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    • 122. 发明申请
    • METHOD FOR ACQUIRING SPECTRUM SHAPE OF A GAIN FLATTENING FILTER IN AN OPTICAL AMPLIFIER
    • 在光放大器中获取增益滤光片的光谱形状的方法
    • US20090052015A1
    • 2009-02-26
    • US12195864
    • 2008-08-21
    • Zhigang WangAihua Yu
    • Zhigang WangAihua Yu
    • H01S3/00
    • H01S3/06754H01S3/0014H01S3/1616H01S2301/04
    • A method for acquiring spectrum shape of a gain flattening filter of a doped optical fiber amplifier comprises the steps of: measuring spectrum shapes at two gain point (H, L) of the doped optical fiber with invariable fiber length respectively; and acquiring various gain spectrums of the doped optical fiber with various fiber length and various population inversion level according to an expression: ErGain(λ,x,L′)=[ErLGain(λ)+[ErHGain(λ)−ErLGain(λ)]*x]*L′, Wherein Gain(λ) refers to the spectral function of gain, x is Δ′inv/Δinv which refers to change of population inversion level, and L′ is set as proportion of doped fiber length. Gain spectrums of the doped optical fiber with various fiber length can be acquired by measuring spectrum shapes at two gain point (H, L) of the doped optical fiber in invariable fiber length and applying change rule of gain spectrum of the doped optical fiber in different population inversion level, which improves the flexibility for design of amplifier.
    • 一种用于获取掺杂光纤放大器的增益平坦滤波器的光谱形状的方法,包括以下步骤:分别测量具有不变光纤长度的掺杂光纤的两个增益点(H,L)处的光谱形状; 并且根据以下表达式获取具有各种光纤长度和各种总体反转电平的掺杂光纤的各种增益光谱:<?in-line-formula description =“In-line Formulas”end =“lead”?> ErGain(λ, x,L')= [ErLGain(lambda)+ [ErHGain(lambda)-ErLGain(lambda)] * x] * L',<?in-line-formula description =“In-line Formulas”end =“tail” ?>其中增益(lambda)是指增益的光谱函数,x是Delta'inv / Deltainv,其指的是群体反转级别的变化,L'被设置为掺杂光纤长度的比例。 通过以不变的光纤长度测量掺杂光纤的两个增益点(H,L)处的光谱形状,并将掺杂光纤的增益光谱的变化规则应用于不同的光纤中,可以获得具有各种光纤长度的掺杂光纤的增益谱 人口反演水平提高了放大器设计的灵活性。
    • 129. 发明授权
    • Flash memory cell programming method and system
    • 闪存单元编程方法和系统
    • US06894925B1
    • 2005-05-17
    • US10342585
    • 2003-01-14
    • Sheunghee ParkSameer S. HaddadChi ChangRichard M. FastowMing Sang KwanZhigang Wang
    • Sheunghee ParkSameer S. HaddadChi ChangRichard M. FastowMing Sang KwanZhigang Wang
    • G11C11/56G11C16/04H01L29/423H01L29/788
    • G11C11/5621G11C16/0416H01L29/42324H01L29/7883
    • A flash memory cell programming system and method that facilitate efficient and quick operation of a flash memory cell by providing a biasable well (e.g., substrate) is presented. The biasable well flash memory cell enables increases in electrical field strengths in a manner that eases resistance to charge penetration of a dielectric barrier (e.g., oxide) around a charge trapping region (e.g., a floating gate). The present biasable well system and method also create a self convergence point that increase control during programming operations and reduces the chances of excessive correction for over erased memory cells. The biasing can assist hard programming to store information and/or soft programming to correct the effects of over-erasing. The biasing can also reduce stress on a drain voltage pump, reduce leakage current and reduce programming durations. Some implementations also include a biasable control gate component, biasable source component and biasable drain component.
    • 提出了一种闪存单元编程系统和方法,其通过提供可偏置的阱(例如,衬底)来促进闪存单元的有效和快速的操作。 可偏置阱快闪存储器单元能够以减轻电荷俘获区域(例如浮栅)周围的电介质势垒(例如氧化物)的电荷穿透的方式增加电场强度。 本发明的偏压井系统和方法还创建了一个自会聚点,从而在编程操作期间增加了控制,并降低了对擦除过的存储器单元过度校正的可能性。 偏置可以帮助硬编程来存储信息和/或软编程以校正过度擦除的影响。 偏置还可以减少漏极电压泵上的应力,减少泄漏电流并减少编程持续时间。 一些实施方案还包括可偏置控制栅极分量,可偏置源分量和可偏置漏极分量。
    • 130. 发明授权
    • Test structure for measuring effect of trench isolation on oxide in a memory device
    • 沟槽隔离对存储器件中氧化物的影响的测试结构
    • US06859748B1
    • 2005-02-22
    • US10190420
    • 2002-07-03
    • Nian YangZhigang WangTien-Chun Yang
    • Nian YangZhigang WangTien-Chun Yang
    • H01L23/544G01R27/29G01S31/00
    • H01L22/34
    • An apparatus for measuring effects of isolation processes (280) on an oxide layer (286) in a memory device (255) is described. In one embodiment, the apparatus comprises a structure (110) comprised of an array (110c) of memory devices (255). A testing unit (120) is coupled with the structure (110). The testing unit (120) is for performing various electrical tests on the array (110c) of memory devices (255). The testing unit (120) is also for providing data regarding each memory device (255) in the array (110c) of memory devices (255). An analyzer (120) is coupled with the structure (110) for analyzing results of the various electrical tests. This determines the condition of the oxide layer (286) of each memory device (255) in the array of memory devices (110c).
    • 描述了用于测量隔离过程(280)对存储器件(255)中的氧化物层(286)的影响的装置。 在一个实施例中,该装置包括由存储器件(255)的阵列(110c)组成的结构(110)。 测试单元(120)与结构(110)耦合。 测试单元(120)用于在存储器件(255)的阵列(110c)上执行各种电测试。 测试单元(120)还用于提供关于存储器件(255)的阵列(110c)中的每个存储器件(255)的数据。 分析器(120)与结构(110)耦合,用于分析各种电气测试的结果。 这决定了存储器件阵列(110c)中每个存储器件(255)的氧化物层(286)的状态。