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141. 发明授权

US06835519B2 Dry toner and image forming method using same 有权
标题翻译：干式调色剂和使用其的成像方法
公开(公告)号：US06835519B2
公开(公告)日：2004-12-28
申请号：US10680246
申请日：2003-10-08
申请人： Tsunemi Sugiyama , Shigeru Emoto , Hiroshi Yamashita , Masami Tomita , Kazuhito Watanabe , Chiaki Tanaka
发明人： Tsunemi Sugiyama , Shigeru Emoto , Hiroshi Yamashita , Masami Tomita , Kazuhito Watanabe , Chiaki Tanaka
IPC分类号： G03G9087
CPC分类号： G03G9/0806 , G03G9/0819 , G03G9/0821 , G03G9/0825 , G03G9/0827 , G03G9/08708 , G03G9/08755 , G03G9/08782 , G03G9/08786 , G03G9/08793 , G03G9/08795 , G03G9/08797
摘要： A dry toner including at least a modified polyester as a toner binder, wherein the modified polyester has a main peak in a molecular weight region of 1000 to 30000 in a molecular weight distribution as measured by GPC, contains 1 to 10% of a component having a molecular weight of at least 30000, and has an Mw/Mn ratio of not greater than 15.
摘要翻译：包含至少一种改性聚酯作为调色剂粘合剂的干燥调色剂，其中所述改性聚酯在通过GPC测量的分子量分布中具有在1000至30000的分子量范围内的主峰，含有1至10％的具有分子量至少为30000，Mw / Mn比不大于15。

142. 发明授权

US06800412B2 Toner for dry developing 有权
公开(公告)号：US06800412B2
公开(公告)日：2004-10-05
申请号：US10681185
申请日：2003-10-09
申请人： Tsunemi Sugiyama , Masami Tomita , Shigeru Emoto , Hiroshi Yamashita
发明人： Tsunemi Sugiyama , Masami Tomita , Shigeru Emoto , Hiroshi Yamashita
IPC分类号： G03G900
CPC分类号： G03G9/0825 , G03G9/08755 , G03G9/08782
摘要： A toner for dry developing, containing a colorant, a binder including a modified polyester, and wax particles dispersed in the binder, wherein that portion of the wax particles having a dispersion diameter of 0.1-3 &mgr;m accounts for at least 70% by number of the wax particles.

143. 发明授权

US06756175B2 Method for fixing toner 有权
标题翻译：墨粉定影方法
公开(公告)号：US06756175B2
公开(公告)日：2004-06-29
申请号：US10188753
申请日：2002-07-05
申请人： Shigeru Emoto , Chiaki Tanaka , Naohiro Watanabe , Hiroshi Yamada , Tsunemi Sugiyama , Hiroshi Yamashita , Kazuhito Watanabe , Masami Tomita
发明人： Shigeru Emoto , Chiaki Tanaka , Naohiro Watanabe , Hiroshi Yamada , Tsunemi Sugiyama , Hiroshi Yamashita , Kazuhito Watanabe , Masami Tomita
IPC分类号： G03G1320
CPC分类号： G03G9/08782 , G03G9/0804 , G03G9/0806 , G03G9/0827 , G03G9/08755 , G03G9/08764 , G03G9/08795
摘要： A method of fixing toner in a belt fixing unit having a fixing roller; a heating roller; an endless fixing belt binding the heating roller and the fixing roller under tension therebetween; a pressure roller disposed to face the fixing roller intervening the fixing belt; and a fixing heater disposed inside one of the pressure roller and the heating roller, the method of fixing includes: a step for fixing a toner image on an image fixing material by conveying the toner image on the image fixing material in between a portion of the fixing belt not touching the fixing roller and the pressure roller; featured by the toner particle being spherical having a roundness of 0.96 or more and contains a colorant and resin component containing a modified polyester resin.
摘要翻译：一种在具有定影辊的带固定单元中定影调色剂的方法; 加热辊; 在加热辊和定影辊之间张紧地结合加热辊的环形定影带; 设置成面对定影辊的定影辊的压力辊; 以及设置在所述加压辊和所述加热辊之一内的定影加热器，所述固定方法包括：通过将所述图像定影材料上的调色剂图像传送到所述图像定影材料的一部分之间来将调色剂图像定影在图像定影材料上的步骤定影带不接触定影辊和加压辊; 其特征在于调色剂颗粒为圆形度为0.96以上的球形，并且含有含有改性聚酯树脂的着色剂和树脂组分。

