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101. 发明申请

US20090185742A1 METHOD FOR IMAGE COMPENSATION 审中-公开
标题翻译：图像补偿方法
公开(公告)号：US20090185742A1
公开(公告)日：2009-07-23
申请号：US12015908
申请日：2008-01-17
申请人： Shih-Chieh Lu , Ching-Hsiang Hsu , Ling-Chih Lu
发明人： Shih-Chieh Lu , Ching-Hsiang Hsu , Ling-Chih Lu
IPC分类号： G06K9/40 , G06K9/36
CPC分类号： H04N9/646 , G06T5/003 , G06T5/50 , G06T2207/20012 , G06T2207/20192 , G06T2207/20201 , H04N1/58
摘要： In an image compensation method, formats of images are identified based on ambient color quantity information. If the image is in text format or of high contrast, over compensation is barred to avoid edge effect. A compensation coefficient is set basing on edge eigenvalue of images. The compensation value is fine tuned based on a threshold value to obtain finer compensation result.
摘要翻译：在图像补偿方法中，基于环境颜色数量信息来识别图像的格式。如果图像为文本格式或高对比度，则过度补偿被禁止以避免边缘效应。基于图像的边缘特征值设置补偿系数。基于阈值对补偿值进行微调，以获得更精细的补偿结果。

102. 发明申请

US20060017742A1 Method of one point color tracking 审中-公开
标题翻译：一点颜色跟踪方法
公开(公告)号：US20060017742A1
公开(公告)日：2006-01-26
申请号：US10896974
申请日：2004-07-23
申请人： Ching-Hsiang Hsu
发明人： Ching-Hsiang Hsu
IPC分类号： G09G5/02
CPC分类号： G09G5/06 , G06F3/04845 , G09G3/2003 , G09G3/3607 , G09G2320/0606 , G09G2320/0666 , G09G2320/0693 , G09G2360/14
摘要： A method of one point color tracking is for the color tracking of the screen panel that executes the tracking operation of the chromatic coordinates for the measured values of screen color parameter by using of the specific parameter values of the chromatic coordinates to get the screen color parameter tracking value and the lookup table of the color parameter tracking value, and to compare the color of the screen color parameter tracking value with the color of the measured values of screen color parameter so as to decide whether the steps of the color tracking stated above are repeated or not. Thereby, a method of one point color tracking can be provided for color display with high preciseness and steadiness. The method can suit for the color display devices such as liquid crystal display panels, plasma display panels, thin film transistor displays or organic light-emitting displays etc.
摘要翻译：一点颜色跟踪的方法是用于通过使用彩色坐标的特定参数值来执行屏幕颜色参数的测量值的色坐标的跟踪操作的屏幕面板的颜色跟踪，以获得屏幕颜色参数跟踪值和颜色参数跟踪值的查找表，并将屏幕颜色参数跟踪值的颜色与屏幕颜色参数的测量值的颜色进行比较，以便确定上述颜色跟踪的步骤是否为反复或不重复因此，可以以高精度和稳定的颜色显示提供一点颜色跟踪的方法。该方法适用于液晶显示面板，等离子体显示面板，薄膜晶体管显示器或有机发光显示器等彩色显示装置。

103. 发明申请

US20050214271A1 LACTOBACILLUS PARACASEI STRAIN GM-080 FOR TREATING ALLERGY RELATED DISEASES 有权
标题翻译： LACTOBACILLUS PARACASEI菌株GM-080用于治疗过敏相关疾病
公开(公告)号：US20050214271A1
公开(公告)日：2005-09-29
申请号：US10808503
申请日：2004-03-25
申请人： Ching-Hsiang Hsu , Wei-Chih Su , Ying-Yu Wang , Tzu-Chi Chang , Cheng-Wei Lai
发明人： Ching-Hsiang Hsu , Wei-Chih Su , Ying-Yu Wang , Tzu-Chi Chang , Cheng-Wei Lai
IPC分类号： A61K45/00 , C12N1/20 , C12R1/225
CPC分类号： C12R1/225 , C12N1/20 , Y10S435/853
摘要： The present invention provides an isolated microorganism strain, Lactobacillus paracasei GM-080, which is found to be effective in treating allergy. The use of the Lactobacillus paracasei GM-080 in treating allergy related disease is also provided.
摘要翻译：本发明提供了分离的微生物菌株，干酪乳酸杆菌GM-080，其被发现在治疗过敏中是有效的。也提供了副干酪乳酸杆菌GM-080在治疗过敏相关疾病中的应用。

