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101. 发明授权

US07698999B2 Printing apparatus and device manufacturing method 失效
标题翻译：印刷装置及装置的制造方法
公开(公告)号：US07698999B2
公开(公告)日：2010-04-20
申请号：US11068040
申请日：2005-03-01
申请人： Klaus Simon
发明人： Klaus Simon
IPC分类号： B41F31/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The printing apparatus, presented herein, comprises a patterning device having a curved member that supports a stamp on its surface. The curved member is adapted to roll over a substrate to be printed on to transfer the pattern onto the substrate. An illumination system directs light onto the region of the substrate that is being printed in order to set a layer of resist, which has been sprayed onto the substrate. The light is directed via a pattern that is made on the surface of the stamp, thereby transferring the pattern to the substrate.
摘要翻译：本文提供的打印装置包括具有在其表面上支撑印模的弯曲构件的图案形成装置。弯曲构件适于在待印刷的基底上滚动以将图案转印到基底上。照明系统将光引导到正被印刷的基板的区域上，以便设置已经喷涂到基板上的抗蚀剂层。光通过在印模的表面上形成的图案引导，从而将图案转印到基板上。

102. 发明授权

US07636475B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US07636475B2
公开(公告)日：2009-12-22
申请号：US11303026
申请日：2005-12-16
申请人： Klaus Simon
发明人： Klaus Simon
IPC分类号： G06K9/00 , G03B27/58 , G03B27/42
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprinting method is disclosed that, in embodiment, includes contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium and separating the first and second templates from the imprinted medium.
摘要翻译：公开了一种压印方法，在实施例中，包括分别将基板上的可压印介质的第一和第二间隔的目标区域与第一和第二模板接触，以在介质中形成相应的第一和第二印记，并将第一和第二模板与印记介质

103. 发明授权

US07507675B2 Device manufacturing method and device 有权
标题翻译：装置制造方法及装置
公开(公告)号：US07507675B2
公开(公告)日：2009-03-24
申请号：US10562212
申请日：2004-06-24
申请人： Johannes Teunis Zuilhof , Klaus Simon , Ernst Jan Robert Sudholter , Qiao-Yu Sun
发明人： Johannes Teunis Zuilhof , Klaus Simon , Ernst Jan Robert Sudholter , Qiao-Yu Sun
IPC分类号： H01L21/31
CPC分类号： G01N33/5438 , G01N27/4145 , Y10S977/809
摘要： A method for patterning a polished silicon surface is disclosed, the method including steps leading to an organic monolayer on at least a part of the silicon surface, the monolayer being functionalized in specific desired locations. The method can be used to produce a device comprising one or more FET structures, the gate of the FET being formed by the functionalized organic monolayer. The functionalized monolayer preferably contains oligosaccharides or oligopeptides which are capable of interacting with biological substance, such that the device acts as a bio-sensor.
摘要翻译：公开了一种用于图案化抛光的硅表面的方法，所述方法包括导致硅表面的至少一部分上的有机单层的步骤，所述单层在特定的所需位置被官能化。该方法可用于制造包括一个或多个FET结构的器件，FET的栅极由官能化有机单层形成。功能化单层优选含有能够与生物物质相互作用的寡糖或寡肽，使得该装置用作生物传感器。

104. 发明申请

US20070002303A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070002303A1
公开(公告)日：2007-01-04
申请号：US11170735
申请日：2005-06-30
申请人： Michael Van De Moosdijk , Klaus Simon , Wilhelmus Maria De Laat
发明人： Michael Van De Moosdijk , Klaus Simon , Wilhelmus Maria De Laat
IPC分类号： G03B27/58
CPC分类号： G03F7/707 , G03F7/70691
摘要： A lithographic apparatus includes a substrate table constructed to hold a first substrate of a first type, the first substrate having a polished surface; and a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The polished surface supports a second substrate of a second type and the projection system is configured to project the patterned radiation beam onto the second substrate.
摘要翻译：光刻设备包括：衬底台，其构造成保持第一类型的第一衬底，所述第一衬底具有抛光表面; 以及投影系统，被配置为将图案化的辐射束投影到基板的目标部分上。抛光表面支撑第二类型的第二衬底，并且投影系统被配置为将图案化的辐射束投影到第二衬底上。

