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101. 发明申请

US20060106160A1 Planarization films for advanced microelectronic applications and devices and methods of production thereof 有权
标题翻译：用于先进微电子应用的平面化膜及其制造方法
公开(公告)号：US20060106160A1
公开(公告)日：2006-05-18
申请号：US10518201
申请日：2003-10-27
申请人： Wei Huang , Joseph Kennedy , Ronald Katsanes
发明人： Wei Huang , Joseph Kennedy , Ronald Katsanes
IPC分类号： C04B26/12
CPC分类号： H01L21/02118 , C04B26/12 , C04B2111/00482 , C08J7/02 , C08J2361/00 , C23F1/10 , C23F1/44 , C23F3/00 , C23F3/04 , H01L21/31051 , H01L21/312 , Y10T428/31942 , C04B2103/0093 , C04B2103/40
摘要： A planarization composition is disclosed herein that comprises: a) a structural constituent; and b) a solvent system, wherein the solvent system is compatible with the structural constituent and lowers the lowers at least one of the intermolecular forces or surface forces components of the planarization composition. A film that includes this planarization composition is also disclosed. In addition, another planarization composition is disclosed herein that comprises: a) a cresol-based polymer compound; and b) a solvent system comprising at least one alcohol and at least one ether acetate-based solvent. A film that includes this planarization composition is also disclosed. A layered component is also disclosed herein that comprises: a) a substrate having a surface topography; and b) a planarization composition or a film such as those described herein, wherein the composition is coupled to the substrate. Methods of forming a planarization compositions are also disclosed herein that comprise: a) providing a structural constituent; b) providing a solvent system, wherein the solvent system is compatible with the structural constituent and lowers at least one of the intermolecular forces or surface forces components of the planarization composition; and c) blending the structural constituent and the solvent system to form a planarization composition. Methods of forming a film are also disclosed that comprise: a) providing a planarization composition such as those disclosed herein; and b) evaporating at least part of the solvent system to form a film.
摘要翻译：本文公开了一种平面化组合物，其包括：a）结构成分; 和b）溶剂体系，其中所述溶剂体系与所述结构组分相容并降低所述平坦化组合物的至少一种分子间力或表面力组分。还公开了包含该平坦化组合物的膜。此外，本文公开了另外的平坦化组合物，其包括：a）甲酚基聚合物化合物; 和b）包含至少一种醇和至少一种乙酸乙烯酯类溶剂的溶剂体系。还公开了包含该平坦化组合物的膜。本文还公开了一种分层组件，其包括：a）具有表面形貌的衬底; 和b）平面化组合物或诸如本文所述的那些的膜，其中所述组合物与所述基材偶联。本文还公开了形成平坦化组合物的方法，其包括：a）提供结构成分; b）提供溶剂系统，其中所述溶剂体系与所述结构组分相容并降低所述平坦化组合物的分子间力或表面力组分中的至少一种; 和c）混合结构成分和溶剂体系以形成平坦化组合物。还公开了形成膜的方法，其包括：a）提供诸如本文公开的那些的平坦化组合物; 和b）蒸发至少部分溶剂系统以形成膜。

102. 发明申请

US20050272894A1 Novel hybrid polyurethanes 有权
标题翻译：新型混合聚氨酯
公开(公告)号：US20050272894A1
公开(公告)日：2005-12-08
申请号：US10858710
申请日：2004-06-02
申请人： Joseph Kennedy , Ralf Peetz
发明人： Joseph Kennedy , Ralf Peetz
IPC分类号： C08G77/04
CPC分类号： C08G77/458 , C07F7/21 , C08G77/045
摘要： Cyclosiloxane-multiol compositions, multicomponent polyurethane networks, and related methods are disclosed.
摘要翻译：公开了环硅氧烷 - 多元醇组合物，多组分聚氨酯网络和相关方法。

