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    • 92. 发明申请
    • FIXING APPARATUS AND AN IMAGE FORMATION APPARATUS
    • 固定装置和图像形成装置
    • US20080292347A1
    • 2008-11-27
    • US12030907
    • 2008-02-14
    • Hiroshi KOIDEHitoshi HattoriMotokazu YasuiTakashi FujitaHirokazu Ikenoue
    • Hiroshi KOIDEHitoshi HattoriMotokazu YasuiTakashi FujitaHirokazu Ikenoue
    • G03G15/20
    • H05B3/0095
    • A fixing apparatus and an image formation apparatus are disclosed. The fixing apparatus includes two or more heaters with temperature detecting function that generate heat with electric current and detect temperature; a heating unit that includes the heater with the temperature detecting function; a film, a surface of which slides on the heating unit; a thermal fixing unit that is heated by the heating unit through the film for fusing a toner image that is yet-to-be fixed on a recording paper at a predetermined fixing temperature; a pressurization roller for pressing the recording paper to the thermal fixing unit; and a temperature control unit for controlling the temperature of the heater to be a predetermined temperature based on the temperature of the heater detected by the heater with the temperature detecting function.
    • 公开了一种定影装置和图像形成装置。 定影装置包括具有温度检测功能的两个或多个加热器,其通过电流产生热量并检测温度; 加热单元,其包括具有温度检测功能的加热器; 其表面在加热单元上滑动; 热定影单元,其由所述加热单元通过所述膜加热,用于将待固定在记录纸上的调色剂图像定影在预定定影温度; 用于将记录纸张压到热定影单元的加压辊; 以及温度控制单元,用于基于由具有温度检测功能的加热器检测到的加热器的温度来将加热器的温度控制在预定温度。
    • 93. 发明申请
    • Polishing condition control apparatus and polishing condition control method of CMP apparatus
    • 抛光条件控制装置和CMP装置的抛光条件控制方法
    • US20080268751A1
    • 2008-10-30
    • US12082366
    • 2008-04-10
    • Toshiyuki YokoyamaTakashi FujitaKatsunori Tanaka
    • Toshiyuki YokoyamaTakashi FujitaKatsunori Tanaka
    • B24B49/02
    • B24B37/005B24B49/12B24B51/00
    • To eliminate the unevenness of the remaining film thickness of the wafers, and increase the polishing efficiency, reduce the running cost and enhance the yield. A CMP apparatus 1 is equipped with a polishing recipe preparing means 3 that prepares polishing conditions so that the polishing conditions such as polishing speed, polishing pressure, abrasive and the like for the wafers become optimal, a remaining film thickness forecasting means 4 that forecasts the remaining film thickness of the wafer to be polished under the polishing conditions after polishing, a remaining film thickness measuring apparatus 4 that measures the remaining film thickness of the wafer after the polishing, and a computer 6 that controls the polishing conditions on the basis of the measurement results of the remaining film thickness. Further, the computer 6 includes a calculating unit 11 that calculate the difference between the measured value of the remaining film thickness and the forecasted value thereof, and a polishing condition correcting/changing unit 13 that corrects/changes the polishing conditions so that the calculated difference becomes minimal, and thereby, the correction/change of the polishing conditions is carried out in real time.
    • 为了消除晶片的剩余膜厚度的不均匀性,提高研磨效率,降低运行成本,提高成品率。 CMP装置1配备有抛光配方准备装置3,其准备抛光条件,使得用于晶片的抛光速度,抛光压力,研磨剂等的抛光条件变得最佳;剩余膜厚度预测装置4,其预测 在研磨后的抛光条件下待研磨晶片的剩余膜厚度,测量抛光后晶片剩余膜厚度的剩余膜厚度测量装置4以及基于该抛光条件控制抛光条件的计算机6 剩余膜厚的测量结果。 此外,计算机6包括:计算剩余膜厚度的测量值与其预测值之间的差的计算单元11以及修正/改变抛光条件的抛光条件校正/改变单元13,使得计算出的差值 变得最小,从而实时地进行抛光条件的校正/变更。
    • 94. 发明授权
    • Electronic keyboard musical instrument
    • 电子键盘乐器
    • US07432428B2
    • 2008-10-07
    • US11488565
    • 2006-07-18
    • Kei KunisadaTakashi KatoTakashi Fujita
    • Kei KunisadaTakashi KatoTakashi Fujita
    • G10H1/00
    • G10H1/348G10C1/00G10C3/06G10H7/006G10H2210/271G10H2230/045G10H2250/041G10H2250/451
    • An electronic keyboard musical instrument capable of performing delicate sound board vibration control based on outputs generated individually for respective ones of transducers, thereby realizing production of natural sounds with sufficient volume, and an easy tone quality adjustment. A sound board is fixed to a frame, and the transducers are mounted to the sound board so as to be spaced from one another. In accordance with first and second performance signals generated in response to a key operation of a keyboard and a damper pedal operation, driving signals for the transducers are individually generated in consideration of characteristics and mounting positions of the transducers, and the driving signals are supplied to the transducers. The sound board is thereby caused to vibrate at a frequency varying according to a tone pitch, thus producing a musical tone and/or a damper tone.
