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91. 发明授权

US06601592B1 Method of semiconductor substrate batch demounting 失效
标题翻译：半导体衬底批量拆卸方法
公开(公告)号：US06601592B1
公开(公告)日：2003-08-05
申请号：US09685734
申请日：2000-10-11
申请人： Zhengming Chen
发明人： Zhengming Chen
IPC分类号： B08B304
CPC分类号： H01L21/67781 , Y10S134/902
摘要： This is a method of cassette-to-cassette batch demounting process that includes providing an apparatus having two cassettes for holding and separating semiconductor substrates. A first cassette is placed on top of a second cassette, using the first cassette as the top cassette that holds the semiconductor substrate and the support substrate, and the second cassette at the bottom as a bottom cassette that receives the semiconductor substrate after demounting process. The semiconductor substrate is loaded with its support substrate into a slot in the top cassette. The top cassette will let only the semiconductor substrate to descend to the bottom cassette while blocking the support substrate from exiting the top cassette. The two cassettes are then soaked in a hot solvent that can dissolve or melt an adhesive that adheres the semiconductor substrate to the support substrate in order to weaken the cohesive force between the two substrates. The thinned semiconductor substrate will gradually demount from its support substrate by gravitational force and vertically slides down into the bottom cassette.
摘要翻译：这是一种盒式到盒式批量拆卸方法，其包括提供一种具有用于保持和分离半导体衬底的两个盒的装置。第一盒被放置在第二盒的顶部上，使用第一盒作为保持半导体衬底和支撑衬底的顶盒，底部的第二盒作为在拆卸之后接收半导体衬底的底盒。半导体衬底将其支撑衬底装载到顶盒中的狭槽中。顶部盒式磁带将仅使半导体衬底下降到底部盒，同时阻止支撑衬底离开顶部盒。然后将两个盒浸泡在热溶剂中，该热溶剂可溶解或熔化将半导体衬底粘附到支撑衬底上的粘合剂，以便削弱两个衬底之间的内聚力。减薄的半导体衬底将通过重力从其支撑衬底逐渐脱落并且垂直地向下滑入底部盒。

92. 发明授权

US06569260B2 Non-solvent very low VOC formulation for removal of ink from printing presses and the like, and methods of using the same 失效
公开(公告)号：US06569260B2
公开(公告)日：2003-05-27
申请号：US10173943
申请日：2002-06-19
申请人： Keith A. Rhodes
发明人： Keith A. Rhodes
IPC分类号： B08B304
CPC分类号： C11D3/3765 , B41N3/06 , C11D3/10 , C11D3/33
摘要： A water-based formulation for the removal of ink comprising a detergent builder including sodium carbonate, neutralized polyacrylic acid, and an acrylic acid/maleic anhydride copolymer; a chelating agent including tetrasodium ethylenediaminetetraacetate and ethylenediaminetetraacetic acid; and a detergent/emulsifier including C9-11 Pareth 8, C6-12 Pareth 6, and PEG Cocomonium Chloride.

93. 发明授权

US06562145B2 Method of cleaning a surface with a system having a two compartment container for neutralizing used cleaning solutions 有权
标题翻译：用具有用于中和用过的清洁溶液的两室容器的系统清洁表面的方法
公开(公告)号：US06562145B2
公开(公告)日：2003-05-13
申请号：US10039086
申请日：2002-01-05
申请人： Michael A. Duckett , John C. Bliley , Gerald J. Kielar , Sayed Sadiq Shah
发明人： Michael A. Duckett , John C. Bliley , Gerald J. Kielar , Sayed Sadiq Shah
IPC分类号： B08B304
CPC分类号： C23G3/00
摘要： A cleaning unit (A) includes a movable cart (20) which carries a cleaning system for cleaning baked-on residues from walls (10) of a sterilizer chamber (12). Alkaline and acid cleaning solutions (180, 182), for removing organic and inorganic residues, respectively, from the chamber, are stored in a multi-compartment container carried by the cart and having two storage compartments (52, 54). The alkaline and acid solutions are sequentially sprayed over the chamber walls and returned to their respective compartments. After cleaning is complete, a wall (200) which separates the two compartments is punctured. The two cleaning fluids are thereby mixed together to form a neutral or near neutral solution which is disposable in a sanitary sewer system without further treatment.
摘要翻译：清洁单元（A）包括可移动的手推车（20），其携带用于清洁来自灭菌室（12）的壁（10）的烘烤残余物的清洁系统。用于从室中分别除去有机和无机残留物的碱性和酸性清洁溶液（180,182）被储存在由推车携带并具有两个储存室（52,54）的多隔室容器中。将碱性和酸性溶液依次喷涂在室壁上并返回到它们各自的隔室中。清洁完成后，分离两个隔室的壁（200）被刺穿。这两种清洁流体因此被混合在一起形成中性或近似中性的溶液，其在卫生下水道系统中是一次性的，无需进一步处理。

94. 发明授权

US06539963B1 Pressurized liquid diffuser 失效
公开(公告)号：US06539963B1
公开(公告)日：2003-04-01
申请号：US09353742
申请日：1999-07-14
申请人： L. Brian Dunn
发明人： L. Brian Dunn
IPC分类号： B08B304
CPC分类号： H01L21/67057 , B08B3/102 , Y10S134/902
摘要： The invention relates to a diffuser for wet processing systems involved in the manufacturing of semiconductor wafers. The diffuser includes a plenum section and a slitted section. Pressurized fluid from the plenum section is forced through the slitted section and across a plurality of wafers mounted in the wet processing system. One advantage is that by “diffusing” pressurized fluid through the slitted section, a generally uniform and/or laminar flow is achieved. Desirably, the diffuser provides a more reliable, and hence more cost-effective, technology for wet processing fabrication of semiconductor wafers.

