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91. 发明申请

US20120211676A1 CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD 有权
标题翻译：充电颗粒光束写字装置和充电颗粒光束写字方法
公开(公告)号：US20120211676A1
公开(公告)日：2012-08-23
申请号：US13368786
申请日：2012-02-08
申请人： Takashi KAMIKUBO
发明人： Takashi KAMIKUBO
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/30483 , H01J2237/31776 , H01J2237/31793
摘要： A charged particle beam writing apparatus includes an unit to measure height positions of a substrate, an unit to input a position dependent height distribution obtained by converting each position error of a pattern generated depending on each corresponding writing position of the substrate into a value in a height direction, and to add the position dependent height distribution to a height distribution obtained based on the height positions in order to correct the height distribution of the substrate, an unit to calculate a deflection shift amount of a pattern to be written by using a corrected height distribution, an unit to calculate a deflection amount for deflecting a beam to a position where a calculated deflection shift amount has been corrected, and an unit to write a pattern on the substrate by deflecting the beam by a calculated deflection amount.
摘要翻译：带电粒子束写入装置包括用于测量衬底的高度位置的单元，用于输入通过将根据衬底的每个相应写入位置生成的图案的每个位置误差转换为基板的每个位置误差而获得的与位置相关的高度分布的单元并且将位置相关高度分布添加到基于高度位置获得的高度分布，以便校正基底的高度分布;单元，通过使用经校正的高度分布来计算要写入的图案的偏移偏移量高度分布的单元，用于计算用于将光束偏转到已经校正了计算出的偏转偏移量的位置的偏转量的单元，以及通过使光束偏转计算的偏转量来将图案写入基板的单元。

92. 发明授权

US07737421B2 Electron beam exposure apparatus and method for cleaning the same 有权
标题翻译：电子束曝光装置及其清洗方法
公开(公告)号：US07737421B2
公开(公告)日：2010-06-15
申请号：US12077153
申请日：2008-03-17
申请人： Hiroshi Yasuda , Yoshihisa Ooae
发明人： Hiroshi Yasuda , Yoshihisa Ooae
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31793
摘要： Provided is an electron beam exposure apparatus for forming a desired pattern on a sample mounted on a wafer stage by exposure with an electron beam generated form an electron gun. The electron beam exposure apparatus includes: supplying device of injecting a reducing gas into a column in which the electron gun and the wafer stage are housed; and control unit of performing control so that the injection of the reducing gas into the column is continued for a predetermined period of time. Organic contamination is combined with H generated from the reducing gas by irradiation of an electron beam, and then evaporates. Further included is supplying device of injecting an ozone gas into the column. The control unit may perform control so that the injection of the ozone gas into the column in addition to the injection of the reducing gas is continued for a predetermined period of time.
摘要翻译：提供一种电子束曝光装置，用于通过用电子枪产生的电子束曝光在安装在晶片台上的样品上形成所需图案。电子束曝光装置包括：将还原气体注入到容纳电子枪和晶片台的列中的供给装置; 以及执行控制的控制单元，使得将还原气体注入到所述列中持续预定时间段。有机污染与通过照射电子束从还原气体生成的H结合，然后蒸发。还包括向柱中注入臭氧气体的供给装置。控制单元可以执行控制，使得除了注入还原气体之外，将臭氧气体注入到塔中持续预定的时间段。

93. 发明授权

US07528393B2 Charged particle beam processing apparatus 有权
标题翻译：带电粒子束处理装置
公开(公告)号：US07528393B2
公开(公告)日：2009-05-05
申请号：US11235411
申请日：2005-09-26
申请人： Kiminobu Akeno
发明人： Kiminobu Akeno
IPC分类号： A61N5/00
CPC分类号： H01L21/67213 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31793
摘要： A charged particle beam processing apparatus includes a sample chamber to process a substrate including side faces by a charged particle beam, a movable stage in the sample chamber, the stage including a place on which the substrate is to be mounted, a height and position acquiring unit to acquire a height of the substrate on the stage by irradiating a laser beam onto the substrate on the stage and using the laser beam reflected from the substrate and to acquire positions of at least two adjacent side faces among the side faces based on the acquired height, and a calculating unit to calculate a position of center of gravity of the substrate on the stage and a rotation angle as to a rotary axis vertical to the place on which the substrate is to be mounted based on the positions of the at least two adjacent side faces.
摘要翻译：带电粒子束处理装置包括：样品室，用于处理包含带电粒子束的侧面的基板;样本室中的可移动台;该台包括要安装基板的位置;高度和位置获取单元，通过将激光束照射在载物台上的基板上并使用从基板反射的激光束并基于获得的位置获取侧面中的至少两个相邻侧面的位置来获取台架上的基板的高度高度，以及计算单元，其基于所述至少两个位置的位置来计算在所述台上的所述基板的重心位置和垂直于要安装所述基板的位置的旋转轴的旋转角度相邻的侧面。