    • 一种电子键盘乐器,其能够基于对于各个换能器单独产生的输出进行精细的声音板振动控制,从而实现具有足够音量的自然声音的产生和简单的音质调整。 声板被固定在框架上,并且换能器被安装到声板以便彼此间隔开。 根据响应于键盘的键操作和制音踏板操作产生的第一和第二性能信号,考虑到换能器的特性和安装位置,分别产生用于换能器的驱动信号,并将驱动信号提供给 传感器。 由此,声音板以根据音调变化的频率振动,从而产生乐音和/或减震音。
    • 95. 发明申请
    • Cleaning apparatus
    • 清洁装置
    • US20080035181A1
    • 2008-02-14
    • US11888689
    • 2007-08-02
    • Hirohiko TakahashiTakashi Fujita
    • Hirohiko TakahashiTakashi Fujita
    • B08B3/10
    • H01L21/67219H01L21/67173H01L21/67178H01L21/6719
    • It is an object of the invention to provide a cleaning apparatus which can subject wafers that have undergone polishing to various cleaning processes while reducing the usage amount of pure water, increase the processing speed of wafers per unit floor area and significantly improve the operating rate, enable change or rearrangement of a plurality of cleaning processing chambers to more optimum arrangement in accordance with the cleaning treatment processes and the like, prevent generation of defects in wafers that are in process of, for example, pre-treatment, and simplify the configuration of the apparatus.In order to achieve the above described object, the present invention provides a cleaning apparatus comprising cleaning lines 2A and 2B comprised of lower and upper two levels, each of the levels comprising a plurality of cleaning processing chambers 2a to 2d or 2e to 2h; a center transporting means 6 comprising a function of transporting a wafer to be processed into or a function of transporting the processed wafer from each of the cleaning processing chambers 2a to 2h in the lower-layer and upper-layer cleaning lines 2A and 2B; an inter-chamber transporting means 16 for sequentially transporting the wafer to the adjacent cleaning processing chamber in each of the lower-layer and upper-layer cleaning lines 2A and 2B; and an introducing means for introducing pure water used in the cleaning processing chamber, which carries out precision cleaning in the upper-layer cleaning line 2B, into the cleaning processing chamber, which carries out rough cleaning in the lower-layer cleaning line 2A, as washing water for the rough cleaning.
    • 本发明的目的是提供一种可以将经过抛光的晶片进行各种清洗处理的清洗装置,同时减少纯水的使用量,增加每单位面积的晶片的处理速度并显着地提高工作速率, 能够根据清洁处理过程等使多个清洁处理室的更改或重新布置成更优化的布置,防止在例如预处理过程中生成晶片中的缺陷,并且简化 该装置。 为了实现上述目的,本发明提供了一种清洁装置,其包括由下部和上部两个层构成的清洁线2A和2B,每个层包括多个清洁处理室2a至2d或2 e至2小时; 中央传送装置6,其包括将待处理的晶片输送到或者从下一层清洁线路2A中的每个清洁处理室2a至2h输送经处理的晶片的功能;以及 2 B; 用于将晶片顺序地输送到下层和上层清洁线路2A和2B中的每一层中的相邻清洁处理室的腔室间传送装置16; 以及引入装置,用于将在上层清洁管线B中执行精密清洁的清洁处理室中使用的纯水引入到在下层清洁管线2A中进行粗略清洁的清洁处理室 ,作为洗涤水进行粗洗。
    • 96. 发明申请
    • PAD CONDITIONER, PAD CONDITIONING METHOD, AND POLISHING APPARATUS
    • PAD调节器,PAD调节方法和抛光装置
    • US20070077870A1
    • 2007-04-05
    • US11463209
    • 2006-08-08
    • Takashi Fujita
    • Takashi Fujita
    • B24B1/00B24B29/00B24B21/18
    • B24B53/017B24D13/10
    • The present invention provides a pad conditioner for dressing a surface of a polishing pad which is used in a polishing apparatus for polishing works, comprising: a substrate disposed opposite to the polishing pad; a plurality of pellets removably attached to the substrate; and a plurality of linear elastic members which have tip ends and are implanted into the pellets, wherein upon contact of the tip ends of the linear elastic members with the polishing pad, the linear elastic members elastically deform, so that a pressure necessary for conditioning the pad is generated in order to maintain a change in conditioning capability within a predetermined range and have a wide margin for adjusting a height of the conditioner.
