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91. 发明申请

US20050032935A1 Heat-curable resin composition 有权
标题翻译：热固性树脂组合物
公开(公告)号：US20050032935A1
公开(公告)日：2005-02-10
申请号：US10498036
申请日：2002-11-21
申请人： Roger Salvin , Martin Roth , Masato Hoshino , Yasuharu Nojima
发明人： Roger Salvin , Martin Roth , Masato Hoshino , Yasuharu Nojima
IPC分类号： G03F7/032 , B32B27/26 , C08F2/00 , C08F290/04 , C08F290/06 , C08F297/02 , C08G81/02 , C08L19/00 , C08L51/08 , C08L53/00 , C08L63/00 , G03F7/004 , G03F7/027 , H05K3/28
CPC分类号： H05K3/285 , B32B27/26 , C08F290/04 , C08F290/06 , C08F297/02 , C08L19/006 , C08L51/085 , C08L53/00 , C08L63/00 , Y10T428/24917 , C08L2666/24 , C08L2666/04 , C08L2666/02
摘要： The present invention relates to a resin composition comprising an at least bifunctional prepolymer (A) curable under ection of heat, a telechelic elastomer and a particulate material having an elastomeric core and a thermoplastic shell. Layers and patterns which are produced using the formulation according to the invention have excellent adhesion properties, chemical stability, good electrical properties and high resistance to rapid temperature ranges. The compositions are suitable in particular as solder resists in the production of circuit boards.
摘要翻译：本发明涉及一种树脂组合物，其包含至少在热作用下可固化的双功能预聚物（A），遥爪弹性体和具有弹性体芯和热塑性壳的颗粒材料。使用本发明的制剂生产的层和图案具有优异的粘合性能，化学稳定性，良好的电性能和对快速温度范围的高耐受性。该组合物特别适用于生产电路板中的阻焊剂。

92. 发明授权

US06180693B2 Core/shell particles, and curable epoxy resin composition comprising same 有权
标题翻译：核/壳颗粒和包含它们的可固化环氧树脂组合物
公开(公告)号：US06180693B2
公开(公告)日：2001-01-30
申请号：US09390122
申请日：1999-09-03
申请人： Qian Tang , Martin Roth , Dean Tallak Behm , Carl Walter Mayer , Klaus Petschel , Sameer Hosam Eldin
发明人： Qian Tang , Martin Roth , Dean Tallak Behm , Carl Walter Mayer , Klaus Petschel , Sameer Hosam Eldin
IPC分类号： C08F232
CPC分类号： C08L51/04 , C08F265/04 , C08F265/06 , C08F279/02 , C08F291/02 , C08L63/00 , Y10S525/902 , C08L2666/02 , C08L2666/14
摘要： Core/shell particles comprising a core comprising an elastomer having a TG value of
摘要翻译：核/壳颗粒包含芯，其包含TG值<0℃的弹性体，其上接枝有交联共聚物的壳，其中壳的共聚物中交联组分的比例为5至90％，基于壳共聚物的共聚单体的总量，适合作为环氧树脂的增韧剂，它们具有良好的相容性

93. 发明授权

US6064294A Temperature switch, particularly adjustable temperature regulator 失效
标题翻译：温度开关，特别是温度调节器
公开(公告)号：US6064294A
公开(公告)日：2000-05-16
申请号：US325218
申请日：1999-06-03
申请人： Manfred Schwarze , Martin Roth
发明人： Manfred Schwarze , Martin Roth
IPC分类号： H01H37/22 , H01H3/32 , H01H13/20 , H01H36/00 , H01H37/38 , H01H37/40 , H01H37/42
CPC分类号： H01H37/38 , H01H13/20 , H01H3/32 , Y10T29/49105
摘要： A temperature regulator operating with a hydraulic expansion capsule or diastat (5) has a lever mechanism (30) for force transmission between the diastat and the switch spring (21) of a snap switch (20). For protecting the switch spring against overloading, into the lever mechanism is integrated a buffer or shock absorber, which is elastically flexible above a limit force associated with the operating force of the switch spring in the switching point and below the limit force is substantially rigid. The standard unit formed by the shock absorber and the lever mechanism is formed by a rocker (31) in the form of a sheet metal bent part, which has a L-shaped pivot lever portion (40), with which is constructed in one piece a stop-limited opening clip spring (41) pretensioned in the opening direction.
摘要翻译：使用液压膨胀胶囊或舒张器（5）操作的温度调节器具有杠杆机构（30），用于在卡扣开关（20）的平滑和开关弹簧（21）之间传递力。为了保护开关弹簧防止过载，进入杠杆机构的缓冲器或减震器被集成起来，该缓冲器或减震器在与开关点中的开关弹簧的操作力相关联的极限力之下弹性地弯曲并且在极限力以下并且基本上是刚性的。由减震器和杠杆机构形成的标准单元由具有L形枢转杆部分（40）的以金属板弯曲部分形式的摇臂（31）形成，其构造成一体止动限制的开启夹弹簧（41），其以打开方向预张紧。