104. 发明授权

US06757940B2 Hinge for a notebook computer 失效
标题翻译：铰链用于笔记本电脑
公开(公告)号：US06757940B2
公开(公告)日：2004-07-06
申请号：US10298093
申请日：2002-11-18
申请人： Sheng-Nan Lu , Ching-Hsiang Hsu
发明人： Sheng-Nan Lu , Ching-Hsiang Hsu
IPC分类号： E05D1110
CPC分类号： G06F1/1681 , E05D11/1078 , E05Y2900/606 , G06F1/1616 , Y10T16/5387 , Y10T16/540255 , Y10T16/540345
摘要： A hinge for a notebook computer is composed of a first seat, a second seat and an axle. The first seat is mounted on a monitor, and the second seat is mounted on a body. The axle is securely mounted on the first seat and pivotally mounted on the second seat. Two sleeves are provided outside the axle and engaged with each other in a closed status. The first sleeve has two lugs received in a channel defined in the second sleeve. The second sleeve has two protrusive portions respectively formed at two sides of the channel, and two cambered surfaces formed between the channel and the protrusive portion. When a user lowers the monitor to a position that the lugs enter into the cambered surfaces, the monitor can automatically descend under the effect of gravity and the force of a resilient member.
摘要翻译：用于笔记本电脑的铰链由第一座椅，第二座椅和车轴组成。第一座位安装在监视器上，第二座椅安装在主体上。车轴牢固地安装在第一座椅上并可枢转地安装在第二座椅上。在轴外设置两个袖子，并处于关闭状态。第一套筒具有接收在限定在第二套筒中的通道中的两个凸耳。第二套筒具有分别形成在通道的两侧的两个突出部分，以及形成在通道和突出部分之间的两个弧形表面。当用户将显示器降低到凸耳进入弧形表面的位置时，显示器可以在重力和弹性构件的力的作用下自动下降。

105. 发明授权

US06717206B2 Structure of an embedded channel write/erase flash memory cell and fabricating method thereof 失效
标题翻译：嵌入式通道写入/擦除闪存单元的结构及其制造方法
公开(公告)号：US06717206B2
公开(公告)日：2004-04-06
申请号：US10064409
申请日：2002-07-11
申请人： Ching-Hsiang Hsu , Ching-Sung Yang
发明人： Ching-Hsiang Hsu , Ching-Sung Yang
IPC分类号： H01L29788
CPC分类号： H01L27/11526 , H01L27/105 , H01L27/115 , H01L27/11546
摘要： The present invention relates to a structure of an embedded channel write/erase flash memory cell and a fabricating method thereof and, more particularly, to a structure combining CMOS devices and flash memory cells, wherein flash memory cell structures and CMOS devices are simultaneously fabricated on a substrate to reduce the cost and to simplify the process flow. Moreover, CMOS devices capable of performing high-voltage and low-voltage operations are reserved. Therefore, the present invention can not only effectively improve the operating efficiency of flash memory cells and CMOS devices, but its whole volume is also smaller than that obtained by combining separately designed and fabricated CMOS devices and flash memory cells.
摘要翻译：本发明涉及嵌入式通道写入/擦除闪存单元的结构及其制造方法，更具体地说，涉及组合CMOS器件和闪存单元的结构，其中闪存单元结构和CMOS器件同时制造在一种降低成本并简化工艺流程的基板。此外，保留能够执行高电压和低电压操作的CMOS器件。因此，本发明不仅可以有效提高闪存单元和CMOS器件的工作效率，而且其整体体积也小于通过组合分别设计和制造的CMOS器件和闪存单元获得的整体体积。

106. 发明授权

US06654284B2 Channel write/erase flash memory cell and its manufacturing method 失效
公开(公告)号：US06654284B2
公开(公告)日：2003-11-25
申请号：US10064365
申请日：2002-07-07
申请人： Ching-Hsiang Hsu , Ching-Sung Yang
发明人： Ching-Hsiang Hsu , Ching-Sung Yang
IPC分类号： G11C1604
CPC分类号： H01L29/66825 , G11C14/00 , G11C16/0433 , H01L29/7881
摘要： A pseudo-dynamic operating method and a flash memory cell capable of performing this operating method are disclosed. A parasitic capacitor near the drain terminal of the flash memory can be charged in few microseconds during operation. Interference generated between the floating gate and the source is avoided by using a first oxide layer which is thicker at the interface between floating gate and source and thinner near central part under stacked gate.

