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    • 104. 发明申请
    • Control for evaporative cooling apparatus
    • 蒸发冷却装置的控制
    • US20050051914A1
    • 2005-03-10
    • US10658436
    • 2003-09-08
    • Larry GordonJon JelenBrian Lee
    • Larry GordonJon JelenBrian Lee
    • F24F1/00F24F5/00B01F3/04
    • F24F5/0035F24F1/0007F24F11/30F24F2006/146F24F2110/10Y02B30/545
    • Evaporative cooling apparatus monitors light and heavy temperature averages to minimize cycling of the apparatus on-and-off when the apparatus is being turned on in the morning when the ambient temperature is rising and is being turned off in the afternoon when the ambient temperature is falling. The apparatus is suspended above the ground and includes a hollow housing with a top portion and a bottom portion, a fan mounted in the top portion of the housing to direct air flow through the housing downwardly toward the ground, and nozzles mounted inside the housing to direct water droplets into air flowing from the fan through the housing. The apparatus also includes a hollow, tapered member which captures a portion of the air flow from the fan and directs the airflow into a central area of the housing to insure that air flowing through the central area moves downwardly toward the ground.
    • 蒸气冷却装置监测轻度和重度温度平均值,以便在环境温度升高并且当环境温度下降的下午关闭时,早上打开设备时开启和关闭设备的循环。 。 该设备悬挂在地面上方,并且包括具有顶部和底部的中空壳体,安装在壳体的顶部中的风扇,以将气流引导通过壳体向下朝向地面,以及安装在壳体内的喷嘴, 将水滴直接从风扇通过外壳流入空气。 该装置还包括中空的锥形构件,其捕获来自风扇的空气流的一部分,并将气流引导到壳体的中心区域,以确保流过中心区域的空气向下移动到地面。
    • 106. 发明授权
    • Integration method for raised contact formation for sub-150 nm devices
    • 用于150纳米器件的凸起接触形成的集成方法
    • US06472302B1
    • 2002-10-29
    • US09993421
    • 2001-11-06
    • Brian Lee
    • Brian Lee
    • H01L2144
    • H01L21/76897H01L21/28525
    • An integrated raised contact formation method to achieve ultra shallow junction devices is described. Semiconductor device structures are provided in and on a substrate and covered with a dielectric layer. The dielectric layer is etched through to form first openings to the substrate. The surface of the substrate exposed within the first openings is amorphized. A silicon layer is selectively formed on the amorphized substrate surface. Then, ions are implanted into the silicon layer to form raised contacts. Thereafter, the dielectric layer is etched through to form second openings to gates. The first and second openings are filled with a conducting layer to complete formation of contacts in the fabrication of an integrated circuit device.
    • 描述了实现超浅结结器件的集成凸起接触形成方法。 半导体器件结构设置在衬底中并且在衬底上并覆盖有电介质层。 蚀刻介电层以形成到基板的第一开口。 在第一开口内暴露的基板的表面是非晶化的。 在非晶化衬底表面上选择性地形成硅层。 然后,将离子注入到硅层中以形成凸起的接触。 此后,电介质层被蚀刻通过以形成第二开口到栅极。 第一和第二开口填充有导电层,以在集成电路器件的制造中完成触点的形成。
    • 107. 发明授权
    • Oscillator free run frequency setting by data bus control
    • 通过数据总线控制振荡器自由运行频率设置
    • US5486866A
    • 1996-01-23
    • US264132
    • 1994-06-21
    • Kenneth J. HelfrichJoseph C. StephensKevin E. McClainBrian Lee
    • Kenneth J. HelfrichJoseph C. StephensKevin E. McClainBrian Lee
    • H04N5/06G09G1/04G09G1/16H03L7/099H04N3/16H04N5/12H04N5/44H04N5/66H04N17/04H04N5/04
    • H04N5/44H04N5/126
    • A free running frequency alignment method in a video display having a sync generator comprising a first oscillator having a first frequency and a second oscillator having a second frequency. The first oscillator is phase modulated by the second oscillator which has a free running frequency different from a standard frequency. The free running frequency of the first oscillator is to be controllably aligned to the standard frequency by a method comprising the steps of applying a frequency determining initial control value to the first oscillator and measuring an average free running frequency responsive to the initial control value. An absolute difference frequency is calculated between the average frequency and the standard frequency. The absolute difference frequency is tested for a frequency value less than a predetermined value which signifies an aligned condition. If the difference frequency is less than the predetermined value the alignment is complete. If the difference frequency is greater than the predetermined value the alignment is continued and a new control value is generated responsive to the difference. The new control value is applied to the first oscillator and the steps of average frequency measurement, absolute difference frequency calculation and difference frequency value testing are repeated until alignment is achieved. Upon failure of the difference frequency test, a counter is incremented and the count examined to determine if a predetermined number of alignment attempts have been exceeded. Upon exceeding the predetermined number the alignment is determined to have failed and the alignment is ended.
    • 一种具有同步发生器的视频显示器中的自由运行频率对准方法,该同步发生器包括具有第一频率的第一振荡器和具有第二频率的第二振荡器。 第一振荡器由第二振荡器进行相位调制,其具有与标准频率不同的自由运行频率。 第一振荡器的自由运行频率通过一种方法可控地与标准频率对准,该方法包括以下步骤:响应于初始控制值,将频率确定初始控制值应用于第一振荡器并测量平均自由运行频率。 在平均频率和标准频率之间计算绝对差分频率。 对于小于表示对准状态的预定值的频率值来测试绝对差频率。 如果差分频率小于预定值,则对齐完成。 如果差异频率大于预定值,则对准继续进行,并响应于该差产生新的控制值。 将新的控制值应用于第一振荡器,并且重复平均频率测量,绝对差频计算和差频测试的步骤,直到达到对准。 在差频测试失败时,计数器递增,并且检查该计数以确定是否已经超过预定数量的对齐尝试。 当超过预定数量时,对准被确定为失败并且对准结束。