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    • 117. 发明公开
    • METHOD FOR CONTROLLING THE SYNTHESIS OF A BLOCK COPOLYMER CONTAINING AT LEAST ONE NONPOLAR BLOCK AND AT LEAST ONE POLAR BLOCK AND USE OF SAID BLOCK COPOLYMER IN APPLICATIONS OF NANOLITHOGRAPHY BY DIRECT SELF-ASSEMBLY
    • 嵌段共聚物含有控制程序合成weningstens极性和非极性嵌段和用法NANO LITHOGRAPHIE DURH自行安排
    • EP3034533A1
    • 2016-06-22
    • EP15200181.4
    • 2015-12-15
    • ARKEMA FRANCE
    • NAVARRO, ChristopheNICOLET, CeliaCHEVALIER, Xavier
    • C08F297/02G03F7/00C09D153/00
    • A method for controlling the synthesis of a block copolymer containing at least two blocks, with at least one nonpolar block and at least one polar block, said method making it possible in particular to control the ratio between the blocks and the molecular weight of each of the blocks, said copolymer being a block copolymer intended to be used as a mask in a method of nanolithography by direct self-assembly (DSA), said control being achieved by semicontinuous anionic polymerization in an aprotic nonpolar medium and comprising the following steps:
      - synthesizing a first nonpolar block in the form of a macro-initiator,
      - preparing a solution of said macro-initiator previously synthesized by mixing it with an alkali metal alcoholate in an aprotic nonpolar solvent,
      - preparing a solution of a polar monomer in an aprotic nonpolar solvent,
      - injecting the two solutions previously prepared of macro-initiator and of polar monomer into a micro-mixer, connected to a polymerization reactor, at a constant flow ratio,
      - recovering the copolymer obtained.
    • 一种用于控制包含至少两个嵌段的嵌段共聚物的合成中,与至少一个非极性嵌段和至少一种极性块的方法,所述方法使得能够在特定的控制块和每一个的分子量之间的比率 的块,所述共聚物为旨在被用作通过直接自组装(DSA)纳米光刻的方法的掩模的嵌段共聚物,所述控制装置通过半连续阴离子聚合在非质子非极性介质和包括以下步骤实现: - 在一个大分子引发剂的形式合成的第一非极性块, - 制备由超过碱金属醇化物在非质子非极性溶剂混合,预先合成的所述宏引发剂的溶液中 - 制备极性单体在非质子的溶液 非极性溶剂, - 注入两种溶液预先制备极性单体的大分子引发剂的和成微混合器,连接于聚合反应器中,在一个 恒定的流量比, - 回收得到的共聚物。