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91. 发明授权

US06435661B1 Liquid discharge head, liquid discharge method and liquid discharge apparatus 失效
标题翻译：排液头，液体排出法和排液装置
公开(公告)号：US06435661B1
公开(公告)日：2002-08-20
申请号：US09650996
申请日：2000-08-31
申请人： Ryoji Inoue , Hiroshi Sugitani , Masanori Takenouchi , Masami Ikeda , Masahiko Kubota , Kiyomitsu Kudo , Takashi Saito
发明人： Ryoji Inoue , Hiroshi Sugitani , Masanori Takenouchi , Masami Ikeda , Masahiko Kubota , Kiyomitsu Kudo , Takashi Saito
IPC分类号： B41J214
CPC分类号： B41J2/14056 , B41J2/055 , B41J2/14048 , B41J2/14129
摘要： There is disclosed a liquid discharge head comprises a discharge port for discharging a liquid, a liquid flow path with one end constantly communicating with the discharge port and with a bubble generating area for generating a bubble in the liquid, a liquid supply port disposed in the liquid flow path and connected to a common liquid supply chamber for storing the liquid to be supplied to the liquid flow path, a plurality of bubble generating means, disposed in the liquid flow path, for generating the bubble in the liquid, and a plate-like movable member disposed in the liquid flow path with the side of the discharge port supported as a free end at a gap of 10 &mgr;m or less with respect to the liquid supply port on the side of the liquid flow path, and provided with a projection area larger than an opening area of the liquid supply port. The discharge port is in a linear communication state with the bubble generating means, and by driving the bubble generating means for generating the bubble with a smallest volume among the plurality of bubble generating means, the movable member seals and substantially shuts off the liquid supply port, which can increase a discharge amount ratio of liquid droplets, equalize liquid droplet discharge speeds, and raise a refill frequency after discharge.
摘要翻译：公开了一种液体排出头，其包括用于排出液体的排出口，一端与排出口恒定连通的液体流路，以及用于在液体中产生气泡的气泡发生区域，液体流动路径并连接到公共液体供应室，用于储存要供应到液体流动通道的液体;多个气泡发生装置，设置在液体流动通道中，用于在液体中产生气泡; 所述液体流路中的所述液体流动路径中的所述液体流动路径中的液体供给口相对于所述液体流路的一侧的所述液体供给口以与所述液体流路相同的方式被支撑为自由端，面积大于液体供应口的开口面积。排出口与气泡产生装置处于线性连通状态，并且通过驱动用于在多个气泡生成装置中产生体积最小的气泡的气泡产生装置，可移动件密封并基本上关闭液体供应口能够提高液滴的排出量比，均匀化液滴喷出速度，并且在排出后提高再充填频率。

92. 发明授权

US06386686B1 Liquid discharge head, manufacturing method of liquid discharge head, head cartridge, and liquid discharge apparatus 失效
标题翻译：排液头，排液头，头盒，排液装置的制造方法
公开(公告)号：US06386686B1
公开(公告)日：2002-05-14
申请号：US09448597
申请日：1999-11-24
申请人： Masahiko Kubota , Aya Yoshihira , Kiyomitsu Kudo
发明人： Masahiko Kubota , Aya Yoshihira , Kiyomitsu Kudo
IPC分类号： B41J205
CPC分类号： B41J2/14064 , B41J2/1604 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1634 , B41J2/1639 , B41J2/1642 , B41J2/1646
摘要： A liquid discharge head has a plurality of first liquid flow passages connected to outlets for discharging the discharge liquid, a plurality of second liquid flow passages having an element board with heating elements for generating a bubble in the bubbling liquid and corresponding to the first liquid flow passages, and movable separation films substantially and mutually separating the first liquid flow passages and the second liquid flow passages at all times, wherein the movable separation films are mutually independent individual separation films for each of the second liquid flow passages. It is possible to directly provide a flow passage wall configuring a side wall of a first liquid flow passage onto the element board by the low temperature junction by using surface activation since the movable separation films are individual separation films. The junction of the flow passage wall to the element board is surely performed and the dispersion in discharge characteristics depending on the lot of products can be restrained.
摘要翻译：液体排出头具有连接到用于排出排出液体的出口的多个第一液体流动通道，多个第二液体流动通道，其具有带有加热元件的元件板，用于在发泡液体中产生气泡并对应于第一液体流通道和可移动隔离膜，其中所有可移动隔离膜是用于每个第二液体流动通道的相互独立的独立分离膜，其基本上相互分离第一液体流道和第二液体流道。由于可移动分隔膜是单独的分离膜，所以可以通过使用表面激活来直接提供通过低温接合部将第一液体流动通道的侧壁构造成元件板的流动通道壁。可靠地进行流路壁与元件基板的接合，能够抑制产品的批次的放电特性的分散。

