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101. 发明授权

US09029065B2 Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an article 有权
标题翻译：包含光生酸化合物和包含其的光致抗蚀剂组合物，包含光致抗蚀剂的涂覆制品和制造制品的方法
公开(公告)号：US09029065B2
公开(公告)日：2015-05-12
申请号：US13661553
申请日：2012-10-26
申请人： Rohm and Haas Electronic Materials LLC
发明人： Emad Aqad , Cheng-Bai Xu , Cong Liu , Mingqi Li , Shintaro Yamada
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20 , G03F7/32 , C07C381/12 , C07C309/06 , C07C309/04 , C07C303/32 , C07C309/12 , C07C309/17
CPC分类号： C07C381/12 , C07C303/32 , C07C309/04 , C07C309/06 , C07C309/12 , C07C309/17 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/322 , G03F7/325
摘要： A compound having the formula (I): wherein a is an integer of from 1 to 10, and x is an integer of from 1 to 3, X1 comprises a fluoroalcohol, fluorinated ester, or fluorinated anhydride, Y is a single bond, C1-20 alkylene group, O, S, NR, ester, carbonate, sulfonate, sulfone, or sulfonamide, wherein R is H or C1-20 alkyl, and wherein the C1-20 alkylene group is structurally only carbon, or one or more structural carbon atoms in the C1-20 alkylene group is replaced by oxygen, carbonyl, ester, or a combination comprising at least one of the foregoing, Ar is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic cycloalkyl; or a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic aryl group, wherein the cycloalkyl or aryl is a carbocycle or comprises a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, each R1 is independently a substituted C5-40 aryl, substituted C5-40 heteroaryl, C1-40 alkyl, a C3-40 cycloalkyl, wherein when x is 1, the two groups R1 are separate or bonded to each other to form a C4-40 ring structure, and Z− is a carboxylate, sulfate, sulfonate, sulfamate, or the anion of a sulfonimide, wherein when Y is a single bond, Z− is not sulfonate.
摘要翻译：具有式（I）的化合物：其中a是1至10的整数，x是1至3的整数，X 1包括氟代醇，氟化酯或氟化酐，Y是单键，C1 -20亚烷基，O，S，NR，酯，碳酸酯，磺酸酯，砜或磺酰胺，其中R是H或C 1-20烷基，其中C 1-20亚烷基在结构上仅为碳，或一个或多个结构 C 1-20亚烷基中的碳原子被氧，羰基，酯或包含至少一个前述的组合代替，Ar是取代或未取代的C5或更大单环，多环或稠合的多环环烷基; 或取代或未取代的C5或更大单环，多环或稠合多环芳基，其中环烷基或芳基是碳环或包含含O，S，N，F的杂原子，或包含至少一个上述，每个R 1独立地为取代的C 5-40芳基，取代的C 5-40杂芳基，C 1-40烷基，C 3-40环烷基，其中当x为1时，两个基团R1彼此分离或键合形成C4 -40环结构，Z-是羧酸盐，硫酸盐，磺酸盐，氨基磺酸盐或磺酰亚胺的阴离子，其中当Y是单键时，Z-不是磺酸盐。

102. 发明申请

US20150118618A1 PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE 有权
标题翻译：光电发生器，光电元件，涂覆基板和形成电子器件的方法
公开(公告)号：US20150118618A1
公开(公告)日：2015-04-30
申请号：US14063148
申请日：2013-10-25
申请人： ROHM AND HAAS ELECTRONIC MATERIALS LLC
发明人： Emad Aqad , Irvinder Kaur , Cong Liu , Mingqi Li , Cheng-Bai Xu
IPC分类号： G03F7/027
CPC分类号： C07D319/08 , C07C309/12 , C07C381/12 , C07C2603/74 , C07D319/04 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/322 , G03F7/325
摘要： A photoacid generator compound has the formula (1) wherein a, b, c, d, e, x, L1, L2, L3, L4, R1, R2, X, and Z− are defined herein. The photoacid generator compound exhibits good solubility in solvents typically used to formulate photoresist compositions and negative tone developers. Described herein are a photoresist composition including the photoacid generator compound, a coated substrate including the photoresist composition, and a device-forming method utilizing the photoresist composition.
摘要翻译：光酸产生剂化合物具有式（1），其中a，b，c，d，e，x，L1，L2，L3，L4，R1，R2，X和Z-在本文中定义。光致酸产生剂化合物在通常用于配制光致抗蚀剂组合物和负色调显影剂的溶剂中表现出良好的溶解性。本文描述的是包含光致酸产生剂化合物的光致抗蚀剂组合物，包括光致抗蚀剂组合物的涂覆基质和利用光致抗蚀剂组合物的器件形成方法。

