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91. 发明授权

US08350326B2 Nonvolatile semiconductor memory device 有权
标题翻译：非易失性半导体存储器件
公开(公告)号：US08350326B2
公开(公告)日：2013-01-08
申请号：US12839895
申请日：2010-07-20
申请人： Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kito , Masaru Kidoh , Hiroyasu Tanaka , Hideaki Aochi
发明人： Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kito , Masaru Kidoh , Hiroyasu Tanaka , Hideaki Aochi
IPC分类号： H01L29/792
CPC分类号： H01L29/7926 , H01L21/28282 , H01L27/11578 , H01L27/11582 , H01L29/42344 , H01L29/66833
摘要： According to one embodiment, a nonvolatile semiconductor memory device includes first and second stacked structural bodies, first and second semiconductor pillars, a memory unit connection portion, a selection unit stacked structural body, first and second selection unit semiconductor pillars, a selection unit connection portion, and first to fifth interconnections. The semiconductor pillars pierce the stacked structural bodies. The first and second interconnections are connected to the first and second semiconductor pillars, respectively. The memory unit connection portion connects the first and second semiconductor pillars. The selection unit semiconductor pillars pierce the selection unit stacked structural body. The third and fourth interconnections are connected to the first and second selection unit semiconductor pillars, respectively. The selection unit connection portion connects the first and second selection unit semiconductor pillars. The fifth interconnection is connected to the third interconnection on a side opposite to the selection unit stacked structural body.
摘要翻译：根据一个实施例，非易失性半导体存储器件包括第一和第二堆叠结构体，第一和第二半导体柱，存储单元连接部分，选择单元堆叠结构体，第一和第二选择单元半导体柱，选择单元连接部分，以及第一至第五互连。半导体支柱刺穿堆叠的结构体。第一和第二互连分别连接到第一和第二半导体柱。存储单元连接部连接第一和第二半导体柱。选择单元半导体柱刺穿选择单元堆叠结构体。第三和第四互连分别连接到第一和第二选择单元半导体柱。选择单元连接部分连接第一和第二选择单元半导体柱。第五互连在与选择单元堆叠结构体相反的一侧连接到第三互连。

92. 发明授权

US08154103B2 Semiconductor device 有权
标题翻译：半导体器件
公开(公告)号：US08154103B2
公开(公告)日：2012-04-10
申请号：US12972243
申请日：2010-12-17
申请人： Hiroyasu Tanaka , Hideaki Aochi , Ryota Katsumata , Masaru Kidoh , Yoshiaki Fukuzumi , Masaru Kito , Yasuyuki Matsuoka
发明人： Hiroyasu Tanaka , Hideaki Aochi , Ryota Katsumata , Masaru Kidoh , Yoshiaki Fukuzumi , Masaru Kito , Yasuyuki Matsuoka
IPC分类号： H01L29/00 , H01L21/76
CPC分类号： H01L29/792 , H01L21/28282 , H01L27/11578 , H01L27/11582 , H01L29/0649 , H01L29/7923 , H01L29/7926
摘要： A semiconductor device has a substrate, a source region formed on the surface portion of the substrate, a first insulating layer formed on the substrate, a gate electrode formed on the first insulating layer, a second insulating layer formed on the gate electrode, a body section connected with the source region, penetrating through the first insulating layer, the gate electrode and the second insulating layer, and containing a void, a gate insulating film surrounding the body section, and formed between the body section and the gate electrode, and a drain region connected with the body section.
摘要翻译：半导体器件具有衬底，形成在衬底的表面部分上的源极区域，形成在衬底上的第一绝缘层，形成在第一绝缘层上的栅电极，形成在栅电极上的第二绝缘层，主体与源极区域连接，穿过第一绝缘层，栅电极和第二绝缘层，并且包含空隙，围绕主体部分的栅极绝缘膜，并且形成在主体部分和栅电极之间，并且漏极区域与主体部分连接。

