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91. 发明授权

US07636999B2 Method of retaining a substrate to a wafer chuck 有权
标题翻译：将基板保持在晶片卡盘上的方法
公开(公告)号：US07636999B2
公开(公告)日：2009-12-29
申请号：US11047499
申请日：2005-01-31
申请人： Byung-Jin Choi , Anshuman Cherala , Daniel A. Babbs
发明人： Byung-Jin Choi , Anshuman Cherala , Daniel A. Babbs
IPC分类号： B23Q7/00
CPC分类号： H01L21/6831 , H01L21/6838 , Y10T29/4978 , Y10T29/49998
摘要： A method of retaining a substrate to a wafer chuck. The method features accelerating a portion of the substrate toward the wafer chuck, generating a velocity of travel of the substrate toward the wafer chuck, and reducing the velocity before the substrate reaches the wafer chuck. In this manner, the force of impact of the portion with the wafer chuck is greatly reduced, which is believed to reduce the probability that the structural integrity of the substrate, and layers on the substrate and/or the wafer chuck, are damaged.
摘要翻译：将基板保持在晶片卡盘上的方法。该方法特征在于，将基板的一部分朝向晶片卡盘加速，产生基板朝向晶片卡盘的移动速度，并降低基板到达晶片卡盘之前的速度。以这种方式，晶片卡盘的部分的冲击力大大降低，这被认为降低了基板的结构完整性和基板和/或晶片卡盘上的层被损坏的可能性。

92. 发明授权

US07635445B2 Method of separating a mold from a solidified layer disposed on a substrate 有权
标题翻译：从设置在基板上的凝固层分离模具的方法
公开(公告)号：US07635445B2
公开(公告)日：2009-12-22
申请号：US11108208
申请日：2005-04-18
申请人： Byung-Jin Choi , Anshuman Cherala , Yeong-jun Choi , Mario J. Meissl , Sidlgata V. Sreenivasan , Norman E. Schumaker , Xiaoming Lu , Ian M. McMackin , Daniel A. Babbs
发明人： Byung-Jin Choi , Anshuman Cherala , Yeong-jun Choi , Mario J. Meissl , Sidlgata V. Sreenivasan , Norman E. Schumaker , Xiaoming Lu , Ian M. McMackin , Daniel A. Babbs
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： H01L21/6875 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/6838 , Y10S977/887
摘要： The present invention is directed towards a method of separating a mold, included in a template, from a layer disposed on a substrate, the method including, inter alia, applying a separation force to the template to separate the template from the layer; and facilitating localized deformation in the substrate to reduce the separation force required to achieve separation.
摘要翻译：本发明涉及一种将包含在模板中的模具与设置在基板上的层分离的方法，该方法尤其包括向模板施加分离力以将模板与层分离; 并且促进基板中的局部变形以减小实现分离所需的分离力。

93. 发明申请

US20090214761A1 REAL TIME IMPRINT PROCESS DIAGNOSTICS FOR DEFECTS 有权
标题翻译：实时印刷过程诊断错误
公开(公告)号：US20090214761A1
公开(公告)日：2009-08-27
申请号：US12392663
申请日：2009-02-25
申请人： Sidlgata V. Sreenivasan , Shrawan Singhal , Byung-Jin Choi
发明人： Sidlgata V. Sreenivasan , Shrawan Singhal , Byung-Jin Choi
IPC分类号： C23C16/52
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Defects and/or particles during an imprint lithography process may provide exclusion zones and/or transition zones in the patterned layer. Exclusion zones and/or transition zones in the patterned layer may be identified to provide a region of interest on a template.
摘要翻译：在压印光刻过程中的缺陷和/或颗粒可以在图案化层中提供排除区和/或过渡区。可以识别图案化层中的排除区和/或过渡区以在模板上提供感兴趣的区域。

94. 发明申请

US20090026657A1 Alignment System and Method for a Substrate in a Nano-Imprint Process 有权
标题翻译：纳米压印过程中基体的对准系统和方法
公开(公告)号：US20090026657A1
公开(公告)日：2009-01-29
申请号：US12175258
申请日：2008-07-17
申请人： Pawan Kumar Nimmakayala , Byung-Jin Choi
发明人： Pawan Kumar Nimmakayala , Byung-Jin Choi
IPC分类号： B28B11/10 , G01B11/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7049 , G03F9/7088
摘要： A transparent imprint template mold is configured with gratings surrounding the active imprint area. The gratings are fabricated at the same time as the active area and thus accurately define the active area with respect to the gratings. The substrate is positioned in tool coordinates under the template mold. A sensor system generates a beam of optical energy and receives reflected energy only at a specific angular window and is used to locate the template mold. The sensor system is scanned to locate the substrate and the gratings in tool coordinates. In this manner, the relative position of the template mold is determined with respect to the substrate in tool coordinates. The substrate is then accurately positioned with respect to the template mold. The system may be used to track imprinted pattern position relative to the substrate and to determine concentricity of patterns to substrates.
摘要翻译：透明压印模板模具配置有围绕活动印记区域的光栅。光栅在有效面积的同时被制造，从而准确地限定相对于光栅的有效面积。基板位于模具模具下的工具坐标下。传感器系统产生光能束，仅在特定的角度窗口处接收反射能量，并用于定位模板模具。扫描传感器系统以确定工件坐标中的基板和光栅。以这种方式，模具模具的相对位置以工具坐标相对于基板确定。然后基板相对于模板模具被精确地定位。该系统可以用于跟踪相对于衬底的印迹图案位置并且确定图案与衬底的同心度。