107. 发明授权

US06501685B2 Channel write/erase flash memory cell and its manufacturing method 失效
标题翻译：通道写/擦除闪存单元及其制造方法
公开(公告)号：US06501685B2
公开(公告)日：2002-12-31
申请号：US09683580
申请日：2002-01-22
申请人： Ching-Hsiang Hsu , Ching-Sung Yang
发明人： Ching-Hsiang Hsu , Ching-Sung Yang
IPC分类号： G11C1604
CPC分类号： H01L29/66825 , G11C14/00 , G11C16/0433 , H01L29/7881
摘要： A pseudo-dynamic operating method and a flash memory cell capable of performing this operating method are disclosed. A parasitic capacitor near the drain terminal of the flash memory can be charged in few microseconds during operation. Interference generated between the floating gate and the source is avoided by using a first oxide layer which is thicker at the interface between floating gate and source and thinner near central part under stacked gate.
摘要翻译：公开了一种能够执行该操作方法的伪动态操作方法和闪存单元。在闪存存储器的漏极端子附近的寄生电容器在操作期间可以在几微秒内被充电。通过使用在浮置栅极和源极之间的界面处较厚的第一氧化物层和在堆叠栅极下方的中心附近较薄的第一氧化物层来避免在浮动栅极和源极之间产生的干扰。

108. 发明授权

US06383525B1 Herbal compositions for treating immunological disorders 失效
标题翻译：用于治疗免疫障碍的草药组合物
公开(公告)号：US06383525B1
公开(公告)日：2002-05-07
申请号：US09735536
申请日：2000-12-14
申请人： Ching-Hsiang Hsu , Shuenn-Jyi Sheu
发明人： Ching-Hsiang Hsu , Shuenn-Jyi Sheu
IPC分类号： A01N6500
CPC分类号： A61K36/344 , A61K36/185 , A61K36/258 , A61K36/28 , A61K36/48 , A61K36/8888 , A61K2300/00
摘要： The present invention provides pharmaceutical compositions which include Chinese herbs. These pharmaceutical compositions are especially effective in treating patients with immunological disorders, such as asthma, atopic eczema, atopic dermatitis, allergic rhinitis and rheumatoid arthritis. The pharmaceutical compositions contain ophiopogon (Tuber Ophiopogonis), pinellia (Tuber Pinelliae), raw licorice (Radix Glycyrrhizae), tang-shen (Radix Codonopsitis) or American ginseng (Radix Pancis Quinquefolii), and lantern tridax (Herba Tridacis procumbentis)/Taiwan adenostema (Herba Adenostematis)/heartleaf houttuynia (Herba houttuyniae). So far, Taiwan adenostema, and heartleaf houttuynia have been found only in Taiwan. Lantern tridax has been found in Taiwan and South America.
摘要翻译：本发明提供包括中草药的药物组合物。这些药物组合物在治疗患有免疫学障碍的患者中特别有效，例如哮喘，特应性湿疹，特应性皮炎，过敏性鼻炎和类风湿性关节炎。药物组合物含有紫菜（Tuber Ophiopogonis），Pinellia（Tuber Pinelliae），生甘草（甘草），唐氏（Radix Codonopsitis）或西洋参（Radix Pancis Quinquefolii）和灯盏草（Herba Tridacis procumbentis）/台湾腺瘤（Herba Adenostematis）/ heartleaf houttuynia（Herba houttuyniae）。到目前为止，仅台湾发现台湾腺瘤病和心脏肝炎。在台湾和南美已发现灯笼tridax。