95. 发明授权

US06536453B2 Apparatus for holding contact lens care composition and contact lens case 失效
公开(公告)号：US06536453B2
公开(公告)日：2003-03-25
申请号：US09919144
申请日：2001-07-31
申请人： John W. Vanden Dries , Rodney J. Terwilliger, Jr. , William Gordon Beecroft
发明人： John W. Vanden Dries , Rodney J. Terwilliger, Jr. , William Gordon Beecroft
IPC分类号： B08B304
CPC分类号： B65D23/12 , A45C11/005 , B65D2585/545 , Y10S134/901
摘要： Apparatus comprising first and second containers for holding contact lens care compositions and contact lens cases, respectively. The first container defines a chamber adapted to hold contact lens care composition. The second container defines a compartment and is adapted to be removably secured to the first container such that the second container extends outwardly away from the first container with the second container removably secured to the first container. The second container is adapted to accommodated one or more contact lens accessory items in a side-by-side relationship. The contact lens accessory items are preferably selected from the group consisting of a contact lens holder, a supply of enzyme tablets and an information pamphlet.

96. 发明授权

US06532973B1 Gloss retention compositions 失效
标题翻译：光泽保留组合物
公开(公告)号：US06532973B1
公开(公告)日：2003-03-18
申请号：US09578645
申请日：2000-05-25
申请人： Stephen F. Gross , Timothy C. Morris , Michael S. Wiggins , Robert J. Valesky
发明人： Stephen F. Gross , Timothy C. Morris , Michael S. Wiggins , Robert J. Valesky
IPC分类号： B08B304
CPC分类号： C11D1/722 , C11D1/662 , C11D1/825
摘要： A cleaning composition containing: (A) an alkyl polyglycoside corresponding to formula I: R1O(R2O)b(Z)a I wherein R1 is a monovalent organic radical having from about 6 to about 30 carbon atoms; R2 is a divalent alkylene radical having from 2 to 4 carbon atoms; Z is a saccharide residue having 5 or 6 carbon atoms; b is a number having a value from 0 to about 12; a is a number having a value from 1 to about 6; and (B) at least one product of a reaction between: a) at least one linking agent of formula IV: R4(Y)3 (IV) wherein each Y group is a halogen atom or one Y group is a halogen atom and two Y groups with two adjacent carbon atoms in the R4 group and an oxygen atom form an epoxy group, and R4 is an alkanetriyl group containing from 3 to 10 carbon atoms; and (b) at least one compound of formula (II) R3(EO)n(PO)m(BO)pX (II) wherein R3 is a substituted or unsubstituted saturated or unsaturated, aliphatic oxy or thio group having from 1 to about 36 carbon atoms or a secondary amino group having from 2 to about 36 carbon atoms; n, m, and p are independently numbers of from 0 to about 50; X is hydrogen, or a mercapto group or an amino group in place of a terminal —OH group, provided that when X is mercapto or amino, the sum of n, m, and p must be at least 1; and wherein the mole ratio of component a) to component b) is from about 0.2/1 to about 5/1.
摘要翻译：一种清洁组合物，其包含：（A）对应于式I的烷基多糖苷：其中R 1是具有约6至约30个碳原子的一价有机基团; R2是具有2至4个碳原子的二价亚烷基; Z是具有5或6个碳原子的糖残基; b是0至约12的数值; a是1至6的数值; 和（B）至少一种以下反应产物：a）至少一种式IV的连接剂：其中每个Y基团是卤素原子或一个Y基团是卤素原子，和两个具有两个相邻碳原子的Y基团 R4基和氧原子形成环氧基，R4是含有3〜10个碳原子的烷撑三基; 和（b）至少一种式（II）化合物，其中R 3是具有1至约36个碳原子的取代或未取代的饱和或不饱和的脂族氧基或硫基或具有2至约36个碳原子的仲氨基 ; n，m和p独立地为0至约50的数; X是氢或巯基或氨基代替末端-OH基团，条件是当X是巯基或氨基时，n，m和p之和必须至少为1; 并且其中组分a）与组分b）的摩尔比为约0.2 / 1至约5/1。

97. 发明授权

US06530385B2 Apparatus and method for wet cleaning or etching a flat substrate 有权
公开(公告)号：US06530385B2
公开(公告)日：2003-03-11
申请号：US09751569
申请日：2000-12-29
申请人： Marc Meuris , Paul Mertens , Marc Heyns
发明人： Marc Meuris , Paul Mertens , Marc Heyns
IPC分类号： B08B304
CPC分类号： H01L21/67057 , H01L21/67086 , Y10S134/902
摘要： An apparatus for wet cleaning or etching of flat substrates comprising a tank with an inlet opening and outlet opening for said substrates. Said tank contains a cleaning liquid and is installed in a gaseous environment. At least one of the openings is a slice in a sidewall of the tank and is present below the liquid-surface. In the tank there may be a portion above the liquid filled with a gas with a pressure being lower than the pressure within said environment. The method comprises the step of transferring a substrate through the cleaning or etching liquid at a level underneath the surface of said liquid making use of said apparatus.

