专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

91. 发明授权

US06887625B2 Assist features for use in lithographic projection 有权
标题翻译：辅助光刻投影的功能
公开(公告)号：US06887625B2
公开(公告)日：2005-05-03
申请号：US09905198
申请日：2001-07-16
申请人： Johannes Jacobus Matheus Baselmans , Markus Schluter , Donis George Flagello , Robert John Socha
发明人： Johannes Jacobus Matheus Baselmans , Markus Schluter , Donis George Flagello , Robert John Socha
IPC分类号： G03F1/00 , G03F7/20 , G03F9/00 , G03C5/00 , G06F17/50
CPC分类号： G03F7/70433 , G03F1/36
摘要： In a mask pattern for a device such as a DRAM including a nearly regular array of isolated features, assist features are positioned so as to make the array more symmetric. Where the isolated features are positioned at most but not all of the points of a regular unit cell, the assist features may be positioned at the points of the unit cell not occupied by the isolated features. The isolated features may represent contact holes.
摘要翻译：在诸如包括几乎规则的孤立特征阵列的DRAM的设备的掩模图案中，辅助特征被定位成使阵列更对称。在隔离特征被定位在常规单位单元的最多但不是全部点处的情况下，辅助特征可以位于不被隔离特征占据的单位单元的点处。隔离的特征可以表示接触孔。

92. 发明授权

US06777139B2 Method of calibration of a lithographic apparatus, mask for use in calibration of lithographic apparatus, lithographic apparatus, device manufacturing method, device manufactured thereby 失效
标题翻译：光刻设备的校准方法，用于光刻设备校准的掩模，光刻设备，器件制造方法，由此制造的器件
公开(公告)号：US06777139B2
公开(公告)日：2004-08-17
申请号：US10139625
申请日：2002-05-07
申请人： Johannes Jacobus Matheus Baselmans
发明人： Johannes Jacobus Matheus Baselmans
IPC分类号： G03F900
CPC分类号： G03F7/70558 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03F9/7076 , G03F9/7084
摘要： An alignment marker for use in calibration of a lithographic projection apparatus has focus sensitive parts and dose sensitive parts, each of which includes an area having a plurality of dots against a contrasting background forming part of a periodic line structure.
摘要翻译：用于光刻投影设备的校准的对准标记具有焦点敏感部件和剂量敏感部件，每个部件和剂量敏感部件包括具有多个点的区域，该区域形成构成周期线结构的一部分的对比背景。

93. 发明授权

US08937706B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US08937706B2
公开(公告)日：2015-01-20
申请号：US11729960
申请日：2007-03-30
申请人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen
发明人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70291 , G03F7/70116 , G03F7/702 , G03F7/70516
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
摘要翻译：装置制造方法包括使用照明系统来调节辐射束。调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。该方法还包括以其横截面中的图案图案化辐射束以形成图案化的辐射束，并将图案化的辐射束投影到基板的目标部分上。

94. 发明授权

US08692974B2 Lithographic apparatus and device manufacturing method using pupil filling by telecentricity control 失效
标题翻译：使用通过远心控制的瞳孔填充的平版印刷设备和器件制造方法
公开(公告)号：US08692974B2
公开(公告)日：2014-04-08
申请号：US11763274
申请日：2007-06-14
申请人： Johannes Jacobus Matheus Baselmans
发明人： Johannes Jacobus Matheus Baselmans
IPC分类号： G03B27/68 , G03B27/54 , G03B27/32 , G03B27/42 , G03B27/52 , G03B27/72
CPC分类号： G03F7/7085 , G03F7/70283 , G03F7/706
摘要： A method of measuring aberration present in a lithographic apparatus comprising the following steps. Modulating a radiation beam using a reflective patterning device. Projecting the radiation beam using a projection system. Detecting the projected radiation using a sensor. Measuring aberration via interference in the detected radiation beam. The radiation beam is tilted away from the optical axis of the projection system prior to entering the projection system.
摘要翻译：一种测量存在于光刻设备中的像差的方法，包括以下步骤。使用反射图案形成装置调制辐射束。使用投影系统投射辐射束。使用传感器检测投影辐射。通过检测到的辐射束中的干涉测量像差。在进入投影系统之前，辐射束从投影系统的光轴倾斜。

