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101. 发明授权

US08724961B2 Terminal device, method for controlling terminal device, and recording medium 有权
标题翻译：终端装置，终端装置的控制方法以及记录介质
公开(公告)号：US08724961B2
公开(公告)日：2014-05-13
申请号：US12759870
申请日：2010-04-14
申请人： Kazuhiko Maeda
发明人： Kazuhiko Maeda
IPC分类号： H04N9/80
CPC分类号： G11B27/105 , G11B27/034 , G11B27/34 , G11B2220/215 , G11B2220/2541 , H04N21/4147 , H04N21/4826
摘要： A terminal device, upon each receiving of an operation regarding a viewing of a content from a user, stores history information indicating the history thereof. Then upon receiving an instruction for writing a content onto an external recording medium, the terminal device creates preference information based on the history information having been collected therein. The terminal device then writes the content specified by the writing instruction and the created preference information onto the external recording medium.
摘要翻译：终端设备每当接收到关于从用户观看内容的操作时，存储指示其历史的历史信息。然后，当接收到用于将内容写入外部记录介质的指令时，终端设备基于其中收集的历史信息来创建偏好信息。然后，终端设备将由写入指令指定的内容和创建的偏好信息写入外部记录介质。

102. 发明授权

US08686098B2 Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method 有权
标题翻译：含氟化合物，含氟高分子化合物，抗蚀剂组合物，面漆组合物和图案形成方法
公开(公告)号：US08686098B2
公开(公告)日：2014-04-01
申请号：US13375026
申请日：2010-05-20
申请人： Kazunori Mori , Yuji Hagiwara , Masashi Nagamori , Yoshimi Isono , Satoru Narizuka , Kazuhiko Maeda
发明人： Kazunori Mori , Yuji Hagiwara , Masashi Nagamori , Yoshimi Isono , Satoru Narizuka , Kazuhiko Maeda
IPC分类号： C08F12/20 , C08F216/12 , C07C69/34 , G03F7/004 , G03F7/40
CPC分类号： C07C69/653 , C07C69/675 , C07C69/732 , C07C2602/42 , C07C2603/68 , C08F220/24 , C08F220/30 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R8 represents a substituted or unsubstituted alkyl group or the like; and W1 represents a single bond, a substituted or unsubstituted methylene group or the like.
摘要翻译：本发明的含氟聚合物含有通式（2）的重复单元（a），其质均分子量为1,000〜1,000,000。该聚合物适用于通过300nm或更小波长或电子束辐射的高能量射线辐射或用于液浸光刻的面漆组合物的图案形成用抗蚀剂组合物，其特征在于具有高的拒水性，特别是高后退接触角。在该式中，R 1表示含有可聚合双键的基团; R2表示氟原子或含氟烷基; R8表示取代或未取代的烷基等; W1表示单键，取代或未取代的亚甲基等。

103. 发明授权

US08663897B2 Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same 有权
标题翻译：含有可聚合阴离子的含氟磺酸盐及其制造方法，含氟树脂，抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US08663897B2
公开(公告)日：2014-03-04
申请号：US13121315
申请日：2009-10-08
申请人： Takashi Masubuchi , Kazunori Mori , Yuji Hagiwara , Satoru Narizuka , Kazuhiko Maeda
发明人： Takashi Masubuchi , Kazunori Mori , Yuji Hagiwara , Satoru Narizuka , Kazuhiko Maeda
IPC分类号： G03F7/004 , G03F7/30 , C07C303/32 , C07C309/20 , C08F220/24 , G03F7/039
CPC分类号： C07C303/32 , C07C309/12 , C07C309/20 , C07C381/12 , C08F220/24 , C08F220/38 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041 , G03F7/30 , Y10S430/108 , Y10S430/111 , C08F220/28
摘要： According to the present invention, there is provided a polymerizable fluorine-containing sulfonic acid onium salt of the following general formula (2) and a resin obtained by polymerization thereof. It is possible by the use of this sulfonate resin of the present invention to provide a resist composition with high resolution, board depth of focus tolerance (DOF), small line edge roughness (LER) and high sensitivity. In the formula, Z represents a substituted or unsubstituted C1-C6 straight or branched alkylene group, or a divalent moiety in which substituted or unsubstituted C1-C6 straight or branched alkylene groups are bonded in series to a divalent group obtained by elimination of two hydrogen atoms from an alicyclic or aromatic hydrocarbon; R represents a hydrogen atom, a halogen atom, or a C1-C3 alkyl or fluorine-containing alkyl group; and Q+ represents a sulfonium cation or an iodonium cation.
摘要翻译：根据本发明，提供了以下通式（2）的可聚合的含氟磺酸鎓盐和通过其聚合获得的树脂。通过使用本发明的磺酸树脂可以提供具有高分辨率，板聚焦偏差（DOF），小线边缘粗糙度（LER）和高灵敏度的抗蚀剂组合物。在该式中，Z表示取代或未取代的C1-C6直链或支链亚烷基或其中取代或未取代的C1-C6直链或支链亚烷基与通过除去两个氢而获得的二价基团串联结合的二价部分来自脂环族或芳族烃的原子; R表示氢原子，卤素原子或C1-C3烷基或含氟烷基; Q +表示锍阳离子或碘鎓阳离子。

