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91. 发明申请

US20100140921A1 CONNECTOR FOR FLUID PRESSURE DEVICES 有权
标题翻译：流体压力装置连接器
公开(公告)号：US20100140921A1
公开(公告)日：2010-06-10
申请号：US12598773
申请日：2008-03-05
申请人： Shinichi Ito
发明人： Shinichi Ito
IPC分类号： F16L55/00
CPC分类号： F16L15/08 , F16L23/032
摘要： An adapter includes a base body including a pair of coupling members and a connecting plug inserted through a hole in the base body and screw-engaged with a port of the two-way valve. In addition, upon threaded engagement of the connecting plug, the base body is mounted with respect to an attachment surface of the two-way valve. Further, a seal member is installed on an end surface of the base body, such that a sealing function is performed by abutment of the seal member against the attachment surface. Moreover, first and second connecting flanges of a connecting apparatus are engaged with respect to the coupling members of the adapter.
摘要翻译：适配器包括基体，其包括一对联接构件和通过基体中的孔插入并与二通阀的端口螺纹接合的连接塞。此外，在连接插头的螺纹接合时，基体相对于开闭阀的安装面安装。此外，密封构件安装在基体的端面上，使得通过密封构件抵靠附接表面进行密封功能。此外，连接装置的第一和第二连接凸缘相对于适配器的联接构件接合。

92. 发明申请

US20100099036A1 Pattern forming method and method of manufacturing semiconductor device 审中-公开
标题翻译：图案形成方法和制造半导体器件的方法
公开(公告)号：US20100099036A1
公开(公告)日：2010-04-22
申请号：US12654295
申请日：2009-12-16
申请人： Daisuke Kawamura , Shinichi Ito
发明人： Daisuke Kawamura , Shinichi Ito
IPC分类号： G03F7/20
CPC分类号： G03F7/11 , G03F7/70341 , G03F7/7065 , G03F7/70958 , Y10S430/162
摘要： A pattern forming method includes forming a resist film on a substrate, coating the resist film with a coating solution which forms a cover film on the resist film to form the cover film on the resist film, transferring a pattern onto the resist film by an immersion lithography method using a liquid immersion fluid to form a latent image on the resist film, removing the cover film after the formation of the latent image, conducting a first inspection to inspect whether or not the cover film has a defect between said forming the latent image and said removing the cover film, performing predetermined processing when the defect is found in the first inspection, and developing the resist film to form a resist pattern on the substrate after said removing the cover film.
摘要翻译：图案形成方法包括在基板上形成抗蚀剂膜，在抗蚀剂膜上形成覆盖膜的涂布溶液涂布抗蚀膜，在抗蚀剂膜上形成覆盖膜，通过浸渍将图案转印到抗蚀剂膜上使用液浸液体在抗蚀剂膜上形成潜像的光刻方法，在形成潜像后去除覆盖膜，进行第一次检查以检查覆盖膜在形成潜像之间是否存在缺陷并且在所述第一检查中发现所述缺陷时，移除所述覆盖膜，执行预定处理，以及在除去所述覆盖膜之后，在所述基板上显影所述抗蚀剂膜以形成抗蚀剂图案。

93. 发明授权

US07687227B2 Resist pattern forming method and manufacturing method of semiconductor device 失效
标题翻译：半导体器件的抗蚀图案形成方法和制造方法
公开(公告)号：US07687227B2
公开(公告)日：2010-03-30
申请号：US11316898
申请日：2005-12-27
申请人： Eishi Shiobara , Daisuke Kawamura , Yasunobu Onishi , Shinichi Ito
发明人： Eishi Shiobara , Daisuke Kawamura , Yasunobu Onishi , Shinichi Ito
IPC分类号： G03F7/26
CPC分类号： G03F7/11 , G03F7/2041
摘要： According to an aspect of the invention, there is provided a resist pattern forming method of forming a resist pattern by immersion exposure, comprising forming a resist film on a substrate to be treated, a contact angle between the resist film and an immersion liquid being a first angle, forming a first cover film on the resist film, a contact angle between the first cover film and the immersion liquid being a second angle which is larger than the first angle, forming a second cover film on the first cover film, a contact angle between the second cover film and the immersion liquid being a third angle which is smaller than the second angle, and forming a latent image on the resist film by the immersion exposure.
摘要翻译：根据本发明的一个方面，提供了一种通过浸渍曝光形成抗蚀剂图案的抗蚀剂图案形成方法，包括在待处理的基底上形成抗蚀剂膜，所述抗蚀剂膜和浸渍液体之间的接触角为第一角度，在抗蚀剂膜上形成第一覆盖膜，第一覆盖膜和浸渍液体之间的接触角是大于第一角度的第二角度，在第一覆盖膜上形成第二覆盖膜，接触第二覆盖膜和浸液之间的角度是比第二角度小的第三角度，并且通过浸渍曝光在抗蚀剂膜上形成潜像。