95. 发明授权

US08508715B2 Lithographic apparatus and device manufacturing method utilizing data filtering 有权
标题翻译：利用数据滤波的平版印刷设备和器件制造方法
公开(公告)号：US08508715B2
公开(公告)日：2013-08-13
申请号：US12915566
申请日：2010-10-29
申请人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
发明人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70191 , G03F7/70291 , G03F7/70433 , G03F7/70508
摘要： An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.
摘要翻译：使用装置和方法在基板上形成图案。该装置包括投影系统，图案形成装置，低通滤波器和数据操作装置。投影系统将辐射束投射到基板上作为子光束阵列。图案形成装置调制子光束以在衬底上基本上产生所要求的剂量图案。低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包含低于选定阈值频率的空间频率分量的限幅目标剂量模式。数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。在各种示例中，也可以使用过滤器。

96. 发明申请

US20110043778A1 Lithographic Apparatus and Device Manufacturing Method Utilizing Data Filtering 有权
标题翻译：利用数据过滤的平版印刷设备和器件制造方法
公开(公告)号：US20110043778A1
公开(公告)日：2011-02-24
申请号：US12915566
申请日：2010-10-29
申请人： Patricius Aloysius Jacobus TINNEMANS , Johannes Jacobus Matheus Baselmans
发明人： Patricius Aloysius Jacobus TINNEMANS , Johannes Jacobus Matheus Baselmans
IPC分类号： G03B27/72 , G03B27/52 , G03B27/32
CPC分类号： G03F7/70191 , G03F7/70291 , G03F7/70433 , G03F7/70508
摘要： An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.
摘要翻译：使用装置和方法在基板上形成图案。该装置包括投影系统，图案形成装置，低通滤波器和数据操作装置。投影系统将辐射束投射到基板上作为子光束阵列。图案形成装置调制子光束以在衬底上基本上产生所要求的剂量图案。低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包含低于选定阈值频率的空间频率分量的限幅目标剂量模式。数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。在各种示例中，也可以使用过滤器。

97. 发明授权

US07773287B2 Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation 有权
标题翻译：无掩模光刻的方法和系统实时图案光栅化和使用计算耦合镜实现最佳特征表征
公开(公告)号：US07773287B2
公开(公告)日：2010-08-10
申请号：US11790222
申请日：2007-04-24
申请人： Azat M. Latypov , Kars Zegar Troost , Johannes Jacobus Matheus Baselmans
发明人： Azat M. Latypov , Kars Zegar Troost , Johannes Jacobus Matheus Baselmans
IPC分类号： G02B26/00
CPC分类号： G03F7/70291
摘要： A method and system for determining specific pixel modulation states of a spatial light modulator (SLM) to print a desired pattern on a substrate are disclosed. The method includes selecting at least one super-pixel in an object plane of the desired pattern, the super-pixel being formed of at least two pixels. At least one edge of the desired pattern crosses a boundary within the super-pixel, the at least one edge being defined by specific slope and position parameters relative to the super-pixel. The method also includes (i) forming an interpolation table to tabulate pre-calculated pixel modulation states and (ii) determining the specific pixel modulation states for each of the pixels in accordance with the interpolation table. Disclosed also are a method and system for providing a spatial light modulator (SLM). The SLM includes a plurality of mirrors structured to form groups of super-pixels. Each super-pixel (i) includes two or more mirrors from the plurality of mirrors and (ii) is configured to switch only one pixel of light. Each of the two or more mirrors can be separately actuated.
摘要翻译：公开了一种用于确定空间光调制器（SLM）的特定像素调制状态以在衬底上打印所需图案的方法和系统。所述方法包括：在所述期望图案的物平面中选择至少一个超像素，所述超像素由至少两个像素形成。所需图案的至少一个边缘穿过超像素内的边界，所述至少一个边缘由相对于超像素的特定斜率和位置参数限定。该方法还包括（i）形成内插表以列出预先计算的像素调制状态，以及（ii）根据内插表确定每个像素的特定像素调制状态。还公开了一种用于提供空间光调制器（SLM）的方法和系统。 SLM包括被构造成形成超像素组的多个反射镜。每个超像素（i）包括来自多个反射镜的两个或更多个反射镜，并且（ii）被配置为仅切换一个像素的光。两个或更多个反射镜中的每一个可以被单独地致动。