144. 发明授权

US06732351B2 Method of forming mask for charged particle beam exposure and processing program of pattern data for forming mask for charged particle beam exposure 失效
标题翻译：形成用于带电粒子束曝光的掩模的方法和用于形成用于带电粒子束曝光的掩模的图案数据的处理程序
公开(公告)号：US06732351B2
公开(公告)日：2004-05-04
申请号：US10084501
申请日：2002-02-28
申请人： Hiroshi Yamashita
发明人： Hiroshi Yamashita
IPC分类号： G06F1750
CPC分类号： G03F1/20
摘要： The present invention relates to a method of forming a mask with an opening pattern used for a charged particle beam exposure; which comprises the steps of: outlining a pattern figure represented by prescribed pattern data; descerning whether every polygonal pattern represented by pattern data being obtained through said contouring is a convex polygon or not; splitting every polygonal pattern which is not identified as a convex polygon into a plurality of pattern sections; and distributing a plurality of said pattern sections onto masks which constitute a set of complementary masks. In the present invention, any of singular patterns which may cause a problem in stencil mask formation is, through systematical identification, extracted and then, this singular pattern is split and distributed onto different masks constituting a set of complementary masks so that, while maintaining sufficient mechanical strength, the number of openings can be reduced to a minimum by avoiding superfluous pattern splitting. As a result, a stencil mask capable to improve the reliability of the pattern projection can be provided efficiently.
摘要翻译：本发明涉及一种形成具有用于带电粒子束曝光的开口图案的掩模的方法; 其包括以下步骤：概述由规定图案数据表示的图案图形; 是否通过所述轮廓获得的图案数据表示的每个多边形图案是否是凸多边形; 将未被识别为凸多边形的每个多边形图案分割成多个图案部分; 以及将多个所述图案部分分布到构成一组互补掩模的掩模上。在本发明中，可以通过系统识别提取模板掩模形成中的任何可能引起问题的单一图案，然后，将该奇异图案分割并分布到构成一组互补掩模的不同掩模上，使得在保持足够的机械强度，通过避免多余的图案分割，开孔数量可以减少到最小。结果，可以有效地提供能够提高图案投影的可靠性的模板掩模。

145. 发明授权

US06673527B2 Color developer solution, concentrated composition thereof for use in silver halide color photographic material and processing method 失效
标题翻译：显色剂显色剂溶液，其浓缩组合物用于卤化银彩色照相材料和加工方法
公开(公告)号：US06673527B2
公开(公告)日：2004-01-06
申请号：US10207455
申请日：2002-07-29
申请人： Hiroshi Yamashita
发明人： Hiroshi Yamashita
IPC分类号： G03C7413
CPC分类号： G03C7/413 , G03C5/266 , G03C7/44
摘要： A color developer solution capable of inhibiting precipitation or tar-staining occurring in the processing tank or the roller rack, even when being processed rapidly or at low replenishing rate and a concentrated composition thereof is disclosed, comprising at least one selected from specified N-disubstituted hydroxylamine derivatives and at least one selected from specified N-monosubstituted hydroxylamine derivatives in a molar ratio falling within the range of 1000:1 to 1:1.
摘要翻译：公开了即使在快速加工或以低补充速度进行加工处理罐或辊架中也能抑制沉淀或焦油污染的显色剂溶液，其包含选自特定的N-二取代的羟胺衍生物和选自特定N-单取代羟胺衍生物中的至少一种摩尔比在1000:1至1:1的范围内。