93. 发明申请

US20110111579A1 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：非挥发性半导体存储器件及其制造方法
公开(公告)号：US20110111579A1
公开(公告)日：2011-05-12
申请号：US13010466
申请日：2011-01-20
申请人： Masaru Kito , Ryota Katsumata , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Hideaki Aochi , Yasuyuki Matsuoka
发明人： Masaru Kito , Ryota Katsumata , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Hideaki Aochi , Yasuyuki Matsuoka
IPC分类号： H01L21/20
CPC分类号： H01L27/11578 , H01L21/8221 , H01L27/0688 , H01L27/11573 , H01L27/11582 , H01L29/66833 , H01L29/7923 , H01L29/7926
摘要： A non-volatile semiconductor storage device has a plurality of memory strings with a plurality of electrically rewritable memory cells connected in series. Each of the memory strings includes: a memory columnar semiconductor extending in a direction perpendicular to a substrate; a tunnel insulation layer contacting the memory columnar semiconductor; a charge accumulation layer contacting the tunnel insulation layer and accumulating charges; a block insulation layer contacting the charge accumulation layer; and a plurality of memory conductive layers contacting the block insulation layer. The lower portion of the charge accumulation layer is covered by the tunnel insulation layer and the block insulation layer.
摘要翻译：非易失性半导体存储装置具有多个具有串联连接的多个电可重写存储单元的存储器串。每个存储器串包括：在垂直于衬底的方向上延伸的存储器柱状半导体; 与记录柱状半导体接触的隧道绝缘层; 与隧道绝缘层接触并积累电荷的电荷累积层; 与电荷累积层接触的块绝缘层; 以及与块绝缘层接触的多个存储器导电层。电荷累积层的下部被隧道绝缘层和块绝缘层覆盖。

94. 发明授权

US07927926B2 Non-volatile semiconductor storage device and method of manufacturing the same 有权
标题翻译：非易失性半导体存储装置及其制造方法
公开(公告)号：US07927926B2
公开(公告)日：2011-04-19
申请号：US12908546
申请日：2010-10-20
申请人： Ryota Katsumata , Masaru Kito , Hiroyasu Tanaka , Masaru Kidoh , Yoshiaki Fukuzumi , Hideaki Aochi , Yasuyuki Matsuoka
发明人： Ryota Katsumata , Masaru Kito , Hiroyasu Tanaka , Masaru Kidoh , Yoshiaki Fukuzumi , Hideaki Aochi , Yasuyuki Matsuoka
IPC分类号： H01L21/82
CPC分类号： H01L21/764 , H01L27/11551 , H01L27/11556 , H01L27/11575 , H01L27/11578
摘要： A non-volatile semiconductor storage device has a plurality of memory strings with a plurality of electrically rewritable memory cells connected in series. Each of the memory strings comprises: a first columnar semiconductor layer extending in a vertical direction to a substrate; a charge accumulation layer formed around the first columnar semiconductor layer via a first insulation layer; and a first conductive layer formed around the charge accumulation layer via a second insulation layer. Each of the first conductive layers is formed to expand in a two-dimensional manner, and air gaps are formed between the first conductive layers located there above and there below.
摘要翻译：非易失性半导体存储装置具有多个具有串联连接的多个电可重写存储单元的存储器串。每个存储器串包括：沿垂直方向延伸到衬底的第一柱状半导体层; 电荷累积层，经由第一绝缘层形成在第一柱状半导体层周围; 以及经由第二绝缘层形成在电荷累积层周围的第一导电层。每个第一导电层被形成为以二维方式膨胀，并且在位于其上方和下方的第一导电层之间形成气隙。

95. 发明申请

US20110084331A1 SEMICONDUCTOR DEVICE 有权
标题翻译：半导体器件
公开(公告)号：US20110084331A1
公开(公告)日：2011-04-14
申请号：US12972243
申请日：2010-12-17
申请人： Hiroyasu Tanaka , Hideaki Aochi , Ryota Katsumata , Masaru Kidoh , Yoshiaki Fukuzumi , Masaru Kito , Yasuyuki Matsuoka
发明人： Hiroyasu Tanaka , Hideaki Aochi , Ryota Katsumata , Masaru Kidoh , Yoshiaki Fukuzumi , Masaru Kito , Yasuyuki Matsuoka
IPC分类号： H01L29/792
CPC分类号： H01L29/792 , H01L21/28282 , H01L27/11578 , H01L27/11582 , H01L29/0649 , H01L29/7923 , H01L29/7926
摘要： A semiconductor device has a substrate, a source region formed on the surface portion of the substrate, a first insulating layer formed on the substrate, a gate electrode formed on the first insulating layer, a second insulating layer formed on the gate electrode, a body section connected with the source region, penetrating through the first insulating layer, the gate electrode and the second insulating layer, and containing a void, a gate insulating film surrounding the body section, and formed between the body section and the gate electrode, and a drain region connected with the body section.
摘要翻译：半导体器件具有衬底，形成在衬底的表面部分上的源极区域，形成在衬底上的第一绝缘层，形成在第一绝缘层上的栅电极，形成在栅电极上的第二绝缘层，主体与源极区域连接，穿过第一绝缘层，栅电极和第二绝缘层，并且包含空隙，围绕主体部分的栅极绝缘膜，并且形成在主体部分和栅电极之间，并且漏极区域与主体部分连接。