105. 发明申请

US20050211161A1 Printing apparatus and device manufacturing method 失效
标题翻译：印刷装置及装置的制造方法
公开(公告)号：US20050211161A1
公开(公告)日：2005-09-29
申请号：US11068040
申请日：2005-03-01
申请人： Klaus Simon
发明人： Klaus Simon
IPC分类号： G03F7/20 , B05C1/06 , B05C1/08 , B05D3/00 , H01L21/027
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The printing apparatus, presented herein, comprises a patterning device having a curved member that supports a stamp on its surface. The curved member is adapted to roll over a substrate to be printed on to transfer the pattern onto the substrate. An illumination system directs light onto the region of the substrate that is being printed in order to set a layer of resist, which has been sprayed onto the substrate. The light is directed via a pattern that is made on the surface of the stamp, thereby transferring the pattern to the substrate.
摘要翻译：本文提供的打印装置包括具有在其表面上支撑印模的弯曲构件的图案形成装置。弯曲构件适于在待印刷的基底上滚动以将图案转印到基底上。照明系统将光引导到正被印刷的基板的区域上，以便设置已经喷涂到基板上的抗蚀剂层。光通过在印模的表面上形成的图案引导，从而将图案转印到基板上。

106. 发明申请

US20050193944A1 Printing apparatus and device manufacturing method 失效
公开(公告)号：US20050193944A1
公开(公告)日：2005-09-08
申请号：US10792267
申请日：2004-03-04
申请人： Klaus Simon
发明人： Klaus Simon
IPC分类号： G03F7/20 , B05C1/06 , B05C1/08 , B05D3/00 , H01L21/027
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The printing apparatus, presented herein, comprises a patterning device having a curved member that supports a stamp on its surface. The curved member is adapted to roll over a substrate to be printed on to transfer the pattern onto the substrate. An illumination system directs light onto the region of the substrate that is being printed in order to set a layer of resist, which has been sprayed onto the substrate. The light is directed via a pattern that is made on the surface of the stamp, thereby transferring the pattern to the substrate.

107. 发明申请

US20050168713A1 Immersion photolithography system and method using microchannel nozzles 有权
公开(公告)号：US20050168713A1
公开(公告)日：2005-08-04
申请号：US11053328
申请日：2005-02-09
申请人： Herman Vogel , Klaus Simon , Antonius Maria Derksen
发明人： Herman Vogel , Klaus Simon , Antonius Maria Derksen
IPC分类号： H01L21/00 , G03F7/20 , H01L21/02 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/20 , G03F7/70358 , G03F7/709 , H01L21/027
摘要： A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.

108. 发明授权

US06867844B2 Immersion photolithography system and method using microchannel nozzles 有权
标题翻译：浸入式光刻系统和使用微通道喷嘴的方法
公开(公告)号：US06867844B2
公开(公告)日：2005-03-15
申请号：US10464542
申请日：2003-06-19
申请人： Herman Vogel , Klaus Simon , Antonius Theodorus Anna Maria Derksen
发明人： Herman Vogel , Klaus Simon , Antonius Theodorus Anna Maria Derksen
IPC分类号： H01L21/00 , G03F7/20 , H01L21/02 , H01L21/027 , G03B27/52 , G03B27/54
CPC分类号： G03F7/70341 , G03F7/20 , G03F7/70358 , G03F7/709 , H01L21/027
摘要： A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.
摘要翻译：液浸式光刻系统包括：用电磁辐射曝光基板的曝光系统，包括将电磁辐射聚焦在基板上的投影光学系统。液体供应系统在投影光学系统和基板之间提供液体流动。可选的多个微喷嘴布置在投影光学系统的一侧的周边周围，以便在衬底被暴露的区域中提供基本均匀的液流速度分布。