146. 发明授权

US06603120B2 Test method of mask for electron-beam exposure and method of electron-beam exposure 有权
标题翻译：电子束曝光掩模试验方法及电子束曝光方法
公开(公告)号：US06603120B2
公开(公告)日：2003-08-05
申请号：US09870219
申请日：2001-05-30
申请人： Hiroshi Yamashita
发明人： Hiroshi Yamashita
IPC分类号： H01L2166
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/20 , G03F1/86 , H01J37/3174 , H01J2237/31791 , H01J2237/31794
摘要： The present invention relates to a test method of a mask for electron-beam exposure which has a pattern region in which, by forming an electron-beam scatterer in prescribed shape on an electron-beam transmittable thin film, a scattering region with said electron-beam scatterer and a membrane region without said electron-beam scatterer are formed in prescribed pattern shape; wherein electron-beam irradiation onto a tested mask is carried out in a plurality of times, with each irradiated region subjected to irradiation at a time being scanned with the electron beam, and through detection of transmitted electrons which is made for each irradiated region subjected to irradiation at a time.
摘要翻译：本发明涉及一种用于电子束曝光的掩模的测试方法，其具有图案区域，其中通过在电子束可透射薄膜上形成规定形状的电子束散射体，具有所述电子束曝光薄膜的散射区域，光束散射体和没有所述电子束散射体的膜区域以规定的图案形状形成; 其中对测试的掩模进行电子束照射多次进行，每个照射区域一次用电子束进行照射，并且通过检测对于经受一次照射

147. 发明授权

US06509127B1 Method of electron-beam exposure 失效
标题翻译：电子束曝光方法
公开(公告)号：US06509127B1
公开(公告)日：2003-01-21
申请号：US09670540
申请日：2000-09-27
申请人： Hiroshi Yamashita
发明人： Hiroshi Yamashita
IPC分类号： G03C500
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/20 , H01J37/3174 , H01J2237/31769 , H01J2237/31791 , Y10S430/143
摘要： A scattering-angle limiting type electron-beam exposure method in which a mask having a scattering region is used, and a limiting aperture is set to control the amount of electrons scattered by the mask that pass through the limiting aperture, whereby a scattering contrast is formed from differences in the scattering angles of electrons. By changing the thickness of the scattering region of the mask according to the pattern density, the scattering angles of the scattered electrons are controlled and the amount of the scattered electrons that pass through the limiting aperture is adjusted.
摘要翻译：使用具有散射区域的掩模的散射角限制型电子束曝光方法，并且设定限制孔径以控制通过限制孔径的掩模散射的电子的量，由此散射对比度为由电子散射角的差异形成。通过根据图案密度改变掩模的散射区域的厚度，控制散射电子的散射角度，并且调节通过限制孔径的散射电子的量。

148. 发明授权

US06459385B2 Non-stop toll collection system and method 失效
标题翻译：不间断收费系统及方法
公开(公告)号：US06459385B2
公开(公告)日：2002-10-01
申请号：US09865486
申请日：2001-05-29
申请人： Hiroshi Yamashita
发明人： Hiroshi Yamashita
IPC分类号： G08G100
CPC分类号： G07B15/063 , G08G1/017
摘要： A non-stop toll collection system has a plurality of road-side radio apparatuses having mutually different radio communication regions, which transmit identification signals responsive to the installation locations thereof, a vehicle-mounted apparatus, which receives an identification signal, records a communication log for each road-side radio apparatus, in response to the identification signal, and transmits the communication log, wherein each of the plurality of road-side radio apparatuses receives the communication log and wherein, in the case in which the communication log indicates that another road-side radio apparatus and the vehicle-mounted apparatus have already communicated, the vehicle-mounted apparatus is instructed to perform billing processing.
摘要翻译：不间断收费系统具有多个具有相互不同的无线电通信区域的路侧无线电设备，其响应于其安装位置发送识别信号，接收识别信号的车载设备记录通信日志对于每个路侧无线电设备，响应于所述识别信号，并且发送所述通信日志，其中所述多个路侧无线电设备中的每一个接收所述通信日志，并且其中，在所述通信日志指示另一个路侧无线电设备和车载装置已经通信，指示车载装置执行计费处理。