104. 发明申请

US20130345362A1 ACRYLIC RUBBER GRAFT COPOLYMER AND THERMOPLASTIC RESIN COMPOSITION 有权
标题翻译：丙烯酸橡胶共聚物和热塑性树脂组合物
公开(公告)号：US20130345362A1
公开(公告)日：2013-12-26
申请号：US14003153
申请日：2012-03-23
申请人： Kazuhiko Maeda , Takahiro Nakamura , Hironori Matsuyama
发明人： Kazuhiko Maeda , Takahiro Nakamura , Hironori Matsuyama
IPC分类号： C08F265/04 , C08L51/04
CPC分类号： C08F265/04 , C08L51/003 , C08L51/04 , C08L2205/02 , C08F212/08 , C08F220/44
摘要： [Object] To provide acrylic rubber graft copolymers capable of giving thermoplastic resin compositions exhibiting excellent impact resistance, rigidity and appearance, and to provide thermoplastic resin compositions including the acrylic rubber graft copolymers.[Solution] An acrylic rubber graft copolymer is obtained by graft polymerizing a vinyl monomer in the presence of a rubbery polymer including acrylate ester monomer units and polyfunctional monomer units, wherein the total amount of the polyfunctional monomer units in the rubbery polymer is 0.3 to 3 parts by mass with respect to 100 parts by mass of the acrylate ester monomer units, and the polyfunctional monomer units include 30 to 95 mass % of polyfunctional monomer units having two unsaturated bonds and 5 to 70 mass % of polyfunctional monomer units having three unsaturated bonds with respect to 100 mass % of the total of the polyfunctional monomer units. A thermoplastic resin composition includes the acrylic rubber graft copolymer.
摘要翻译：提供能够提供耐冲击性，刚性和外观优异的热塑性树脂组合物的丙烯酸橡胶接枝共聚物，以及提供包含丙烯酸橡胶接枝共聚物的热塑性树脂组合物。 [溶液]丙烯酸橡胶接枝共聚物通过在包含丙烯酸酯单体单元和多官能单体单元的橡胶状聚合物存在下将乙烯基单体接枝聚合而获得，其中橡胶状聚合物中多官能单体单元的总量为0.3〜3 相对于100质量份丙烯酸酯单体单元为质量份，多官能单体单元包含30〜95质量％的具有2个不饱和键的多官能单体单元和5〜70质量％的具有3个不饱和键的多官能单体单元相对于多官能单体单元的100质量％。热塑性树脂组合物包括丙烯酸橡胶接枝共聚物。

105. 发明申请

US20130010154A1 IMAGE MANAGEMENT DEVICE, IMAGE MANAGEMENT METHOD, PROGRAM, RECORDING MEDIUM, AND INTEGRATED CIRCUIT 有权
标题翻译：图像管理设备，图像管理方法，程序，记录介质和集成电路
公开(公告)号：US20130010154A1
公开(公告)日：2013-01-10
申请号：US13636810
申请日：2011-11-16
申请人： Kazuhiko Maeda
发明人： Kazuhiko Maeda
IPC分类号： G06K9/46 , H04N5/225
CPC分类号： G06F17/30259
摘要： An image management device clusters acquired images (S201) and generates blocks by grouping the images (S202). Next, the image management device calculates an intra-block importance degree of each cluster in each generated block (S204), calculates cluster importance degrees by accumulating the calculated intra-block importance degrees of each cluster (S205), and calculates an image importance degree based on the calculated cluster importance degrees (S206).
摘要翻译：图像管理装置对所获取的图像进行聚类（S201），并通过对图像进行分组来生成块（S202）。接下来，图像管理装置计算每个生成块中的每个簇的块内重要度（S204），通过累积所计算的每个簇的块内重要度来计算聚类重要度（S205），并计算图像重要度基于所计算的聚类重要度（S206）。