98. 发明授权

US06530384B1 Potentiated disinfectant cleaning solutions and methods of use 有权
标题翻译：强化消毒液清洗方法及使用方法
公开(公告)号：US06530384B1
公开(公告)日：2003-03-11
申请号：US09918382
申请日：2001-07-30
申请人： Stephen J. Meyers , Lyn M. Dyster
发明人： Stephen J. Meyers , Lyn M. Dyster
IPC分类号： B08B304
CPC分类号： C11D3/48 , C11D1/62 , C11D1/72 , C11D1/835 , C11D3/3947 , C11D11/0052
摘要： Potentiated compositions and methods for disinfection of porous surfaces, such as ceiling tiles contaminated with bacteria and fungi permits renewal without requiring replacement tiles. The compositions, preferably water clear aqueous solutions, comprise synergistic combination of quaternary ammonium compound, a surfactant, and a hydrogen peroxide solution at very low concentrations than otherwise required if used alone. The active components are present in minimal proportional ranges sufficient to achieve a virtual 100 percent kill of bacteria and fungi present on surfaces.
摘要翻译：用于消毒多孔表面的增强组合物和方法，例如被细菌和真菌污染的天花板，允许更新而不需要更换瓷砖。组合物，优选水清洁的水溶液，包含季铵化合物，表面活性剂和过氧化氢溶液的协同组合，其浓度非常低，如果单独使用则为其他要求。活性组分以足够的最小比例范围存在，以实现表面上存在的细菌和真菌的虚拟100％杀死。

99. 发明授权

US06527872B1 Environmentally friendly peracetic acid decontamination formula with increased performance and chemical stability 有权
标题翻译：环保型过乙酸去污配方，性能和化学稳定性提高
公开(公告)号：US06527872B1
公开(公告)日：2003-03-04
申请号：US09974499
申请日：2001-10-10
申请人： Christopher M. Fricker , Brian C. Wojcieck , Stephanie A. S. Harrington , Iain F. McVey , George E. Grignol
发明人： Christopher M. Fricker , Brian C. Wojcieck , Stephanie A. S. Harrington , Iain F. McVey , George E. Grignol
IPC分类号： B08B304
CPC分类号： A61L2/186 , A61B1/123 , A61B90/70 , A61B2090/701 , A61L2202/14 , A61L2202/17 , A61L2202/24 , B08B3/02 , B08B3/04 , C11D3/0073 , C11D3/128 , C11D3/3907 , C11D3/3942 , C11D3/3945 , C11D3/48
摘要： An environmentally friendly decontaminant solution, which may be disposed of after use without posing significant environmental hazards, is formulated without molybdenum-based corrosion inhibitors and preferably is free of all heavy metals. A zeolite-based buffering system optionally replaces phosphate buffers for maintaining the pH of the decontaminant solution at an appropriate pH for effective antimicrobial decontamination. Molybdenum-free decontaminant solutions containing peracetic acid retain their peracetic acid levels, and thus their antimicrobial effectiveness, for longer periods than comparable solutions formulated with a molybdate corrosion inhibitor.
摘要翻译：无需使用钼基腐蚀抑制剂即可配制环保型去污剂溶液，其可在使用后处理而不造成重大环境危害，并且优选不含所有重金属。基于沸石的缓冲系统任选地替代磷酸盐缓冲液，以将去污剂溶液的pH保持在适当的pH下以进行有效的抗菌去污。含有过乙酸的无钼净化剂溶液比用钼酸盐腐蚀抑制剂配制的可比溶液保持其过乙酸水平，因此保持其抗微生物效力更长的时间。

100. 发明授权

US06527870B2 Wafer cleaning module and method for cleaning the surface of a substrate 失效
公开(公告)号：US06527870B2
公开(公告)日：2003-03-04
申请号：US09976856
申请日：2001-10-12
申请人： Yehiel Gotkis
发明人： Yehiel Gotkis
IPC分类号： B08B304
CPC分类号： H01L21/67046 , B08B7/00 , C11D11/0047 , H01L21/02074 , Y10S134/902
摘要： In a method for cleaning a surface of a substrate an amount of a solution is applied on a surface of the substrate. After the solution is applied on the surface, crystallization of the solution is initiated to form a liquid-crystal mixture. Once the liquid-crystal mixture is formed, relative motion between the liquid-crystal mixture and the substrate is created to dislodge contaminants adhered to the substrate. In one alternative method, the solution is applied on a pad. In another alternative method, the substrate is place in a bath of the solution. A wafer cleaning module also is described.

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