94. 发明授权

US5554797A Tetra (hydroxphenyl) alkanes 失效
标题翻译：四（羟基苯基）烷烃
公开(公告)号：US5554797A
公开(公告)日：1996-09-10
申请号：US399686
申请日：1995-03-07
申请人： Reinhard Schulz , Norbert M unzel , Martin Roth , Wilhelm Knobloch
发明人： Reinhard Schulz , Norbert M unzel , Martin Roth , Wilhelm Knobloch
IPC分类号： G03F7/004 , C07C39/15 , C07C309/71 , C07C309/76 , C08K5/42 , C08L101/00 , G03F7/022 , H01L21/027 , H05K3/00 , C07C43/30 , C07C43/32
CPC分类号： C07C309/76 , C07C39/15 , G03F7/0226
摘要： Positive photoresist compositions comprising, in an organic solvent, at leasta) one alkali-soluble resin,b) one photosensitive quinone diazide,c) one aromatic hydroxy compound of formula I ##STR1## wherein each R is --H, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy,--OCH.sub.2 C.sub.6 H.sub.5, --OC.sub.6 H.sub.5 or --COOC.sub.1 -C.sub.4 alkyl, and R.sub.1 and R.sub.2 are each independently of the other H, C.sub.1 -C.sub.4 alkyl,--C.sub.6 H.sub.5 or a cycloaliphatic 5- or 6-membered ring, a is an integer from 0 to 4, and m and n are each independently of the other 0, 1 or 2, which compound enhances the photosensitivity and/or the rate of development, and optionallyd) additional customary modifiers,are eminently suitable for making relief structures.
摘要翻译：正性光致抗蚀剂组合物，其在有机溶剂中包含至少一种碱溶性树脂，b）一种光敏醌二叠氮化物，c）一种式I的芳族羟基化合物，其中每个R是-H，C1 C 1-4烷基，C 1 -C 4烷氧基，-OCH 2 C 6 H 5，-OC 6 H 5或-COOC 1 -C 4烷基，R 1和R 2各自独立地为H，C 1 -C 4烷基，-C 6 H 5或脂环族五元或六元环，a为 0至4的整数，m和n各自独立地为0,1或2，该化合物增强了光敏性和/或显影速率，并且任选地d）另外的常规改性剂特别适用于制备浮雕结构。

95. 发明授权

US5352831A Oligomeric cyanoguanidines 失效
标题翻译：低聚氰胍
公开(公告)号：US5352831A
公开(公告)日：1994-10-04
申请号：US914158
申请日：1992-07-14
申请人： Peter Flury , Martin Roth , Sameer H. Eldin
发明人： Peter Flury , Martin Roth , Sameer H. Eldin
IPC分类号： C07C279/28 , C08G18/02 , C08G59/40
CPC分类号： C07C279/28 , C08G18/025 , C08G59/4021
摘要： Oligomeric cyanoguanidines of formula I ##STR1## wherein, for example, R.sup.1 and R.sup.2 are each phenyl, R is 1,4-phenylene and n is an integer from 1 to 20, are suitable latent hardeners for epoxy resins. They are readily soluble in solvents suitable for the application of epoxy resins, and the cured products obtained therewith have a high glass transition temperature.
摘要翻译：式I的低聚氰基胍其中例如R1和R2各自为苯基，R为1,4-亚苯基，n为1至20的整数，为环氧树脂的合适的潜在硬化剂。它们易溶于适用于环氧树脂的溶剂中，由此获得的固化产物具有较高的玻璃化转变温度。

