiba , Shinichi Ito
IPC分类号： G03F7/00
CPC分类号： G03F7/40 , G03F7/405
摘要： A pattern forming method comprises forming a first resist pattern on a substrate, irradiating light on the first resist pattern, forming a resist film including a cross-linking material on the substrate and the first resist pattern, forming a second resist pattern including a cross-linking layer formed at an interface between the first resist pattern and the resist film by causing a cross-linking reaction at the interface, and irradiating light on the first resist pattern including setting an amount of the light irradiated on the first resist pattern such that a dimension of the second resist pattern is to be a predetermined dimension based on a previously prepared relationship between a difference between a dimension relating to the first resist pattern and a dimension relating to the second resist pattern and the amount of the light irradiated on the first resist pattern.
摘要翻译：图案形成方法包括在基板上形成第一抗蚀剂图案，在第一抗蚀剂图案上照射光，在基板上形成包含交联材料的抗蚀剂膜和第一抗蚀剂图案，形成第二抗蚀剂图案，通过在界面处引起交联反应而在第一抗蚀剂图案和抗蚀剂膜之间的界面处形成的连接层，并且对第一抗蚀剂图案照射光，包括设定照射在第一抗蚀剂图案上的光量，使得基于与第一抗蚀剂图案有关的尺寸与第二抗蚀剂图案的尺寸之间的差异以及照射在第一抗蚀剂层上的光量，第二抗蚀剂图案的尺寸为预定尺寸模式。

149. 发明授权

US07371434B2 Liquid film forming method and solid film forming method 失效
标题翻译：液膜成膜法和固体成膜法
公开(公告)号：US07371434B2
公开(公告)日：2008-05-13
申请号：US10202657
申请日：2002-07-25
申请人： Shinichi Ito
发明人： Shinichi Ito
IPC分类号： B05D1/02
CPC分类号： G03F7/162
摘要： A method of forming a liquid film characterized by dropping a liquid on a substrate from a dropping unit while rotating the substrate, moving the dropping unit in the radial direction from the inner periphery of the substrate to the outer periphery of the substrate so that the move pitch of the dropping unit in the radial direction occurring in every revolution of the substrate may change slightly, and forming a liquid film on the substrate by adjusting the feed speed of the liquid to the substrate from the dropping unit, while lowering the rotational frequency of the substrate gradually, so that the liquid on the substrate may not move due to centrifugal force by rotation of the substrate, along with the move of the dropping unit in the radial direction of the substrate.
摘要翻译：一种形成液膜的方法，其特征在于在旋转基板的同时从滴液单元将液体滴落到基板上，使滴下单元从基板的内周沿径向移动到基板的外周，使得移动在基板的每一转中发生的放射单元的间距可能稍微变化，并且通过从下降单元调节液体对基板的进给速度而在基板上形成液膜，同时降低使基板的液体随着基板的旋转的离心力而不会随着基板的径向移动而不能移动。

150. 发明申请

US20080063987A1 Immersion supporting plate cleaning method and a pattern forming method 失效
标题翻译：浸渍支撑板清洗方法和图案形成方法
公开(公告)号：US20080063987A1
公开(公告)日：2008-03-13
申请号：US11898322
申请日：2007-09-11
申请人： Shinichi Ito
发明人： Shinichi Ito
IPC分类号： G03C5/00 , B08B3/02
CPC分类号： B08B3/04 , G03F7/70341 , G03F7/70925
摘要： An immersion supporting plate cleaning method of cleaning an immersion supporting plate provided around a substrate to be processed in immersion exposure. An immersion boundary between an immersion area contact part and an immersion area noncontact part on the immersion supporting plate formed when an immersion area is moved according to a predetermined exposure area and an exposure map is determined in advance. Then, the immersion supporting plate is cleaned while a cleaning jig is being moved along the determined immersion boundary.
摘要翻译：一种浸没式支撑板清洁方法，其用于清洗浸没式支撑板，其设置在浸没曝光中待处理基板周围。预先确定当浸入区域根据预定曝光区域和曝光图而移动时形成的浸没支撑板上的浸没区域接触部分和浸没区域非接触部分之间的浸没边界。然后，在沿着确定的浸入边界移动清洁夹具的同时清洁浸没支撑板。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式