    • 本发明提供一种用于修整用于抛光工件的抛光装置中的抛光垫的表面的垫调节器,包括:与抛光垫相对设置的基板; 多个可拆卸地附接到所述基板的小球; 以及多个线状弹性构件,其具有尖端并且被注入到所述颗粒中,其中当所述线性弹性构件的所述末端与所述抛光垫接触时,所述线性弹性构件弹性变形,使得调节所述 生成垫以便将调节能力的变化保持在预定范围内并且具有用于调节调节器的高度的宽裕度。
    • 98. 发明申请
    • Electronic keyboard musical instrument
    • 电子键盘乐器
    • US20070017353A1
    • 2007-01-25
    • US11488565
    • 2006-07-18
    • Kei KunisadaTakashi KatoTakashi Fujita
    • Kei KunisadaTakashi KatoTakashi Fujita
    • G10H3/00
    • G10H1/348G10C1/00G10C3/06G10H7/006G10H2210/271G10H2230/045G10H2250/041G10H2250/451
    • An electronic keyboard musical instrument capable of performing delicate sound board vibration control based on outputs generated individually for respective ones of transducers, thereby realizing production of natural sounds with sufficient volume, and an easy tone quality adjustment. A sound board is fixed to a frame, and the transducers are mounted to the sound board so as to be spaced from one another. In accordance with first and second performance signals generated in response to a key operation of a keyboard and a damper pedal operation, driving signals for the transducers are individually generated in consideration of characteristics and mounting positions of the transducers, and the driving signals are supplied to the transducers. The sound board is thereby caused to vibrate at a frequency varying according to a tone pitch, thus producing a musical tone and/or a damper tone.
    • 一种电子键盘乐器,其能够基于对于各个换能器单独产生的输出进行精细的声音板振动控制,从而实现具有足够音量的自然声音的产生和简单的音质调整。 声板被固定在框架上,并且换能器被安装到声板以便彼此间隔开。 根据响应于键盘的键操作和制音踏板操作产生的第一和第二性能信号,考虑到换能器的特性和安装位置,分别产生用于换能器的驱动信号,并将驱动信号提供给 传感器。 由此,声音板以根据音调变化的频率振动,从而产生乐音和/或减震音。
    • 100. 发明授权
    • Heat exchanger
    • 热交换器
    • US07063135B2
    • 2006-06-20
    • US10808139
    • 2004-03-24
    • Torahide TakahashiYoshihiro SasakiTakashi Fujita
    • Torahide TakahashiYoshihiro SasakiTakashi Fujita
    • F28F9/02
    • F28D1/05391F28F9/0204F28F9/0251F28F9/026F28F9/027
    • A heat exchanger includes a plurality of tubes, a pair of header pipes, partition walls, an inlet connector block and an outlet connector block. The plurality of tubes have one ends connected to one header pipe and other ends connected to the other header pipe. The header pipe internally has a pipe-inside flow-through bore. The partition wall is internally formed in each header pipe to divide the pipe-inside flow-through bore into two regions. Each header pipe has a block connector bore opening at an outer side wall opposing to an area to which the tubes are connected and opening to the pipe-inside flow-though bore by cutting out a portion of the partition wall. The inlet connector block is connected to the block connector bore of one header pipe to admit coolant to flow in. The outlet connector block is connected to the block connector bore of the other header pipe to permit coolant to flow out.
    • 热交换器包括多个管,一对总管,分隔壁,入口连接器块和出口连接器块。 多个管的一端连接到一个集管,另一端连接到另一个集管。 集管内部具有管内流通孔。 在每个总管内部形成分隔壁,以将管内流通孔分成两个区域。 每个集管具有在与管连接的区域相对的外侧壁处的块连接器孔,并且通过切掉分隔壁的一部分而与管内流通孔相通。 入口连接器块连接到一个集管的块连接器孔,以允许冷却剂流入。出口连接器块连接到另一个集管的块连接器孔,以允许冷却剂流出。