93. 发明授权

US06331043B1 Liquid discharging method, a liquid discharge head, and a liquid discharger apparatus 失效
标题翻译：液体排出方法，液体排出头和排液装置
公开(公告)号：US06331043B1
公开(公告)日：2001-12-18
申请号：US09089427
申请日：1998-06-03
申请人： Satoshi Shimazu , Hiroshi Sugitani , Kazuaki Masuda , Masami Ikeda , Hiroyuki Ishinaga , Toshio Kashino , Masahiko Kubota , Aya Yoshihira , Kiyomitsu Kudo
发明人： Satoshi Shimazu , Hiroshi Sugitani , Kazuaki Masuda , Masami Ikeda , Hiroyuki Ishinaga , Toshio Kashino , Masahiko Kubota , Aya Yoshihira , Kiyomitsu Kudo
IPC分类号： B41J214
CPC分类号： B41J2/04533 , B41J2/04573 , B41J2/0458 , B41J2/14048 , B41J2/14056 , B41J2/14064
摘要： A liquid discharging method for discharging liquid, which uses the pressure exerted at the time of creating each of bubbles in liquid in a bubble generating area, is arranged to provide two bubble generating areas for generating bubbles in such a manner as to enable these areas to face each other at least partly, hence discharging liquid by means for the pressure thus exerted in the bubble generating areas. In this way, it becomes possible to increase the amount of liquid discharged, as well as to enhance the durability of the movable members, while stabilizing the discharge of liquid from each of the discharge openings.
摘要翻译：用于排出液体的液体排放方法，其使用在气泡产生区域中产生液体中的每个气泡时施加的压力，以提供两个用于产生气泡的气泡产生区域，以使得这些区域能够至少部分地彼此面对，从而通过用于由此施加在气泡生成区域中的压力排出液体。以这种方式，可以在稳定来自每个排出口的液体的排放的同时增加排出的液体的量以及增加可移动部件的耐久性。

94. 发明授权

US06305783B1 Liquid discharge method, liquid discharge head, manufacturing method of the head, head cartridge, and liquid discharge device 有权
标题翻译：液体排出法，排液头，头，头盒，排液装置的制造方法
公开(公告)号：US06305783B1
公开(公告)日：2001-10-23
申请号：US09452181
申请日：1999-12-02
申请人： Masahiko Kubota , Yuji Tsuruoka
发明人： Masahiko Kubota , Yuji Tsuruoka
IPC分类号： B41J214
CPC分类号： B41J2/14056 , B41J2/14048 , B41J2/1604 , B41J2/1626 , B41J2/1631 , B41J2/1642 , B41J2/1646 , B41J2202/13
摘要： A liquid discharge method is disclosed which comprises a displacement step where a movable member is displaced by generating an electrostatic force between a substrate having a thermal energy generating element for generating thermal energy which is utilized to discharge a liquid through a discharge port and the movable member disposed opposite to the thermal energy generating element and having a free end on a downstream side in the flow direction of the liquid to thereby displace a liquid surface at the discharge port to an upstream side in the flow direction of the liquid; and a discharge step where the movable member is displaced owing to a bubble formed by the thermal energy generated by the thermal energy generating element to discharge the liquid through the discharge port. In addition, there are also herein disclosed a liquid discharge head, a manufacturing method of the head, a head cartridge, a liquid discharge device, and the like.
摘要翻译：本发明公开了一种液体排出方法，该方法包括一种位移步骤，其中通过在具有用于产生用于通过排出口排出液体的热能的热能产生元件的基板之间产生静电力而移动可动件，并且可移动件与所述热能产生元件相对设置并且在所述液体的流动方向上的下游侧具有自由端，从而将所述排出口处的液面移动到所述液体的流动方向的上游侧; 以及排出步骤，其中可移动构件由于由热能产生元件产生的热能形成的气泡而移位，以通过排出口排放液体。此外，还公开了液体排出头，头部的制造方法，头盒，液体排出装置等。

