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131. 发明专利

FR2743088A1 未知
公开(公告)号：FR2743088A1
公开(公告)日：1997-07-04
申请号：FR9515582
申请日：1995-12-27
申请人： FRAMATOME SA
发明人： HERTZ DANIEL , BELMONTE THIERRY , MICHEL HENRI , PIERSON JEAN FRANCOIS
IPC分类号： C23C16/02 , C23C16/38 , C23C16/452 , G21C3/18 , C23C16/08 , G21C3/07 , G21C3/20
摘要： A surface preoxidation of the substrate (5) is carried out by placing the substrate in contact with an oxidant gas excited in a cold plasma, the substrate (5) being placed in the post-discharge of the plasma flow and heated to a temperature lower than 480 DEG C. At a temperature lower than 500 DEG C, metal boride is deposited on the preoxidized substrate (5). The deposition of boride is obtained by placing in contact with each other and with the substrate (5) a metal halide, a boron compound and a reducer element, in the form of gas substances. At least one of the gas substances is excited in a cold plasma. The process is particularly intended to coat the internal surface or the external surface of the lining tube of zirconium alloy with a zirconium boride layer which absorbes the neutrons.

132. 发明专利

CA2202387A1 CONFORMAL TITANIUM-BASED FILMS AND METHOD FOR THEIR PREPARATION 未知
公开(公告)号：CA2202387A1
公开(公告)日：1996-04-25
申请号：CA2202387
申请日：1995-10-10
申请人： UNIV NEW YORK STATE RES FOUND , GELEST INC
发明人： ARKLES BARRY C , KALOYEROS ALAIN E
IPC分类号： C23C16/08 , H01L21/77 , H01L27/02
摘要： Titanium and titanium nitride layers can be produced by chemical vapor deposition (CVD) processes conducted at temperatures below 475 ·C. The layers may serve as diffusion and adhesion barriers for ultra-large scale integration (ULSI) microelectronic applications. The processes use a titanium halide precursor, such as titanium tetraiodide, and hydrogen or hydrogen in combination with nitrogen, argon, or ammonia to either produce pure titanium metal films, titanium films which alloy with the underlying silicon, or titanium nitride films. The deposition of titanium metal from titanium halide and hydrogen or the deposition of titanium nitride from titanium halide with nitrogen and hydrogen is achieved with the assistance of a low energy plasma. The process allows smooth and reversible transition between deposition of films of either titanium metal or titanium nitride by introduction or elimination of nitrogen or ammonia.

133. 发明专利

DE19518927A1 Wear-resistant composite ceramic coating for sintered carbide or ceramic cutting tool inserts 未知
公开(公告)号：DE19518927A1
公开(公告)日：1996-01-25
申请号：DE19518927
申请日：1995-05-23
申请人： VALENITE INC
发明人： RUSSELL WILLIAM C
IPC分类号： B23P15/28 , B32B18/00 , C04B35/622 , C23C16/08 , C23C16/32 , C23C16/34 , C23C16/36 , C23C16/38 , C23C16/40 , C23C30/00 , C23C16/44
摘要： A process for depositing a wear-resistant composite ceramic coating on a substrate (12) consisting of at least one support selected from sintered carbide and ceramic is new. The process comprises: passing a first metal halide gas, a second metal halide gas, a volatile oxidising gas, a carrier gas and a doping agent over the substrate at a temp. of ca 700-1250 deg C and at a pressure of ca. 133 Pa (1 torr) to atmos. pressure so that a wear-resistant dual-phase composite ceramic coating is deposited on the substrate. The coating (16) comprises a dual-phase metal oxide layer of a completely dense, adhering discontinuous metal oxide phase 922). The metal halide gas is selected from aluminium halide, yttrium halide and zirconium halide. The first halide gas is passed at such a partial pressure, at such a flow rate and for such a period of substrate activity over the substrate that the continuous metal oxide phase, which contains a metal oxide from the first metal halide, is formed and is deposited on the substrate. The second metal halide gas is selected from aluminium halide, yttrium halide and zirconium halide. The second metal halide gas is different from the first and is mixed with the first. The second halide gas is passed at such a partial pressure, at such a flow rate and for such a period of substrate activity over the substrate that the discontinuous metal oxide phase, which contains a metal oxide from the second metal halide gas, is formed and is deposited on the substrate. The discontinuous metal oxide phase is dispersed within the continuous metal oxide phase in the form of a discrete second phase. The doping agent is selected from S, a S cpd., Se, a Se cpd., Te, a Te cpd., P, a P cpd., as, a As cpd., Sb, a Sb cpd., Bi and a Bi cpd.. Also claimed is the wear-resistant article produced by the above process.

134. 发明专利

DE4420287A1 未知
公开(公告)号：DE4420287A1
公开(公告)日：1995-12-14
申请号：DE4420287
申请日：1994-06-10
申请人： SEL ALCATEL AG
发明人： WEBER DIETER DR
IPC分类号： G02B6/00 , C03B37/018 , C03C13/04 , C23C16/30 , H01S3/06 , H01S3/067 , H01S3/17 , G02F1/39 , G02B1/00 , G02B6/16 , C23C16/08
摘要： The light wave conductor is made of a core material and coating material based on silicon dioxide. The core material contains trace elements to increase the refraction index together with erbium, aluminium and fluorine in the form of erbium trifluoride or aluminium trifluoride.