94. 发明申请

US20080258084A1 Charged-Particle Exposure Apparatus 有权
标题翻译：带电粒子曝光装置
公开(公告)号：US20080258084A1
公开(公告)日：2008-10-23
申请号：US11816353
申请日：2006-02-16
申请人： Elmar Platzgummer , Stefan Cernusca , Gerhard Stengl
发明人： Elmar Platzgummer , Stefan Cernusca , Gerhard Stengl
IPC分类号： G21K5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3175 , H01J2237/31788 , H01J2237/31793
摘要： A particle-beam projection processing apparatus for irradiating a target, with an illumination system for forming a wide-area illuminating beam of energetic electrically charged particles; a pattern definition means for positioning an aperture pattern in the path of the illuminating beam; and a projection system for projecting the beam thus patterned onto a target to be positioned after the projection system. A foil located across the path of the patterned beam is positioned between the pattern definition means and the position of the target at a location close to an image of the aperture pattern formed by the projection system.
摘要翻译：一种用于照射目标的粒子束投影处理装置，具有用于形成能量带电粒子的广域照明光束的照明系统; 用于将光圈图案定位在照明光束的路径中的图案定义装置; 以及投影系统，用于将如此图案化的光束投影到待投影系统上的待定位的靶上。位于图案化光束的路径上的箔位于图案定义装置之间并且位于靠近由投影系统形成的孔径图案的图像的位置处的目标的位置。

95. 发明授权

US07342241B2 Method and apparatus for electron-beam lithography 失效
标题翻译：电子束光刻的方法和装置
公开(公告)号：US07342241B2
公开(公告)日：2008-03-11
申请号：US11179628
申请日：2005-07-13
申请人： Yasuko Aoki , Tsutomu Tawa , Yoshimitsu Saze
发明人： Yasuko Aoki , Tsutomu Tawa , Yoshimitsu Saze
IPC分类号： G21K5/04 , H01J33/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31793
摘要： The present invention is to provide an electron-beam lithography method and an electron-beam lithography apparatus that can draw patterns with a high precision despite a change in barometric pressure, can ensure a satisfactory throughput, and are inexpensive. In the electron-beam lithography method that uses an electron beam to draw patterns on a sample, a difference between a current measured barometric pressure and a previous measured barometric pressure, and an elapsed time between their barometric pressure-measurement points in time are determined. When the rate of the difference of their barometric pressures with respect to the elapsed time is equal to or larger than a prescribed barometric pressure change rate value, a drawing precision is calibrated.
摘要翻译：本发明是提供一种电子束光刻方法和电子束光刻设备，尽管大气压力发生变化，但能够高精度地绘制图案，可以确保令人满意的生产量，并且便宜。在使用电子束在样品上绘制图案的电子束光刻方法中，确定当前测量的大气压力与先前测量的大气压力之间的差异以及它们在大气压力测量点之间的经过时间。当大气压力相对于经过时间的差异的比率等于或大于规定的气压变化率值时，校准绘制精度。

96. 发明申请

US20070114461A1 CHARGED BEAM DRAWING APPARATUS AND CHARGED BEAM DRAWING METHOD 有权
标题翻译：充电光束绘图装置和充电光束绘图方法
公开(公告)号：US20070114461A1
公开(公告)日：2007-05-24
申请号：US11560127
申请日：2006-11-15
申请人： Kiyoshi HATTORI , Kenji Ohtoshi , Tomohiro Iijima , Yoshiaki Onimaru , Hayato Kimura , Tateki Watanabe
发明人： Kiyoshi HATTORI , Kenji Ohtoshi , Tomohiro Iijima , Yoshiaki Onimaru , Hayato Kimura , Tateki Watanabe
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31793
摘要： There is provided a charged beam drawing apparatus which includes main/sub two-stage deflectors, divides a main deflection drawing region on a sample into sub deflection drawing regions determined by the deflection width of the sub deflector, selects one of the sub deflection drawing regions by use of the main deflector and draws shots in the selected sub deflection drawing region by use of the sub deflector. A sub deflection driving unit includes a sub deflection sensitivity correction circuit, a sub deflection astigmatic correction circuit, an adder circuit which adds an output of the sub deflection sensitivity correction circuit and an output of the sub deflection astigmatic correction circuit, and a deflection amplifier which additionally applies an output of the adder circuit to the sub deflector.
摘要翻译：提供了一种带电束的拉伸装置，其包括主/次两级偏转器，将样品上的主偏转绘制区域划分成由次偏转器的偏转宽度确定的次偏转绘图区域，选择一个子偏转绘图区域通过使用主偏转器，并且通过使用副偏转器在所选择的亚偏转绘图区域中绘制照片。副偏转驱动单元包括副偏转灵敏度校正电路，副偏转像散校正电路，将副偏转灵敏度校正电路的输出和副偏转像散校正电路的输出相加的加法电路，以及偏转放大器，另外将加法器电路的输出施加到副偏转器。

