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91. 发明授权

EP2905804B1 MOBILE BODY DEVICE, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD 有权
公开(公告)号：EP2905804B1
公开(公告)日：2019-05-01
申请号：EP13843307.3
申请日：2013-10-02
申请人： Nikon Corporation
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20 , H01L21/027 , H01L21/68 , H02K41/03 , H02K7/08

92. 发明授权

EP2071613B1 EXPOSURE METHOD AND APPARATUS 有权
公开(公告)号：EP2071613B1
公开(公告)日：2019-01-23
申请号：EP07806596.8
申请日：2007-09-03
申请人： Nikon Corporation
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20 , G01B11/00 , G01B11/26 , H01L21/027

93. 发明公开

EP3407136A1 EXPOSURE DEVICE, EXPOSURE DEVICE CONTROL METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：EP3407136A1
公开(公告)日：2018-11-28
申请号：EP16872985.3
申请日：2016-12-06
申请人： Nikon Corporation
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20 , G03F9/00 , H01L21/68
CPC分类号： G03F7/70725 , G03F7/20 , G03F9/00 , H01L21/68
摘要： An exposure apparatus (100) is equipped with: an irradiation device (30) that irradiates a target (W) with an electron beam; a stage (26) that holds the target; a stage driving system that includes an electromagnetic motor to drive the stage; and a control system that controls the stage driving system on the basis of an irradiation state of the electron beam on the target. The control system changes the control content with respect to the stage driving system between the irradiation time and the non-irradiation time of the electron beam on the target. Accordingly, it becomes possible to use the electromagnetic motor as a drive source of the stage and also to suppress the irradiation position displacement of the electron beam on the target at the time of driving of the stage.

94. 发明公开

EP3219411A1 SHAPING DEVICE AND SHAPING METHOD 审中-公开
标题翻译：成形装置和成形方法
公开(公告)号：EP3219411A1
公开(公告)日：2017-09-20
申请号：EP14905892.7
申请日：2014-11-14
申请人： Nikon Corporation
发明人： SHIBAZAKI, Yuichi
IPC分类号： B22F3/105
摘要： This shaping apparatus is equipped with: a movement system which moves a target surface (TAS) ; a measurement system for acquiring position information of the target surface (TAS) in a state movable by the movement system, a beam shaping system (500) that has a beam irradiation section (520) and a material processing section (530) which supplies a shaping material irradiated by a beam (LB) from beam irradiation section (520) ; and a controller. On the basis of 3D data of a three-dimensional shaped object to be formed on a target surface and position information of the target surface (TAS) acquired using the measurement system, the controller controls the movement system and the beam shaping system (500) such that a target portion (TA) on the target surface (TAS) is shaped by supplying the shaping material while moving the target surface (TAS) and the beam (LB) from beam irradiation section (520) relative to each other.
摘要翻译：该成形装置具备：移动目标面（TAS）的移动系统; 测量系统，该测量系统用于获取处于可由移动系统移动的状态下的目标表面（TAS）的位置信息;光束整形系统（500），其具有光束照射部分（520）;以及材料处理部分（530）使来自光束照射部（520）的光束（LB）照射的成形材料; 和一个控制器。控制器基于将要形成在目标表面上的三维成形物体的3D数据和使用测量系统获取的目标表面（TAS）的位置信息，控制移动系统和光束整形系统（500）使得通过在使来自射束照射部520的目标表面TAS和射束LB相对于彼此移动的同时供应成形材料来对目标表面TAS上的目标部分TA进行成形。

95. 发明公开

EP3096346A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： BELICHTUNGSVORRICHTUNG，BELICHTUNGSVERFAHREN UND VORRICHTUNGSHERSTELLUNGSVERFAHREN
公开(公告)号：EP3096346A1
公开(公告)日：2016-11-23
申请号：EP15737108.9
申请日：2015-01-08
申请人： Nikon Corporation
发明人： SHIBAZAKI, Yuichi
IPC分类号： H01L21/027 , G01B11/00 , G03F7/20
CPC分类号： G03F7/70583 , G03F7/32 , G03F7/706 , G03F7/70716 , G03F7/70775 , G03F7/7085 , G03F7/70875
摘要： An exposure apparatus (100) transfers a pattern on a wafer (W) by irradiating a reticle (R) with an illumination light (IL), and the pattern is formed on a pattern surface of reticle (R). The exposure apparatus is provided with a reticle stage (RST) that moves holding reticle (R), and a sensor (30) that irradiates a measurement light on the pattern surface of reticle (R) held by reticle stage (RST) and detects speckles from the pattern.
摘要翻译：曝光装置（100）通过用照明光（IL）照射掩模版（R）而在晶片（W）上传送图案，并且图案形成在掩模版（R）的图案表面上。曝光装置具有移动保持标线（R）的标线片台（RST）和将测量光照射在由标线片台（RST）保持的标线片（R）的图案表面上并检测斑点的传感器（30）从模式。

96. 发明授权

EP2470962B1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置，曝光方法及元件制造方法
公开(公告)号：EP2470962B1
公开(公告)日：2016-08-03
申请号：EP10752444.9
申请日：2010-08-24
申请人： Nikon Corporation
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20
CPC分类号： G03F7/70108 , G03F7/70058 , G03F7/70191 , G03F7/70516 , G03F7/70725 , G03F7/70758 , G03F7/70775 , G03F7/70975 , G03F9/70 , G03F9/7046 , Y10T29/49004
摘要： An exposure apparatus is equipped with an encoder system which measures positional information of a wafer stage (WST1) by irradiating a measurement beam using four heads (60 1 to 60 4 ) installed on the wafer stage (WST1) on a scale plate (21) which covers the movement range of the wafer stage (WST1) except for the area right under a projection optical system (PL). Placement distances (A, B) of the heads (60 1 to 60 4 ) here are each set to be larger than width (a i , b i ) of the opening of the scale plates (21), respectively. This allows the positional information of the wafer stage to be measured, by switching and using the three heads facing the scale plate out of the four heads according to the position of the wafer stage.