95. 发明授权

US08869401B2 Method for manufacturing microstructure, and method for manufacturing liquid jetting head 有权
标题翻译：微结构的制造方法以及液体喷射头的制造方法
公开(公告)号：US08869401B2
公开(公告)日：2014-10-28
申请号：US12811255
申请日：2009-03-26
申请人： Masahiko Kubota , Satoshi Kokubo
发明人： Masahiko Kubota , Satoshi Kokubo
IPC分类号： B21D53/76 , B23P17/00 , H05K3/02 , H05K3/10 , G03C1/00 , G03F7/00 , B41J2/16
CPC分类号： B41J2/1603 , B41J2/1634 , Y10T29/49155 , Y10T29/49401
摘要： A liquid ejection head or microstructure manufacturing method includes providing a substrate with an organic resin material layer for forming a flow passage wall member, and forming a flow path and ejection outlet by partly removing the organic resin material layer by illumination with a laser beam having a pulse width between 2 and 20 picosecs and having a focal point inside the organic resin material layer, with movement of the focal point of the laser beam. The ejection outlet is formed by exposure of the organic resin material to the laser beam condensed by a first lens having a numerical aperture of not less than 0.3, and the liquid flow path is formed by exposure of the organic resin material to the laser beam condensed by a second lens having a numerical aperture which is larger than that of the first lens and which is not less than 0.5.
摘要翻译：液体喷射头或微结构制造方法包括向基板提供用于形成流路壁构件的有机树脂材料层，以及通过用具有下述方式的激光束照射部分去除有机树脂材料层而形成流路和喷射出口脉冲宽度在2至20皮秒之间，并且随着激光束的焦点的移动而在有机树脂材料层内具有焦点。喷射出口是通过将有机树脂材料暴露于由数值孔径不小于0.3的第一透镜冷凝的激光束而形成的，并且液体流动路径是通过将有机树脂材料暴露于浓缩的激光束而形成的通过具有比第一透镜大的数值孔径并且不小于0.5的数值孔径的第二透镜。

96. 发明授权

US08829391B2 Laser processing method 有权
标题翻译：激光加工方法
公开(公告)号：US08829391B2
公开(公告)日：2014-09-09
申请号：US12907349
申请日：2010-10-19
申请人： Kosuke Kurachi , Masahiko Kubota , Akihiko Okano , Atsushi Hiramoto
发明人： Kosuke Kurachi , Masahiko Kubota , Akihiko Okano , Atsushi Hiramoto
IPC分类号： B23K26/42 , B23K26/40 , B23K26/18 , B23K26/36 , H01L21/268 , B23K26/00
CPC分类号： B23K26/18 , B23K26/361 , B23K26/40 , B23K26/53 , B23K26/60 , B23K2103/50 , H01L21/268
摘要： A laser processing method of processing an object to be processed. The object to be processed has a modified portion and a non-modified portion. A modified layer forming step forms a modified layer of the object to be processed by scanning an inner portion of the object with a condensing point of first laser light. The modified layer (i) has a processing speed with second laser light that is lower than a processing speed of a non-modified portion and (ii) is formed below the non-modified portion. A removing step removes a portion of the non-modified portion. The portion of the non-modified portion ranges from a surface of the object to the modified layer. The removing step includes irradiating the portion of the non-modified portion with the second laser light.
摘要翻译：一种处理被处理物体的激光加工方法。待处理对象具有修改部分和未修改部分。改性层形成步骤通过用第一激光的聚光点扫描物体的内部来形成被处理物体的改性层。改性层（i）的处理速度与第二激光的处理速度相比低于非变形部的处理速度，（ii）形成在非变形部的下方。去除步骤去除未修饰部分的一部分。未改性部分的部分从物体的表面到改性层的范围。去除步骤包括用第二激光照射非改性部分的部分。

97. 发明授权

US08597529B2 Method for processing substrate and method for producing liquid ejection head and substrate for liquid ejection head 有权
标题翻译：用于处理基板的方法和用于制造液体喷射头的液体喷射头和基板的方法
公开(公告)号：US08597529B2
公开(公告)日：2013-12-03
申请号：US12484937
申请日：2009-06-15
申请人： Keisuke Kishimoto , Satoshi Ibe , Takuya Hatsui , Shimpei Otaka , Hiroto Komiyama , Hiroyuki Morimoto , Masahiko Kubota , Toshiyasu Sakai
发明人： Keisuke Kishimoto , Satoshi Ibe , Takuya Hatsui , Shimpei Otaka , Hiroto Komiyama , Hiroyuki Morimoto , Masahiko Kubota , Toshiyasu Sakai
IPC分类号： G01D15/00
CPC分类号： B41J2/1603 , B41J2/1629 , B41J2/1634 , B41J2/1635 , B41J2/1639
摘要： A method for processing a substrate includes preparing a substrate having a first layer on a first surface side thereof, the first layer having a material capable of suppressing transmission of laser light, processing the substrate with laser light from a second surface that is opposite the first surface of the substrate toward the first surface of the substrate, and allowing the laser light to reach the first layer to form a hole in the substrate, and performing etching of the substrate from the second surface through the hole.
摘要翻译：一种处理衬底的方法包括制备在其第一表面侧上具有第一层的衬底，所述第一层具有能够抑制激光透射的材料，用来自与第一层相反的第二表面的激光来处理衬底基板的表面朝向基板的第一表面，并且允许激光到达第一层以在基板中形成孔，并且通过该孔从第二表面进行基板的蚀刻。

