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    • 91. 发明申请
    • DECISION FEEDBACK EQUALIZATION WITH COMPOSITE TRELLIS SLICER
    • 决策反馈与复合TRELLIS SLICER的均衡
    • US20070140329A1
    • 2007-06-21
    • US11425602
    • 2006-06-21
    • Yuwei ZhangKevin HwangJun LuShue-Lee Chang
    • Yuwei ZhangKevin HwangJun LuShue-Lee Chang
    • H03H7/30H04B1/10
    • H04L25/03057H04L25/03267H04L2025/0349
    • A decision feedback equalizer is configured to equalize an input signal to generate a recovered output signal. Linear feed-forward filter circuitry is configured to provide a linearly filtered output signal based on the input signal. Composite trellis decoder circuitry configured to process a combined signal that is based on a combination of at least the linearly feed-forward filtered output signal and on output of linear or non-linear feedback filter circuitry, in accordance with state metrics generated by processing a composite trellis diagram relative to the combined signal, to provide a trellis-decoded output signal as input to the linear or non-linear feedback filter circuitry. The composite trellis decoder circuitry is further configured to provide a particular phase output of the combined signal, based on the state metrics, as the decoded output signal.
    • 判定反馈均衡器被配置为均衡输入信号以产生恢复的输出信号。 线性前馈滤波器电路被配置为基于输入信号提供线性滤波的输出信号。 复合网格解码器电路,被配置为处理基于至少线性前馈滤波的输出信号和线性或非线性反馈滤波器电路的输出的组合的组合信号,根据通过处理复合 网格图相对于组合信号,以提供格状解码的输出信号作为线性或非线性反馈滤波器电路的输入。 复合网格解码器电路还被配置为基于状态度量提供组合信号的特定相位输出作为解码输出信号。
    • 92. 发明授权
    • Collapsing bridge crimp
    • 坍塌的桥梁卷曲
    • US07179116B2
    • 2007-02-20
    • US11146638
    • 2005-06-07
    • Stephane MenardJun Lu
    • Stephane MenardJun Lu
    • H01R11/20
    • H01R4/183
    • The collapsing bridge crimp comprises a central portion and two mutually-opposite side arms extending from the central portion. Each side arm comprises a first portion attached to the central portion, the first portion being inwardly curved, and a second portion extending from the first portion and located above the central portion. The second portion of each side arm is substantially straight and defines an upwardly-oriented angle with reference to the central portion. The second portion also has a free end provided with an end face, the end face of both side arms defining a top-opened wire-receiving groove between them.
    • 塌缩的桥式压接包括从中心部分延伸的中心部分和两个相互相对的侧臂。 每个侧臂包括附接到中心部分的第一部分,第一部分向内弯曲,以及从第一部分延伸并位于中心部分上方的第二部分。 每个侧臂的第二部分基本上是直的并且相对于中心部分限定向上定向的角度。 第二部分还具有设置有端面的自由端,两个侧臂的端面在它们之间限定顶部开放的线容纳槽。
    • 94. 发明申请
    • Uniformity control using multiple tilt axes, rotating wafer and variable scan velocity
    • 使用多个倾斜轴,旋转晶片和可变扫描速度的均匀性控制
    • US20050263721A1
    • 2005-12-01
    • US11021420
    • 2004-12-23
    • Anthony RenauJoseph OlsonDonna SmatlakJun Lu
    • Anthony RenauJoseph OlsonDonna SmatlakJun Lu
    • G21K5/10H01J37/08
    • H01J37/3023H01J37/304H01J37/3171H01J2237/20214H01J2237/31703H01L21/265
    • A system, method and program product for enhancing dose uniformity during ion implantation are disclosed. The present invention is directed to allowing the use of an at least partially untuned ion beam to obtain a uniform implant by scanning the beam in multiple rotationally-fixed orientations (scan directions) of the target at variable or non-uniform scan velocities. The non-uniform scan velocities are dictated by a scan velocity profile that is generated based on the ion beam profile and/or the scan direction. The beam can be of any size, shape or tuning. A platen holding a wafer is rotated to a new desired rotationally-fixed orientation after a scan, and a subsequent scan occurs at the same scan velocity profile or a different scan velocity profile. Also included is a method, system and program product for conducting a uniform dose ion implantation in which the target is rotated and tilted about greater than one axes relative to the ion beam.
