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    • 96. 发明申请
    • Process of octagonal pole for microwave assisted magnetic recording (MAMR) writer
    • 微波辅助磁记录(MAMR)作者八角极的过程
    • US20110216447A1
    • 2011-09-08
    • US12660819
    • 2010-03-03
    • Min LiCherng-Chyi HanKenichi TakanoJoe Smyth
    • Min LiCherng-Chyi HanKenichi TakanoJoe Smyth
    • G11B5/33G03F7/20
    • G11B5/314G11B5/1278G11B2005/0024
    • A microwave assisted magnetic recording writer is disclosed with an octagonal write pole having a top portion including a trailing edge that is self aligned to a spin transfer oscillator (STO). Leading and trailing edges are connected by two sidewalls each having three sections. A first section on each side is coplanar with the STO sidewalls and is connected to a sloped second section at a first corner. Each second section is connected to a third section at a second corner where the distance between second corners is greater than the distance between first corners. A method of forming the writer begins with a trapezoidal shaped write pole in an insulation layer. Two ion beam etch (IBE) steps are used to shape top and middle portions of the write pole and narrow the pole width to
    • 公开了一种具有八角写磁极的微波辅助磁记录装置,其具有包括与自旋转移振荡器(STO)自对准的后沿的顶部。 前缘和后缘由具有三个部分的两个侧壁连接。 每侧的第一部分与STO侧壁共面,并且在第一角处连接到倾斜的第二部分。 每个第二部分连接到第二角处的第三部分,其中第二角之间的距离大于第一角之间的距离。 一种形成写入器的方法从绝缘层中的梯形写入极开始。 使用两个离子束蚀刻(IBE)步骤来形成写入极的顶部和中间部分,并且将极宽度窄化到<50nm而不破裂。 最后,在STO上形成一个后挡板。
    • 97. 发明申请
    • Method to make a perpendicular magnetic recording head with a bottom side shield
    • 制造具有底侧屏蔽的垂直磁记录头的方法
    • US20080297945A1
    • 2008-12-04
    • US11809346
    • 2007-05-31
    • Cherng-Chyi HanMin LiFenglin LiuLijie Guan
    • Cherng-Chyi HanMin LiFenglin LiuLijie Guan
    • G11B5/127G11B5/147H04R31/00
    • G11B5/3163G11B5/1278G11B5/3116G11B5/315Y10T29/49032Y10T29/49052
    • A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of bottom side shields and shielded from above by an upper shield. The bottom side shields surround a lower portion of the pole tip while the upper portion of the pole tip is surrounded by non-magnetic layers. The bottom shields and the non-magnetic layer form wedge-shaped trench in which the pole tip is formed by a self-aligned plating process. The wedge shape is formed by a RIE process using specific gases applied through a masking layer formed of material that has a slower etch rate than the non-magnetic material or the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a non-magnetic layer of alumina that is formed on a shield layer of NiFe and using RIE gases of CH3OH, CO or NH3 or their combinations, produces the desired result. A write gap layer and an upper shield is then formed above the side shields and pole. The resulting structure substantially eliminates track overwrite while maintaining good track definition.
    • 垂直磁记录(PMR)头被制造成具有通过分离的一对底侧屏蔽横向屏蔽的极尖,并由上屏蔽从上面屏蔽。 底侧屏蔽围绕极尖的下部,而极尖的上部被非磁性层包围。 底部屏蔽层和非磁性层形成楔形沟槽,其中极尖通过自对准电镀工艺形成。 楔形形状通过RIE工艺形成,其使用通过由比非磁性材料或屏蔽材料具有较慢蚀刻速率的材料形成的掩模层施加的特定气体。 形成在NiFe的屏蔽层上并使用CH 3 OH,CO或NH 3的RIE气体或其组合的形成在氧化铝的非磁性层上的Ta,Ru / Ta,TaN或Ti的掩蔽层产生期望的结果 。 然后在侧屏和极上方形成写间隙层和上屏蔽。 所得到的结构基本上消除了轨道重写,同时保持良好的轨道定义。
    • 100. 发明授权
    • Method for fabricating a high coercivity hard bias structure for magnetoresistive sensor
    • 用于制造用于磁阻传感器的高矫顽力硬偏置结构的方法
    • US09034149B2
    • 2015-05-19
    • US12387377
    • 2009-05-01
    • Min ZhengKunliang ZhangMin Li
    • Min ZhengKunliang ZhangMin Li
    • C23C14/58C23C14/14C23C14/02G01R33/09G11B5/31G11B5/39
    • C23C14/5833C23C14/025C23C14/14C23C14/5873G01R33/098G11B5/3163G11B5/3932
    • A hard bias (HB) structure for longitudinally biasing a free layer in a MR sensor is disclosed that includes a mildly etched seed layer and a hard bias (HB) layer on the etched seed layer. The HB layer may contain one or more HB sub-layers stacked on a lower sub-layer which contacts the etched seed layer. Each HB sub-layer is mildly etched before depositing another HB sub-layer thereon. The etch may be performed in an IBD chamber and creates a higher concentration of nucleation sites on the etched surface thereby promoting a smaller HB average grain size than would be realized with no etch treatments. A smaller HB average grain size is responsible for increasing Hcr in a CoPt HB layer to as high as 2500 to 3000 Oe. Higher Hcr is achieved without changing the seed layer or HB material and without changing the thickness of the aforementioned layers.
    • 公开了用于纵向偏置MR传感器中的自由层的硬偏置(HB)结构,其包括在蚀刻的种子层上的温和蚀刻的种子层和硬偏置(HB)层。 HB层可以包含堆叠在与蚀刻的种子层接触的下子层上的一个或多个HB子层。 每个HB子层在其上沉积另一个HB子层之前被轻度蚀刻。 蚀刻可以在IBD室中进行,并且在蚀刻表面上产生更高浓度的成核位点,从而促进比无蚀刻处理实现的更小的HB平均晶粒尺寸。 较小的HB平均粒径负责将CoPt HB层中的Hcr增加到高达2500至3000 Oe。 在不改变种子层或HB材料而不改变上述层的厚度的情况下实现更高的Hcr。