94. 发明授权

US07541136B2 Mask, manufacturing method for mask, and manufacturing method for semiconductor device 失效
标题翻译：掩模，掩模的制造方法和半导体器件的制造方法
公开(公告)号：US07541136B2
公开(公告)日：2009-06-02
申请号：US11472452
申请日：2006-06-22
申请人： Kyoko Izuha , Hideki Kanai , Soichi Inoue , Shingo Kanamitsu , Shinichi Ito
发明人： Kyoko Izuha , Hideki Kanai , Soichi Inoue , Shingo Kanamitsu , Shinichi Ito
IPC分类号： G03C5/00
CPC分类号： G03F1/30 , G03F1/32 , G03F7/70641 , G03F7/70683
摘要： Disclosed is a mask comprising a first area including a first surrounding area in which a halftone phase shift film or a stacked film of a halftone phase shift film and an opaque film is provided on a transparent substrate, and a first opening area surrounded by the first surrounding area, and a second area including a second surrounding area in which a halftone phase shift film is provided on the transparent substrate and a second opening area surrounded by the second surrounding area, wherein a transparent film is provided in at least a part of the second opening area, the transparent film being configured to give a predetermined phase difference to exposure light passing through that part of the second opening area in which the transparent film is provided relative to exposure light passing through the second surrounding area.
摘要翻译：公开了一种掩模，其包括：第一区域，包括第一周围区域，在透明基板上设置有半色调相移膜或半色调相移膜的叠层膜和不透明膜;以及第一开口区域，以及第二区域，其包括在透明基板上设置半色调相移膜的第二周围区域和由第二周围区域围绕的第二开口区域，其中在至少一部分中设置透明膜第二开口区域，所述透明膜被配置为相对于穿过所述第二周围区域的曝光光而通过其中设置有所述透明膜的所述第二开口区域的那部分的曝光而给予预定的相位差。

95. 发明授权

US07477353B2 Lithography apparatus, method of forming pattern and method of manufacturing semiconductor device 失效
标题翻译：平版印刷设备，形成图案的方法和制造半导体器件的方法
公开(公告)号：US07477353B2
公开(公告)日：2009-01-13
申请号：US11174722
申请日：2005-07-06
申请人： Shinichi Ito , Tsuyoshi Shibata
发明人： Shinichi Ito , Tsuyoshi Shibata
IPC分类号： G03B27/42 , G03B27/52 , G03B27/32 , G03F7/00
CPC分类号： G03F7/70991 , G03F7/70341 , G03F7/70858 , G03F7/70916 , G03F7/70925
摘要： A lithography apparatus includes a resist processing apparatus to perform a process of applying a resist on a substrate, a process of heating a resist film on the substrate, and a process of developing the resist film on the substrate, an immersion exposure apparatus including a projection optical system which projects an image of a pattern on a photomask onto the resist film and configured to perform exposure through liquid located on an optical path between the projection optical system and resist film, a transporting apparatus connected to the resist processing and immersion exposure apparatuses to perform transportation of the substrate between the resist processing and immersion exposure apparatuses, and a temperature/humidity control apparatus configured to control at least one of temperature and humidity in at least one of the resist processing and transporting apparatuses based on temperature and humidity or the in humidity the immersion exposure apparatus.
摘要翻译：光刻设备包括：抗蚀剂处理设备，用于执行在基板上施加抗蚀剂的工艺;加热基板上的抗蚀剂膜的工艺;以及在基板上显影抗蚀剂膜的工艺;浸渍曝光设备，包括：投影光学系统，其将光掩模上的图案的图像投影到抗蚀剂膜上，并且被配置为通过位于投影光学系统和抗蚀剂膜之间的光路上的液体进行曝光，连接到抗蚀剂处理和浸没曝光装置的传送装置在抗蚀剂处理和浸没曝光装置之间执行基板的传送，以及温度/湿度控制装置，其被配置为基于温度和湿度控制至少一个抗蚀剂处理和输送装置中的温度和湿度，湿度浸渍曝光设备。

