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    • 93. 发明申请
    • Fungicidal Mixtures Comprising a Substituted 3-Hydroxymethylpyridine and a Further Fungicidal Compound
    • 包含取代的3-羟甲基吡啶和另外的杀真菌化合物的杀真菌混合物
    • US20100273650A1
    • 2010-10-28
    • US12742717
    • 2008-11-14
    • Jens RennerSarah UlmschneiderJochen DietzEgon Haden
    • Jens RennerSarah UlmschneiderJochen DietzEgon Haden
    • A01C1/06A61K31/4427A61K31/535
    • A01N43/40A01N2300/00
    • The present invention relates to mixtures of fungicidally active compounds comprising at least one substituted 3-hydroxymethylpyridin compound formula I and at least one further fungicidally active compound II. wherein: X is O, S or NR4; R1 is C1-C6-alkyl, C1-C6-alkoxy-C1-C6-alkyl, C1-C6-haloalkyl, aryl-C1-C4-alkyl, aryloxy-C1-C4-alkyl, arylthio-C1-C4-alkyl, aryl or heteroaryl, wherein the cyclic moieties of the last five radicals are unsubstituted or substituted with 1, 2 or 3 radicals selected from halogen, C1-C4-alkyl, C2-C4-alkenyl, C2-C4-alkynyl, C1-C4-haloalkyl, C1-C4-alkoxy, C1-C4-alkylthio, C1-C4-haloalkoxy, C1-C4-haloalkylthio, cyano and nitro; R2 is H or C1-C4-alkyl; R3 is C1-C6-alkyl, C1-C6-alkoxy-C1-C6-alkyl, C1-C6-haloalkyl, aryl-C1-C4-alkyl, aryloxy-C1-C4-alkyl, arylthio-C1-C4-alkyl, aryl or heteroaryl, wherein the cyclic moieties of the last five radicals are unsubstituted or substituted with 1, 2 or 3 radicals selected from halogen, C1-C4-alkyl, C2-C4-alkenyl, C2-C4-alkynyl, C1-C4-haloalkyl, C1-C4-alkoxy, C1-C4-alkylthio, C1-C4-haloalkoxy, C1-C4-haloalkylthio, cyano and nitro; R4 is H, C1-C6-alkyl, C1-C6-alkoxy-C1-C6-alkyl, C1-C6-haloalkyl, aryl-C1-C4-alkyl, aryloxy-C1-C4-alkyl, arylthio-C1-C4-alkyl, aryl or heteroaryl, wherein the cyclic moieties of the last five radicals are unsubstituted or substituted with 1, 2 or 3 radicals selected from halogen, C1-C4-alkyl, C2-C4-alkenyl, C2-C4-alkynyl, C1-C4-haloalkyl, C1-C4-alkoxy, C1-C4-alkylthio, C1-C4-haloalkoxy, C1-C4-haloalkylthio, cyano and nitro;
    • 本发明涉及杀真菌活性化合物的混合物,其包含至少一种取代的3-羟甲基吡啶化合物式I和至少一种其它杀真菌活性化合物II。 其中:X是O,S或NR4; R 1是C 1 -C 6烷基,C 1 -C 6烷氧基-C 1 -C 6烷基,C 1 -C 6卤代烷基,芳基-C 1 -C 4烷基,芳氧基-C 1 -C 4烷基,芳硫基-C 1 -C 4烷基, 芳基或杂芳基,其中最后五个基团的环状部分是未取代的或被1,2或3个选自卤素,C 1 -C 4 - 烷基,C 2 -C 4 - 烯基,C 2 -C 4 - 炔基,C 1 -C 4 - 卤代烷基,C 1 -C 4 - 烷氧基,C 1 -C 4 - 烷硫基,C 1 -C 4卤代烷氧基,C 1 -C 4卤代烷硫基,氰基和硝基; R2是H或C1-C4-烷基; R 3是C 1 -C 6烷基,C 1 -C 6烷氧基-C 1 -C 6烷基,C 1 -C 6卤代烷基,芳基-C 1 -C 4烷基,芳氧基-C 1 -C 4烷基,芳硫基-C 1 -C 4烷基, 芳基或杂芳基,其中最后五个基团的环状部分是未取代的或被1,2或3个选自卤素,C 1 -C 4 - 烷基,C 2 -C 4 - 烯基,C 2 -C 4 - 炔基,C 1 -C 4 - 卤代烷基,C 1 -C 4 - 烷氧基,C 1 -C 4 - 烷硫基,C 1 -C 4卤代烷氧基,C 1 -C 4卤代烷硫基,氰基和硝基; R 4是H,C 1 -C 6烷基,C 1 -C 6烷氧基-C 1 -C 6烷基,C 1 -C 6卤代烷基,芳基-C 1 -C 4烷基,芳氧基-C 1 -C 4烷基,芳硫基-C 1 -C 4 - 烷基,芳基或杂芳基,其中最后五个基团的环状部分是未取代的或被1,2或3个选自卤素,C 1 -C 4 - 烷基,C 2 -C 4 - 烯基,C 2 -C 4 - 炔基,C 1 -C 4 - C 1 -C 4 - 卤代烷基,C 1 -C 4 - 烷氧基,C 1 -C 4 - 烷硫基,C 1 -C 4卤代烷氧基,C 1 -C 4卤代烷硫基,氰基和硝基;