98. 发明授权

US07649676B2 System and method to form unpolarized light 有权
标题翻译：系统和方法形成非偏振光
公开(公告)号：US07649676B2
公开(公告)日：2010-01-19
申请号：US11452435
申请日：2006-06-14
申请人： Johannes Jacobus Matheus Baselmans , Huibert Visser
发明人： Johannes Jacobus Matheus Baselmans , Huibert Visser
IPC分类号： G02B26/08
CPC分类号： G02B27/123 , G03F7/70566
摘要： A system and method are used to form an unpolarized light beam from a polarized light beam. A system comprises a source of radiation and a unpolarizing system. The source of radiation produces a linear polarized beam. The unpolarizing system has first and second optical paths and splits the linear polarized beam. A first portion of the split beam travels along the first optical path having a first path length. A second portion of the split beam travels along the second optical path having a second, different path length. The first and second portions of the split beam are combined to form the unpolarized beam.
摘要翻译：使用系统和方法来形成来自偏振光束的非偏振光束。系统包括辐射源和非偏振系统。辐射源产生线偏振光束。非偏振系统具有第一和第二光路，并分裂线偏振光束。分束的第一部分沿着具有第一路径长度的第一光路行进。分束的第二部分沿着具有第二不同路径长度的第二光路传播。分束的第一和第二部分被组合以形成非偏振光束。

99. 发明授权

US07561252B2 Interferometric lithography system and method used to generate equal path lengths of interfering beams 有权
标题翻译：用于产生相等路径长度的干涉光束的干涉光刻系统和方法
公开(公告)号：US07561252B2
公开(公告)日：2009-07-14
申请号：US11320473
申请日：2005-12-29
申请人： Harry Sewell , Johannes Jacobus Matheus Baselmans
发明人： Harry Sewell , Johannes Jacobus Matheus Baselmans
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G03B27/54 , G03F7/70408
摘要： A system and method are provided for writing patterns onto substrates. First and second beams are directed to converge and substantially overlap in a common region on a substrate. This can be done so that the first and second beams are mutually temporally coherent and spatially coherent in the region of overlap to form interference fringes to define a writing image. A beam width of the first and second beams is adjusted. This can be done so that respective path lengths of the beams are matched when they reach the common region to ensure the first and second beams are mutually spatially coherent and temporally coherent across an entire width of the common region. In one example, the substrate is moved with respect to the writing image, while writing patterns onto the substrate. In another example, the substrate remains stationary.
摘要翻译：提供了将图案写入基板的系统和方法。引导第一和第二光束在基板上的公共区域中会聚并基本重叠。这可以进行，使得第一和第二波束在重叠区域中相互时空相干和空间相干以形成干涉条纹以限定写入图像。调整第一和第二光束的光束宽度。这可以进行，使得当它们到达公共区域时，波束的相应路径长度匹配，以确保第一和第二波束在公共区域的整个宽度上相互空间相干和时间相干。在一个示例中，当将图案写入基板时，基板相对于写入图像移动。在另一个实例中，衬底保持静止。

100. 发明申请

US20090168039A1 Device Manufacturing Method and Lithographic Apparatus 有权
标题翻译：设备制造方法和平版印刷设备
公开(公告)号：US20090168039A1
公开(公告)日：2009-07-02
申请号：US12345105
申请日：2008-12-29
申请人： Haico Victor KOK , Johannes Jacobus Matheus Baselmans , Marcus Adrianus Van De Kerkhof
发明人： Haico Victor KOK , Johannes Jacobus Matheus Baselmans , Marcus Adrianus Van De Kerkhof
IPC分类号： G03B27/42
CPC分类号： G03F7/70116 , G03F7/70075 , G03F7/706
摘要： A device manufacturing method includes a measurement phase and an exposure phase. The measurement phase includes conditioning a radiation beam with a first beam condition, forming the patterned radiation beam by imparting the radiation beam with the first beam condition with a first pattern in its cross-section, and projecting the patterned beam onto a sensor capable of providing a sensor output signal. The exposure phase includes fast switching the conditioning of the radiation beam to a second beam condition, the second beam condition being different from the first beam condition, forming the patterned radiation beam by imparting the radiation beam with the second beam condition with a second pattern in its cross-section, the second pattern being provided by a patterning device, and projecting the patterned beam onto a target portion of the substrate.
摘要翻译：装置制造方法包括测量阶段和曝光阶段。测量阶段包括对具有第一光束条件的辐射束进行调节，通过在其横截面中赋予具有第一图案的第一光束条件的辐射束来形成图案化的辐射束，并且将图案化的光束投影到能够提供传感器输出信号。曝光阶段包括将辐射束的调理快速切换到第二光束状态，第二光束条件不同于第一光束条件，通过将第二光束条件赋予具有第二光束条件的第二光束条件来形成图案化辐射束其横截面，第二图案由图案形成装置提供，并且将图案化的光束投影到基板的目标部分上。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式