103. 发明授权

US06969753B2 Spin-on-glass anti-reflective coatings for photolithography 有权
标题翻译：旋光玻璃防反射涂层，用于光刻
公开(公告)号：US06969753B2
公开(公告)日：2005-11-29
申请号：US10300357
申请日：2002-11-19
申请人： Teresa Baldwin , Joseph Kennedy , Nigel Hacker , Richard Spear
发明人： Teresa Baldwin , Joseph Kennedy , Nigel Hacker , Richard Spear
IPC分类号： G03F7/004 , C03C17/00 , C03C17/30 , C07F7/18 , C08K5/00 , C09D7/12 , C09D183/04 , C09D183/06 , C09D183/08 , G03C1/492 , G03F7/075 , G03F7/09 , G03F7/11 , H01L21/027 , C08G77/12
CPC分类号： G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/0752 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
摘要翻译：用于深紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的一种或多种有机光吸收化合物。合适的吸收化合物在可用于光刻的诸如365nm，248nm和193nm的波长附近的波长范围上是强吸收的。制造吸收旋涂玻璃材料的方法包括在旋涂玻璃材料的合成期间将一种或多种有机吸收化合物与烷氧基硅烷或卤代硅烷反应物组合。

104. 发明申请

US20050238889A1 Layered components, materials, methods of production and uses thereof 审中-公开
标题翻译：分层的部件，材料，生产方法及其用途
公开(公告)号：US20050238889A1
公开(公告)日：2005-10-27
申请号：US10875050
申请日：2004-06-22
申请人： Nancy Iwamoto , Joseph Kennedy , Eal Lee
发明人： Nancy Iwamoto , Joseph Kennedy , Eal Lee
IPC分类号： B32B3/26 , B32B9/04 , C07C13/28 , H01L21/31 , H01L21/316 , H01L21/768 , H05K1/03 , H05K1/16 , H05K3/00
CPC分类号： H01L21/02203 , H01L21/02118 , H01L21/02126 , H01L21/02205 , H01L21/0228 , H01L21/02362 , H01L21/31695 , H01L21/7682 , H01L21/76841 , H01L2221/1047 , H05K1/036 , H05K1/162 , H05K3/0011 , H05K2201/0116 , H05K2203/1147 , Y10T428/249953 , Y10T428/31663
摘要： A layered component is described herein that includes: a substrate; a dielectric material having a plurality of pores, wherein the material is coupled to the substrate; and a self-assembled diffusion blocking material coupled to the dielectric material, wherein the diffusion blocking material is attracted to the dielectric material. A layered component is also described herein that includes: a substrate; a dielectric material having a plurality of pores, wherein the material is coupled to the substrate; and a self-assembled diffusion blocking material coupled to the dielectric material, wherein the diffusion blocking material reacts with the dielectric material. A layered material is described that includes: a) a porous material comprising a porous surface; and b) a layer of blocking material comprising reactive functionalities coupled to the porous surface, wherein the interaction of the reactive functionalities with the porous material forms a diffusion blocking layer. Methods are also described of minimizing the diffusion of metal atoms, reactive etchants or CVD/ALD precursor materials into a material having a plurality of pores are disclosed herein that include: a) providing a precursor material that comprises a carbon-including material; b) providing a solvent carrier solution; c) combining the precursor material and the solvent carrier solution to form a diffusion blocking reactive solution; and d) applying the diffusion blocking reactive solution to the material having a plurality of pores to form a diffusion blocking material.
摘要翻译：本文描述了一种分层组件，其包括：基底; 具有多个孔的介电材料，其中所述材料耦合到所述基底; 以及耦合到电介质材料的自组装扩散阻挡材料，其中扩散阻挡材料被吸引到电介质材料。本文还描述了分层组件，其包括：基底; 具有多个孔的介电材料，其中所述材料耦合到所述基底; 以及耦合到所述介电材料的自组装扩散阻挡材料，其中所述扩散阻挡材料与所述电介质材料反应。描述了层状材料，其包括：a）包含多孔表面的多孔材料; 和b）包含耦合到多孔表面的反应性官能团的阻挡材料层，其中反应性官能团与多孔材料的相互作用形成扩散阻挡层。还描述了使金属原子，反应性蚀刻剂或CVD / ALD前体材料扩散到具有多个孔的材料中的扩散的方法，其包括：a）提供包含含碳材料的前体材料; b）提供溶剂载体溶液; c）将前体材料和溶剂载体溶液组合以形成扩散阻断反应溶液; 以及d）将扩散阻挡反应性溶液施加到具有多个孔的材料上以形成扩散阻挡材料。

