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91. 发明专利

JPS60245644A VINYL CHLORIDE RESIN MOLDING 失效
公开(公告)号：JPS60245644A
公开(公告)日：1985-12-05
申请号：JP10193884
申请日：1984-05-21
申请人： SHINETSU CHEM IND CO
发明人： KITAMURA HAJIME , UENO SUSUMU , NOMURA HIROKAZU
IPC分类号： C08J7/00 , B29C71/04 , B29K27/06
摘要： PURPOSE:The titled molding free of plasticizer migration to the surface, coloration and deterioration of the mechanical properties, having excellent heat resistance, hydrophilic properties, etc., obtained by the short-time pulse irradiation of the surface of a vinyl chloride resin molding with an ultraviolet laser of a specified wave range. CONSTITUTION:The surface of a non-rigid vinyl chloride resin molding (e.g. a film of a non-rigid vinyl chloride resin), made by molding a vinyl chloride resin with a plasticizer, a stabilizer, a filler, a modifying additive rubber, etc. incorporated therein, is treated by short-time pulse irradiatioi with an ultraviolet laser having a wave range of 95-200nm, under conditions of average power output of several to tens of W and a repetition frequency of 1-100Hz. This treatment will easily form an extremely thin barrier layer on the surface of the molding without disadvantages such as coloration and deterioration of the physical properties, thus giving the titled molding having a plasticizer extraction by n-hexane of 0.5mg/cm or less.

92. 发明专利

JPS6037816B2 失效
公开(公告)号：JPS6037816B2
公开(公告)日：1985-08-28
申请号：JP13190980
申请日：1980-09-22
申请人： SHINETSU CHEM IND CO
发明人： IMADA KYOSHI , UENO SUSUMU , NOMURA HIROKAZU
IPC分类号： C08J7/00 , B29C59/14 , C08J7/12

93. 发明专利

JPS60143815A COMPOSITE MOLDED BODY FOR SEPARATING GAS 失效
公开(公告)号：JPS60143815A
公开(公告)日：1985-07-30
申请号：JP25057883
申请日：1983-12-29
申请人： SHINETSU CHEM IND CO
发明人： UENO SUSUMU , NOMURA HIROKAZU , KITAMURA HAJIME
IPC分类号： B01D53/22 , B01D67/00 , B01D69/12 , B01D71/44 , B01D71/70
摘要： PURPOSE:To obtain a composite molded body for separating gas which is excellent in gas permeability and in selective separation function for gas by forming a low-temp. plasma-polymerized film of gaseous organic comp. on the surface of molded silylacetylene copolymer material. CONSTITUTION:A low-temp. plasam-polymerized film of gaseous organic comp. is formed on the surface of molded copolymer material of silylacetylene monomer comp. shown by the figure. In formulas shown by the figure, R' is H or monovalent 1-4C hydrocarbon group, R , R , R , R and R are H, halogen atom, monovalent 1-4C hydrocarbon group or 1-8C alkoxyl group, A is O, bivalent 1-4C hydrocarbon group or group shown by (OSiR R )n and R , R are monovalent 1-4C hydrocarbon group, n is 1-3. Organic silicon comp., organic fluorine comp. and hydrocarbon comp., etc. are used as the organic comp. used for said plasma polymerization. About 0.005-1mu thickness of said plasma polymerized film is preferable.

94. 发明专利

JPS60122026A COMPOUND MOLDED BODY FOR GAS SEPARATION 失效
公开(公告)号：JPS60122026A
公开(公告)日：1985-06-29
申请号：JP22799683
申请日：1983-12-02
申请人： SHINETSU CHEM IND CO
发明人： UENO SUSUMU , NOMURA HIROKAZU , KITAMURA HAJIME
IPC分类号： B01D53/22 , B01D67/00 , B01D71/44 , B01D71/70
摘要： PURPOSE:To obtain a compound molded body for gas separation having high permeability of oxygen and large separation factor for nitrogen from oxygen by forming a polymerized film of a gaseous org. compd. using low temp. plasma on the surface of a molded product of polymer of an org. unsatd. compd. contg. Si. CONSTITUTION:An org. unsatd. compd. as expressed by the formula is polymerized by an appropriate method. (In the formula, R is 1-8C univalent hydrocarbon group; R and R are same or different groups selected from 1-8C univalent hydrocarbon group and 1-8C univalent hydrocarbon group and 1-8C alkoxy group; R is a group selected from 1-8C univalent hydrocarbon group, 1-8C alkoxy group, and triorganosilyl alkylene group). Preferred degree of polymn. is >=1,000. The polymer can be formed to a film, but an appropriate support may be used also. A low-temp. plasma polymerized film is formed on said molded polymer body. For this stage, a gaseous org. compd. such as organosilicon compd., organofluorine compd. etc. is introduced into a low temp. plasma generator; coexistence of inert gas such as N2, O2, etc. may be permitted. Suitable film thickness is 0.005-1mu.