135. 发明专利

CA2149567A1 Coated Cutting Tool and Method of Making Same 未知
公开(公告)号：CA2149567A1
公开(公告)日：1995-12-01
申请号：CA2149567
申请日：1995-05-17
申请人： VALENITE INC
发明人： RUSSELL WILLIAM C
IPC分类号： B23P15/28 , B32B18/00 , C04B35/622 , C23C16/08 , C23C16/32 , C23C16/34 , C23C16/36 , C23C16/38 , C23C16/40 , C23C30/00
摘要： A cemented carbide or ceramic substrate has a wear-resistant composite ceramic coating comprising a doped two-phase metal oxide layer comprising a fully dense, adherent, continuous metal oxide phase and a fully dense, adherent, discontinuous metal oxide phase. The continuous metal oxide phase comprises aluminum oxide, yttrium oxide, or zirconium oxide, and the discontinuous metal oxide phase comprises a dispersed, discrete second phase of aluminum oxide, yttrium oxide, or zirconium oxide, with the continuous metal oxide phase being of a different metal oxide from that of the discontinuous metal oxide phase. The continuous metal oxide phase, and/or the discontinuous metal oxide phase, contains a dopant comprising at least one member selected from the group consisting of sulfur, selenium, tellurium, phosphorus, arsenic, antimony, and bismuth. The wear-resistant composite ceramic coating is deposited on a cemented carbide or ceramic substrate by passing a first metal halide gas, a volatile oxidizing gas, a second metal halide gas, a carrier gas, and a dopant, over the substrate at a temperature of from about 700 DEG to 1250 DEG C., and at a pressure of from about 1 torr to ambient pressure, so that the continuous and discontinuous metal oxide phases are deposited on the substrate.

136. 发明专利

DE69018307T2 未知
公开(公告)号：DE69018307T2
公开(公告)日：1995-08-03
申请号：DE69018307
申请日：1990-05-09
申请人： FUJITSU LTD
发明人： OHBA TAKAYUKI
IPC分类号： H01L21/306 , H01L21/768 , H01L21/285 , C23C16/02 , C23C16/08
摘要： A method of forming a contact in a semiconductor device involving cleaning the surface of a substrate exposed in a contact hole, formed for example through an SiO2 film on the substrate, using the reducing effect of a nitrogen hydride or nitrogen hydride derivative gas, for example N2H4 gas. Thereafter, for example, a TiN barrier may be formed by a CVD method using a mixed gas of N2H4 and TiCl4 (the surface not being exposed to air) and then a tungsten contact layer formed thereon by a CVD method using a mixed gas of N2H4 and WF6. Alternatively, a TiN layer may be formed by a CVD method on a tungsten contact layer formed by a CVD method direct on the substrate.

137. 发明专利

DE69015448D1 未知
公开(公告)号：DE69015448D1
公开(公告)日：1995-02-09
申请号：DE69015448
申请日：1990-05-23
申请人： GEN ELECTRIC
发明人： WOODRUFF DAVID WINFIELD , REDWING JOAN MARIE
IPC分类号： C23C16/06 , C23C16/08 , H01J9/14 , H01J35/10 , C23C16/14 , C23C28/02 , C23C16/02
摘要： Fine-grained and/or equiaxed tungsten and/or rhenium coatings, substantially free from columnar structure, are deposited on substrates (especially graphite) by chemical vapor deposition by directing the flow of reactant gases to the substrate with high velocity and in close proximity thereto, most often at a velocity gradient of at least about 1050 and preferably at least about 2000 cm./cm.-sec. The deposition process is preferably conducted while moving the substrate so as to coat large areas thereof. By this method, tungsten and/or rhenium-coated articles useful as X-ray targets having excellent properties under conditions of rapid temperature cycling may be produced.

138. 发明专利

AT116691T 未知
公开(公告)号：AT116691T
公开(公告)日：1995-01-15
申请号：AT90402924
申请日：1990-10-18
申请人： AIR LIQUIDE
发明人： CLAVERIE PIERRE , KIMURA MASAO , ARAI JUICHI , JALBY PIERRE
IPC分类号： C23C16/08 , C23C16/44

139. 发明专利

DE4334818A1 Process for producing high-purity, stress-free inter-fractional metal coatings or shaped articles 未知
$Process for producing high-purity, stress-free inter-fractional metal coatings or shaped articles$
公开(公告)号：DE4334818A1
公开(公告)日：1994-09-15
申请号：DE4334818
申请日：1993-10-06
申请人： SINTEC KERAMIK GMBH
发明人： FORREST DAVID , HAYMAN COLIN , GOETZ ULRICH
IPC分类号： C23C16/01 , C23C16/08 , C23C16/00
摘要： The process describes the production of high-purity, inter-fractional metal coatings on various ceramic substrate materials such as boron nitride or carbon, wherein an appropriate process procedure gives either an adherent coating or else free-standing, thin-walled shaped articles which can be separated from the mandrel after CVD coating. The significant advantage is that free-standing shaped articles which are dimensionally stable, even at high temperatures, can be produced using this technology, without complicated machining becoming necessary. The layers produced by the process are free of pores both in the case of coatings and in the case of free-standing shaped articles.

140. 发明专利

NL189819C 未知
公开(公告)号：NL189819C
公开(公告)日：1993-08-02
申请号：NL8104092
申请日：1981-09-03
申请人： APPLIED MATERIALS INC
IPC分类号： C23C16/04 , C23C16/08 , H01L21/28 , H01L21/285 , H01L21/768 , C23C16/44 , H01L21/443

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