149. 发明授权

US06376132B1 Mask for electron beam exposure, manufacturing method for the same, and manufacturing method for semiconductor device 失效
标题翻译：用于电子束曝光的掩模，及其制造方法以及半导体器件的制造方法
公开(公告)号：US06376132B1
公开(公告)日：2002-04-23
申请号：US09560336
申请日：2000-04-28
申请人： Hiroshi Yamashita
发明人： Hiroshi Yamashita
IPC分类号： G03F900
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/20 , G03F1/36 , H01J37/3174 , H01J2237/31771
摘要： A mask material which is the same as that of a wafer to be exposed is prepared (step Q1), and the proximity effect correction dose for mask-writing is operated. Then, a resist film of the mask material is exposed by a pattern accompanying a correction dose twice the proximity effect correction dose in mask-writing at the same accelerating voltage as in wafer-exposing (step Q2). Next, the resist film is developed to form a resist film pattern, and the mask material is etched by using the resist film pattern as a mask, whereby a mask is prepared (step Q3). Thereafter, by using this mask, the resist film on the wafer is EB-exposed without proximity effect correction (step Q4). According to the present invention, the time required for calculation processing is shortened and the calculation accuracy is improved.
摘要翻译：准备与要曝光的晶片相同的掩模材料（步骤Q1），并且操作用于掩模写入的邻近效应校正剂量。然后，在与晶片曝光相同的加速电压下，掩模材料的抗蚀剂膜通过伴随校正剂量的两倍于掩模写入的邻近效应校正剂量的图案曝光（步骤Q2）。接下来，将抗蚀剂膜显影以形成抗蚀剂膜图案，并且通过使用抗蚀剂膜图案作为掩模来蚀刻掩模材料，由此制备掩模（步骤Q3）。此后，通过使用该掩模，晶片上的抗蚀剂膜被曝光而不进行邻近效应校正（步骤Q4）。根据本发明，缩短了计算处理所需的时间，提高了计算精度。

150. 发明授权

US06181259B2 Vehicle-mounted device with sleep function for use in road-to-vehicle communication system 失效
标题翻译：具有睡眠功能的车载装置用于道路交通通信系统
公开(公告)号：US06181259B2
公开(公告)日：2001-01-30
申请号：US09518785
申请日：2000-03-03
申请人： Hiroshi Yamashita
发明人： Hiroshi Yamashita
IPC分类号： G08G100
CPC分类号： G07B15/063
摘要： There is disclosed a vehicle-mounted device with a sleep function for use in a road-to-vehicle communication system. After having indicated a switching period T1 and reception frequencies F1, F2 to a frequency switching controller, a controller stops operation of an internal counter, and enters a sleep mode until it cancels the sleep mode in response to a detected signal from a receiver. While a vehicle with the vehicle-mounted device is running outside of a communication range of a road radio unit installed at a toll gate or the like, the frequency switching controller independently performs a frequency search process on an RF module, and the controller is in the sleep mode. Therefore, the vehicle-mounted device has a relatively low power requirement.
摘要翻译：公开了一种具有用于道路对车辆通信系统中的睡眠功能的车载装置。在将切换期间T1和接收频率F1，F2指示给频率切换控制器之后，控制器停止内部计数器的操作，并且进入睡眠模式，直到其响应于来自接收器的检测信号而取消睡眠模式。具有车载装置的车辆在安装在收费站等的道路无线电单元的通信范围外运行时，频率切换控制器对RF模块独立地进行频率搜索处理，并且控制器处于睡眠模式。因此，车载装置的功率要求相对较低。

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