97. 发明公开

EP3038137A1 MOBILE BODY APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译： MOBILEKÖRPERVORRICHTUNG，BELICHTUNGSVORRICHTUNG UND VORRICHTUNGSHERSTELLUNGSVERFAHREN
公开(公告)号：EP3038137A1
公开(公告)日：2016-06-29
申请号：EP14816681.2
申请日：2014-06-26
申请人： Nikon Corporation
发明人： SHIBAZAKI, Yuichi
IPC分类号： H01L21/027 , G03F7/20 , H01L21/68
摘要： A supporting member (25) on which a wafer table (WTB) is mounted is substantially kinematically supported, via six rod members (23 1 to 23 3 , 24 1 to 24 3 ) placed on a slider (22). Further, coupling members (29) are placed facing in a non-contact manner via a predetermined gap, thin plate-shaped edges (25c) provided at both ends in the Y-axis direction of the supporting member (25). By this arrangement, vibration-damping is performed by the coupling members (29) (squeeze dampers) facing the edges (25c), on vibration of the supporting member (25) mounted on the wafer table (WTB). Further, because the supporting member (25) is kinematically supported via the plurality of rod members, it becomes possible to reduce deformation of the wafer table (WTB) that accompanies deformation of the slider (22).
摘要翻译：通过放置在滑块（22）上的六个杆构件（23 1至23 3，24 1至24 3），安装有晶片台（WTB）的支撑构件（25）基本上被运动支撑。此外，联接构件（29）经由预定间隙以非接触方式放置，设置在支撑构件（25）的Y轴方向上的两端的薄板状边缘（25c）。通过这种布置，通过安装在晶片台（WTB）上的支撑构件（25）的振动，通过面对边缘（25c）的联接构件（挤压阻尼器）进行减振。此外，由于支撑构件（25）经由多个杆构件被运动支撑，所以可以减少伴随滑块（22）的变形的晶片台（WTB）的变形。

98. 发明公开

EP2905805A1 EXPOSURE DEVICE AND EXPOSURE METHOD, AND DEVICE-MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，曝光方法以及设备管理方法
公开(公告)号：EP2905805A1
公开(公告)日：2015-08-12
申请号：EP13844272.8
申请日：2013-10-02
申请人： Nikon Corporation
发明人： SHIBAZAKI, Yuichi
IPC分类号： H01L21/027 , G01B11/00 , G01B11/26 , G03F7/20 , H01L21/68
摘要： In corner sections of a first quadrant, a second quadrant, a third quadrant and a fourth quadrant whose origin point is a center of an upper surface of a stage (WST1), three each of two-dimensional heads (60 i , 60 ia , 60i b (i=1 to 4)) are provided. Stage (WST1) is driven, while measuring a position of stage (WST1) using three heads (60 i ) that face a two-dimensional grating (RG) of a scale plate (21) provided above the stage (WST1) from four heads (60 i (i=1, 2, 3, 4)), and during the driving, difference data of measurement values in a measurement direction are taken in for two remaining heads (60 ia , 60 ib ) of a head group (61 i ) having the three each of heads to which the three heads (60 i ) belong, respectively, and using the difference data, grid errors in the measurement direction of two-dimensional grating (RG) are calibrated.

99. 发明公开

EP2905804A1 MOBILE BODY DEVICE, EXPOSURE DEVICE, AND DEVICE-MANUFACTURING METHOD 审中-公开
标题翻译：与移动体，曝光装置，及器件制造方法的装置
公开(公告)号：EP2905804A1
公开(公告)日：2015-08-12
申请号：EP13843307.3
申请日：2013-10-02
申请人： Nikon Corporation
发明人： SHIBAZAKI, Yuichi
IPC分类号： H01L21/027 , H01L21/68 , H02K41/03
CPC分类号： G03F7/70716 , G03F7/70758 , G03F7/70808 , G03F7/70816 , H02K7/08 , H02K41/03 , H02K41/031 , H02K2201/18
摘要： A stage device is equipped with a surface plate (30) and a wafer stage (WST) which is mounted on surface plate (30) and has an exhausting port (73) formed on a surface facing the surface plate. In a state where wafer stage (WST) lands on the surface plate, an air chamber (72) is formed in between surface plate (30) and wafer stage (WST). Pressurized gas blows out from exhausting port (73) provided at stage main section (22) into air chamber (72), and self-weight of wafer stage (WST) is cancelled by an inner pressure of air chamber (72). This allows to the wafer stage which has stopped on the surface plate to be moved manually.

100. 发明公开

EP2836875A1 LIQUID IMMERSION MEMBER AND EXPOSURE APPARATUS 审中-公开
标题翻译：浸液元与曝光装置
公开(公告)号：EP2836875A1
公开(公告)日：2015-02-18
申请号：EP13718235.8
申请日：2013-03-15
申请人： Nikon Corporation
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20
摘要： A liquid immersion member forms a liquid immersion space on an object movable below an optical member so that the light path of exposure light emitted from an emission surface of an optical member is filled with liquid. The liquid immersion member includes a first member disposed in at least a portion of the periphery of the optical member, and a second member which is movable at the outside of at least a portion of the first member and which includes a recovery port that recovers at least a portion of the liquid in the liquid immersion space.

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