106. 发明授权

US08283106B2 Sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent 有权
标题翻译：磺酸盐及其衍生物，光酸发生剂，以及使用光致酸发生剂的抗蚀剂材料和图案形成方法
公开(公告)号：US08283106B2
公开(公告)日：2012-10-09
申请号：US12740780
申请日：2008-10-31
申请人： Kazuhiko Maeda , Yoshimi Isono , Satoru Narizuka
发明人： Kazuhiko Maeda , Yoshimi Isono , Satoru Narizuka
IPC分类号： G03F7/004 , G03F7/30 , C07C271/24 , C07C309/15
CPC分类号： C07C309/59 , C07C309/12 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D207/46 , C09D133/14 , C09D133/16 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： Disclosed is a fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound having a structure represented by the following general formula (A). In the formula, n indicates an integer of 1 to 10; R indicates a substituted or unsubstituted C1-C20 linear, branched or cyclic alkyl group, a substituted or unsubstituted C1-C20 linear, branched or cyclic alkenyl group, a substituted or unsubstituted C6-C15 aryl group, or a C4-C15 heteroaryl group; and a indicates 1 or 0. A photoacid generator containing the above fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound shows high sensitivity to an ArF excimer laser or the like, presents no concerns about human body accumulation, can generate an acid (photoacid) of sufficiently high acidity, and exhibits high solubility in a resist solvent and good compatibility with a resist resin.
摘要翻译：公开了具有由以下通式（A）表示的结构的氟化磺酸盐或含氟磺酸基化合物。在该式中，n表示1〜10的整数， R表示取代或未取代的C1-C20直链，支链或环状烷基，取代或未取代的C1-C20直链，支链或环状烯基，取代或未取代的C6-C15芳基或C4-C15杂芳基; a表示1或0.含有上述含氟磺酸盐或含氟磺酸基的化合物的光酸产生剂对ArF准分子激光等具有高灵敏度，不关于人体积累，可产生酸（光酸），并且在抗蚀剂溶剂中表现出高溶解性和与抗蚀剂树脂的良好相容性。

107. 发明申请

US20120002881A1 IMAGE MANAGEMENT DEVICE, IMAGE MANAGEMENT METHOD, PROGRAM, RECORDING MEDIUM, AND INTEGRATED CIRCUIT 审中-公开
标题翻译：图像管理设备，图像管理方法，程序，记录介质和集成电路
公开(公告)号：US20120002881A1
公开(公告)日：2012-01-05
申请号：US13256505
申请日：2011-01-13
申请人： Kazuhiko Maeda
发明人： Kazuhiko Maeda
IPC分类号： G06K9/46
CPC分类号： G06K9/00677
摘要： An image management device acquires an image group with an image acquisition unit, extracts objects and feature amounts from each image in the image group with an object detection unit, and sorts the objects into relevant clusters with an object sorting unit. Next, a similarity calculation unit calculates a similarity between the feature amounts of each object and each relevant cluster, a co-occurrence information generation unit finds co-occurrence information for each cluster, and then an accuracy calculation unit and an evaluation value calculation unit find an evaluation value for each object with respect to each cluster from the similarity and co-occurrence information. An object priority evaluation unit evaluates the object priority of each object with the evaluation value, and an image priority evaluation unit evaluates the priority of each image from the object priority.
摘要翻译：图像管理装置利用图像获取单元获取图像组，利用对象检测单元从图像组中的每个图像提取对象和特征量，并且利用对象分类单元将对象分类为相关群集。接下来，相似度计算单元计算每个对象的特征量与每个相关群集之间的相似度，共生信息生成单元查找每个群集的同现信息，然后精确度计算单元和评估值计算单元查找根据相似性和同现信息，针对每个聚类的每个对象的评估值。对象优先级评估单元用评估值来评估每个对象的对象优先级，并且图像优先级评估单元从对象优先级评估每个图像的优先级。