96. 发明授权

US5310909A Photochromic compounds, a process for their preparation, and their use 失效
标题翻译：光致变色化合物，其制备方法及其用途
公开(公告)号：US5310909A
公开(公告)日：1994-05-10
申请号：US616550
申请日：1990-11-21
申请人： Evelyn Fischer , Walter Fischer , Jurgen Finter , Kurt Meier , Martin Roth
发明人： Evelyn Fischer , Walter Fischer , Jurgen Finter , Kurt Meier , Martin Roth
IPC分类号： G03F7/028 , C07D219/06 , C07D311/86 , C07D335/16 , C07D401/12 , C07D407/12 , C07D409/12 , C08F2/50 , C09K3/00 , C09K9/02 , G03F7/031 , G03F7/038 , H01R13/52 , C07D471/22 , C07D409/14
CPC分类号： C07D401/12 , C07D219/06 , C07D311/86 , C07D335/16 , C09K9/02 , G03F7/031 , G03F7/0388 , Y10S430/163
摘要： Compounds of the formula I ##STR1## in which X is O, S, SO, SO.sub.2 or NR.sub.13, R.sub.13 is, for example, methyl, and R.sub.1 to R.sub.12, independently of one another, are, for example, H, C.sub.1 -C.sub.12 alkyl, C.sub.1 -C.sub.12 Alkoxy, halogen or --CN. The compounds are photosensitive and photochromic and are suitable as photosensitizers and simultaneously as color indicators, and as photoswitchable color filters.
摘要翻译：其中X为O，S，SO，SO 2或NR 13的式I（I）化合物，R 13为例如甲基，R 1至R 12彼此独立地为H， C 1 -C 12烷基，C 1 -C 12烷氧基，卤素或-CN。这些化合物是光敏的和光致变色的，并且适合作为光敏剂，同时作为颜色指示剂，以及作为可开关的滤色器。

97. 发明授权

US5300380A Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers 失效
标题翻译：使用基于多酚和环氧化合物或乙烯基醚的负性光致抗蚀剂生产浮雕结构的方法
公开(公告)号：US5300380A
公开(公告)日：1994-04-05
申请号：US947899
申请日：1992-09-17
申请人： Martin Roth , Kurt Meier
发明人： Martin Roth , Kurt Meier
IPC分类号： G03F7/038 , G03F7/30 , G03F7/40
CPC分类号： G03F7/0388
摘要： The present invention relates to a negative photoresist consisting essentially of a process for the production of relief structures usinga) at least one solid film-forming polyphenol,b) at least one compound which contains at least two epoxide groups or at least two vinyl ether groups or at least one epoxide and vinyl ether group in the molecule,c) at least one cationic photoinitiator for component b) andd) if appropriate customary additives.The resist can be developed under aqueous-alkaline conditions.
摘要翻译：本发明涉及一种负光致抗蚀剂，其基本上由生产浮雕结构的方法组成，该方法使用a）至少一种固体成膜多酚，b）至少一种含有至少两个环氧基或至少两个乙烯基醚的化合物基团或至少一个环氧化物和乙烯基醚基团，c）至少一种用于组分b）的阳离子光引发剂和d）如果合适的常规添加剂。抗蚀剂可以在水 - 碱性条件下显影。

98. 发明授权

US5079129A Negative photoresist based on polyphenols and epoxy compounds or vinyl ethers 失效
标题翻译：基于聚苯酚和环氧化合物或乙烯基的负离子光催化剂
公开(公告)号：US5079129A
公开(公告)日：1992-01-07
申请号：US445134
申请日：1989-11-30
申请人： Martin Roth , Kurt Meier
发明人： Martin Roth , Kurt Meier
IPC分类号： C08L61/06 , A61K38/00 , C08L61/04 , G03F7/023 , G03F7/027 , G03F7/033 , G03F7/038 , H04N5/232
CPC分类号： G03F7/0388 , H04N5/23203 , A61K38/00 , Y10S430/106
摘要： The present invention relates to a negative photoresist consisting essentially ofa) at least one solid film-forming polyphenol,b) at least one compound which contains at least two epoxide groups or at least two vinyl ether groups or at least one epoxide and vinyl ether group in the molecule,c) at least one cationic photoinitiator for component b) andd) if appropriate customary additives.The resist can be developed under aqueous-alkaline conditions.
摘要翻译：本发明涉及基本上由a）至少一种固体成膜多酚组成的负性光致抗蚀剂，b）至少一种含有至少两个环氧基团或至少两个乙烯基醚基团的化合物或至少一种环氧化物和乙烯基醚 c）至少一种用于组分b）的阳离子光引发剂和d）如果合适的常规添加剂。抗蚀剂可以在水 - 碱性条件下显影。