105. 发明申请

US20050100018A1 Tag-based commands for controlling a set of receivers 审中-公开
标题翻译：用于控制一组接收器的基于标签的命令
公开(公告)号：US20050100018A1
公开(公告)日：2005-05-12
申请号：US10702703
申请日：2003-11-06
申请人： Joseph Kennedy , David Placek
发明人： Joseph Kennedy , David Placek
IPC分类号： H04L12/18 , H04L12/24 , H04L12/56
CPC分类号： H04L12/18
摘要： This invention is a system and method for controlling a set of receivers in a distributed network. The system uses a tag-based syntax that defines the devices in the receivers and the corresponding commands for the respective devices. The tag is a combination of device and command constructs which is unique to each one of the receiver's parameters. The parameters can be logically grouped in a command stream using the device values. Members in the group are represented by the command values. The standardized syntax allows multiple parameters to be controlled with a single autonomous variable length command and also allows the receivers to operate on the command stream with a standardized set of parser routines.
摘要翻译：本发明是用于控制分布式网络中的一组接收机的系统和方法。系统使用基于标签的语法来定义接收器中的设备和相应设备的相应命令。标签是设备和命令结构的组合，对于接收机的每个参数都是唯一的。参数可以使用设备值在逻辑上分组在命令流中。组中的成员由命令值表示。标准化语法允许使用单个自主变长命令来控制多个参数，并且还允许接收器使用标准化的解析器例程集合对命令流进行操作。

106. 发明申请

US20050093854A1 System for synchronizing display of images in a multi-display computer system 失效
标题翻译：用于在多显示器计算机系统中同步显示图像的系统
公开(公告)号：US20050093854A1
公开(公告)日：2005-05-05
申请号：US10695779
申请日：2003-10-30
申请人： Joseph Kennedy , John Klenoski , Greg Sadowski
发明人： Joseph Kennedy , John Klenoski , Greg Sadowski
IPC分类号： G06F3/14 , G09G3/20 , G09G5/00 , G09G5/12
CPC分类号： G09G3/2096 , G06F3/1423 , G09G5/008 , G09G5/12 , G09G2360/02
摘要： An image display system synchronizes the display of images on a plurality of display devices. The system includes a first computer system generating a first signal representing first image data to be displayed on a first display device, a second computer system generating a second signal representing second image data to be displayed on a second display device, and means for synchronizing the first and second image data. The synchronizing means includes a phase-locked loop circuit having a digital rate controller. The digital rate controller allows programmable control of the speed of the phase-locked loop.
摘要翻译：图像显示系统使多个显示装置上的图像的显示同步。该系统包括：第一计算机系统，生成表示要显示在第一显示装置上的第一图像数据的第一信号;第二计算机系统，生成表示要显示在第二显示装置上的第二图像数据的第二信号;以及装置，第一和第二图像数据。同步装置包括具有数字速率控制器的锁相环电路。数字速率控制器允许可编程控制锁相环的速度。