98. 发明授权

US08557164B2 Liquid discharge head and manufacturing method of the same 失效
标题翻译：排液头及其制造方法相同
公开(公告)号：US08557164B2
公开(公告)日：2013-10-15
申请号：US12581666
申请日：2009-10-19
申请人： Naozumi Nabeshima , Toru Yamane , Takumi Suzuki , Masahiko Kubota , Tamaki Sato , Ryoji Kanri , Maki Hatta , Kazuhiro Asai
发明人： Naozumi Nabeshima , Toru Yamane , Takumi Suzuki , Masahiko Kubota , Tamaki Sato , Ryoji Kanri , Maki Hatta , Kazuhiro Asai
IPC分类号： B29C33/76
CPC分类号： B41J2/1404 , B41J2/1603 , B41J2/1629 , B41J2/1631 , B41J2/1639 , B41J2/1645 , Y10T29/49401
摘要： A liquid discharge head includes a substrate having an energy generating element configured to generate energy required to discharge liquid, a discharge port configured to discharge the liquid and provided in an opposed relationship to the energy generating element, a wall member defining a chamber adapted to store the energy required to discharge liquid the energy being generated by the energy generating element, a discharge portion defining a fluid path connecting the chamber and the discharge port, a supply path facilitating supplying the liquid into the chamber, and a pair of hollow portions provided in the wall member, wherein the hollow portions oppose each other and sandwich at least the entire discharge port in a direction from the discharge port to the substrate, and the hollow portions are independent of the chamber.
摘要翻译：液体排出头包括具有能量产生元件的基板，该能量产生元件被配置为产生排出液体所需的能量，排出端口，其构造成排出液体并以与该能量产生元件相对的关系提供;壁构件，其限定适于存储的室由能量产生元件产生的能量排出液体所需的能量，限定连接腔室和排放口的流体路径的排出部分，便于将液体供应到腔室中的供应路径以及设置在腔室中的一对中空部分所述壁构件，其中所述中空部分彼此相对并且在从所述排出口到所述基板的方向上至少夹着所述排出口的整个排出口，并且所述中空部分与所述室独立。

99. 发明申请

US20120069094A1 LIQUID EJECTION HEAD AND MANUFACTURING METHOD THEREFOR 有权
标题翻译：液体喷射头及其制造方法
公开(公告)号：US20120069094A1
公开(公告)日：2012-03-22
申请号：US13218851
申请日：2011-08-26
申请人： Akihiko Okano , Masahiko Kubota , Ryoji Kanri , Yoshiyuki Fukumoto , Masafumi Morisue
发明人： Akihiko Okano , Masahiko Kubota , Ryoji Kanri , Yoshiyuki Fukumoto , Masafumi Morisue
IPC分类号： B41J2/045 , B23P17/00
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1631 , B41J2/1645 , Y10T29/49401
摘要： Provided is a liquid ejection head including a substrate including a liquid supply port and an energy generating element, in which the liquid supply port has at least one groove shape formed in a wall surface thereof, the at least one groove shape extending from a rear surface, which is a surface opposite to a front surface on which the energy generating element is formed, toward the front surface.
摘要翻译：本发明提供一种液体喷射头，其特征在于，包括：液体供给口和能量产生元件的基板，所述液体供给口和能量产生元件的壁面形成有至少一个槽形状，所述至少一个槽形状从后表面，其是形成有能量产生元件的正面的表面朝向前表面。

100. 发明申请

US20120028383A1 PROCESSING METHOD OF SILICON SUBSTRATE AND LIQUID EJECTION HEAD MANUFACTURING METHOD 有权
标题翻译：硅基板和液体喷射头制造方法的处理方法
公开(公告)号：US20120028383A1
公开(公告)日：2012-02-02
申请号：US13186740
申请日：2011-07-20
申请人： Atsushi Hiramoto , Masahiko Kubota , Ryoji Kanri , Akihiko Okano , Yoshiyuki Fukumoto , Atsunori Terasaki
发明人： Atsushi Hiramoto , Masahiko Kubota , Ryoji Kanri , Akihiko Okano , Yoshiyuki Fukumoto , Atsunori Terasaki
IPC分类号： H01L21/3065
CPC分类号： B41J2/1603 , B41J2/1629 , B41J2/1631 , B41J2002/14467 , H01L21/30655
摘要： A processing method of a silicon substrate including forming a second opening in a bottom portion of a first opening using a patterning mask having a pattern opening by plasma reactive ion etching. The reactive ion etching is performed with a shield structure formed in or on the silicon substrate, the shield structure preventing inside of the first opening from being exposed to the plasma.
摘要翻译：一种硅衬底的处理方法，包括使用具有通过等离子体反应离子蚀刻的图案开口的图案化掩模在第一开口的底部形成第二开口。反应离子蚀刻通过形成在硅衬底中或之上的屏蔽结构进行，防止第一开口内部的屏蔽结构暴露于等离子体。

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