96. 发明授权

US07847342B2 Non-volatile semiconductor storage device and method of manufacturing the same 有权
标题翻译：非易失性半导体存储装置及其制造方法
公开(公告)号：US07847342B2
公开(公告)日：2010-12-07
申请号：US12325023
申请日：2008-11-28
申请人： Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kidoh , Masaru Kito , Hiroyasu Tanaka , Hideaki Aochi , Yasuyuki Matsuoka
发明人： Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kidoh , Masaru Kito , Hiroyasu Tanaka , Hideaki Aochi , Yasuyuki Matsuoka
IPC分类号： H01L27/115 , H01L21/336 , H01L29/792 , H01L21/8247
CPC分类号： H01L27/11578 , G11C16/0483 , H01L21/8221 , H01L27/115 , H01L27/11556
摘要： A non-volatile semiconductor storage device has a plurality of memory strings with a plurality of electrically rewritable memory cells connected in series. Each of the memory strings includes: a first columnar semiconductor layer extending in a direction perpendicular to a substrate and having a first hollow extending downward from its upper end; a first insulation layer formed in contact with the outer wall of the first columnar semiconductor layer; a second insulation layer formed on the inner wall of the first columnar semiconductor layer so as to leave the first hollow; and a plurality of first conductive layers formed to sandwich the first insulation layer with the first columnar semiconductor layer and functioning as control electrodes of the memory cells.
摘要翻译：非易失性半导体存储装置具有多个具有串联连接的多个电可重写存储单元的存储器串。每个存储器串包括：第一柱状半导体层，其在垂直于衬底的方向上延伸并具有从其上端向下延伸的第一中空; 形成为与第一柱状半导体层的外壁接触的第一绝缘层; 第二绝缘层，形成在第一柱状半导体层的内壁上以离开第一中空部; 以及形成为将第一绝缘层与第一柱状半导体层夹在中间并用作存储单元的控制电极的多个第一导电层。

97. 发明申请

US20090146206A1 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：非挥发性半导体存储器件及其制造方法
公开(公告)号：US20090146206A1
公开(公告)日：2009-06-11
申请号：US12325023
申请日：2008-11-28
申请人： Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kidoh , Masaru Kito , Hiroyasu Tanaka , Hideaki Aochi , Yasuyuki Matsuoka
发明人： Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kidoh , Masaru Kito , Hiroyasu Tanaka , Hideaki Aochi , Yasuyuki Matsuoka
IPC分类号： H01L27/115 , H01L21/336 , H01L29/792 , H01L21/8247
CPC分类号： H01L27/11578 , G11C16/0483 , H01L21/8221 , H01L27/115 , H01L27/11556
摘要： A non-volatile semiconductor storage device has a plurality of memory strings with a plurality of electrically rewritable memory cells connected in series. Each of the memory strings includes: a first columnar semiconductor layer extending in a direction perpendicular to a substrate and having a first hollow extending downward from its upper end; a first insulation layer formed in contact with the outer wall of the first columnar semiconductor layer; a second insulation layer formed on the inner wall of the first columnar semiconductor layer so as to leave the first hollow; and a plurality of first conductive layers formed to sandwich the first insulation layer with the first columnar semiconductor layer and functioning as control electrodes of the memory cells.
摘要翻译：非易失性半导体存储装置具有多个具有串联连接的多个电可重写存储单元的存储器串。每个存储器串包括：第一柱状半导体层，其在垂直于衬底的方向上延伸并具有从其上端向下延伸的第一中空; 形成为与第一柱状半导体层的外壁接触的第一绝缘层; 第二绝缘层，形成在第一柱状半导体层的内壁上以离开第一中空部; 以及形成为将第一绝缘层与第一柱状半导体层夹在中间并用作存储单元的控制电极的多个第一导电层。

98. 发明申请

US20090090965A1 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：非挥发性半导体存储器件及其制造方法
公开(公告)号：US20090090965A1
公开(公告)日：2009-04-09
申请号：US12244989
申请日：2008-10-03
申请人： Masaru KITO , Ryota Katsumata , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Hideaki Aochi , Yasuyuki Matsuoka
发明人： Masaru KITO , Ryota Katsumata , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Hideaki Aochi , Yasuyuki Matsuoka
IPC分类号： H01L29/792 , H01L21/336
CPC分类号： H01L27/11578 , H01L21/8221 , H01L27/0688 , H01L27/11573 , H01L27/11582 , H01L29/66833 , H01L29/7923 , H01L29/7926
摘要： A non-volatile semiconductor storage device has a plurality of memory strings with a plurality of electrically rewritable memory cells connected in series. Each of the memory strings includes: a memory columnar semiconductor extending in a direction perpendicular to a substrate; a tunnel insulation layer contacting the memory columnar semiconductor; a charge accumulation layer contacting the tunnel insulation layer and accumulating charges; a block insulation layer contacting the charge accumulation layer; and a plurality of memory conductive layers contacting the block insulation layer. The lower portion of the charge accumulation layer is covered by the tunnel insulation layer and the block insulation layer.
摘要翻译：非易失性半导体存储装置具有多个具有串联连接的多个电可重写存储单元的存储器串。每个存储器串包括：在垂直于衬底的方向上延伸的存储器柱状半导体; 与记录柱状半导体接触的隧道绝缘层; 与隧道绝缘层接触并积累电荷的电荷累积层; 与电荷累积层接触的块绝缘层; 以及与块绝缘层接触的多个存储器导电层。电荷累积层的下部被隧道绝缘层和块绝缘层覆盖。