108. 发明申请

US20110318542A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same 有权
标题翻译：含氟化合物，含氟聚合物化合物，抗蚀剂组合物和使用其的图案化方法
公开(公告)号：US20110318542A1
公开(公告)日：2011-12-29
申请号：US13141945
申请日：2009-12-15
申请人： Kazunori Mori , Yuji Hagiwara , Yoshimi Isono , Satoru Narizuka , Kazuhiko Maeda
发明人： Kazunori Mori , Yuji Hagiwara , Yoshimi Isono , Satoru Narizuka , Kazuhiko Maeda
IPC分类号： B32B3/00 , G03F7/20 , G03F7/004 , C07C229/30 , C08F220/22
CPC分类号： C07C235/08 , C07C235/06 , C08F20/22 , C08F220/36 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/2041 , Y10T428/24802 , C08F220/28
摘要： There is disclosed a fluorine-containing polymer compound comprising a repeating unit (a) of the following general formula (2) and having a weight-average molecular weight of 1000 to 1000000 where R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R3 represents a hydrogen atom, an acid labile group, a cross-linking site or the other monovalent organic group; and W1 represents a linking moiety.When the fluorine-containing polymer compound is used in a resist compound for pattern formation by high energy radiation of 300 nm or less wavelength or electron beam radiation, it is possible to form a resist pattern with a good rectangular profile.
摘要翻译：公开了含有下述通式（2）的重复单元（a），重均分子量为1000〜1000000的含氟高分子化合物，其中R1表示可聚合双键的基团; R2表示氟原子或含氟烷基; R3表示氢原子，酸不稳定基团，交联位点或其它单价有机基团; 而W1表示连接部分。当通过300nm或更小的波长或电子束辐射的高能量辐射将含氟聚合物化合物用于形成图案的抗蚀剂化合物时，可以形成具有良好矩形轮廓的抗蚀剂图案。

109. 发明申请

US20110214685A1 Cleaning Agent For Silicon Wafer 有权
标题翻译：硅晶片清洗剂
公开(公告)号：US20110214685A1
公开(公告)日：2011-09-08
申请号：US12898185
申请日：2010-10-05
申请人： Soichi KUMON , Takashi Saio , Shinobu Arata , Hidehisa Nanai , Yoshinori Akamatsu , Shigeo Hamaguchi , Kazuhiko Maeda
发明人： Soichi KUMON , Takashi Saio , Shinobu Arata , Hidehisa Nanai , Yoshinori Akamatsu , Shigeo Hamaguchi , Kazuhiko Maeda
IPC分类号： B08B3/00 , C11D3/20
CPC分类号： H01L21/02052 , B08B3/00 , C09D183/04 , C11D3/162 , C11D7/5022 , H01L21/00 , H01L21/02054
摘要： A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved.
摘要翻译：一种用于硅晶片（第一清洁剂）的清洁剂至少含有一种水基清洗液和一种防水清洗液，用于在清洁过程中至少提供具有防水性的凹凸图案的凹陷部分。水性清洗液是将具有与硅晶片中的Si元素和疏水性基团化学结合的反应性部分的防水化合物和至少含有醇溶剂的有机溶剂混合并包含的液体。利用该清洁剂，可以提高倾向于引起图案塌陷的清洁处理。

110. 发明授权

US07703303B2 Magnetic disk glass substrate manufacturing method 失效
标题翻译：磁盘玻璃基板的制造方法
公开(公告)号：US07703303B2
公开(公告)日：2010-04-27
申请号：US11078324
申请日：2005-03-14
申请人： Hideki Isono , Shinji Eda , Kazuhiko Maeda , Naohiro Kamiya , Nobuyuki Eto
发明人： Hideki Isono , Shinji Eda , Kazuhiko Maeda , Naohiro Kamiya , Nobuyuki Eto
IPC分类号： C03C21/00
CPC分类号： C03C3/083 , C03C19/00 , C03C21/002
摘要： A magnetic disk glass substrate manufacturing method includes a step of polishing a surface of a glass substrate to a mirror surface, a gas heating process step of causing a heated atmosphere and the glass substrate to contact each other so as to heat the glass substrate at a temperature T0, a step of causing a chemically strengthening salt melted exceeding a freezing temperature TF and the glass substrate to contact each other so as to chemically strengthen the glass substrate at a temperature T1, a gas cooling process step of causing a gas coolant and the glass substrate to contact each other so as to cool the glass substrate to a temperature T2, and a liquid cooling process step of causing a liquid coolant and the glass substrate to contact each other so as to cool the glass substrate to a temperature T3, the above-mentioned steps being included in this order, wherein the temperature T2 is set to a temperature less than the freezing temperature TF of the chemical strengthening salt in a gas cooling process.
摘要翻译：磁盘玻璃基板的制造方法包括将玻璃基板的表面研磨成镜面的工序，使加热气氛与玻璃基板接触的气体加热工序，以将玻璃基板加热到温度T0，使化学强化盐熔化超过冷冻温度TF的步骤和玻璃基板彼此接触，以便在温度T1下化学强化玻璃基板;气体冷却工艺步骤，使气体冷却剂和玻璃基板彼此接触以将玻璃基板冷却至温度T2;以及液体冷却步骤，使液体冷却剂和玻璃基板彼此接触，以将玻璃基板冷却至温度T3，上述步骤按照该顺序包括，其中将温度T2设定为低于化学强化盐的冷冻温度TF的温度在气体冷却过程中。

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