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    • 94. 发明申请
    • DISPLAY DEVICE AND COLOR FILTER SUBSTRATE
    • 显示设备和彩色滤光片基板
    • US20120147314A1
    • 2012-06-14
    • US13391857
    • 2010-08-19
    • Takenori YoshizawaKeiichi Tanaka
    • Takenori YoshizawaKeiichi Tanaka
    • G02F1/1343H05B37/00G02B5/22
    • G02B5/201G02F1/133514G02F2201/40G02F2201/52
    • The display device (100) of this invention has pixels (P) arranged in columns and rows to form a matrix pattern. Each pixel (P) is defined by subpixels (R, G, B, Y) arranged in m columns and n rows (where n and m are integers and n and m≧2) to form a matrix pattern and that include first, second, third and fourth subpixels (R, B, Y, G) representing first, second, third and fourth colors, respectively. In three arbitrary pixels (P) arranged in line in one of row and column directions, if the central one of the three is called a first pixel (P1) and the other two second and third pixels (P2, P3), the arrangement of the subpixels (R, G, B, Y) in the first pixel (P1) is different from that of the subpixels (R, G, B, Y) in the second and third pixels (P2, P3). The first subpixels (R) of the first and second pixels (P1, P2) are adjacent to each other, so are their second subpixels (B). The third subpixels (Y) of the first and third pixels (P1, P3) are adjacent to each other, so are their fourth subpixels (G). According to the present invention, a display device, of which each pixel is defined by four or more subpixels, can have its aperture ratio increased.
    • 本发明的显示装置(100)具有以行和列排列的像素(P),以形成矩阵图案。 每个像素(P)由以m列和n行(其中n和m为整数,n和m≥2)排列的子像素(R,G,B,Y)定义,以形成矩阵图案,并且包括第一,第二 ,第三和第四子像素(R,B,Y,G)分别表示第一,第二,第三和第四颜色。 在行和列方向中的一个排列成行的三个任意像素(P)中,如果三个中心一个被称为第一像素(P1),另外两个第二和第三像素(P2,P3) 第一像素(P1)中的子像素(R,G,B,Y)与第二和第三像素(P2,P3)中的子像素(R,G,B,Y)的子像素不同。 第一和第二像素(P1,P2)的第一子像素(R)彼此相邻,它们的第二子像素(B)也相邻。 第一和第三像素(P1,P3)的第三子像素(Y)彼此相邻,它们的第四子像素(G)也相邻。 根据本发明,每个像素由四个或更多个子像素限定的显示装置可以使其开口率增加。
    • 95. 发明授权
    • Stage apparatus and exposure apparatus
    • 舞台装置和曝光装置
    • US07994484B2
    • 2011-08-09
    • US12385059
    • 2009-03-30
    • Keiichi Tanaka
    • Keiichi Tanaka
    • G01N31/00A61N5/00
    • G03F7/70858B82Y10/00B82Y40/00G03F7/70716G03F7/70766G03F7/70783G03F7/70808G03F7/70816G03F7/70841H01J37/3174
    • The present invention provides a stage apparatus wherein an object is disposed in an atmosphere with a gas pressure lower than atmospheric pressure, and the object can be driven with high accuracy. The stage apparatus that drives a reticle comprises: a vacuum chamber, which forms a space and has an opening; an integrated coarse and fine motion table, which has an electrostatic chuck that holds the object, that, when driven, moves the electrostatic chuck inside the space; a counter mass, which is disposed so that it covers the opening, that is capable of moving because of the reaction force produced when the integrated coarse and fine motion table is driven; and a vacuum cover, which forms a space that houses the counter mass; wherein the space and the space are set to prescribed gas pressures.
    • 本发明提供了一种舞台装置,其中物体设置在气压低于大气压的气氛中,并且可以高精度地驱动物体。 驱动掩模版的平台装置包括:真空室,其形成空间并具有开口; 具有固定物体的静电卡盘的集成的粗细动作台,驱动时将静电卡盘移动到空间内; 设置为使其覆盖开口的反质量块,其由于在驱动集成的粗细动作台时产生的反作用力而能够移动; 和真空盖,其形成容纳对置质量的空间; 其中所述空间和所述空间被设定为规定的气体压力。
    • 96. 发明申请
    • PROCESS FOR CLEANING SEMICONDUCTOR ELEMENT
    • 清洁半导体元件的工艺
    • US20110146726A1
    • 2011-06-23
    • US12995303
    • 2009-05-20
    • Keiichi TanakaRyuji Sotoaka
    • Keiichi TanakaRyuji Sotoaka
    • B08B3/00
    • H01L21/02071G03F7/423
    • In a wiring formation process for a semiconductor device, the resist residue forming in dry etching with a reactive gas and aching with a plasma gas is removed, not corroding the members of the semiconductor device such as the interlayer insulating material and the wiring material thereof, and the device is protected from after-corrosion to occur after left for a given period of time after the treatment.According to a method comprising (1) washing step with an aqueous solution containing hydrofluoric acid, (2) a washing step with a mixed solution of ammonia and hydrogen peroxide, and (3) a washing step with hydrogen peroxide water, the resist residue on the side wall of a metal wiring that comprises aluminium (Al) as the main ingredient thereof is removed, and occurrence of after-corrosion is prevented.