99. 发明授权

US4806448A Cyclic acetals or ketals of 8-keto esters or amides 失效
标题翻译： 8-酮酯或酰胺的环状缩醛或缩酮
公开(公告)号：US4806448A
公开(公告)日：1989-02-21
申请号：US125668
申请日：1987-11-27
申请人： Martin Roth
发明人： Martin Roth
IPC分类号： C07D317/30 , C07D319/06 , G03C1/72 , G03F7/004 , G03F7/022 , G03F7/039 , H01L21/027 , H01L21/30 , G03C1/495 , C07D405/14 , C07D407/12 , C07D407/14
CPC分类号： C07D319/06 , C07D317/30 , G03F7/0045 , G03F7/022
摘要： Compounds of formula I ##STR1## in conjunction with compounds that donate acid when exposed to actinic radiation, are suitable for use as positive photoresists. In formula I, R.sup.1 and R.sup.2 are hydrogen, alkyl, aryl, cycloalkyl, aralkyl or alkaryl, R.sup.3 to R.sup.8 are hydrogen or lower alkyl, X is --O-- or --NR.sup.9 --, where R.sup.9 is hydrogen or C.sub.1 -C.sub.4 alkyl n is 0 or 1, m is 2, 3 or 4 and Q is an organic radical of valency m.The photoresists are suitable for making printing formes, printed circuits, integrated circuits or silver-free photographic films.
摘要翻译：结合式I（I）化合物与暴露于光化辐射时提供酸的化合物一起适用于阳性光致抗蚀剂。在式I中，R 1和R 2为氢，烷基，芳基，环烷基，芳烷基或烷芳基，R 3至R 8为氢或低级烷基，X为-O-或-NR 9 - ，其中R 9为氢或C 1 -C 4烷基n为0 或1，m为2,3或4，且Q为化合价m的有机基团。光致抗蚀剂适用于制作印版，印刷电路，集成电路或无银摄影胶片。

100. 发明授权

US4435489A Cationic hydrazone derivatives, processes for their preparation and their use 失效
标题翻译：阳离子腙衍生物，其制备方法及其用途
公开(公告)号：US4435489A
公开(公告)日：1984-03-06
申请号：US421221
申请日：1982-09-22
申请人： Beat Muller , Martin Roth
发明人： Beat Muller , Martin Roth
IPC分类号： C09K3/00 , C07C67/00 , C07C241/00 , C07C249/16 , C07C251/80 , C07C251/86 , C07C253/00 , C07C255/66 , C08K5/19 , C08K5/30 , C10G11/18 , G03C11/10 , G03F1/56 , G03F7/09 , G03C1/84 , C08K5/16 , G02B5/20 , G02C7/10
CPC分类号： C07C251/72 , C07C255/00 , C08K5/30 , G03F1/56 , G03F7/091 , Y10S430/132
摘要： Hydrazone derivatives of the formula ##STR1## in which A.sub.1 is an aromatic radical, B.sub.1 is hydrogen, alkyl, cycloalkyl, aralkyl or aryl, R.sub.1, R.sub.2 and R.sub.3 independently of one another are alkyl, cycloalkyl, aralkyl or polyoxyalkylene, Z.sub.1 is arylene, X.sup..crclbar. is an anion and m is 0, 1, 2 or 3.The hydrazone derivatives are suitable as UV absorbers, especially in polymer coatings.
摘要翻译：其中A1是芳族基团，B1是氢，烷基，环烷基，芳烷基或芳基，R1，R2和R3彼此独立的式腙衍生物是烷基，环烷基，芳烷基或聚氧化烯，Z1是亚芳基， X（ - ）是阴离子，m是0,1,2或3.腙衍生物适合作为UV吸收剂，特别是在聚合物涂料中。

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