95. 发明专利

JPS6014773B2 失效
公开(公告)号：JPS6014773B2
公开(公告)日：1985-04-16
申请号：JP8177479
申请日：1979-06-28
申请人： SHINETSU CHEM IND CO
发明人： IMADA KYOSHI , UENO SUSUMU , NISHINA YASUHIDE , NOMURA HIROKAZU
IPC分类号： C08J7/00 , B29C71/04 , B29K27/06

96. 发明专利

JPS60945A CONTINUOUS VACUUM TREATMENT DEVICE 失效
公开(公告)号：JPS60945A
公开(公告)日：1985-01-07
申请号：JP10787483
申请日：1983-06-17
申请人： HITACHI LTD , SHINETSU CHEM IND CO
发明人： UENO SUSUMU , KURODA KOUICHI , KITAMURA HAJIME , TOUKAI MASAYA , KATOU KENICHI , HIRAISHI NOBUYUKI
IPC分类号： B01J19/08 , B29C71/04 , C08J7/00 , C23C14/56 , F16J15/16
摘要： PURPOSE:To obtain the titled device capable of making miniaturization of a reserve vacuum chamber and reduction of power and vacuum displacement without generating a bend at the time of transportation of an article to be treated, by making the reserve vacuum chamber at a vacuum treatment chamber side smaller than that at the maximum air side. CONSTITUTION:Reserve vacuum chambers 2', 3' at a vacuum treatment chamber 1 side are made smaller than those 2, 3 at the maximum air side and the diameters of an upper and lower seal rolls of the reserve vacuum chambers 2', 3' are miniaturized. As differential pressure between the reserve vacuum chambers 2, 3 becomes extremely higher than that between the reserve vacuum chambers 2', 3', it is enough to consider a quantity of a bend of an article to be treated at the reserve vacuum chambers 2, 3 at the maximum air side wherein the differential pressure is high.

97. 发明专利

JPS59218789A FLEXIBLE PRINTED CIRCUIT BOARD AND METHOD OF PRODUCING SAME 失效
公开(公告)号：JPS59218789A
公开(公告)日：1984-12-10
申请号：JP7915183
申请日：1983-05-06
申请人： SHINETSU CHEM IND CO
发明人： UENO SUSUMU , KITAMURA HAJIME , INOUE YOUJIN
IPC分类号： B32B15/08 , C08J5/18 , H05K1/00 , H05K3/38 , H05K1/02

98. 发明专利

JPS59106570A Fiber product having different functions at front and back surfaces thereof 失效
标题翻译：纤维制品在其前表面和背面上具有不同的功能
公开(公告)号：JPS59106570A
公开(公告)日：1984-06-20
申请号：JP21238882
申请日：1982-12-03
申请人： Shinetsu Chem Ind Co , Nikka Chemical Ind Co Ltd , Emori Shoji Kk
发明人： UENO SUSUMU , NOMURA HIROKAZU , HASHIZUME SHINOBU , NISHIDE TOSHISUKE
IPC分类号： D06M10/00 , D06M10/02 , D06M13/00

99. 发明专利

JPS58224800A Mat on desk 失效
标题翻译： MAT上桌
公开(公告)号：JPS58224800A
公开(公告)日：1983-12-27
申请号：JP10797782
申请日：1982-06-23
申请人： Mitsubishi Monsanto Chem , Shinetsu Chem Ind Co
发明人： OKANO MASAJI , WASHIMI MIZUO , UENO SUSUMU , KAMATA HIDEAKI , IMADA KIYOSHI
IPC分类号： B43L3/00 , A47B97/00 , C08J7/00

100. 发明专利

JPS57202323A ANTISTATIC FLUORINE-CONTAINED RESIN MOLDED ARTICLE 失效
公开(公告)号：JPS57202323A
公开(公告)日：1982-12-11
申请号：JP8794681
申请日：1981-06-08
申请人： SHINETSU CHEM IND CO
发明人： UENO SUSUMU , NOMURA HIROKAZU , IMADA KIYOSHI
IPC分类号： C08J7/00
摘要： PURPOSE:To provide the titled molded article having durable antistatic property, by treating the surface of a molded article with a low-temperature plasma of a specific organic silicon compound, thereby modifying the surface characteristics of the article. CONSTITUTION:A fluorine-contained resin molded article (e.g. polytetrafluoroethylene resin) is placed in a low-temperature plasma generating vessel. The vessel is maintained at a pressure of preferably 1-0.005 Torr while passing the gas of an organic silicon compound selected from an organosilane of formula [R is (substituted) univalent hydrocarbon group; X is halogen or alkoxy; a is 1, 2 or 3; b is 0 or 1; a+b is 1, 2 or 3](e.g. trimethylchlorosilane) or its hydrolytic condensate (e.g. divinyltetramethyldisiloxane) through the vessel. The molded article is treated with low-temperature plasma for several seconds - several tens minutes to obtain the objective molded article.

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