    • 在半导体装置的布线形成工序中,去除了用反应气体的干蚀刻形成的抗蚀剂残留物和等离子体气体的起伏,而不会腐蚀诸如层间绝缘材料及其布线材料的半导体器件的部件, 并且在处理之后,在保持一段给定的时间后,保护装置免于腐蚀。 根据包括(1)用含有氢氟酸的水溶液进行洗涤步骤的方法,(2)用氨和过氧化氢的混合溶液进行洗涤步骤,和(3)用过氧化氢水洗涤步骤,将抗蚀剂残留物 除去以铝(Al)为主要成分的金属配线的侧壁,防止发生腐蚀。
    • 97. 发明申请
    • VEHICLE DATA STORAGE SYSTEM, VEHICLE DATA STORAGE APPARATUS, VEHICLE DATA STORAGE SERVER, AND VEHICLE DATA STORAGE METHOD
    • 车辆数据存储系统,车辆数据存储设备,车辆数据存储服务器和车辆数据存储方法
    • US20110131666A1
    • 2011-06-02
    • US13055314
    • 2009-07-24
    • Keiichi Tanaka
    • Keiichi Tanaka
    • G06F21/24
    • G07C5/085G07C5/008
    • A vehicle data storage system, in which vehicle data obtained from a vehicle-mounted device is stored, includes a vehicle data storage portion in which the vehicle data is stored; a country determination portion that determines a country in which a vehicle exists, based on position data of the vehicle; a selection table storage portion in which a type of the vehicle data that should be stored in the vehicle data storage portion is stored in association with country data; a data determination portion that determines the type of the vehicle data that should be stored in the vehicle data storage portion, based on the country determined by the country determination portion, by referring to the selection table storage portion; and a data processing portion that stores, in the vehicle data storage portion, the vehicle data determined by the data determination portion.
    • 一种车载数据存储系统,其中存储从车载装置得到的车辆数据,包括其中存储车辆数据的车辆数据存储部分; 基于车辆的位置数据确定车辆所在的国家的国家确定部分; 选择表存储部,其中应该存储在车辆数据存储部分中的车辆数据的类型与国家数据相关联地存储; 数据确定部分,通过参照选择表存储部分,基于由国家确定部分确定的国家来确定应存储在车辆数据存储部分中的车辆数据的类型; 以及数据处理部,其在车辆数据存储部中存储由数据确定部确定的车辆数据。
    • 98. 发明授权
    • Vacuum device, operation method for vacuum device, exposure system, and operation method for exposure system
    • 真空装置,真空装置的操作方法,曝光系统和曝光系统的操作方法
    • US07948603B2
    • 2011-05-24
    • US10569167
    • 2004-08-17
    • Keiichi Tanaka
    • Keiichi Tanaka
    • G03B27/52
    • G03F7/70808G03F7/70841
    • The exposure apparatus 100 comprises a double shell structure which has an upper vacuum chamber 140 on the outside of the reticle chamber 135, and a lower vacuum chamber 160 on the outside of the wafer chamber 155. A cryo pump CP and a turbo molecular pump TMP/dry pump DP are connected in parallel to each of the chambers, i.e., the reticle chamber 135 and wafer chamber 155. During exposure operation and alignment of the exposure apparatus 100, only the cryo pump CP (vibration-free type vacuum pump) is operated; the turbo molecular pump TMP/dry pump DP (vibrating type vacuum pump) is stopped. As a result, it is possible to cut off the transmission of vibration from the vibrating type vacuum pump during exposure operation and alignment of the exposure apparatus, so that the precision of the stage devices 137 and 157 can be ensured to a much greater degree; accordingly, deterioration of the exposure performance can be reduced to a much greater extent.
    • 曝光装置100包括双层结构,其在分划板室135的外侧具有上真空室140,在晶片室155的外侧具有下真空室160.冷冻泵CP和涡轮分子泵TMP /干泵DP平行地连接到每个室,即标线室135和晶片室155.在曝光操作和曝光装置100的对准期间,只有低温泵CP(无振动型真空泵)是 操作; 涡轮分子泵TMP /干泵DP(振动式真空泵)停止。 结果,可以在曝光操作和曝光装置的对准期间切断来自振动式真空泵的振动的传递,从而可以更大程度地确保舞台装置137和157的精度; 因此,曝光性能的劣化可以更大程度地降低。
    • 99. 发明授权
    • X-ray analyzer
    • X射线分析仪
    • US07910888B2
    • 2011-03-22
    • US12343364
    • 2008-12-23
    • Keiichi TanakaAkikazu OdawaraSatoshi NakayamaSumio IijimaShunji Bandow
    • Keiichi TanakaAkikazu OdawaraSatoshi NakayamaSumio IijimaShunji Bandow
    • H01L27/18
    • G01T1/1606
    • Provided is an X-ray analyzer capable of significantly suppressing an influence of an external magnetic field on a transition edge sensor (TES). The X-ray analyzer includes: a TES (7) for detecting energy of a received X-ray as a temperature change and outputting the temperature change as a current signal; a superconducting magnetic shield (8) which contains the TES (7) and enters a superconducting state; and a room temperature magnetic shield (9) which covers the superconducting magnetic shield (8) and performs external magnetic field shielding until the superconducting magnetic shield (8) enters the superconducting state, in which the superconducting magnetic shield (8) and the room temperature magnetic shield (9) are concentrically arranged to have a cylindrical shape.
    • 提供能够显着抑制外部磁场对过渡边缘传感器(TES)的影响的X射线分析装置。 X射线分析仪包括:TES(7),用于检测接收到的X射线的能量作为温度变化,并输出温度变化作为电流信号; 包含TES(7)并进入超导状态的超导磁屏蔽(8); 和覆盖超导磁屏蔽(8)的室温磁屏蔽(9),并执行外部磁场屏蔽,直到超导磁屏蔽(8)进入超导状态,其中超导磁屏蔽(8)和室温 磁屏蔽(9)同心地布置成具有圆柱形形状。