97. 发明授权

US07087910B2 Method for detecting and compensating for positional displacements in photolithographic mask units and apparatus for carrying out the method 有权
标题翻译：用于检测和补偿光刻掩模单元中的位置位移的方法和用于执行该方法的装置
公开(公告)号：US07087910B2
公开(公告)日：2006-08-08
申请号：US10835217
申请日：2004-04-29
申请人： Jens Schneider , Tarek Lutz
发明人： Jens Schneider , Tarek Lutz
IPC分类号： H01J37/304
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/30438 , H01J2237/30461 , H01J2237/31788 , H01J2237/31793
摘要： A method for detecting and compensating for positional displacements of a photolithographic mask unit, includes providing mask production data for the writing of the mask unit with an electron beam. A structure density of the mask unit is input and an electron beam deflection is brought about on the mask unit in dependence on the determined structure density of the mask unit. The mask production data are corrected through the use of the determined electron beam deflection, in order to obtain corrected mask production data, and the corrected mask production data are output. A lithography apparatus for mask units with correction of positional displacements of the mask unit, is also provided.
摘要翻译：一种用于检测和补偿光刻掩模单元的位置位移的方法，包括提供用于用电子束写入掩模单元的掩模生产数据。输入掩模单元的结构密度，并根据确定的掩模单元的结构密度在掩模单元上产生电子束偏转。通过使用确定的电子束偏转来校正掩模生产数据，以获得校正的掩模生产数据，并且输出校正的掩模生产数据。还提供了一种用于具有校正掩模单元的位置位移的掩模单元的光刻设备。

98. 发明申请

US20060060781A1 Charged-particle beam apparatus and method for automatically correcting astigmatism and for height detection 审中-公开
标题翻译：带电粒子束装置和自动校正散光和高度检测的方法
公开(公告)号：US20060060781A1
公开(公告)日：2006-03-23
申请号：US11114203
申请日：2005-04-26
申请人： Masahiro Watanabe , Masayoshi Takeda , Koichi Hayakawa , Yasuhiro Gunji
发明人： Masahiro Watanabe , Masayoshi Takeda , Koichi Hayakawa , Yasuhiro Gunji
IPC分类号： G21K7/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/153 , H01J37/265 , H01J37/28 , H01J2237/15 , H01J2237/1532 , H01J2237/216 , H01J2237/2482 , H01J2237/31793 , H01J2237/31798
摘要： Charged-particle beam arrangements (e.g., apparatus and methods) for automatically correcting astigmatism and for height detection.
摘要翻译：用于自动校正像散和高度检测的带电粒子束布置（例如，装置和方法）。

99. 发明授权

US06982427B2 Electron beam apparatus with aberration corrector 有权
公开(公告)号：US06982427B2
公开(公告)日：2006-01-03
申请号：US10754581
申请日：2004-01-12
申请人： Takeshi Kawasaki , Takaho Yoshida , Yoichi Ose , Hideo Todokoro
发明人： Takeshi Kawasaki , Takaho Yoshida , Yoichi Ose , Hideo Todokoro
IPC分类号： G01K1/08 , G21K1/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/1471 , H01J37/153 , H01J37/265 , H01J37/28 , H01J37/302 , H01J2237/1501 , H01J2237/1534 , H01J2237/21 , H01J2237/2487 , H01J2237/2817 , H01J2237/31793
摘要： An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

100. 发明申请

US20040153989A1 Pattern writing method capable of preventing or reducing an error between design dimensions and finished dimensions of a pattern 审中-公开
标题翻译：图案写入方法能够防止或减少图案的设计尺寸和成品尺寸之间的误差
公开(公告)号：US20040153989A1
公开(公告)日：2004-08-05
申请号：US10430292
申请日：2003-05-07
申请人： Renesas Technology Corp.
发明人： Koji Tange
IPC分类号： G06F017/50
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31793
摘要： When a unit figure (F1) is divided by a provisional stripe boundary (C12) into a first portion (F11) and a second portion (F12), and besides, when width (W1) of the first portion (F11) is smaller than a predetermined threshold value (0.40 nullm), the provisional stripe boundary (C12) is partly shifted in a position where the unit figure (F1) is described such that the first portion (F11) belongs to a provisional stripe region (R2). That is, provisional stripe regions (R1, R2) are corrected to obtain formal stripe regions (R1a, R2a). As a result, the unit figure (F1) belongs to the formal stripe region (R2a) as a whole. The writing section 3 then writes a pattern on a target of writing (6) based on pattern data (D2) in which the formal stripe regions (R1a, R2a) are defined.
摘要翻译：当单位图形（F1）被临时条形边界（C12）划分成第一部分（F11）和第二部分（F12）时，此外，当第一部分（F11）的宽度（W1）小于预定阈值（0.40μm），临时条纹边界（C12）在描述单位图形（F1）的位置部分移位，使得第一部分（F11）属于临时条纹区域（R2）。也就是说，修正临时条带区域（R1，R2）以获得正式条带区域（R1a，R2a）。结果，单位图（F1）作为整体属于正式条带区域（R2a）。写入部分3然后基于其中定义了形式条带区域（R1a，R2a）的图案数据（D2）将图案写入到写入目标（6）上。

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