95. 发明授权

US07462028B2 Partial vacuum environment imprinting 有权
标题翻译：部分真空环境印记
公开(公告)号：US07462028B2
公开(公告)日：2008-12-09
申请号：US11695263
申请日：2007-04-02
申请人： Anshuman Cherala , Pankaj B. Lad , Ian M. McMackin , Byung-Jin Choi
发明人： Anshuman Cherala , Pankaj B. Lad , Ian M. McMackin , Byung-Jin Choi
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B29C43/003 , B29C43/021 , B29C2043/025 , B29C2043/5833 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed towards a method and a system to create and maintain a desired environment in the vicinity of a nano-imprint lithography template by creation of a partial vacuum using channels or holes in the template holding the nano-imprint mold.
摘要翻译：本发明涉及通过使用保持纳米压印模具的模板中的通道或孔产生部分真空来在纳米压印光刻模板附近创建和维持所需环境的方法和系统。

96. 发明授权

US07432634B2 Remote center compliant flexure device 有权
标题翻译：远程中心兼容挠性装置
公开(公告)号：US07432634B2
公开(公告)日：2008-10-07
申请号：US11068526
申请日：2005-02-28
申请人： Byung-Jin Choi , Sidlgata V. Sreenivasan , Stephen C. Johnson
发明人： Byung-Jin Choi , Sidlgata V. Sreenivasan , Stephen C. Johnson
IPC分类号： H02N2/00
CPC分类号： G03F7/0002 , B29C43/021 , B29C43/50 , B29C2043/025 , B29C2043/5007 , B29C2043/5092 , B29C2791/008 , B82Y10/00 , B82Y40/00 , Y10T156/1168
摘要： An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of rotation. A body is coupled to the flexure system to move about a plurality of axes. An actuation system is coupled to the flexure system to selectively constrain movement of the body along a subset of the plurality of axes.
摘要翻译：用于控制与表面间隔开的物体的位移的装置包括具有限定第一旋转轴线的第一弯曲构件和限定第二旋转轴线的第二挠曲构件的挠曲系统。身体联接到挠曲系统以围绕多个轴线移动。致动系统联接到挠曲系统以选择性地限制身体沿着多个轴的子集的运动。

97. 发明授权

US07387508B2 Compliant device for nano-scale manufacturing 有权
标题翻译：符合纳米级制造的器件
公开(公告)号：US07387508B2
公开(公告)日：2008-06-17
申请号：US11142838
申请日：2005-06-01
申请人： Byung-Jin Choi , Sidigata V. Sreenivasan
发明人： Byung-Jin Choi , Sidigata V. Sreenivasan
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B29C43/021 , B29C2043/025 , B29C2043/5858 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： The present invention is directed to a compliant device comprising a support body, a floating body, and a plurality of flexure arms. Each of the plurality of flexure arms is connected between the support body and the floating body to transfer a load therebetween in parallel. To that end, the flexure arms have first and second sets of flexure joints. The first set of flexure joints facilitate rotational movement of said flexure arm about a first axis extending along a first direction. The second set of flexure joints are arranged to facilitate rotational movement of the flexure arm about a second axis, extending along a second direction that is transverse to the first direction. The flexure joints are resolute joints.
摘要翻译：本发明涉及一种包括支撑体，浮体和多个弯曲臂的柔性装置。多个挠曲臂中的每一个连接在支撑体和浮体之间，以在它们之间平行地传送负载。为此，弯曲臂具有第一组和第二组挠曲接头。第一组弯曲接头便于围绕围绕第一方向延伸的第一轴线的所述弯曲臂的旋转运动。第二组弯曲接头被布置成便于弯曲臂围绕第二轴线的旋转运动，第二轴线沿着横向于第一方向的第二方向延伸。挠性接头是坚固的接头。