107. 发明申请

US20050042860A1 Method for eliminating reaction between photoresist and OSG 审中-公开
标题翻译：消除光刻胶与OSG反应的方法
公开(公告)号：US20050042860A1
公开(公告)日：2005-02-24
申请号：US10949142
申请日：2004-09-24
申请人： Brian Daniels , Jude Dunne , Joseph Kennedy
发明人： Brian Daniels , Jude Dunne , Joseph Kennedy
IPC分类号： H01L21/768 , H01L23/532 , H01L21/4763
CPC分类号： H01L21/76831 , H01L21/76807 , H01L21/76808 , H01L21/76811 , H01L21/76813 , H01L21/76825 , H01L21/76826 , H01L21/76828 , H01L21/76829 , H01L21/76835 , H01L21/76843 , H01L23/53238 , H01L23/5329 , H01L23/53295 , H01L2221/1063 , H01L2924/0002 , H01L2924/00
摘要： A method of forming a microelectronic device while preventing photoresist poisoning. Various layers of conductive metals and dielectric materials are deposited onto a substrate in selective sequence to form an integrated circuit. Vias and trenches are formed throughout the structure by exposing and patterning a photoresist material. The dielectric materials of the insulating layers are protected from the photoresist to prevent chemical reactions which lead to photoresist poisoning. This is done by forming a modified surface layer on the dielectric material by either depositing an additional layer that covers the dielectric material, or by modifying the exposed surface of the dielectric material to a plasma or chemical treatment.
摘要翻译：在防止光致抗蚀剂中毒的同时形成微电子器件的方法。各种导电金属和介电材料层以选择性顺序沉积到衬底上以形成集成电路。通过曝光和图案化光致抗蚀剂材料，在整个结构中形成通孔和沟槽。保护绝缘层的电介质材料免受光致抗蚀剂的阻碍，以防止导致光致抗蚀剂中毒的化学反应。这可以通过在电介质材料上形成修饰的表面层，方法是沉积覆盖介电材料的附加层，或通过将介电材料的暴露表面改性为等离子体或化学处理。

108. 发明申请

US20050027086A1 Polymerization of i-butene in hydrocarbon media using bis(borane) co-initiators 失效
标题翻译：使用双（硼烷）共引发剂在烃介质中聚合异丁烯
公开(公告)号：US20050027086A1
公开(公告)日：2005-02-03
申请号：US10817465
申请日：2004-04-02
申请人： Joseph Kennedy , Scott Collins , Stewart Lewis
发明人： Joseph Kennedy , Scott Collins , Stewart Lewis
IPC分类号： C08F10/10 , C08F110/10 , C08F210/12 , C08F4/52
CPC分类号： C08F10/10 , C08F110/10 , C08F210/12 , C08F4/52 , C08F2/18 , C08F4/54 , C08F4/44 , C08F2500/03 , C08F236/08
摘要： A method is provided for cationically polymerizing olefin monomer by using a novel coinitiator in the presence of water. More specifically, a method is provided for cationically polymerizing olefin monomer by using a novel coinitiator in an aqueous suspension or aqueous emulsion polymerization process.
摘要翻译：提供了一种在水存在下使用新型共引发剂使烯烃单体进行阳离子聚合的方法。更具体地，提供了一种通过在水性悬浮液或水性乳液聚合方法中使用新型共引发剂来阳离子聚合烯烃单体的方法。

109. 发明授权

US06824879B2 Spin-on-glass anti-reflective coatings for photolithography 有权
标题翻译：旋光玻璃防反射涂层，用于光刻
公开(公告)号：US06824879B2
公开(公告)日：2004-11-30
申请号：US10001143
申请日：2001-11-15
申请人： Teresa Baldwin , Joseph Kennedy , Nigel Hacker , Richard Spear
发明人： Teresa Baldwin , Joseph Kennedy , Nigel Hacker , Richard Spear
IPC分类号： C08G7718
CPC分类号： G02B5/23 , C03C17/008 , C03C17/30 , C08G77/04 , C08G77/12 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/091 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要： Anti-reflective coating materials for ultraviolet photolithography include at least one organic light-absorbing compound incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining at least one organic absorbing compound with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
摘要翻译：用于紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的至少一种有机光吸收化合物。合适的吸收化合物在可用于光刻的诸如365nm，248nm，193nm和157nm的波长周围的波长范围上是强吸收的。制造吸收旋涂玻璃材料的方法包括在旋涂玻璃材料的合成期间将至少一种有机吸收化合物与烷氧基硅烷或卤代硅烷反应物组合。

110. 发明授权

US06506497B1 Spin-on-glass anti-reflective coatings for photolithography 有权
公开(公告)号：US06506497B1
公开(公告)日：2003-01-14
申请号：US09491166
申请日：2000-01-26
申请人： Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
发明人： Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
IPC分类号： B32B904
CPC分类号： G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.

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