96. 发明授权

US07472582B2 Leak diagnosis system and leak diagnosis method 失效
标题翻译：泄漏诊断系统和泄漏诊断方法
公开(公告)号：US07472582B2
公开(公告)日：2009-01-06
申请号：US11431651
申请日：2006-05-11
申请人： Shinichi Ito , Nobuhiro Takano
发明人： Shinichi Ito , Nobuhiro Takano
IPC分类号： G01M3/04
CPC分类号： F02M25/0809
摘要： An ECU drives a pump in a first stage at a first pumping capacity. The ECU drives the pump in a second stage after the first stage at a second pumping capacity, which is lower than the first pumping capacity. The second pumping capacity is set such that when at least one leak hole, which forms a predetermined total opening cross sectional area, exists in the purge apparatus, the driving of the pump at the second pumping capacity substantially maintains a predetermined reference pressure in the purge apparatus. The ECU diagnoses whether a leak hole exits in the purge apparatus based on the pressure measured with the pressure sensor in view of the predetermined reference pressure at the time of driving the pump in the second stage at the second pumping capacity.
摘要翻译： ECU以第一泵送能力在第一级驱动泵。 ECU在第一阶段之后的第二阶段中以比第一泵送能力低的第二泵送能力驱动泵。第二抽吸能力设定成使得当在净化装置中存在至少一个形成预定总开口横截面面积的泄漏孔时，在第二抽水能力下的泵的驱动基本上保持了吹扫中的预定参考压力仪器。考虑到在第二阶段以第二泵送能力驱动泵时的预定参考压力，ECU基于在压力传感器测量的压力下，泄漏孔是否泄漏在净化装置中。

97. 发明申请

US20080218715A1 IMMERSION EXPOSURE METHOD OF AND IMMERSION EXPOSURE APPARATUS FOR MAKING EXPOSURE IN A STATE WHERE THE SPACE BETWEEN THE PROJECTION LENS AND SUBSTRATE TO BE PROCESSED IS FILLED WITH A LIQUID 审中-公开
标题翻译：在投影镜头和待处理的衬底之间的空间填充液体的状态下，接触曝光方法和浸入曝光装置
公开(公告)号：US20080218715A1
公开(公告)日：2008-09-11
申请号：US12044439
申请日：2008-03-07
申请人： Masayuki HATANO , Shinichi Ito
发明人： Masayuki HATANO , Shinichi Ito
IPC分类号： G03B27/42
CPC分类号： G03F7/70358 , G03F7/70341 , G03F7/70425
摘要： An immersion exposure method is disclosed which, while causing a relative movement of an immersion area formed so as to intervene between a substrate to be exposed on an exposure stage and a projection lens to the substrate, exposes an irradiation area of the substrate covered with the immersion area. An exposure stage is moved in a first direction, thereby exposing a first exposure area of the substrate. The exposure stage is moved in a second direction opposite to the first direction, thereby exposing a second exposure area adjoining the first exposure area. In a state where the second exposure area is held inside the immersion boundary of the immersion area, the exposure stage is moved from the movement end position of the exposure stage in a first exposure moving process to the movement start position of the exposure stage in a second exposure moving process.
摘要翻译：公开了一种浸没曝光方法，其中，使形成的浸渍区域的相对运动在曝光台上待曝光的基板和投影透镜之间介入到基板的同时，使被覆盖的基板的照射区域曝光沉浸区域。曝光阶段沿第一方向移动，从而暴露基板的第一曝光区域。曝光阶段在与第一方向相反的第二方向上移动，从而暴露与第一曝光区域相邻的第二曝光区域。在第二曝光区域保持在浸没区域的浸没边界内的状态下，曝光阶段在第一曝光移动处理中从曝光台的移动结束位置移动到曝光台的移动开始位置第二曝光移动过程。