109. 发明授权

US06251663B1 Recombinant eukaryotic plasmids containing allergen-gene and use thereof for the prevention and/or treatment of allergic diseases 失效
标题翻译：含有过敏原基因的重组真核质粒及其用于预防和/或治疗过敏性疾病的用途
公开(公告)号：US06251663B1
公开(公告)日：2001-06-26
申请号：US09166967
申请日：1998-10-06
申请人： Ching-Hsiang Hsu , Kaw-Yan Chua , Mi-Hua Tao , Kue-Hsiung Hsieh
发明人： Ching-Hsiang Hsu , Kaw-Yan Chua , Mi-Hua Tao , Kue-Hsiung Hsieh
IPC分类号： A61K3170
CPC分类号： A61K39/35 , A61K2039/53
摘要： The present invention relates to recombinant eukaryotic plasmids comprising an eukaryotic expression vector and an allergen gene for the prevention and/or treatment of allergic diseases. When the recombinant vector containing allergen-gene administrate to an individual in need of such prevention and/or treatment by intramuscular injection, intranasal delivery or intratracheal delivery, the production of allergen-specific IgE synthesis can be inhibited. The invention also relates to the pharmaceutical compositions comprising the the recombinant vector for use in the the prevention and/or treatment of allergic diseases and the production of allergen-specific IgE synthesis. A method for the prevention and/or treatment of allergic diseases is also provided.
摘要翻译：本发明涉及包含真核表达载体和用于预防和/或治疗过敏性疾病的变应原基因的重组真核质粒。当含有变应原基因的重组载体通过肌内注射，鼻内递送或气管内递送需要这种预防和/或治疗的个体时，可以抑制过敏原特异性IgE合成的产生。本发明还涉及包含用于预防和/或治疗过敏性疾病和产生变应原特异性IgE合成的重组载体的药物组合物。还提供了用于预防和/或治疗过敏性疾病的方法。

110. 发明授权

US6150235A Method of forming shallow trench isolation structures 有权
标题翻译：形成浅沟槽隔离结构的方法
公开(公告)号：US6150235A
公开(公告)日：2000-11-21
申请号：US490275
申请日：2000-01-24
申请人： Yih-Yuh Doong , Sung-Chun Hsieh , Tsu-Bin Shen , Ching-Hsiang Hsu
发明人： Yih-Yuh Doong , Sung-Chun Hsieh , Tsu-Bin Shen , Ching-Hsiang Hsu
IPC分类号： H01L21/762 , H01L21/8238 , H01L21/76
CPC分类号： H01L21/76237 , H01L21/823878
摘要： A method for forming shallow trench isolation (STI) structures on a semiconductor substrate is disclosed. First a semiconductor substrate with a first area and a second area adjacent to the first area is provided. A mask layer is formed on the substrate, and is etched to expose portions of the substrate. A first photoresist is formed to cover the second area for exposing the first area. A first implanting procedure is performed with a titled angle to form first doping areas on the substrate encroaching into portions of the substrate covered by the first photoresist. The first photoresist is removed. A second photoresist is formed on the substrate to cover the first area for exposing the second area. And a second implanting procedure is done with a titled angle to form second doping areas on the substrate encroaching into portions of the substrate covered by the second photoresist. The second photoresist is removed. The substrate is etched to remove the first doping areas and the second doping areas for forming trench structures therein. It is noted that portions of the first doping areas and the second doping areas are residual in upper portions of sidewalls of the trench structures adjacent to the mask layer. Then the shallow trench isolations are formed in the trench structures.
摘要翻译：公开了一种在半导体衬底上形成浅沟槽隔离（STI）结构的方法。首先，提供具有与第一区域相邻的第一区域和第二区域的半导体衬底。掩模层形成在衬底上，并被蚀刻以暴露衬底的部分。形成第一光致抗蚀剂以覆盖用于暴露第一区域的第二区域。以标题角度执行第一植入过程，以在衬底上形成侵蚀到由第一光致抗蚀剂覆盖的衬底的部分中的第一掺杂区域。去除第一光致抗蚀剂。在基板上形成第二光致抗蚀剂以覆盖用于暴露第二区域的第一区域。并且以标题角完成第二种植入过程，以在衬底上形成侵蚀到由第二光致抗蚀剂覆盖的衬底的部分中的第二掺杂区域。去除第二光致抗蚀剂。蚀刻衬底以除去第一掺杂区域和用于在其中形成沟槽结构的第二掺杂区域。要注意的是，第一掺杂区域和第二掺杂区域的部分在与掩模层相邻的沟槽结构的侧壁的上部残留。然后在沟槽结构中形成浅沟槽隔离。

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