109. 发明授权

US06845145B2 Method of improving x-ray lithography in the sub 100nm range to create high quality semiconductor devices 失效
标题翻译：在100nm范围内改进x射线光刻的方法，以创建高质量的半导体器件
公开(公告)号：US06845145B2
公开(公告)日：2005-01-18
申请号：US09876443
申请日：2001-06-07
申请人： Robert Allen Selzer , Franz Ludwig Rauch , Heinz Siegert , Klaus Simon , William Rudolf Friml , Joe Baker Gagnon , Robert Harrison Macklin
发明人： Robert Allen Selzer , Franz Ludwig Rauch , Heinz Siegert , Klaus Simon , William Rudolf Friml , Joe Baker Gagnon , Robert Harrison Macklin
IPC分类号： G03F7/20 , G21K5/00
CPC分类号： G03F7/70216 , G03F7/708 , G21K5/00 , Y10S430/168
摘要： The present invention is directed to the production of high quality semi-conductor devices created at speeds and in sizes that far exceed current x-ray lithography capabilities. The steps involved in the method include the use and development of horizontal beams from a synchrotron or point source of x-ray beams; preparation of submicrometer, transverse horizontal and vertical stepper stages and frames; providing a stepper base frame for the proper housing and mating of the x-ray beam; minimizing the effects of temperature and airflow control by means of a environmental chamber; transporting, handling and prealigning wafers and other similar items for tight process control; improving the control and sensing of positional accuracy through the use of differential variable reluctance transducers; controlling the continuous gap and all six degrees of freedom of the wafer being treated with a multiple variable stage control; incorporating alignment systems using unambiguous targets to provide data to align one level to the next level; beam transport, shaping or shaping devices, to include x-ray point sources; using an inline collimator or concentrator for collimating or concentrating the x-ray beams; and, imaging the mask pattern at the precise moment for optimum effectiveness.
摘要翻译：本发明涉及生产以超过当前x射线光刻能力的速度和尺寸产生的高质量半导体器件。该方法涉及的步骤包括使用和开发来自同步加速器或X射线束的点光源的水平光束; 亚微米，横向水平和垂直步进台和框架的准备; 提供用于X射线束的适当壳体和配合的步进基座; 通过环境室最小化温度和气流控制的影响; 运输，处理和预先对准晶片和其他类似物品以进行严格的过程控制; 通过使用差分可变磁阻传感器改善位置精度的控制和感测; 控制用多变量级控制处理的晶片的连续间隙和全部六个自由度; 结合使用明确目标的对准系统来提供数据以将一个级别与下一级对齐; 光束传输，成形或成形装置，以包括x射线点源; 使用在线准直器或集中器来准直或集中X射线束; 并且在精确时刻对掩模图案进行成像以获得最佳效果。

110. 发明授权

US4313615A Buckling angle control arrangement for an articulated vehicle 失效
标题翻译：铰接式车辆的弯曲角度控制装置
公开(公告)号：US4313615A
公开(公告)日：1982-02-02
申请号：US100079
申请日：1979-12-04
申请人： Klaus Simon
发明人： Klaus Simon
IPC分类号： B62D15/00 , B62D47/02 , B62D53/06
CPC分类号： B62D15/00 , B62D47/025
摘要： A buckling angle control arrangement for the articulated front and trailing members of a vehicle, including an element, such as a disk or ring, pivotable about the first axis of the articulation between the vehicle members. A pushrod pivotally interconnects the pivotable element with the steering mechanism of the vehicle in such a way that the steering mechanism and pivotable element rotate in opposite directions. Two hydraulic cylinder and piston assemblies are arranged on opposite sides of the articulation axis, each assembly being between the two vehicle members. A three-position valve, for controlling hydraulic fluid flow between the two cylinder and piston assemblies, is itself controlled by an actuating member which cooperates with two cams carried by the pivotable element.
摘要翻译：一种用于车辆的铰接的前部和后部构件的弯曲角度控制装置，包括诸如盘或环的元件，可围绕车辆构件之间的关节的第一轴线枢转。推杆枢转地将可枢转元件与车辆的转向机构互连，使得转向机构和可枢转元件沿相反的方向旋转。两个液压缸和活塞组件布置在铰接轴的相对侧上，每个组件位于两个车辆构件之间。用于控制两个气缸和活塞组件之间的液压流体流动的三位置阀本身由与由可枢转元件承载的两个凸轮配合的致动构件控制。

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