    • 公开了一种用于在离子注入期间增强剂量均匀性的系统,方法和程序产品。 本发明旨在允许使用至少部分未经调制的离子束以可变或不均匀的扫描速度扫描靶的多个旋转固定取向(扫描方向)来获得均匀的注入。 不均匀的扫描速度由基于离子束分布和/或扫描方向产生的扫描速度分布决定。 光束可以是任何尺寸,形状或调谐。 在扫描之后,保持晶片的压板旋转到新的期望的旋转固定取向,并且随后的扫描以相同的扫描速度分布或不同的扫描速度分布发生。 还包括用于进行均匀剂量离子注入的方法,系统和程序产品,其中靶相对于离子束旋转并且倾斜大于大于一个轴。
    • 95. 发明申请
    • Uniformity control using multiple fixed wafer orientations and variable scan velocity
    • 使用多个固定晶片取向和可变扫描速度的均匀性控制
    • US20050258379A1
    • 2005-11-24
    • US11008764
    • 2004-12-08
    • Anthony RenauJoseph OlsonDonna SmatlakJun Lu
    • Anthony RenauJoseph OlsonDonna SmatlakJun Lu
    • G21K5/10H01J37/08
    • H01J37/3023H01J37/304H01J37/3171H01J2237/20214H01J2237/31703H01L21/265
    • A system, method and program product for enhancing dose uniformity during ion implantation are disclosed. The present invention is directed to allowing the use of an at least partially un-tuned ion beam to obtain a uniform implant by scanning the beam in multiple rotationally-fixed orientations (scan directions) of the target at variable or non-uniform scan velocities. The non-uniform scan velocities are dictated by a scan velocity profile that is generated based on the ion beam profile and/or the scan direction. The beam can be of any size, shape or tuning. A platen holding a wafer is rotated to a new desired rotationally-fixed orientation after a scan, and a subsequent scan occurs at the same scan velocity profile or a different scan velocity profile. This technique may be used independently or in conjunction with other uniformity approaches to achieve the required level of uniformity.
    • 公开了一种用于在离子注入期间增强剂量均匀性的系统,方法和程序产品。 本发明旨在允许使用至少部分未调谐的离子束通过以可变或不均匀的扫描速度以目标的多个旋转固定取向(扫描方向)扫描光束来获得均匀的注入。 不均匀的扫描速度由基于离子束分布和/或扫描方向产生的扫描速度分布决定。 光束可以是任何尺寸,形状或调谐。 在扫描之后,保持晶片的压板旋转到新的期望的旋转固定取向,并且随后的扫描以相同的扫描速度分布或不同的扫描速度分布发生。 该技术可以独立地使用或与其他均匀性方法结合使用以实现所需的均匀性水平。
    • 96. 发明申请
    • System and method for stored data archive verification
    • 用于存储数据归档验证的系统和方法
    • US20050246376A1
    • 2005-11-03
    • US10990286
    • 2004-11-15
    • Jun LuArun Amarendran
    • Jun LuArun Amarendran
    • G06F7/00G06F11/14G06F17/30H02H3/05
    • G06F11/1448Y10S707/99943Y10S707/99953Y10S707/99955
    • Methods and systems are described for verifying stored data by receiving a first set of metadata associated with a first set of stored data, generating a second set of metadata associated with a second set of stored data which is associated with the first set of stored data, and comparing the first set of metadata and second set of metadata. Alternatively, the storage system can also generate a first set of metadata associated with a first set of stored data, generate a second set of stored data which is a copy of the first set of stored data, generate a second set of metadata associated with the second set of stored data, and compare the first set of metadata and the second set of metadata.
