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    • 91. 发明公开
    • OPTOELEKTRONISCHES BAUELEMENT
    • OPTOELEKTRONISCHES宝石
    • EP2596532A1
    • 2013-05-29
    • EP11726077.8
    • 2011-05-25
    • OSRAM Opto Semiconductors GmbH
    • HÖPPEL, Lutz
    • H01L25/16H01L33/38H01L33/62
    • H01L33/62H01L25/167H01L33/22H01L33/38H01L2924/0002H01L2924/00
    • The invention relates to an optoelectronic component, having a semiconductor body (1) comprising an epitaxial layer sequence (2), and a carrier substrate (6) made of a semiconductor material and connected to the semiconductor body (1) by means of a solder layer (7) and further comprising interlayer connections (9a, 9b). The carrier substrate (6) comprises a surface doping zone (14) extending along a first main surface (11) facing the semiconductor body (1). The surface doping zone (14) comprises a p-conductive region (14a) and an n-conducting region (14b) adjacent thereto, between which a pn-transition (16) is formed. The n-conductive region (14b) is electrically connected to a p-doped region (3) of the epitaxial layer sequence (2) by means of a first sub-region (7a) of the solder layer (7), and the p-conductive region (14a) is electrically connected to an n-doped region (5) of the epitaxial layer sequence (2) by means of a second sub-region (7b) of the solder layer (7), so that the pn-transition (16) forms a protective diode for the semiconductor body (1) in the surface doping zone (14).
    • 本发明涉及一种光电子器件,其具有包括外延层序列(2)的半导体本体(1)以及由半导体材料制成并且通过焊料连接到半导体本体(1)的载体衬底(6) 层(7)并且还包括层间连接(9a,9b)。 载体衬底(6)包括沿着面对半导体本体(1)的第一主表面(11)延伸的表面掺杂区(14)。 表面掺杂区(14)包括p型导电区(14a)和与其相邻的n型导电区(14b),在其间形成pn型过渡区(16)。 借助于焊料层(7)的第一子区域(7a),n导电区域(14b)电连接到外延层序列(2)的p掺杂区域(3),并且p 通过焊料层(7)的第二子区域(7b)将导电区域(14a)电连接到外延层序列(2)的n掺杂区域(5),使得pn- 过渡(16)形成用于表面掺杂区(14)中的半导体本体(1)的保护二极管。