98. 发明申请

US20070231422A1 System to vary dimensions of a thin template 审中-公开
标题翻译：系统以改变薄模板的尺寸
公开(公告)号：US20070231422A1
公开(公告)日：2007-10-04
申请号：US11687902
申请日：2007-03-19
申请人： Anshuman Cherala , Byung-Jin Choi
发明人： Anshuman Cherala , Byung-Jin Choi
IPC分类号： B28B7/00
CPC分类号： G03F7/0002 , B01J2219/00382 , B29C2059/023 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed towards a system to vary dimensions of a body having first and second opposed sides, the first side having a patterning area, the system including, inter alia, a fluid chamber having a support region and a recess, the support region cincturing the recess and the body resting against the support region, with the recess and a portion of the body in superimposition therewith defining a sub-chamber, the sub-chamber having a pressure defined therein to couple the fluid chamber to the second side of the body; and an actuator coupled to the fluid chamber, the actuator applying a force to the fluid chamber such that the dimensions of the body are varied.
摘要翻译：本发明涉及一种用于改变具有第一和第二相对侧的本体的尺寸的系统，该第一侧具有图案化区域，该系统尤其包括具有支撑区域和凹部的流体室，该支撑区域使凹部和身体静止抵靠支撑区域，其中凹部和主体的一部分叠加形成子室，子室具有限定在其中的压力以将流体室连接到第二侧身体; 以及联接到所述流体室的致动器，所述致动器向所述流体室施加力，使得所述主体的尺寸改变。

99. 发明申请

US20070228610A1 Method of Concurrently Patterning a Substrate Having a Plurality of Fields and a Plurality of Alignment Marks 有权
标题翻译：同时形成具有多个场和多个对准标记的基板的方法
公开(公告)号：US20070228610A1
公开(公告)日：2007-10-04
申请号：US11695850
申请日：2007-04-03
申请人： Sidlgata V. Sreenivasan , Ian M. McMackin , Christopher Mark Melliar-Smith , Byung-Jin Choi
发明人： Sidlgata V. Sreenivasan , Ian M. McMackin , Christopher Mark Melliar-Smith , Byung-Jin Choi
IPC分类号： B29C43/02
CPC分类号： B29C43/021 , B29C43/003 , B29C43/58 , B29C2043/025 , B29C2043/142 , B29C2043/5825 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/703 , G03F9/7042 , G03F9/7076 , G03F9/708 , G03F9/7084 , Y10S977/887
摘要： A method of patterning a substrate comprising first and second fields with a template, the template having a mold and a plurality of alignment forming areas and a plurality of template alignment marks, the method comprising: positioning a material on the first field of the substrate and a plurality of regions of the substrate, the plurality of regions laying outside of the first and second fields; positioning the mold and the substrate such that a desired spatial relationship between the mold and the first field of the substrate is obtained to define a pattern in the material on the first field of the substrate while concurrently defining a plurality of substrate alignment marks with the material in the plurality of regions of the substrate in superimposition with the plurality of alignment forming areas of the template; positioning a material on the second field of the substrate; and positioning the mold and the substrate to obtain a desired spatial relationship between the plurality of template alignment marks and the plurality of substrate alignment marks such that a desired spatial relationship between the mold and the second field of the substrate is obtained to define a pattern in the material on the second field of the substrate.
摘要翻译：一种使用模板构图包括第一场和第二场的衬底的方法，所述模板具有模具和多个对准形成区域和多个模板对准标记，所述方法包括：将材料定位在所述衬底的第一场上，以及所述基板的多个区域，所述多个区域布置在所述第一和第二场外; 定位模具和基板，使得获得模具和基板的第一场之间的期望的空间关系，以在基板的第一场上的材料中限定图案，同时用材料限定多个基板对准标记在与所述模板的所述多个对准形成区域重叠的所述基板的所述多个区域中; 将材料定位在基板的第二场上; 并且定位所述模具和所述基板以获得所述多个模板对准标记与所述多个基板对准标记之间的期望的空间关系，使得获得所述模具和所述基板的所述第二场之间的期望的空间关系，以限定所述模板衬底的第二场上的材料。

100. 发明申请

US20070132152A1 Method and System for Double-Sided Patterning of Substrates 有权
标题翻译：基板双面图案化方法与系统
公开(公告)号：US20070132152A1
公开(公告)日：2007-06-14
申请号：US11565350
申请日：2006-11-30
申请人： Byung-Jin Choi , Sidlgata Sreenivasan
发明人： Byung-Jin Choi , Sidlgata Sreenivasan
IPC分类号： B29C35/02
CPC分类号： G03F7/70425 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S977/887
摘要： The present invention is directed towards a method and a system of patterning first and second opposed sides of a substrate. The method and system may employ a mold assembly and obtaining a desired spatial relationship between the first and second opposed sides of the substrate and the mold assembly. In a further embodiment, the method and system may employ a first and a second mold assembly.
摘要翻译：本发明涉及一种图案化基板的第一和第二相对侧面的方法和系统。该方法和系统可以采用模具组件并且获得基板和模具组件的第一和第二相对侧之间的期望的空间关系。在另一个实施例中，该方法和系统可以采用第一和第二模具组件。

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