103. 发明申请

US20150056558A1 PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME 审中-公开
标题翻译：光电发生器和包含相同的光电发生器
公开(公告)号：US20150056558A1
公开(公告)日：2015-02-26
申请号：US14532134
申请日：2014-11-04
申请人： Rohm and Haas Electronic Materials LLC
发明人： Emad Aqad , Cheng-Bai Xu , Mingqi Li , Shintaro Yamada , William Williams, III
IPC分类号： G03F7/038 , G03F7/004 , G03F7/30
CPC分类号： G03F7/30 , C07C309/65 , C07C311/09 , C07C2603/74 , C07D313/08 , C07D313/10 , C07D327/04 , C07D493/18 , C07D497/18 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0397 , G03F7/2041
摘要： A photoacid generator compound has the formula (I): [A—(CHR1)p]k-(L)—(CH2)m—(C(R2)2)nSO3−Z+ (I) wherein A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic C5 or greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, R1 is H, a single bond, or a substituted or unsubstituted C1-30 alkyl group, wherein when R1 is a single bond, R1 is covalently bonded to a carbon atom of A, each R2 is independently H, F, or C1-4 fluoroalkyl, wherein at least one R2 is not hydrogen, L is a linking group comprising a sulfonate group, a sulfonamide group, or a C1-30 sulfonate or sulfonamide-containing group, Z is an organic or inorganic cation, p is an integer of 0 to 10, k is 1 or 2, m is an integer of 0 or greater, and n is an integer of 1 or greater. A precursor compound to the photoacid generator, a photoresist composition including the photoacid generator, and a substrate coated with the photoresist composition, are also disclosed.
摘要翻译：光生酸化合物具有式（I）：其中A是取代或未取代的（A）（A）所示的[A-（CHR1）p] k-（L） - （CH2）m-（C（R2）2）nSO3-Z + ，任选包含O，S，N，F或包含至少一个前述的组合的单环，多环或稠合多环C 5或更多脂环族基团，其中R 1为H，单键或取代或未取代的C1-30 烷基，其中当R 1为单键时，R 1与A的碳原子共价键合，每个R 2独立地为H，F或C 1-4氟代烷基，其中至少一个R 2不是氢，L是连接基团包括磺酸酯基，磺酰胺基或含C 1〜30磺酸酯或磺酰胺的基团，Z为有机或无机阳离子，p为0〜10的整数，k为1或2，m为0的整数以上，n为1以上的整数。还公开了光致酸产生剂的前体化合物，包含光致酸产生剂的光致抗蚀剂组合物和涂有光致抗蚀剂组合物的基材。

104. 发明授权

US08790861B2 Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer 有权
标题翻译：环脂族单体，包含其的聚合物和包含该聚合物的光致抗蚀剂组合物
公开(公告)号：US08790861B2
公开(公告)日：2014-07-29
申请号：US13723973
申请日：2012-12-21
申请人： Rohm and Haas Electronic Materials LLC
发明人： Cong Liu , Mingqi Li , Cheng-Bai Xu
IPC分类号： G03F7/039 , G03F7/09 , G03F7/20 , C07C69/54 , C08F20/68
CPC分类号： G03F7/039 , C07C69/54 , C07C2601/08 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.
摘要翻译：单体具有式I：其中R 1，R 2和R 3各自独立地为C 1-30单价有机基团，并且R 1，R 2和R 3各自独立地为未取代的或包括卤素，腈，醚，酯，酮，醇，或包含至少一个前述官能团的组合; R4包括H，F，C 1-4烷基或C 1-4氟代烷基; A是单键或二价连接基团，其中A是未取代的或被取代的，包括卤素，腈，醚，酯，酮，醇或包含至少一个前述官能团的组合; m和n各自独立地为1至8的整数; x为0〜2n + 2，y为0〜2m + 2。

105. 发明申请

US20130171429A1 CYCLOALIPHATIC MONOMER, POLYMER COMPRISING THE SAME, AND PHOTORESIST COMPOSITION COMPRISING THE POLYMER 审中-公开
标题翻译：环己烷单体，包含该聚合物的聚合物和包含聚合物的光聚合组合物
公开(公告)号：US20130171429A1
公开(公告)日：2013-07-04
申请号：US13711175
申请日：2012-12-11
申请人： Rohm and Haas Electronic Materials LLC
发明人： Cong Liu , Mingqi Li , Cheng-Bai Xu
IPC分类号： C07C69/533 , G03F7/027
CPC分类号： C07C69/533 , C07C69/54 , C07C2601/08 , G03F7/0046 , G03F7/027 , G03F7/0397 , G03F7/2041 , Y10T428/24802
摘要： A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.
摘要翻译：单体具有式I：其中R 1，R 2和R 3各自独立地为C 1-30单价有机基团，并且R 1，R 2和R 3各自独立地为未取代的或包括卤素，腈，醚，酯，酮，醇，或包含至少一个前述官能团的组合; R4包括H，F，C 1-4烷基或C 1-4氟代烷基; A是单键或二价连接基团，其中A是未取代的或被取代的，包括卤素，腈，醚，酯，酮，醇或包含至少一个前述官能团的组合; m和n各自独立地为1至8的整数; x为0〜2n + 2，y为0〜2m + 2。

106. 发明申请

US20140378592A1 NEUTRAL LAYER POLYMERS, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME 有权
公开(公告)号：US20140378592A1
公开(公告)日：2014-12-25
申请号：US14297095
申请日：2014-06-05
申请人： Dow Global Technologies LLC , ROHM AND HAAS ELECTRONICS MATERIALS LLC
发明人： Peter Trefonas, III , Phillip D. Hustad , Deyan Wang , Rahul Sharma , Mingqi Li , Jieqian J. Zhang
IPC分类号： C09D183/10 , B05D3/00 , B05D3/02 , C09D133/16 , C09D153/00
CPC分类号： C09D153/00 , B81C1/00031 , B81C2201/0149 , C08F293/005 , C08F2438/03 , C08G77/442 , C08L53/00 , C08L83/10 , G03F7/0002 , C08L33/12
摘要： Disclosed herein is a block copolymer comprising a first segment and a second segment that are covalently bonded to each other and that are chemically different from each other; where the first segment has a first surface free energy and where the second segment has a second surface free energy; and an additive copolymer; where the additive copolymer comprises a surface free energy reducing moiety where the surface free energy reducing moiety has a lower surface free energy than that of the first segment and the second segment; the additive copolymer further comprising one or more moieties having an affinity to the block copolymer; where the surface free energy reducing moiety is chemically different from the first segment and from the second segment; where the additive copolymer is not water miscible; and where the additive copolymer is not covalently bonded with the block copolymer.

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