99. 发明授权

US07910432B2 Non-volatile semiconductor storage device and method of manufacturing the same 有权
标题翻译：非易失性半导体存储装置及其制造方法
公开(公告)号：US07910432B2
公开(公告)日：2011-03-22
申请号：US12393509
申请日：2009-02-26
申请人： Hiroyasu Tanaka , Masaru Kidoh , Ryota Katsumata , Masaru Kito , Yoshiaki Fukuzumi , Hideaki Aochi , Yasuyuki Matsuoka
发明人： Hiroyasu Tanaka , Masaru Kidoh , Ryota Katsumata , Masaru Kito , Yoshiaki Fukuzumi , Hideaki Aochi , Yasuyuki Matsuoka
IPC分类号： H01L21/336
CPC分类号： H01L27/11578 , H01L27/11582
摘要： Each of the memory strings includes: a first columnar semiconductor layer extending in a vertical direction to a substrate; a plurality of first conductive layers formed to sandwich an insulation layer with a charge trap layer and expand in a two-dimensional manner; a second columnar semiconductor layer formed in contact with the top surface of the first columnar semiconductor layer and extending in a vertical direction to the substrate; and a plurality of second conductive layers formed to sandwich an insulation layer with the second columnar semiconductor layer and formed in a stripe pattern extending in a first direction orthogonal to the vertical direction. Respective ends of the plurality of first conductive layers in the first direction are formed in a stepwise manner in relation to each other, entirety of the plurality of the second conductive layers are formed in an area immediately above the top layer of the first conductive layers, and the plurality of first conductive layers and the plurality of second conductive layers are covered with a protection insulation layer that is formed continuously with the plurality of first conductive layers and the second conductive layers.
摘要翻译：每个存储器串包括：在垂直方向上延伸到衬底的第一柱状半导体层; 多个第一导电层，其形成为夹着具有电荷陷阱层的绝缘层并以二维方式扩展; 第二柱状半导体层，其与所述第一柱状半导体层的顶表面接触并且在垂直方向上延伸到所述衬底; 以及多个第二导电层，其形成为与第二柱状半导体层夹着绝缘层，并且形成为沿与垂直方向正交的第一方向延伸的条纹图案。多个第一导电层的第一方向的端部相对于彼此分步地形成，多个第二导电层的整体形成在第一导电层的顶层的正上方的区域中，并且多个第一导电层和多个第二导电层被与多个第一导电层和第二导电层连续形成的保护绝缘层覆盖。

100. 发明授权

US07902591B2 Non-volatile semiconductor storage device 有权
标题翻译：非易失性半导体存储器件
公开(公告)号：US07902591B2
公开(公告)日：2011-03-08
申请号：US12244989
申请日：2008-10-03
申请人： Masaru Kito , Ryota Katsumata , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Hideaki Aochi , Yasuyuki Matsuoka
发明人： Masaru Kito , Ryota Katsumata , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Hideaki Aochi , Yasuyuki Matsuoka
IPC分类号： H01L29/792
CPC分类号： H01L27/11578 , H01L21/8221 , H01L27/0688 , H01L27/11573 , H01L27/11582 , H01L29/66833 , H01L29/7923 , H01L29/7926
摘要： A non-volatile semiconductor storage device has a plurality of memory strings with a plurality of electrically rewritable memory cells connected in series. Each of the memory strings includes: a memory columnar semiconductor extending in a direction perpendicular to a substrate; a tunnel insulation layer contacting the memory columnar semiconductor; a charge accumulation layer contacting the tunnel insulation layer and accumulating charges; a block insulation layer contacting the charge accumulation layer; and a plurality of memory conductive layers contacting the block insulation layer. The lower portion of the charge accumulation layer is covered by the tunnel insulation layer and the block insulation layer.
摘要翻译：非易失性半导体存储装置具有多个具有串联连接的多个电可重写存储单元的存储器串。每个存储器串包括：在垂直于衬底的方向上延伸的存储器柱状半导体; 与记录柱状半导体接触的隧道绝缘层; 与隧道绝缘层接触并积累电荷的电荷累积层; 与电荷累积层接触的块绝缘层; 以及与块绝缘层接触的多个存储器导电层。电荷累积层的下部被隧道绝缘层和块绝缘层覆盖。

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