    • 描述了用于通过接收与第一组存储数据相关联的第一组元数据来生成与第一组存储数据相关联的与第二组存储数据相关联的第二组元数据来验证存储的数据的方法和系统, 以及比较第一组元数据和第二组元数据。 或者,存储系统还可以生成与第一组存储数据相关联的第一组元数据,生成作为第一组存储数据的副本的第二组存储数据,生成与第一组元数据相关联的第二组元数据 第二组存储数据,并比较第一组元数据和第二组元数据。
    • 98. 发明授权
    • Method and system for operating a variable aperture in an ion implanter
    • 用于在离子注入机中操作可变孔径的方法和系统
    • US06194734B1
    • 2001-02-27
    • US09253374
    • 1999-02-19
    • Paul A. LoomisHans J. RutishauserJun LuMichiro SugitaniToru MurakamiHiroshi Sogabe
    • Paul A. LoomisHans J. RutishauserJun LuMichiro SugitaniToru MurakamiHiroshi Sogabe
    • H01J37317
    • H01J37/09H01J37/304H01J37/3171
    • A system and method are provided for operating a variable aperture (30) for adjusting the amount of ion beam current passing therethrough in an ion implantation system (10). The system and method comprise means or steps for (i) measuring ion beam current at an implanter location using a current detector (35); (ii) comparing the measured ion beam current with a desired ion beam current; (iii) outputting a control signal (126, 128) based on the comparison of the measured ion beam current with the desired ion beam current; and (iv) adjusting a gap (50), through which through ion beam passes and which is defined by opposing first and second aperture plates (44A, 44B), in response to the control signal to control the amount of ion beam current passing therethrough. The current detector (35) provides ion beam current feedback, and a position sensor (116, 118) may be utilized to provide aperture plate (44A, 44B) position feedback. The system and method provide a quick, direct, and precise mechanism for effecting significant changes in ion beam current without requiring re-tuning of the source. The gap (50) of the aperture (44) is adjustable in increments of about 5 microns (&mgr;m).
    • 提供了一种用于操作可变孔径(30)以用于调节在离子注入系统(10)中通过其中的离子束电流的量的系统和方法。 该系统和方法包括用于(i)使用电流检测器(35)测量在注入器位置处的离子束电流的装置或步骤; (ii)将所测量的离子束电流与期望的离子束电流进行比较; (iii)基于所测量的离子束电流与期望的离子束电流的比较来输出控制信号(126,128); 和(iv)响应于控制信号调节通过离子束通过并由相对的第一和第二孔板(44A,44B)限定的间隙(50),以控制通过其的离子束电流的量 。 电流检测器(35)提供离子束电流反馈,并且位置传感器(116,118)可用于提供孔板(44A,44B)的位置反馈。 该系统和方法提供快速,直接和精确的机制来实现离子束电流的显着变化,而不需要对源进行重新调谐。 孔(44)的间隙(50)可以约5微米(母体)的增量调节。
    • 99. 外观设计
    • Audio interface
    • USD997130S1
    • 2023-08-29
    • US29720520
    • 2020-01-14
    • Jun Lu
    • Jun Lu
    • FIG. 1 is a top, front, right side perspective view of an AUDIO INTERFACE, showing my design.
      FIG. 2 is a bottom, rear, left side perspective view thereof.
      FIG. 3 is a front elevation view thereof.
      FIG. 4 is a rear elevation view thereof.
      FIG. 5 is a left side elevation view thereof.
      FIG. 6 is a right side elevation view thereof.
      FIG. 7 is a top plan view thereof.
      FIG. 8 is a bottom plan view thereof.
      FIG. 9 is an enlarged view of an area labeled 9 in FIG. 1.
      FIG. 10 is an enlarged view of an area labeled 10 in FIG. 1.
      The evenly spaced dashed broken lines depict portions of the Audio Interface that form no part of the claimed design. The dot-dash line circles depict the limits of the enlarged views and form no part of the claimed design.