98. 发明授权

US07423728B2 Immersion exposure method and apparatus, and manufacturing method of a semiconductor device 有权
标题翻译：浸渍曝光方法和装置以及半导体装置的制造方法
公开(公告)号：US07423728B2
公开(公告)日：2008-09-09
申请号：US11315000
申请日：2005-12-23
申请人： Kentaro Matsunaga , Takuya Kono , Shinichi Ito
发明人： Kentaro Matsunaga , Takuya Kono , Shinichi Ito
IPC分类号： G03B27/54
CPC分类号： G03F7/70341
摘要： There is disclosed an immersion exposure method of carrying out an exposure process in a state that liquid is at least partly filled between a substrate to be exposed and a projection optical system of an exposure apparatus carrying out the exposure process, comprising carrying out a process of making large a contact angle to the liquid with at least outer peripheral portion of a main surface of the substrate compared with a contact angle to the liquid with an area adjacent to the outer peripheral portion of the substrate, which area is a part of a surface of a substrate supporting side of a substrate support member supporting the substrate included in the exposure apparatus, and carrying out the exposure process.
摘要翻译：公开了一种在液体至少部分地填充在待曝光的基板和进行曝光处理的曝光装置的投影光学系统之间进行曝光处理的浸渍曝光方法，包括进行以下处理：与具有与基板的外周部分相邻的区域的液体的接触角相比，与基板的主表面的至少外周部分形成与液体大的接触角，该区域是表面的一部分支撑包含在曝光装置中的基板的基板支撑部件的基板支撑侧，进行曝光处理。

99. 发明授权

US07413185B2 Paper sheet takeout apparatus 失效
标题翻译：纸张取出装置
公开(公告)号：US07413185B2
公开(公告)日：2008-08-19
申请号：US11132416
申请日：2005-05-19
申请人： Yusuke Mitsuya , Shinichi Ito
发明人： Yusuke Mitsuya , Shinichi Ito
IPC分类号： B65H3/52
CPC分类号： B65H1/14 , B65H1/025 , B65H3/0653 , B65H3/5246 , B65H2511/414 , B65H2513/10 , B65H2515/30 , B65H2557/23 , B65H2220/01 , B65H2220/02
摘要： A paper sheet takeout apparatus has a memory which has several processing modes, and stores parameters of a supply speed of a supply unit, a pressing force of a delivering roller and a separating force of a separating roller for each processing mode, a setting unit which selects one of several processing modes, and a controller which reads the parameters from the memory in accordance with the processing mode selected by the setting unit and which controls at least one of supply speed of the supply unit, a pressing force of a delivering roller and a separating force of the separating roller, on the basis of the parameters read from the memory.
摘要翻译：纸张取出装置具有多种处理模式的存储器，并存储用于每种处理模式的供给单元的供给速度，输送辊的按压力和分离辊的分离力的参数，设定单元，选择若干处理模式之一，以及控制器，其根据由设定单元选择的处理模式从存储器读取参数，并且控制供应单元的供给速度，输送辊的按压力和输送辊的压力中的至少一个，基于从存储器读取的参数，分离辊的分离力。

100. 发明授权

US07367557B2 Sheet material feeding apparatus 失效
标题翻译：片材送料装置
公开(公告)号：US07367557B2
公开(公告)日：2008-05-06
申请号：US11170800
申请日：2005-06-30
申请人： Shinichi Ito , Naruaki Hiramitsu , Yoshihiko Naruoka
发明人： Shinichi Ito , Naruaki Hiramitsu , Yoshihiko Naruoka
IPC分类号： B65H1/02
CPC分类号： B65H1/025 , B65H3/0653 , B65H2511/214 , B65H2701/1916 , B65H2220/02 , B65H2220/08
摘要： A sheet material feeding apparatus includes a feed-out device that brings the stacked sheet materials conveyed on a floor belt into contact with a pickup roller and feeds the sheet materials out in a direction crossing the conveying direction of the stacked sheet materials by rotation of the pickup roller, and an inclination correcting device provided in an upstream of the feed-out device in its sheet material feeding direction and including an upper roller located at a position higher than that of the pickup roller, that brings an upper side of the stacked sheet materials conveyed towards the feed-out device into contact with the upper roller to correct the inclination of the stacked sheet materials.
摘要翻译：片材供给装置包括：送出装置，其将输送在地板带上的层叠片材与拾取辊接触，并将片材沿与叠层片材的输送方向交叉的方向通过拾取辊和倾斜校正装置，其设置在所述送出装置的片材供给方向的上游，并且包括位于比拾取辊的位置高的位置的上辊，其将堆叠片材的上侧向送出装置输送的材料与上辊接触以校正堆叠的片材的倾斜度。

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