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    • 91. 发明授权
    • Reversible or irreversible production of an image
    • 可逆或不可逆转的图像制作
    • US5312703A
    • 1994-05-17
    • US838293
    • 1992-03-13
    • Gerhard WagenblastVolker Bach
    • Gerhard WagenblastVolker Bach
    • B41M5/36G02F1/13G03G5/00G03G5/12G03G13/01G03G13/056G03G15/05G03G5/024G03G15/056
    • G03G13/056G03G13/01G03G5/00Y10S430/146
    • A process for the reversible or irreversible production of an image by imagewise exposure of a recording layer to energy in the presence or absence of an electrical and/or magnetic field, resulting in a pattern of surface charges on the surface of the recording layer corresponding to the imagewise exposure to energy. The recording layer consists essentially ofan organic material which solidifies in a glass-like manner, is non-photoconductive or substantially non-photoconductive and contains permanent dipoles, in whichthe pattern of surface charges is produced without or substantially without the formation of free charge carriers by reversible imagewise alignment of at least some of the permanent dipoles present in the recording layer.The process is advantageously carried out using an apparatus which comprises a suitable recording element, devices for imagewise exposure of the recording layer of the recording element to energy, and a counter-electrode which is in direct contact with the recording layer and can be removed therefrom. The pattern of surface charges produced by the process can be toned with liquid or solid toners. The resultant toner image can then either be fixed on the recording layer or transferred from the recording layer to another surface, after which the pattern of surface charges can be erased by exposing the entire surface to energy. A further image can then be produced. In this way, photocopies can be produced without the need to use the high-voltage sources which are necessary in conventional electrophotographic processes.
    • PCT No.PCT / EP90 / 01539 Sec。 371日期:1992年3月13日 102(e)1992年3月13日PCT PCT 1990年9月12日PCT公布。 出版物WO91 / 04514 日期1991年4月4日。一种通过在存在或不存在电场和/或磁场的情况下通过将记录层图像曝光成能量来逆转或不可逆地产生图像的方法,导致在 记录层的表面对应于图像曝光能量。 记录层基本上由有机材料组成,其以玻璃状的方式固化,是非光导或基本上非光导的,并且包含永久偶极子,其中表面电荷的图案不产生或基本上不形成游离电荷 载体通过存在于记录层中的至少一些永久偶极子的可逆图像取向。 该方法有利地使用包括合适的记录元件的装置,用于将记录元件的记录层成像曝光到能量的装置以及与记录层直接接触并可从其移除的对电极 。 由该方法产生的表面电荷的图案可以用液体或固体调色剂调色。 所得到的调色剂图像然后可以固定在记录层上或从记录层转移到另一个表面,之后可以通过将整个表面暴露于能量来消除表面电荷的图案。 然后可以产生另一图像。 以这种方式,可以生产复印件,而不需要使用常规电子照相方法中所需的高压源。
    • 93. 发明授权
    • Thiophene compounds
    • 噻吩化合物
    • US4937256A
    • 1990-06-26
    • US356552
    • 1989-05-25
    • Reiner KoberJoachim LeyendeckerRainer SeeleStefan KarbachNorbert MeyerKarl-Otto WestphalenBruno WuerzerGerhard Wagenblast
    • Reiner KoberJoachim LeyendeckerRainer SeeleStefan KarbachNorbert MeyerKarl-Otto WestphalenBruno WuerzerGerhard Wagenblast
    • A01N43/10C07D333/22C07D333/28C07D333/38C07D409/14C07D413/14
    • C07D409/14A01N43/10C07D333/22C07D333/28
    • Thiophene compounds of the formula I ##STR1## where the substituents and the index have the following meanings: n is 0 or 1;R.sup.1 is hydrogen, halogen, C.sub.1 -C.sub.8 -alkyl, C.sub.1 -C.sub.6 -alkoxy, C.sub.1 -C.sub.8 -haloalkyl or C.sub.1 -C.sub.6 -haloalkoxy;R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are cyano, nitro or the groups given for R.sup.1 ;A is hydrogen, C.sub.1 -C.sub.8 -alkyl, C.sub.1 -C.sub.6 -haloalkyl, C.sub.1 -C.sub.8 -alkoxy, C.sub.1 -C.sub.6 -haloalkoxy, substituted or unsubstituted aryl or heteroaryl, a radical OR.sup.6, whereR.sup.6 is hydrogen, C.sub.1 -C.sub.8 -alkyl, substituted C.sub.1 -C.sub.4 -alkyl, substituted or unsubstituted C.sub.2 -C.sub.8 -alkenyl, substituted or unsubstituted C.sub.3 -C.sub.7 -alkynyl, C.sub.4 -C.sub.9 -cycloalkyl, or a radical NR.sup.7 R.sup.8, where R.sup.7 and R.sup.8 are hydrogen, C.sub.1 -C.sub.8 -alkyl, C.sub.1 -C.sub.8 -alkoxy, C.sub.1 -C.sub.6 -haloalkyl, C.sub.1 -C.sub.6 -haloalkoxy, substituted or unsubstituted aryl or hetaryl, substituted or unsubstituted C.sub.1 -C.sub.12 -alkylcarbonyl, C.sub.1 -C.sub.12 -haloalkylcarbonyl, substituted or unsubstituted aryl or hetaryl,and their environmentally acceptable salts, processes for their manufacture, and their use.
    • 式I的噻吩化合物(I)其中取代基和指数具有以下含义:n为0或1; R 1是氢,卤素,C 1 -C 8 - 烷基,C 1 -C 6 - 烷氧基,C 1 -C 8 - 卤代烷基或C 1 -C 6 - 卤代烷氧基; R2,R3,R4和R5是氰基,硝基或R1给出的基团; A是氢,C 1 -C 8 - 烷基,C 1 -C 6 - 卤代烷基,C 1 -C 8 - 烷氧基,C 1 -C 6 - 卤代烷氧基,取代或未取代的芳基或杂芳基,基团OR 6,其中R 6是氢,C 1 -C 8烷基, 取代或未取代的C 2 -C 8 - 烯基,取代或未取代的C 3 -C 7 - 炔基,C 4 -C 9 - 环烷基或NR 7 R 8基团,其中R 7和R 8为氢,C 1 -C 8 - 烷基,C 1 -C 8 - C 1-8 - 烷氧基,C 1 -C 6 - 卤代烷基,C 1 -C 6 - 卤代烷氧基,取代或未取代的芳基或杂芳基,取代或未取代的C 1 -C 12烷基羰基,C 1 -C 12 - 卤代烷基羰基,取代或未取代的芳基或杂芳基, 盐,其制造方法及其用途。